JPH10133233A5 - - Google Patents

Info

Publication number
JPH10133233A5
JPH10133233A5 JP1996308684A JP30868496A JPH10133233A5 JP H10133233 A5 JPH10133233 A5 JP H10133233A5 JP 1996308684 A JP1996308684 A JP 1996308684A JP 30868496 A JP30868496 A JP 30868496A JP H10133233 A5 JPH10133233 A5 JP H10133233A5
Authority
JP
Japan
Prior art keywords
film
silicon nitride
nitride film
gate insulating
display circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1996308684A
Other languages
English (en)
Japanese (ja)
Other versions
JP3602279B2 (ja
JPH10133233A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP30868496A priority Critical patent/JP3602279B2/ja
Priority claimed from JP30868496A external-priority patent/JP3602279B2/ja
Priority to US08/962,047 priority patent/US6262438B1/en
Publication of JPH10133233A publication Critical patent/JPH10133233A/ja
Priority to US09/906,883 priority patent/US6660549B2/en
Application granted granted Critical
Publication of JP3602279B2 publication Critical patent/JP3602279B2/ja
Publication of JPH10133233A5 publication Critical patent/JPH10133233A5/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP30868496A 1996-11-04 1996-11-04 アクティブマトリクス型表示回路およびその作製方法 Expired - Fee Related JP3602279B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP30868496A JP3602279B2 (ja) 1996-11-04 1996-11-04 アクティブマトリクス型表示回路およびその作製方法
US08/962,047 US6262438B1 (en) 1996-11-04 1997-10-31 Active matrix type display circuit and method of manufacturing the same
US09/906,883 US6660549B2 (en) 1996-11-04 2001-07-16 Method of manufacturing an active matrix type display circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30868496A JP3602279B2 (ja) 1996-11-04 1996-11-04 アクティブマトリクス型表示回路およびその作製方法

Publications (3)

Publication Number Publication Date
JPH10133233A JPH10133233A (ja) 1998-05-22
JP3602279B2 JP3602279B2 (ja) 2004-12-15
JPH10133233A5 true JPH10133233A5 (enrdf_load_stackoverflow) 2004-12-24

Family

ID=17984048

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30868496A Expired - Fee Related JP3602279B2 (ja) 1996-11-04 1996-11-04 アクティブマトリクス型表示回路およびその作製方法

Country Status (1)

Country Link
JP (1) JP3602279B2 (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE42139E1 (en) 1998-09-04 2011-02-15 Semiconductor Energy Laboratory Co., Ltd. Method of fabricating a semiconductor device

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000012864A (ja) 1998-06-22 2000-01-14 Semiconductor Energy Lab Co Ltd 半導体装置の作製方法
JP3127894B2 (ja) * 1998-07-24 2001-01-29 日本電気株式会社 アクティブマトリクス型液晶表示装置
US7317438B2 (en) 1998-10-30 2008-01-08 Semiconductor Energy Laboratory Co., Ltd. Field sequential liquid crystal display device and driving method thereof, and head mounted display
JP2000221524A (ja) * 1999-01-29 2000-08-11 Sanyo Electric Co Ltd カラー液晶表示装置
US6583471B1 (en) * 1999-06-02 2003-06-24 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device having first and second insulating films
JP4651777B2 (ja) * 1999-06-02 2011-03-16 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP6111398B2 (ja) * 2011-12-20 2017-04-12 株式会社Ｊｏｌｅｄ 表示装置および電子機器
JP6063766B2 (ja) 2013-02-20 2017-01-18 株式会社ジャパンディスプレイ 半導体装置
KR102110226B1 (ko) * 2013-09-11 2020-05-14 삼성디스플레이 주식회사 표시패널 및 그 제조방법

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE42139E1 (en) 1998-09-04 2011-02-15 Semiconductor Energy Laboratory Co., Ltd. Method of fabricating a semiconductor device

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