JPH10126058A - Manufacture of multilayered printed interconnection board - Google Patents

Manufacture of multilayered printed interconnection board

Info

Publication number
JPH10126058A
JPH10126058A JP29708196A JP29708196A JPH10126058A JP H10126058 A JPH10126058 A JP H10126058A JP 29708196 A JP29708196 A JP 29708196A JP 29708196 A JP29708196 A JP 29708196A JP H10126058 A JPH10126058 A JP H10126058A
Authority
JP
Japan
Prior art keywords
copper
layers
circuit pattern
laminated
via holes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP29708196A
Other languages
Japanese (ja)
Inventor
Masaru Hanamori
優 花森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Avionics Co Ltd
Original Assignee
Nippon Avionics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Avionics Co Ltd filed Critical Nippon Avionics Co Ltd
Priority to JP29708196A priority Critical patent/JPH10126058A/en
Publication of JPH10126058A publication Critical patent/JPH10126058A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To improve the surface smoothness of a multilayered printed interconnection board by increasing the adhesion of a circuit pattern on the surface of the wiring board by thermocompression bonding one-sided copper-plated insulating layers to both surfaces of a laminated intermediate body and forming via holes through the insulating layers, and then, plating the upper surface of copper foil and internal surfaces of the via holes with copper and forming outermost-layer circuit patterns on the plated copper layers. SOLUTION: After insulating layers 14 and 14 are again formed on both surfaces of the core material 10 of a laminated intermediate body and via holes 16 and 16 are formed through the layers 14 and 14, via holes 20 are formed by forming plated copper layers 18 and 18 on the surfaces of the insulating layers 14 and 14 and circuit patterns 24 are formed on the layers 18 and 18. By repeating the above-mentioned operations, a laminated intermediate body 72 composed of five layers is obtained. Copper-plated laminated boards 76 carrying copper soil 74 stuck to one surface are thermocompression bonded to both surfaces of the intermediate body 72 and outermost layers with an adhesive and circuit patterns 80 and via holes 82 are formed on the boards 72 after forming via holes 78. Since the laminated board 76 are pressed against the intermediate body 72 and heated by holding the boards 76 between the heating boards of a press machine at the time of thermocompression bonding the boards 76 to the intermediate body 72, the surface smoothness of a multilayered printed interconnection board can be improved by increasing the adhesion of the circuit pattern on the surface of the board.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、ビルドアップ法に
よる多層プリント配線板の製造方法に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a multilayer printed wiring board by a build-up method.

【0002】[0002]

【従来の技術】従来よりビルドアップ法が知られてい
る。このビルドアップ法は、回路パターンを形成した内
層コア材に、絶縁層と導体層とを交互に積み重ねてゆく
方法であり、各層の導体層に回路パターンを形成する際
にその下の導体層との導通をとるビアホールを形成する
ものである。
2. Description of the Related Art A build-up method is conventionally known. This build-up method is a method in which an insulating layer and a conductor layer are alternately stacked on an inner core material on which a circuit pattern is formed, and when a circuit pattern is formed on each layer of the conductor layer, To form a via hole that establishes conduction.

【0003】このビルドアップ法には、絶縁樹脂コート
により絶縁層を形成する樹脂コーティング方式と、銅箔
張り絶縁板を積層する積層方式とがある。これらの両方
式をそれぞれ図2と図3を用いて説明する。
[0003] The build-up method includes a resin coating method in which an insulating layer is formed by an insulating resin coat and a laminating method in which a copper foil-clad insulating plate is laminated. Both of these methods will be described with reference to FIGS. 2 and 3, respectively.

【0004】図2は樹脂コーティング方式を示す工程説
明図である。この図2の工程(A)は内層コア材10を
用意する工程であり、このコア材10の両面に回路パタ
ーン12、12を形成しておく。コア材に10には、例
えば紙やガラスなどの基材に樹脂を含浸させたシート
(プリプレグ)を重ね、加圧・加熱処理して作った絶縁
板に銅箔を張り付けた銅張積層板を用いる。この銅張積
層板の銅箔に公知のフォトエッチングにより回路パター
ンを形成する。
FIG. 2 is a process explanatory view showing a resin coating method. The step (A) in FIG. 2 is a step of preparing the inner layer core material 10, and circuit patterns 12, 12 are formed on both surfaces of the core material 10. On the core material 10, a sheet (prepreg) obtained by impregnating a resin such as paper or glass with a base material, for example, is laminated, and a copper-clad laminate is formed by applying a copper foil to an insulating plate made by applying pressure and heat. Used. A circuit pattern is formed on the copper foil of the copper-clad laminate by known photoetching.

【0005】このコア材10の両面に、カーテンコート
や印刷などの方法によって絶縁樹脂をコーティングす
る。このコーティングにより、絶縁層14、14を形成
することができる(図2の工程(B))。
[0005] Both surfaces of the core material 10 are coated with an insulating resin by a method such as curtain coating or printing. With this coating, the insulating layers 14 can be formed (step (B) in FIG. 2).

【0006】この絶縁層14、14にはビアホール孔1
6、16が加工される(図2の工程(C))。この加工
には、フォト法、レーザー法、ドリル法、ホーニング法
など種々の方法が使用できる。フォト法は、前記工程
(B)で絶縁層14を形成するのに用いる絶縁樹脂とし
て感光性インクを用い、ビアホールの位置を含むパター
ンを露光してビアホール孔16以外のインクを硬化させ
るものである。その後ビアホールに対応する位置にある
未硬化樹脂を洗浄し除去することにより、ビアホール孔
16を形成するものである。
The insulating layers 14 and 14 have via hole holes 1
6 and 16 are processed (step (C) in FIG. 2). For this processing, various methods such as a photo method, a laser method, a drill method, and a honing method can be used. In the photo method, a photosensitive ink is used as an insulating resin used to form the insulating layer 14 in the step (B), and a pattern including the positions of the via holes is exposed to cure the ink other than the via hole holes 16. . Thereafter, the via-hole 16 is formed by washing and removing the uncured resin at the position corresponding to the via-hole.

【0007】レーザー法はレーザービームをビアホール
孔16の位置に照射して孔をあけるものである。このレ
ーザービームは下の回路パターン12に到達するとそれ
以上中へは入らないから、回路パターン12に到達する
深さのビアホール孔16を正確に形成できる。
In the laser method, a laser beam is applied to the position of the via hole 16 to make a hole. When the laser beam reaches the lower circuit pattern 12, it does not enter any more. Therefore, the via hole 16 having a depth reaching the circuit pattern 12 can be formed accurately.

【0008】ドリル法は高速回転するドリルで絶縁層1
4に直接ビアホール孔16を機械加工するものである。
ホーニング法は、ビアホール孔16の位置に小孔をあけ
た保護シートを絶縁層14の表面に張り付け、上から研
磨材を含む液体あるいは空気を吹き付けてビアホール孔
16をあけるものである。
[0008] The drilling method uses a drill that rotates at a high speed and the insulating layer 1
4 is to machine the via hole 16 directly.
In the honing method, a protective sheet having small holes at the positions of the via holes 16 is attached to the surface of the insulating layer 14, and a liquid or air containing an abrasive is blown from above to form the via holes 16.

【0009】ビアホール孔16を形成した後、この絶縁
層14の表面に銅めっきが施される。(図2の工程
(D))。この銅めっき層18、18の一部がビアホー
ル孔16の内面に形成されてビアホール20となる。こ
の銅めっき層18を形成するためには、絶縁層14の表
面に無電解めっきを施して表面に導電性を付与し、その
後電解銅めっきを施す。
After forming the via hole 16, the surface of the insulating layer 14 is plated with copper. (Step (D) in FIG. 2). A part of the copper plating layers 18 is formed on the inner surface of the via hole 16 to form the via hole 20. In order to form the copper plating layer 18, electroless plating is performed on the surface of the insulating layer 14 to impart conductivity to the surface, and then electrolytic copper plating is performed.

【0010】この銅めっき層18の上には感光性レジス
ト22を用いて回路パターン24が形成される(図2の
工程(D)、(E)参照)。すなわち銅めっき層18の
上に感光性樹脂シートからなるドライフィルムを熱圧着
し、回路パターン24と同一形状のパターンを紫外線露
光により焼付け、現像して回路パターン24と同じパタ
ーンにレジスト22を残す。そして表面をエッチングす
ることにより銅めっき層18の不用な部分を除去し、回
路パターン24を形成する。この結果下の層の回路パタ
ーン12と表面の層の回路パターン24とが、ビアホー
ル20で電気的に接続される。
A circuit pattern 24 is formed on the copper plating layer 18 using a photosensitive resist 22 (see steps (D) and (E) in FIG. 2). That is, a dry film made of a photosensitive resin sheet is thermocompression-bonded on the copper plating layer 18, a pattern having the same shape as the circuit pattern 24 is baked by ultraviolet exposure, and developed to leave the resist 22 in the same pattern as the circuit pattern 24. Then, unnecessary portions of the copper plating layer 18 are removed by etching the surface, and a circuit pattern 24 is formed. As a result, the circuit pattern 12 on the lower layer and the circuit pattern 24 on the surface layer are electrically connected by the via hole 20.

【0011】この工程(E)でできた積層体26の上に
工程(B)〜(E)と同じ工程による加工を2回繰り返
すことにより、図2の(F)に示す7層の多層プリント
配線板28ができあがる。
By repeating the processing in the same step as steps (B) to (E) twice on the laminate 26 formed in step (E), a seven-layer multilayer print shown in FIG. The wiring board 28 is completed.

【0012】次に積層方式を図3により説明する。図3
はこの方式の工程説明図である。工程(A)は回路パタ
ーン12を形成した内層コア材10を準備する工程であ
り、前記図2の工程(A)と同じである。このコア材1
0の表面には片面銅張り積層板50が積層される(図3
の工程(B))。
Next, the lamination method will be described with reference to FIG. FIG.
FIG. 2 is a process explanatory view of this method. The step (A) is a step of preparing the inner layer core material 10 on which the circuit pattern 12 is formed, and is the same as the step (A) in FIG. This core material 1
A single-sided copper-clad laminate 50 is laminated on the surface of No. 0.
Step (B)).

【0013】ここに積層板50は、前記コア材10と同
様に紙やガラスに樹脂を含浸させたプリプレグを加圧・
加熱して硬化させた絶縁板を用意し、、その片面に銅箔
52を張ったものである。この積層板50にはビアホー
ル孔54が加工される(図3の工程(C))。
The laminate 50 is formed by pressing a prepreg obtained by impregnating paper or glass with a resin in the same manner as the core material 10.
An insulating plate cured by heating is prepared, and a copper foil 52 is provided on one side thereof. Via holes 54 are formed in the laminate 50 (step (C) in FIG. 3).

【0014】このビアホール孔54の加工方法として
は、銅箔52にエッチングで孔をあけて、この孔の下に
表れる絶縁板にレーザービームで孔をあける方法が使用
できる。またドリルで機械的に加工するドリル法、ドリ
ルで銅箔52に孔をあけその下の絶縁板に化学溶剤によ
るエッチングで孔をあけるケミカルミリング法、などが
使用できる。
As a method of forming the via hole hole 54, a method can be used in which a hole is formed in the copper foil 52 by etching, and a hole is formed in the insulating plate below the hole by a laser beam. Further, a drilling method of mechanically processing with a drill, a chemical milling method of making a hole in the copper foil 52 with a drill, and making a hole in an insulating plate thereunder by etching with a chemical solvent, and the like can be used.

【0015】このようにビアホール孔54を形成した
後、表面およびこのビアホール孔54の内面に銅めっき
を施す(図3の工程(D))。この銅めっき層56は前
記図3の工程(D)と同様に、無電解銅めっきの後で電
解銅めっきを行うことにより形成できる。
After the formation of the via hole 54, copper plating is applied to the surface and the inner surface of the via hole 54 (step (D) in FIG. 3). This copper plating layer 56 can be formed by performing electroless copper plating after electroless copper plating as in the step (D) in FIG.

【0016】この銅めっき層56の上には感光性レジス
ト58を用いて回路パターン60が形成される(図3の
工程(D、E)参照)。
A circuit pattern 60 is formed on the copper plating layer 56 using a photosensitive resist 58 (see steps (D, E) in FIG. 3).

【0017】すなわち前記図2の工程(D、E)で説明
したように、ドライフィルムを熱圧着し、回路パターン
60と同一形状のパターンを紫外線露光により焼付け、
現像して回路パターン60と同一形状にレジスト58を
残し、そして銅めっき層56と銅箔52との不用部分を
除去するものである。
That is, as described in the steps (D, E) in FIG. 2, the dry film is thermocompression-bonded, and a pattern having the same shape as the circuit pattern 60 is baked by ultraviolet exposure.
The development is performed to leave the resist 58 in the same shape as the circuit pattern 60, and to remove unnecessary portions between the copper plating layer 56 and the copper foil 52.

【0018】この結果上の層の回路パターン60が下の
層の回路パターン12にビアホール62によって接続さ
れる。この上に工程(B)〜(E)を繰り返すことによ
り、積層体64ができあがる(図3の工程(F))。
As a result, the circuit pattern 60 in the upper layer is connected to the circuit pattern 12 in the lower layer by a via hole 62. By repeating steps (B) to (E) on this, a laminate 64 is completed (step (F) in FIG. 3).

【0019】[0019]

【従来技術の問題点】図2に示した樹脂コーティング方
式は各絶縁層14が樹脂コーティング層で形成されるた
め製作が容易で安価になるという長所を有する。しかし
この樹脂コーティング層は、銅めっき層からなる回路パ
ターン12、24との密着力が弱く、せいぜい1kg/
cm2程度しか得られない。
2. Problem of the Prior Art The resin coating method shown in FIG. 2 has the advantage that the manufacturing is easy and inexpensive because each insulating layer 14 is formed of a resin coating layer. However, this resin coating layer has a weak adhesion to the circuit patterns 12 and 24 made of a copper plating layer, and is at most 1 kg /
Only about cm 2 can be obtained.

【0020】このため絶縁層14が回路パターン12、
24から剥がれ易く、特に最外層の回路パターン24A
(図2の(F)参照)にはんだ付け作業を繰り返す場合
に回路パターン24Aが剥がれて致命的欠陥となるおそ
れがあった。このため部品の交換ができない(リペアビ
リティが悪い)という問題があった。
For this reason, the insulating layer 14 is
24, especially the outermost circuit pattern 24A
When the soldering operation is repeated (see FIG. 2 (F)), the circuit pattern 24A may be peeled off, resulting in a fatal defect. Therefore, there is a problem that parts cannot be replaced (repairability is poor).

【0021】また表面に多数のビアホール20が開口し
ているだけでなく、内層のビアホール20の上の絶縁層
14もこの下のビアホール20の部分が僅かに陥没する
ため、表面の平滑度(コプラナリティ)が悪くなる。こ
のため例えばBGA(ボール・グリッド・アレイ)の接
続端子を持つLSIやHIC(ハイブリッドIC)など
を実装する際の信頼性が低下するという問題もあった。
In addition to the large number of via holes 20 formed on the surface, the insulating layer 14 on the inner via hole 20 is slightly depressed at the portion of the via hole 20 therebelow, so that the surface smoothness (coplanarity) is reduced. ) Gets worse. For this reason, for example, there is a problem that the reliability when mounting an LSI or HIC (hybrid IC) having a connection terminal of a BGA (ball grid array) is reduced.

【0022】一方図3に示した積層方式では、絶縁層が
銅張積層板50の樹脂板で形成され、表面の回路パター
ン60A(図3の工程(F)参照)はプリプレグで下の
絶縁層に接着されるから、絶縁層と回路パターン60A
との密着力が十分に大きくなる。このためはんだ付けを
繰り返しても回路パターン60Aが剥がれることがな
い。また銅張積層板50を積層する際には全体を加熱し
プレスするから、表面の平滑性が良くなるという長所も
持つことになる。
On the other hand, in the lamination method shown in FIG. 3, the insulating layer is formed of a resin plate of the copper-clad laminate 50, and the circuit pattern 60A on the surface (see step (F) in FIG. 3) is a prepreg and the lower insulating layer. Is bonded to the insulating layer and the circuit pattern 60A.
Adhesion with the substrate becomes sufficiently large. Therefore, the circuit pattern 60A does not come off even if soldering is repeated. Further, when the copper-clad laminate 50 is laminated, the whole is heated and pressed, so that the surface smoothness is improved.

【0023】しかしこの積層方式には複数回熱プレスす
るために時間がかかるという問題がある。すなわち、通
常1回熱プレスを行うだけでも1.5時間位を要するか
ら、この熱プレスを複数回繰り返すのでは生産性が極め
て悪くなるのである。
However, this laminating method has a problem that it takes a long time to perform hot pressing a plurality of times. That is, it takes about 1.5 hours even if only one heat press is performed. Therefore, if this heat press is repeated a plurality of times, the productivity becomes extremely poor.

【0024】[0024]

【発明の目的】本発明はこのような事情に鑑みなされた
ものであり、樹脂コーティング方式の問題点と積層方式
の問題点を共に解消する多層プリント配線板の製造方法
を提供することを目的とする。すなわち表面の回路パタ
ーンの密着力を高めてリペアビリティを良くし、表面の
平滑性を向上させて部品実装時のはんだ付け信頼性を向
上させ、さらに生産性も向上させることができる多層プ
リント配線板の製造方法を提供することを目的とする。
SUMMARY OF THE INVENTION It is an object of the present invention to provide a method of manufacturing a multilayer printed wiring board which can solve both the problems of the resin coating method and the lamination method. I do. That is, a multilayer printed wiring board that can improve the repairability by increasing the adhesion of the circuit pattern on the surface, improve the smoothness of the surface, improve the soldering reliability at the time of component mounting, and further improve the productivity. It is an object of the present invention to provide a method for producing the same.

【0025】[0025]

【発明の構成】本発明によればこの目的は、ビルドアッ
プ法による多層プリント配線板の製造方法において、
(a)回路パターンを形成した内層コア材を用意し、
(b)この内層コア材に絶縁樹脂コートによる絶縁層を
形成し、(c)この絶縁層にビアホールを形成し、
(d)この絶縁層の表面およびビアホール内面にめっき
層を施し、(e)このめっき層に回路パターンを形成
し、(f)前記工程(b)〜(e)を繰り返して積層中
間体を形成し、(g)この積層中間体の上に片面銅箔張
り絶縁板を熱圧着し、(h)この銅箔張り絶縁板にビア
ホールを形成し、(i)銅箔上面およびビアホール内面
に銅めっきを施し、(j)この銅めっき層に最外層回路
パターンを形成する、ことを特徴とする多層プリント配
線板の製造方法により達成される。
According to the present invention, there is provided a method for manufacturing a multilayer printed wiring board by a build-up method.
(A) Prepare an inner layer core material on which a circuit pattern is formed,
(B) forming an insulating layer with an insulating resin coat on the inner core material; (c) forming a via hole in the insulating layer;
(D) a plating layer is formed on the surface of the insulating layer and the inner surface of the via hole; (e) a circuit pattern is formed on the plating layer; and (f) the steps (b) to (e) are repeated to form a laminated intermediate. (G) A single-sided copper-foiled insulating plate is thermocompression-bonded on the laminated intermediate, (h) A via hole is formed in the copper-foiled insulating plate, and (i) Copper plating is applied to the upper surface of the copper foil and the inner surface of the via hole. And (j) forming an outermost circuit pattern on the copper plating layer.

【0026】[0026]

【実施態様】図1は本発明の一実施態様の工程図であ
る。この図1で工程(A)〜(E)は前記樹脂コーティ
ング方式を示し、図2の工程(A)〜(E)に対応す
る。従ってこの図1の工程(A)〜(E)では図2と同
一部分に同一符号を付してその説明は繰り返さない。
FIG. 1 is a process diagram of one embodiment of the present invention. In FIG. 1, steps (A) to (E) show the resin coating method, and correspond to steps (A) to (E) in FIG. Therefore, in steps (A) to (E) of FIG. 1, the same portions as those of FIG. 2 are denoted by the same reference numerals, and description thereof will not be repeated.

【0027】工程(E)では、その前の工程(D)で得
られた3層の積層中間体70にもう一度工程(B)〜
(D)の工程を繰り返して5層の積層中間体72を得て
いる。この積層中間体72の両面には、図3に示した前
記積層方式により最外層が積層される。
In the step (E), the three-layered intermediate body 70 obtained in the preceding step (D) is again subjected to the steps (B) to
By repeating the step of (D), a five-layered laminated body 72 is obtained. The outermost layers are laminated on both surfaces of the laminated intermediate 72 by the lamination method shown in FIG.

【0028】すなわちこの最外層は、片面に銅箔74を
張った銅張積層板76をプリプレグあるいは接着剤で積
層中間体72に熱圧着し(図1の工程(F))、ドリル
加工やレーザービーム加工などにより、ビアホール孔7
8を形成し(図1の工程(G))、回路パターン80お
よびビアホール82を形成したものである(図1の工程
(H))。これらの工程(F)〜(H)は前記図3に示
す工程(B)〜(E)に対応するものであるから、その
詳細な説明は繰り返さない。
That is, the outermost layer is formed by thermocompression bonding a copper-clad laminate 76 having a copper foil 74 on one side to a laminate intermediate 72 with a prepreg or an adhesive (step (F) in FIG. 1), drilling or laser processing. Via hole processing, etc.
8 (step (G) in FIG. 1), and a circuit pattern 80 and a via hole 82 are formed (step (H) in FIG. 1). Steps (F) to (H) correspond to steps (B) to (E) shown in FIG. 3, and therefore, detailed description thereof will not be repeated.

【0029】この実施態様によれば工程(F)で積層板
76を熱圧着する際に、プレス機の熱盤間に挟んで加圧
し、加熱する。従って製品である積層体84の平滑度が
良く、両表面の平行度が良くなる。またこのプレス機に
よる加熱プレス工程は、最後の積層工程(F)で1回行
うだけであるから、製造に要する時間の増加も従来の樹
脂コーティング方式に比べて僅かであるのに対し、従来
の積層方式に比べて大幅に短縮できる。
According to this embodiment, when the laminated plate 76 is thermocompression-bonded in the step (F), the laminated plate 76 is sandwiched between hot plates of a press machine and pressurized and heated. Therefore, the smoothness of the laminate 84 as a product is good, and the parallelism of both surfaces is good. Further, since the heating press step by this press machine is performed only once in the last laminating step (F), the time required for the production is slightly increased as compared with the conventional resin coating method. It can be greatly reduced compared to the lamination method.

【0030】この図1に示した実施態様ではコア材10
の両面に複数の絶縁層14と1枚の積層板76とを積層
しているが、この発明は一方の面だけに積層したものに
も適用でき、これを包含する。また最外層の銅張積層板
76としては、接着能力のある積層板、例えば銅箔付き
ノーフロープリプレグ(銅箔の片面に流動性の無いプリ
プレグを張り、さらに接着剤を塗ったもの)を用いた
り、樹脂付き銅箔(片面に樹脂を塗布した銅箔)を用い
たものであってもよい。要するに熱プレスにより圧着す
ることにより積層する構造のものであればよい。
In the embodiment shown in FIG.
Although a plurality of insulating layers 14 and one laminated plate 76 are laminated on both surfaces of the present invention, the present invention can also be applied to a laminate laminated on only one surface, and includes this. As the outermost copper-clad laminate 76, a laminate having an adhesive ability, for example, a no-flow prepreg with a copper foil (a prepreg having no fluidity on one side of a copper foil and further coated with an adhesive) is used. Alternatively, a copper foil with resin (a copper foil coated with a resin on one side) may be used. In short, any structure may be used as long as it is laminated by pressing with a hot press.

【0031】[0031]

【発明の効果】請求項1の発明は以上のように、樹脂コ
ーティング方式で製作した積層中間体に、積層方式によ
り最外層を形成したものであるから、最外層の回路パタ
ーンの密着力を高めてはんだ付けで部品の交換を行うこ
とを可能にし(リペアビリティを高める)、表面の平滑
性を向上して部品実装の信頼性を向上し、生産性を高め
ることができる。
According to the first aspect of the present invention, as described above, the outermost layer is formed by the laminating method on the laminated intermediate produced by the resin coating method, so that the adhesion of the circuit pattern of the outermost layer is improved. This makes it possible to replace components by soldering (to improve repairability), improve the smoothness of the surface, improve the reliability of component mounting, and increase productivity.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の工程説明図FIG. 1 is a process explanatory view of the present invention.

【図2】従来方式の工程説明図FIG. 2 is a process explanatory view of a conventional method.

【図3】従来方式の工程説明図FIG. 3 is a process explanatory view of a conventional method.

【符号の説明】[Explanation of symbols]

10 コア材 12 回路パターン 14 絶縁層 16 ビアホール孔 20 ビアホール 24、24 回路パターン 72 積層中間体 74 銅箔 76 積層板 78 ビアホール孔 80 回路パターン 82 ビアホール REFERENCE SIGNS LIST 10 core material 12 circuit pattern 14 insulating layer 16 via hole hole 20 via hole 24, 24 circuit pattern 72 laminated intermediate 74 copper foil 76 laminated plate 78 via hole hole 80 circuit pattern 82 via hole

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 ビルドアップ法による多層プリント配線
板の製造方法において、(a)回路パターンを形成した
内層コア材を用意し、(b)この内層コア材に絶縁樹脂
コートによる絶縁層を形成し、(c)この絶縁層にビア
ホールを形成し、(d)この絶縁層の表面およびビアホ
ール内面にめっき層を施し、(e)このめっき層に回路
パターンを形成し、(f)前記工程(B)〜(E)を繰
り返して積層中間体を形成し、(g)この積層中間体の
上に片面銅箔張り絶縁板を熱圧着し、(h)この銅箔張
り絶縁板にビアホールを形成し、(i)銅箔上面および
ビアホール内面に銅めっきを施し、(j)この銅めっき
層に最外層回路パターンを形成する、ことを特徴とする
多層プリント配線板の製造方法。
In a method for manufacturing a multilayer printed wiring board by a build-up method, (a) an inner core material having a circuit pattern is prepared, and (b) an insulating layer is formed on the inner core material by an insulating resin coat. (C) forming a via hole in the insulating layer; (d) applying a plating layer to the surface of the insulating layer and the inner surface of the via hole; (e) forming a circuit pattern in the plating layer; )-(E) are repeated to form a laminated intermediate, (g) a single-sided copper-foiled insulating plate is thermocompression-bonded on the laminated intermediate, and (h) via holes are formed in the copper-foiled insulating plate. And (i) applying copper plating to the upper surface of the copper foil and the inner surface of the via hole, and (j) forming an outermost layer circuit pattern on the copper plating layer.
JP29708196A 1996-10-21 1996-10-21 Manufacture of multilayered printed interconnection board Pending JPH10126058A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29708196A JPH10126058A (en) 1996-10-21 1996-10-21 Manufacture of multilayered printed interconnection board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29708196A JPH10126058A (en) 1996-10-21 1996-10-21 Manufacture of multilayered printed interconnection board

Publications (1)

Publication Number Publication Date
JPH10126058A true JPH10126058A (en) 1998-05-15

Family

ID=17841962

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29708196A Pending JPH10126058A (en) 1996-10-21 1996-10-21 Manufacture of multilayered printed interconnection board

Country Status (1)

Country Link
JP (1) JPH10126058A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000059031A (en) * 1998-08-07 2000-02-25 Nippon Carbide Ind Co Inc Printed wiring board and manufacture thereof
JP2002171048A (en) * 2000-12-01 2002-06-14 Shinko Electric Ind Co Ltd Method for manufacturing wiring board
JP2007311642A (en) * 2006-05-19 2007-11-29 Sharp Corp Method of manufacturing multilayer printed wiring board
JP2020500660A (en) * 2016-12-06 2020-01-16 エコール ポリテクニーク フェデラル ドゥ ローザンヌ (ウ・ペ・エフ・エル)Ecole Polytechnique Federale De Lausanne (Epfl) Embedded electrode and manufacturing method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000059031A (en) * 1998-08-07 2000-02-25 Nippon Carbide Ind Co Inc Printed wiring board and manufacture thereof
JP2002171048A (en) * 2000-12-01 2002-06-14 Shinko Electric Ind Co Ltd Method for manufacturing wiring board
JP2007311642A (en) * 2006-05-19 2007-11-29 Sharp Corp Method of manufacturing multilayer printed wiring board
JP2020500660A (en) * 2016-12-06 2020-01-16 エコール ポリテクニーク フェデラル ドゥ ローザンヌ (ウ・ペ・エフ・エル)Ecole Polytechnique Federale De Lausanne (Epfl) Embedded electrode and manufacturing method
US11621410B2 (en) 2016-12-06 2023-04-04 École Polytechnique Fédérale de Lausanne Implantable electrode and method for manufacturing

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