JPH1010431A - 反射屈折光学系 - Google Patents

反射屈折光学系

Info

Publication number
JPH1010431A
JPH1010431A JP8180013A JP18001396A JPH1010431A JP H1010431 A JPH1010431 A JP H1010431A JP 8180013 A JP8180013 A JP 8180013A JP 18001396 A JP18001396 A JP 18001396A JP H1010431 A JPH1010431 A JP H1010431A
Authority
JP
Japan
Prior art keywords
optical system
lens group
image
imaging optical
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8180013A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1010431A5 (enExample
Inventor
Yasuhiro Omura
泰弘 大村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP8180013A priority Critical patent/JPH1010431A/ja
Priority to KR1019970021294A priority patent/KR980005328A/ko
Priority to DE19726058A priority patent/DE19726058A1/de
Publication of JPH1010431A publication Critical patent/JPH1010431A/ja
Publication of JPH1010431A5 publication Critical patent/JPH1010431A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP8180013A 1996-06-20 1996-06-20 反射屈折光学系 Pending JPH1010431A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP8180013A JPH1010431A (ja) 1996-06-20 1996-06-20 反射屈折光学系
KR1019970021294A KR980005328A (ko) 1996-06-20 1997-05-28 반사굴절 광학계
DE19726058A DE19726058A1 (de) 1996-06-20 1997-06-19 Katadioptrisches System zur Photolithographie

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8180013A JPH1010431A (ja) 1996-06-20 1996-06-20 反射屈折光学系

Publications (2)

Publication Number Publication Date
JPH1010431A true JPH1010431A (ja) 1998-01-16
JPH1010431A5 JPH1010431A5 (enExample) 2004-11-04

Family

ID=16075939

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8180013A Pending JPH1010431A (ja) 1996-06-20 1996-06-20 反射屈折光学系

Country Status (3)

Country Link
JP (1) JPH1010431A (enExample)
KR (1) KR980005328A (enExample)
DE (1) DE19726058A1 (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999052004A1 (en) * 1998-04-07 1999-10-14 Nikon Corporation Projection exposure apparatus and method, and reflection refraction optical system
US6195213B1 (en) 1998-06-08 2001-02-27 Nikon Corporation Projection exposure apparatus and method
JP2001237165A (ja) * 2000-02-23 2001-08-31 Canon Inc 露光装置
JP2011047951A (ja) * 1999-07-07 2011-03-10 Kla-Tencor Corp 試料を検査するための装置および対物光学系

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09311278A (ja) 1996-05-20 1997-12-02 Nikon Corp 反射屈折光学系
JP3395801B2 (ja) 1994-04-28 2003-04-14 株式会社ニコン 反射屈折投影光学系、走査型投影露光装置、及び走査投影露光方法
USRE38438E1 (en) 1994-08-23 2004-02-24 Nikon Corporation Catadioptric reduction projection optical system and exposure apparatus having the same
JPH08179204A (ja) 1994-11-10 1996-07-12 Nikon Corp 投影光学系及び投影露光装置
JP3454390B2 (ja) 1995-01-06 2003-10-06 株式会社ニコン 投影光学系、投影露光装置及び投影露光方法
DE69933973T2 (de) 1998-07-29 2007-06-28 Carl Zeiss Smt Ag Katadioptrisches optisches system und damit ausgestattete belichtungsvorrichtung
US6995930B2 (en) 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
TW538256B (en) 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
WO2002044786A2 (en) 2000-11-28 2002-06-06 Carl Zeiss Smt Ag Catadioptric projection system for 157 nm lithography
US7301605B2 (en) * 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
DE10127227A1 (de) 2001-05-22 2002-12-05 Zeiss Carl Katadioptrisches Reduktionsobjektiv
US7046459B1 (en) 2001-12-18 2006-05-16 Carl Zeiss Smt Ag Catadioptric reductions lens
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151365A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR101376931B1 (ko) 2004-05-17 2014-03-25 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
DE102005033564A1 (de) * 2005-07-19 2007-02-01 Carl Zeiss Smt Ag Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage oder eines digitalen Projektionssystems

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999052004A1 (en) * 1998-04-07 1999-10-14 Nikon Corporation Projection exposure apparatus and method, and reflection refraction optical system
US6707616B1 (en) 1998-04-07 2004-03-16 Nikon Corporation Projection exposure apparatus, projection exposure method and catadioptric optical system
US6195213B1 (en) 1998-06-08 2001-02-27 Nikon Corporation Projection exposure apparatus and method
US6512641B2 (en) 1998-06-08 2003-01-28 Nikon Corporation Projection exposure apparatus and method
US6639732B2 (en) 1998-06-08 2003-10-28 Nikon Corporation Projection exposure apparatus and method
JP2011047951A (ja) * 1999-07-07 2011-03-10 Kla-Tencor Corp 試料を検査するための装置および対物光学系
JP2001237165A (ja) * 2000-02-23 2001-08-31 Canon Inc 露光装置
US6707532B2 (en) 2000-02-23 2004-03-16 Canon Kabushiki Kaisha Projection exposure apparatus
US7038761B2 (en) 2000-02-23 2006-05-02 Canon Kk Projection exposure apparatus

Also Published As

Publication number Publication date
KR980005328A (ko) 1998-03-30
DE19726058A1 (de) 1998-01-02

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