JPH10189424A5 - - Google Patents

Info

Publication number
JPH10189424A5
JPH10189424A5 JP1996350085A JP35008596A JPH10189424A5 JP H10189424 A5 JPH10189424 A5 JP H10189424A5 JP 1996350085 A JP1996350085 A JP 1996350085A JP 35008596 A JP35008596 A JP 35008596A JP H10189424 A5 JPH10189424 A5 JP H10189424A5
Authority
JP
Japan
Prior art keywords
mask
exposure apparatus
cooling
irradiation amount
photosensitive substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1996350085A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10189424A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP8350085A priority Critical patent/JPH10189424A/ja
Priority claimed from JP8350085A external-priority patent/JPH10189424A/ja
Publication of JPH10189424A publication Critical patent/JPH10189424A/ja
Publication of JPH10189424A5 publication Critical patent/JPH10189424A5/ja
Pending legal-status Critical Current

Links

JP8350085A 1996-12-27 1996-12-27 露光装置 Pending JPH10189424A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8350085A JPH10189424A (ja) 1996-12-27 1996-12-27 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8350085A JPH10189424A (ja) 1996-12-27 1996-12-27 露光装置

Publications (2)

Publication Number Publication Date
JPH10189424A JPH10189424A (ja) 1998-07-21
JPH10189424A5 true JPH10189424A5 (enExample) 2004-12-16

Family

ID=18408141

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8350085A Pending JPH10189424A (ja) 1996-12-27 1996-12-27 露光装置

Country Status (1)

Country Link
JP (1) JPH10189424A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020064453A (ko) * 2001-02-01 2002-08-09 삼성전자 주식회사 반도체 노광시스템 및 이를 이용한 반도체 노광방법
JP4488867B2 (ja) * 2004-11-05 2010-06-23 株式会社東芝 パターン形成方法
JPWO2007066687A1 (ja) * 2005-12-06 2009-05-21 株式会社ニコン 温度計測方法、露光方法、露光装置、及びデバイス製造方法
US9703212B2 (en) 2015-03-12 2017-07-11 Kabushiki Kaisha Toshiba Exposure apparatus
JP2020187334A (ja) 2019-05-17 2020-11-19 キヤノン株式会社 露光装置、および物品製造方法

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