JPH10121034A - 磁気ディスク基板の研磨用組成物 - Google Patents
磁気ディスク基板の研磨用組成物Info
- Publication number
- JPH10121034A JPH10121034A JP5183897A JP5183897A JPH10121034A JP H10121034 A JPH10121034 A JP H10121034A JP 5183897 A JP5183897 A JP 5183897A JP 5183897 A JP5183897 A JP 5183897A JP H10121034 A JPH10121034 A JP H10121034A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- particles
- magnetic disk
- zirconium oxide
- accelerator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 115
- 239000000758 substrate Substances 0.000 title claims abstract description 36
- 239000000203 mixture Substances 0.000 title claims description 32
- 239000002245 particle Substances 0.000 claims abstract description 44
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims abstract description 37
- 229910001928 zirconium oxide Inorganic materials 0.000 claims abstract description 37
- 239000011163 secondary particle Substances 0.000 claims abstract description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 14
- 239000011164 primary particle Substances 0.000 claims abstract description 12
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 claims abstract description 7
- 239000010419 fine particle Substances 0.000 claims description 15
- 239000007800 oxidant agent Substances 0.000 claims description 6
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 claims description 4
- 238000000034 method Methods 0.000 abstract description 26
- 230000003746 surface roughness Effects 0.000 abstract description 7
- -1 i.e. Substances 0.000 abstract description 4
- 238000002425 crystallisation Methods 0.000 abstract description 2
- 230000008025 crystallization Effects 0.000 abstract description 2
- 206010039737 Scratch Diseases 0.000 abstract 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 25
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 13
- 238000009826 distribution Methods 0.000 description 10
- 239000000843 powder Substances 0.000 description 10
- 239000002002 slurry Substances 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 229910001593 boehmite Inorganic materials 0.000 description 6
- FAHBNUUHRFUEAI-UHFFFAOYSA-M hydroxidooxidoaluminium Chemical compound O[Al]=O FAHBNUUHRFUEAI-UHFFFAOYSA-M 0.000 description 6
- 239000002244 precipitate Substances 0.000 description 6
- 239000002243 precursor Substances 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 4
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 3
- 235000011114 ammonium hydroxide Nutrition 0.000 description 3
- 239000008119 colloidal silica Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000010298 pulverizing process Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910000531 Co alloy Inorganic materials 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000005708 Sodium hypochlorite Substances 0.000 description 2
- 239000003082 abrasive agent Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 235000019270 ammonium chloride Nutrition 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 230000001186 cumulative effect Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 239000000314 lubricant Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 150000002978 peroxides Chemical class 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 1
- RGHNJXZEOKUKBD-SQOUGZDYSA-N Gluconic acid Natural products OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000008043 acidic salts Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- JLDSOYXADOWAKB-UHFFFAOYSA-N aluminium nitrate Chemical compound [Al+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O JLDSOYXADOWAKB-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- ZCLVNIZJEKLGFA-UHFFFAOYSA-H bis(4,5-dioxo-1,3,2-dioxalumolan-2-yl) oxalate Chemical compound [Al+3].[Al+3].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O ZCLVNIZJEKLGFA-UHFFFAOYSA-H 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 229910001679 gibbsite Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000000174 gluconic acid Substances 0.000 description 1
- 235000012208 gluconic acid Nutrition 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- VCJMYUPGQJHHFU-UHFFFAOYSA-N iron(3+);trinitrate Chemical compound [Fe+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O VCJMYUPGQJHHFU-UHFFFAOYSA-N 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- 231100000989 no adverse effect Toxicity 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- CMOAHYOGLLEOGO-UHFFFAOYSA-N oxozirconium;dihydrochloride Chemical compound Cl.Cl.[Zr]=O CMOAHYOGLLEOGO-UHFFFAOYSA-N 0.000 description 1
- 238000010979 pH adjustment Methods 0.000 description 1
- YAOULQGDLCJSSG-UHFFFAOYSA-N perchloric acid hydrochloride Chemical compound Cl(=O)(=O)(=O)O.Cl YAOULQGDLCJSSG-UHFFFAOYSA-N 0.000 description 1
- 239000010702 perfluoropolyether Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 239000012286 potassium permanganate Substances 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000007665 sagging Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- BAZAXWOYCMUHIX-UHFFFAOYSA-M sodium perchlorate Chemical compound [Na+].[O-]Cl(=O)(=O)=O BAZAXWOYCMUHIX-UHFFFAOYSA-M 0.000 description 1
- 229910001488 sodium perchlorate Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- VXYADVIJALMOEQ-UHFFFAOYSA-K tris(lactato)aluminium Chemical compound CC(O)C(=O)O[Al](OC(=O)C(C)O)OC(=O)C(C)O VXYADVIJALMOEQ-UHFFFAOYSA-K 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5183897A JPH10121034A (ja) | 1996-03-18 | 1997-03-06 | 磁気ディスク基板の研磨用組成物 |
| MYPI97003113A MY119713A (en) | 1996-08-30 | 1997-07-09 | Abrasive composition for magnetic recording disc substrate |
| US08/890,330 US5935278A (en) | 1996-08-30 | 1997-07-09 | Abrasive composition for magnetic recording disc substrate |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8871996 | 1996-03-18 | ||
| JP8-88719 | 1996-08-30 | ||
| JP23077496 | 1996-08-30 | ||
| JP8-230774 | 1996-08-30 | ||
| JP5183897A JPH10121034A (ja) | 1996-03-18 | 1997-03-06 | 磁気ディスク基板の研磨用組成物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10121034A true JPH10121034A (ja) | 1998-05-12 |
| JPH10121034A5 JPH10121034A5 (enExample) | 2004-08-12 |
Family
ID=27294454
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5183897A Pending JPH10121034A (ja) | 1996-03-18 | 1997-03-06 | 磁気ディスク基板の研磨用組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH10121034A (enExample) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001207161A (ja) * | 2000-01-24 | 2001-07-31 | Showa Denko Kk | 磁気ディスク基板研磨用組成物 |
| WO2006123562A1 (ja) * | 2005-05-20 | 2006-11-23 | Nissan Chemical Industries, Ltd. | 研磨用組成物の製造方法 |
| JP2008108397A (ja) * | 2006-10-27 | 2008-05-08 | Fuji Electric Device Technology Co Ltd | 磁気記録媒体用非金属基板の再生方法 |
| WO2012102180A1 (ja) | 2011-01-27 | 2012-08-02 | 株式会社 フジミインコーポレーテッド | 研磨材及び研磨用組成物 |
| JP2012250318A (ja) * | 2011-06-02 | 2012-12-20 | Tosoh Corp | ジルコニア系研磨剤 |
| WO2013100154A1 (ja) * | 2011-12-29 | 2013-07-04 | Hoya株式会社 | 磁気ディスク用ガラス基板の製造方法 |
| WO2013146090A1 (ja) * | 2012-03-30 | 2013-10-03 | Hoya株式会社 | 磁気ディスク用ガラス基板の製造方法 |
| WO2015087771A1 (ja) * | 2013-12-13 | 2015-06-18 | 株式会社フジミインコーポレーテッド | 金属酸化物膜付き物品 |
-
1997
- 1997-03-06 JP JP5183897A patent/JPH10121034A/ja active Pending
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001207161A (ja) * | 2000-01-24 | 2001-07-31 | Showa Denko Kk | 磁気ディスク基板研磨用組成物 |
| JP5218736B2 (ja) * | 2005-05-20 | 2013-06-26 | 日産化学工業株式会社 | 研磨用組成物の製造方法 |
| WO2006123562A1 (ja) * | 2005-05-20 | 2006-11-23 | Nissan Chemical Industries, Ltd. | 研磨用組成物の製造方法 |
| US7678703B2 (en) | 2005-05-20 | 2010-03-16 | Nissan Chemical Industries, Ltd. | Production method of polishing composition |
| US8323368B2 (en) | 2005-05-20 | 2012-12-04 | Nissan Chemical Industries, Ltd. | Production method of polishing composition |
| JP2008108397A (ja) * | 2006-10-27 | 2008-05-08 | Fuji Electric Device Technology Co Ltd | 磁気記録媒体用非金属基板の再生方法 |
| WO2012102180A1 (ja) | 2011-01-27 | 2012-08-02 | 株式会社 フジミインコーポレーテッド | 研磨材及び研磨用組成物 |
| JP2012250318A (ja) * | 2011-06-02 | 2012-12-20 | Tosoh Corp | ジルコニア系研磨剤 |
| WO2013100154A1 (ja) * | 2011-12-29 | 2013-07-04 | Hoya株式会社 | 磁気ディスク用ガラス基板の製造方法 |
| CN104011795A (zh) * | 2011-12-29 | 2014-08-27 | Hoya株式会社 | 磁盘用玻璃基板的制造方法 |
| JPWO2013100154A1 (ja) * | 2011-12-29 | 2015-05-11 | Hoya株式会社 | 磁気ディスク用ガラス基板の製造方法 |
| CN104011795B (zh) * | 2011-12-29 | 2017-02-22 | Hoya株式会社 | 磁盘用玻璃基板的制造方法 |
| WO2013146090A1 (ja) * | 2012-03-30 | 2013-10-03 | Hoya株式会社 | 磁気ディスク用ガラス基板の製造方法 |
| JPWO2013146090A1 (ja) * | 2012-03-30 | 2015-12-10 | Hoya株式会社 | 磁気ディスク用ガラス基板の製造方法 |
| WO2015087771A1 (ja) * | 2013-12-13 | 2015-06-18 | 株式会社フジミインコーポレーテッド | 金属酸化物膜付き物品 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4273475B2 (ja) | 研磨用組成物 | |
| JP4231632B2 (ja) | 研磨液組成物 | |
| US6007592A (en) | Polishing composition for aluminum disk and polishing process therewith | |
| US6117220A (en) | Polishing composition and rinsing composition | |
| JP4090589B2 (ja) | 研磨用組成物 | |
| US6811583B2 (en) | Polishing composition for a substrate for a magnetic disk and polishing method employing it | |
| US6569215B2 (en) | Composition for polishing magnetic disk substrate | |
| JP4920819B2 (ja) | 研磨用組成物およびそれを用いたメモリーハードディスクの製造方法 | |
| JPH10204416A (ja) | 研磨用組成物 | |
| US5935278A (en) | Abrasive composition for magnetic recording disc substrate | |
| GB2375116A (en) | A polishing composition comprising silicon dioxide, an oxidizing agent and an organic acid and its use in polishing a memory hard disk | |
| GB2354769A (en) | Polishing compositions for magnetic disks | |
| JP3106339B2 (ja) | 研磨用組成物 | |
| CN1986717B (zh) | 硬盘基板用研磨液组合物 | |
| US6152976A (en) | Abrasive composition for disc substrate, and process for polishing disc substrate | |
| US20050028449A1 (en) | Polishing composition | |
| JPH10121034A (ja) | 磁気ディスク基板の研磨用組成物 | |
| JP2004253058A (ja) | 研磨液組成物 | |
| TW528645B (en) | Composition for polishing magnetic disk substrate | |
| JPH1121545A (ja) | 研磨用組成物 | |
| JP3825844B2 (ja) | 精密研磨用組成物、Ａｌ合金基板上に成膜された無電解ＮｉＰメッキ膜の研磨方法、無電解ＮｉＰメッキ膜を有するＡｌ合金基板の製造方法 | |
| JP3997154B2 (ja) | 研磨液組成物 | |
| JPH10121035A (ja) | 磁気ディスク基板研磨用組成物 | |
| JP2000063805A (ja) | 磁気ディスク基板研磨用組成物 | |
| JP2004204152A (ja) | 研磨液組成物 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RD13 | Notification of appointment of power of sub attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7433 Effective date: 20050510 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20060120 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20060314 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20060718 |