JPH10110262A5 - - Google Patents

Info

Publication number
JPH10110262A5
JPH10110262A5 JP1996281794A JP28179496A JPH10110262A5 JP H10110262 A5 JPH10110262 A5 JP H10110262A5 JP 1996281794 A JP1996281794 A JP 1996281794A JP 28179496 A JP28179496 A JP 28179496A JP H10110262 A5 JPH10110262 A5 JP H10110262A5
Authority
JP
Japan
Prior art keywords
vacuum vessel
high voltage
holding member
exhaust
supplying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1996281794A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10110262A (ja
JP3913296B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP28179496A priority Critical patent/JP3913296B2/ja
Priority claimed from JP28179496A external-priority patent/JP3913296B2/ja
Priority to US08/789,552 priority patent/US5855682A/en
Priority to EP97300931A priority patent/EP0834593A3/en
Publication of JPH10110262A publication Critical patent/JPH10110262A/ja
Publication of JPH10110262A5 publication Critical patent/JPH10110262A5/ja
Application granted granted Critical
Publication of JP3913296B2 publication Critical patent/JP3913296B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP28179496A 1996-10-02 1996-10-02 プラズマ成膜装置 Expired - Fee Related JP3913296B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP28179496A JP3913296B2 (ja) 1996-10-02 1996-10-02 プラズマ成膜装置
US08/789,552 US5855682A (en) 1996-10-02 1997-01-27 Plasma thin-film forming apparatus
EP97300931A EP0834593A3 (en) 1996-10-02 1997-02-13 Plasma thin-film forming apparatus and method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28179496A JP3913296B2 (ja) 1996-10-02 1996-10-02 プラズマ成膜装置

Publications (3)

Publication Number Publication Date
JPH10110262A JPH10110262A (ja) 1998-04-28
JPH10110262A5 true JPH10110262A5 (enExample) 2004-09-30
JP3913296B2 JP3913296B2 (ja) 2007-05-09

Family

ID=17644077

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28179496A Expired - Fee Related JP3913296B2 (ja) 1996-10-02 1996-10-02 プラズマ成膜装置

Country Status (3)

Country Link
US (1) US5855682A (enExample)
EP (1) EP0834593A3 (enExample)
JP (1) JP3913296B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002122579A (ja) * 2000-10-12 2002-04-26 Nippon Laser & Electronics Lab クロマトグラフィー用吸着材
DE102007016029A1 (de) * 2007-03-30 2008-10-02 Sig Technology Ag Haltevorrichtung für eine CVD- oder PVD-Beschichtungsanlage
US9170215B2 (en) 2012-10-25 2015-10-27 Hexagon Metrology, Inc. Apparatus and method of imaging a heterogeneous object

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4649024A (en) * 1983-06-29 1987-03-10 Stauffer Chemical Company Method for forming evaporated pnictide and alkali metal polypnictide films
JPH03167737A (ja) * 1989-11-27 1991-07-19 Hitachi Ltd イオン源
WO1991017284A1 (en) * 1990-04-30 1991-11-14 International Business Machines Corporation Apparatus for low temperature cvd of metals
JPH04160147A (ja) * 1990-10-22 1992-06-03 Ulvac Japan Ltd 高蒸気圧原料用蒸発源装置
US5366764A (en) * 1992-06-15 1994-11-22 Sunthankar Mandar B Environmentally safe methods and apparatus for depositing and/or reclaiming a metal or semi-conductor material using sublimation
JP2748213B2 (ja) * 1993-05-24 1998-05-06 日本レーザ電子株式会社 プラズマ製膜装置
US5670218A (en) * 1995-10-04 1997-09-23 Hyundai Electronics Industries Co., Ltd. Method for forming ferroelectric thin film and apparatus therefor

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