JPH10125579A5 - - Google Patents

Info

Publication number
JPH10125579A5
JPH10125579A5 JP1996277913A JP27791396A JPH10125579A5 JP H10125579 A5 JPH10125579 A5 JP H10125579A5 JP 1996277913 A JP1996277913 A JP 1996277913A JP 27791396 A JP27791396 A JP 27791396A JP H10125579 A5 JPH10125579 A5 JP H10125579A5
Authority
JP
Japan
Prior art keywords
mask
substrate
scanning direction
stage
axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1996277913A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10125579A (ja
JP3809676B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP27791396A priority Critical patent/JP3809676B2/ja
Priority claimed from JP27791396A external-priority patent/JP3809676B2/ja
Priority to KR1019970054077A priority patent/KR100525521B1/ko
Publication of JPH10125579A publication Critical patent/JPH10125579A/ja
Priority to US09/347,572 priority patent/US6700667B2/en
Publication of JPH10125579A5 publication Critical patent/JPH10125579A5/ja
Application granted granted Critical
Publication of JP3809676B2 publication Critical patent/JP3809676B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP27791396A 1996-10-21 1996-10-21 走査型露光装置 Expired - Lifetime JP3809676B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP27791396A JP3809676B2 (ja) 1996-10-21 1996-10-21 走査型露光装置
KR1019970054077A KR100525521B1 (ko) 1996-10-21 1997-10-21 노광장치및노광방법
US09/347,572 US6700667B2 (en) 1996-10-21 1999-07-06 Exposure apparatus and method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27791396A JP3809676B2 (ja) 1996-10-21 1996-10-21 走査型露光装置

Publications (3)

Publication Number Publication Date
JPH10125579A JPH10125579A (ja) 1998-05-15
JPH10125579A5 true JPH10125579A5 (enExample) 2004-10-21
JP3809676B2 JP3809676B2 (ja) 2006-08-16

Family

ID=17590049

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27791396A Expired - Lifetime JP3809676B2 (ja) 1996-10-21 1996-10-21 走査型露光装置

Country Status (1)

Country Link
JP (1) JP3809676B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4511707B2 (ja) * 2000-09-28 2010-07-28 株式会社アドバンテスト 電子ビーム露光装置、露光方法、及び半導体素子製造方法
EP1583934A1 (en) * 2002-12-12 2005-10-12 Zygo Corporation In-process correction of stage mirror deformations during a photolithography exposure cycle
TWI433210B (zh) * 2005-10-24 2014-04-01 尼康股份有限公司 An exposure apparatus, an exposure method, and an element manufacturing method
CN112947005B (zh) * 2019-11-26 2023-02-21 上海微电子装备（集团）股份有限公司 一种载物台位置的测量装置及光刻机
CN112835271B (zh) * 2021-01-19 2024-04-26 上海集成电路装备材料产业创新中心有限公司 具有旋转交换双工件台的光刻装置的曝光方法
CN113441351A (zh) * 2021-06-29 2021-09-28 珠海市华亚智能科技有限公司 一种激光雷达反射镜校准装配设备

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