DE19726058A1 - Katadioptrisches System zur Photolithographie - Google Patents
Katadioptrisches System zur PhotolithographieInfo
- Publication number
- DE19726058A1 DE19726058A1 DE19726058A DE19726058A DE19726058A1 DE 19726058 A1 DE19726058 A1 DE 19726058A1 DE 19726058 A DE19726058 A DE 19726058A DE 19726058 A DE19726058 A DE 19726058A DE 19726058 A1 DE19726058 A1 DE 19726058A1
- Authority
- DE
- Germany
- Prior art keywords
- lens group
- imaging system
- concave mirror
- image
- catadioptric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000206 photolithography Methods 0.000 title claims description 5
- 238000003384 imaging method Methods 0.000 claims abstract description 73
- 230000004907 flux Effects 0.000 claims abstract description 41
- 230000003287 optical effect Effects 0.000 claims abstract description 29
- 239000000758 substrate Substances 0.000 claims abstract description 15
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims description 16
- 239000010436 fluorite Substances 0.000 claims description 16
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 7
- 230000002457 bidirectional effect Effects 0.000 claims description 5
- 230000000694 effects Effects 0.000 abstract 1
- 230000004075 alteration Effects 0.000 description 28
- 230000005499 meniscus Effects 0.000 description 24
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 206010010071 Coma Diseases 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000010363 phase shift Effects 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 230000029305 taxis Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Lenses (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8180013A JPH1010431A (ja) | 1996-06-20 | 1996-06-20 | 反射屈折光学系 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE19726058A1 true DE19726058A1 (de) | 1998-01-02 |
Family
ID=16075939
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19726058A Withdrawn DE19726058A1 (de) | 1996-06-20 | 1997-06-19 | Katadioptrisches System zur Photolithographie |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPH1010431A (enExample) |
| KR (1) | KR980005328A (enExample) |
| DE (1) | DE19726058A1 (enExample) |
Cited By (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0964307A3 (en) * | 1998-06-08 | 2001-09-05 | Nikon Corporation | Projection exposure apparatus and method |
| EP0989434A3 (en) * | 1998-07-29 | 2001-10-17 | Carl Zeiss | Catadioptric optical system and exposure apparatus having the same |
| WO2002044786A3 (en) * | 2000-11-28 | 2002-08-29 | Zeiss Carl Semiconductor Mfg | Catadioptric projection system for 157 nm lithography |
| USRE37846E1 (en) | 1995-01-06 | 2002-09-17 | Nikon Corporation | Projection optical system and exposure apparatus using the same |
| USRE38403E1 (en) | 1994-11-10 | 2004-01-27 | Nikon Corporation | Projection optical system and projection exposure apparatus |
| USRE38421E1 (en) | 1994-04-28 | 2004-02-10 | Nikon Corporation | Exposure apparatus having catadioptric projection optical system |
| USRE38438E1 (en) | 1994-08-23 | 2004-02-24 | Nikon Corporation | Catadioptric reduction projection optical system and exposure apparatus having the same |
| US6717746B2 (en) | 2001-05-22 | 2004-04-06 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Catadioptric reduction lens |
| US6873476B2 (en) | 2000-01-14 | 2005-03-29 | Carl-Zeiss-Stiftung | Microlithographic reduction projection catadioptric objective |
| US6995930B2 (en) | 1999-12-29 | 2006-02-07 | Carl Zeiss Smt Ag | Catadioptric projection objective with geometric beam splitting |
| US7046459B1 (en) | 2001-12-18 | 2006-05-16 | Carl Zeiss Smt Ag | Catadioptric reductions lens |
| USRE39296E1 (en) | 1993-03-12 | 2006-09-19 | Nikon Corporation | Catadioptric projection systems |
| DE102005033564A1 (de) * | 2005-07-19 | 2007-02-01 | Carl Zeiss Smt Ag | Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage oder eines digitalen Projektionssystems |
| EP1191378A4 (en) * | 2000-03-03 | 2009-11-04 | Nikon Corp | REFLECTIVE-REFRACTIVE OPTICAL SYSTEM AND ITS USE IN A PROJECTION EXPOSURE SYSTEM |
| US7869122B2 (en) | 2004-01-14 | 2011-01-11 | Carl Zeiss Smt Ag | Catadioptric projection objective |
| US8199400B2 (en) | 2004-01-14 | 2012-06-12 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US8913316B2 (en) | 2004-05-17 | 2014-12-16 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6512631B2 (en) * | 1996-07-22 | 2003-01-28 | Kla-Tencor Corporation | Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system |
| EP1079253A4 (en) * | 1998-04-07 | 2004-09-01 | Nikon Corp | DEVICE AND PROCESS FOR PROJECTION EXPOSURE, AND OPTICAL SYSTEM WITH REFLECTION AND REFRACTION |
| JP4532647B2 (ja) * | 2000-02-23 | 2010-08-25 | キヤノン株式会社 | 露光装置 |
-
1996
- 1996-06-20 JP JP8180013A patent/JPH1010431A/ja active Pending
-
1997
- 1997-05-28 KR KR1019970021294A patent/KR980005328A/ko not_active Withdrawn
- 1997-06-19 DE DE19726058A patent/DE19726058A1/de not_active Withdrawn
Cited By (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USRE39296E1 (en) | 1993-03-12 | 2006-09-19 | Nikon Corporation | Catadioptric projection systems |
| USRE39024E1 (en) | 1994-04-28 | 2006-03-21 | Nikon Corporation | Exposure apparatus having catadioptric projection optical system |
| USRE38421E1 (en) | 1994-04-28 | 2004-02-10 | Nikon Corporation | Exposure apparatus having catadioptric projection optical system |
| USRE38438E1 (en) | 1994-08-23 | 2004-02-24 | Nikon Corporation | Catadioptric reduction projection optical system and exposure apparatus having the same |
| USRE38403E1 (en) | 1994-11-10 | 2004-01-27 | Nikon Corporation | Projection optical system and projection exposure apparatus |
| USRE37846E1 (en) | 1995-01-06 | 2002-09-17 | Nikon Corporation | Projection optical system and exposure apparatus using the same |
| EP1293832A1 (en) * | 1998-06-08 | 2003-03-19 | Nikon Corporation | Projection exposure apparatus and method |
| EP0964307A3 (en) * | 1998-06-08 | 2001-09-05 | Nikon Corporation | Projection exposure apparatus and method |
| EP0989434A3 (en) * | 1998-07-29 | 2001-10-17 | Carl Zeiss | Catadioptric optical system and exposure apparatus having the same |
| US6985286B2 (en) | 1998-07-29 | 2006-01-10 | Carl Zeiss Smt Ag | Catadioptric optical system and exposure apparatus having the same |
| US7426082B2 (en) | 1999-12-29 | 2008-09-16 | Carl Zeiss Smt Ag | Catadioptric projection objective with geometric beam splitting |
| US6995930B2 (en) | 1999-12-29 | 2006-02-07 | Carl Zeiss Smt Ag | Catadioptric projection objective with geometric beam splitting |
| US7237915B2 (en) | 2000-01-14 | 2007-07-03 | Carl Zeiss Smt Ag | Catadioptric projection system for 157 nm lithography |
| US7859748B2 (en) | 2000-01-14 | 2010-12-28 | Carl Zeiss Smt Gmbh | Microlithographic reduction projection catadioptric objective |
| US6873476B2 (en) | 2000-01-14 | 2005-03-29 | Carl-Zeiss-Stiftung | Microlithographic reduction projection catadioptric objective |
| US7218445B2 (en) | 2000-01-14 | 2007-05-15 | Carl-Zeiss Stiftung | Microlithographic reduction projection catadioptric objective |
| US7508581B2 (en) | 2000-01-14 | 2009-03-24 | Carl Zeiss Smt Ag | Catadioptric projection system for 157 nm lithography |
| EP1191378A4 (en) * | 2000-03-03 | 2009-11-04 | Nikon Corp | REFLECTIVE-REFRACTIVE OPTICAL SYSTEM AND ITS USE IN A PROJECTION EXPOSURE SYSTEM |
| WO2002044786A3 (en) * | 2000-11-28 | 2002-08-29 | Zeiss Carl Semiconductor Mfg | Catadioptric projection system for 157 nm lithography |
| US7006304B2 (en) | 2001-05-22 | 2006-02-28 | Carl Zeiss Smt Ag | Catadioptric reduction lens |
| US6717746B2 (en) | 2001-05-22 | 2004-04-06 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Catadioptric reduction lens |
| US7046459B1 (en) | 2001-12-18 | 2006-05-16 | Carl Zeiss Smt Ag | Catadioptric reductions lens |
| US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US8730572B2 (en) | 2004-01-14 | 2014-05-20 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US8199400B2 (en) | 2004-01-14 | 2012-06-12 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US9772478B2 (en) | 2004-01-14 | 2017-09-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with parallel, offset optical axes |
| US8208199B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US8289619B2 (en) | 2004-01-14 | 2012-10-16 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US8339701B2 (en) | 2004-01-14 | 2012-12-25 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US8355201B2 (en) | 2004-01-14 | 2013-01-15 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US8416490B2 (en) | 2004-01-14 | 2013-04-09 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US7869122B2 (en) | 2004-01-14 | 2011-01-11 | Carl Zeiss Smt Ag | Catadioptric projection objective |
| US8804234B2 (en) | 2004-01-14 | 2014-08-12 | Carl Zeiss Smt Gmbh | Catadioptric projection objective including an aspherized plate |
| US8908269B2 (en) | 2004-01-14 | 2014-12-09 | Carl Zeiss Smt Gmbh | Immersion catadioptric projection objective having two intermediate images |
| US8913316B2 (en) | 2004-05-17 | 2014-12-16 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
| US9019596B2 (en) | 2004-05-17 | 2015-04-28 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
| US9134618B2 (en) | 2004-05-17 | 2015-09-15 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
| US9726979B2 (en) | 2004-05-17 | 2017-08-08 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
| DE102005033564A1 (de) * | 2005-07-19 | 2007-02-01 | Carl Zeiss Smt Ag | Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage oder eines digitalen Projektionssystems |
Also Published As
| Publication number | Publication date |
|---|---|
| KR980005328A (ko) | 1998-03-30 |
| JPH1010431A (ja) | 1998-01-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8139 | Disposal/non-payment of the annual fee |