JP3809676B2 - 走査型露光装置 - Google Patents

走査型露光装置 Download PDF

Info

Publication number
JP3809676B2
JP3809676B2 JP27791396A JP27791396A JP3809676B2 JP 3809676 B2 JP3809676 B2 JP 3809676B2 JP 27791396 A JP27791396 A JP 27791396A JP 27791396 A JP27791396 A JP 27791396A JP 3809676 B2 JP3809676 B2 JP 3809676B2
Authority
JP
Japan
Prior art keywords
stage
scanning direction
mask
substrate
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP27791396A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10125579A (ja
JPH10125579A5 (enExample
Inventor
健爾 西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP27791396A priority Critical patent/JP3809676B2/ja
Priority to KR1019970054077A priority patent/KR100525521B1/ko
Publication of JPH10125579A publication Critical patent/JPH10125579A/ja
Priority to US09/347,572 priority patent/US6700667B2/en
Publication of JPH10125579A5 publication Critical patent/JPH10125579A5/ja
Application granted granted Critical
Publication of JP3809676B2 publication Critical patent/JP3809676B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP27791396A 1996-10-21 1996-10-21 走査型露光装置 Expired - Lifetime JP3809676B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP27791396A JP3809676B2 (ja) 1996-10-21 1996-10-21 走査型露光装置
KR1019970054077A KR100525521B1 (ko) 1996-10-21 1997-10-21 노광장치및노광방법
US09/347,572 US6700667B2 (en) 1996-10-21 1999-07-06 Exposure apparatus and method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27791396A JP3809676B2 (ja) 1996-10-21 1996-10-21 走査型露光装置

Publications (3)

Publication Number Publication Date
JPH10125579A JPH10125579A (ja) 1998-05-15
JPH10125579A5 JPH10125579A5 (enExample) 2004-10-21
JP3809676B2 true JP3809676B2 (ja) 2006-08-16

Family

ID=17590049

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27791396A Expired - Lifetime JP3809676B2 (ja) 1996-10-21 1996-10-21 走査型露光装置

Country Status (1)

Country Link
JP (1) JP3809676B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4511707B2 (ja) * 2000-09-28 2010-07-28 株式会社アドバンテスト 電子ビーム露光装置、露光方法、及び半導体素子製造方法
WO2004053425A1 (en) * 2002-12-12 2004-06-24 Zygo Corporation In-process correction of stage mirror deformations during a photolithography exposure cycle
TWI433210B (zh) * 2005-10-24 2014-04-01 尼康股份有限公司 An exposure apparatus, an exposure method, and an element manufacturing method
CN112947005B (zh) * 2019-11-26 2023-02-21 上海微电子装备（集团）股份有限公司 一种载物台位置的测量装置及光刻机
CN112835271B (zh) * 2021-01-19 2024-04-26 上海集成电路装备材料产业创新中心有限公司 具有旋转交换双工件台的光刻装置的曝光方法
CN113441351A (zh) * 2021-06-29 2021-09-28 珠海市华亚智能科技有限公司 一种激光雷达反射镜校准装配设备

Also Published As

Publication number Publication date
JPH10125579A (ja) 1998-05-15

Similar Documents

Publication Publication Date Title
US6700667B2 (en) Exposure apparatus and method
US6486955B1 (en) Shape measuring method and shape measuring device, position control method, stage device, exposure apparatus and method for producing exposure apparatus, and device and method for manufacturing device
JP3376179B2 (ja) 面位置検出方法
JP3890233B2 (ja) 位置決めステージ装置、露光装置及び半導体デバイスの製造方法
US4699515A (en) Process of transfer of mask pattern onto substrate and apparatus for alignment therebetween
US4676630A (en) Exposure apparatus
KR0139039B1 (ko) 노광장치와 이것을 이용한 디바이스 제조방법
US6483571B1 (en) Exposure apparatus and method for transferring a pattern from a plurality of masks onto at least one substrate
US6188464B1 (en) Exposure apparatus
US4669867A (en) Alignment and exposure apparatus
US5850291A (en) Projection exposure apparatus and method for controlling a stage on the basis of a value corrected by ABBE error
JPH10223528A (ja) 投影露光装置及び位置合わせ方法
JPH05226223A (ja) 露光装置
JP3316706B2 (ja) 投影露光装置、及び該装置を用いる素子製造方法
JP3809676B2 (ja) 走査型露光装置
JPH09139340A (ja) 位置ずれ補正方法
US5523574A (en) Exposure apparatus
JP3180301B2 (ja) 走査露光方法、走査型露光装置及び前記方法を使用するデバイス製造方法
KR100445850B1 (ko) 노광방법및장치
JP3809680B2 (ja) 露光方法
JPH11307436A (ja) 投影露光装置及びレチクル及びレチクルの位置決め方法
JPH09306811A (ja) 露光方法
JP7222660B2 (ja) ステージ装置、リソグラフィ装置、および物品の製造方法
JP3266895B2 (ja) 投影露光装置及び該装置を用いるデバイス製造方法
JP2646417B2 (ja) 露光装置

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20050513

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20050519

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050715

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20060502

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20060515

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20170602

Year of fee payment: 11

EXPY Cancellation because of completion of term