JPH09255852A - Epoxy resin composition for sealing material and semiconductor device using the same - Google Patents

Epoxy resin composition for sealing material and semiconductor device using the same

Info

Publication number
JPH09255852A
JPH09255852A JP6694796A JP6694796A JPH09255852A JP H09255852 A JPH09255852 A JP H09255852A JP 6694796 A JP6694796 A JP 6694796A JP 6694796 A JP6694796 A JP 6694796A JP H09255852 A JPH09255852 A JP H09255852A
Authority
JP
Japan
Prior art keywords
epoxy resin
resin
resin composition
weight
inorganic filler
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6694796A
Other languages
Japanese (ja)
Other versions
JP3267144B2 (en
Inventor
Takayuki Tsuji
隆行 辻
Takashi Toyama
貴志 外山
Tatsuyoshi Wada
辰佳 和田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=13330727&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JPH09255852(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP6694796A priority Critical patent/JP3267144B2/en
Publication of JPH09255852A publication Critical patent/JPH09255852A/en
Application granted granted Critical
Publication of JP3267144B2 publication Critical patent/JP3267144B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain an epoxy resin composition for a sealing material, excellent in adhesion between a lead frame and a cured resin product and moldability, useful in semiconductor devices by formulating a silane coupling agent having a specific structure to a specifically composed sealing resin. SOLUTION: This resin composition comprises (A) an epoxy resin, (B) a curing agent, (C) an inorganic filler and (D) a silane coupling agent. The component A contains 40-100 pts.wt. of a dicyclopenta-diene type epoxy resin in 100 pts.wt. of the whole epoxy resin. The component C is contained in this composition in an amount of 70-95 pts.wt. in 100 pts.wt. of said composition. As a component D, a formulation containing a silane of formula I (R<1> , R<3> and R<4> are each H, a 1-12C monovalent hydrocarbon; R2 is a 1-12C divalent hydrocarbon; n is an integer of 1-3) and a silane of formula II (R<5> is a 1-12C divalent hydrocarbon; R<6> and R<7> are each H a 1-12C monovalent hydrocarbon; m is an integer of 1-3). The amount of the component D is preferably 0.05-1.5 pt.wt. per 100 pts.wt. of the component C, respectively.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、半導体等の封止に
使用される封止材用エポキシ樹脂組成物及びそれを用い
た半導体装置に関するものである。
TECHNICAL FIELD The present invention relates to an epoxy resin composition for an encapsulant used for encapsulating a semiconductor or the like and a semiconductor device using the same.

【0002】[0002]

【従来の技術】半導体装置などの電子部品の封止方法と
して、セラミックや、熱硬化性樹脂を用いる方法が、従
来より行われている。なかでも、エポキシ樹脂組成物に
よる封止が、経済性及び性能のバランスより好ましく、
広く行われている。この封止材用エポキシ樹脂組成物
(以下封止樹脂と記す)により封止された半導体装置
は、例えばリードフレーム用金属上に半導体素子を搭載
し、その半導体素子とリードフレームをボンディングワ
イヤー等を用いて電気的に接続し、半導体素子の全体及
びリードフレームの一部を、封止樹脂で封止して形成さ
れている。
2. Description of the Related Art As a method for sealing electronic components such as semiconductor devices, a method using ceramic or thermosetting resin has been conventionally used. Among them, encapsulation with an epoxy resin composition is more preferable than the balance between economic efficiency and performance,
Widely used. A semiconductor device encapsulated with this epoxy resin composition for encapsulant (hereinafter referred to as encapsulating resin) is, for example, a semiconductor element mounted on a lead frame metal, and the semiconductor element and the lead frame are bonded with a bonding wire or the like. They are electrically connected to each other, and the entire semiconductor element and a part of the lead frame are sealed with a sealing resin.

【0003】上記リードフレームとしては、電気伝導性
の性能の点より銅合金製のリードフレームや、熱膨張率
の性能の点より42アロイ合金製のリードフレームが一
般に使用されている。これらのリードフレームは、金線
等のボンディングワイヤーとの接着性が低いため、リー
ドフレームのボンディングワイヤーと接続しようとする
部分にあらかじめ銀メッキや金メッキを行った後、ボン
ディングワイヤーと接続し、接続の信頼性を改良する方
法が検討されている。
As the lead frame, a lead frame made of a copper alloy is generally used because of its electric conductivity, and a lead frame made of 42 alloy is generally used because of its thermal expansion coefficient. Since these lead frames have low adhesiveness with bonding wires such as gold wires, the parts of the lead frame that are to be connected to the bonding wires are silver-plated or gold-plated in advance, and then connected to the bonding wires. Methods of improving reliability are being investigated.

【0004】また、封止樹脂の硬化物(以下樹脂硬化物
と記す)が吸湿すると、電子部品を母基板に実装する時
のハンダ付けの熱衝撃により、吸湿水分が急激に膨張し
て、樹脂硬化物の内部にクラックが発生し、信頼性が低
下するという問題が発生する場合があった。そのため吸
湿ハンダ耐熱性の改良として、封止樹脂中に無機充填材
を充填することにより封止樹脂中の吸湿しやすい成分で
あるエポキシ樹脂の割合を減らし樹脂硬化物の吸湿量を
減らす方法や、吸湿率の低いエポキシ樹脂等を用いる方
法や、無機充填材の表面をシランカップリング剤等によ
り処理したものを用いる方法等が検討されている。
Further, when a cured product of the sealing resin (hereinafter referred to as a cured resin) absorbs moisture, the absorbed moisture rapidly expands due to a thermal shock of soldering when mounting an electronic component on a mother board, and the resin absorbs moisture. In some cases, a crack may occur inside the cured product, resulting in a decrease in reliability. Therefore, as an improvement of moisture absorption solder heat resistance, a method of reducing the moisture absorption of the resin cured product by reducing the proportion of the epoxy resin, which is a component that easily absorbs moisture in the sealing resin, by filling the sealing resin with an inorganic filler, A method using an epoxy resin or the like having a low moisture absorption rate, a method using an inorganic filler whose surface is treated with a silane coupling agent or the like are being studied.

【0005】この吸湿率の低いエポキシ樹脂を用いる方
法として、ジシクロペンタジエン型エポキシ樹脂を用い
る方法が検討されている。
As a method of using the epoxy resin having a low moisture absorption rate, a method of using a dicyclopentadiene type epoxy resin has been studied.

【0006】しかし封止樹脂中に無機充填材を高い比率
で含有させ、かつ、ジシクロペンタジエン型エポキシ樹
脂を全エポキシ樹脂中に高い比率で含有させて吸湿ハン
ダ耐熱性を改良した場合、成形性が低下して樹脂硬化物
の内部に気泡が残ったり、実際に半導体装置を使用する
ときに曝される温度サイクルにより、リードフレームの
銀メッキを行った部分等と樹脂硬化物との接合部に、こ
れらの接着性が低いためと推定されるが、クラックが発
生する場合があった。そのため封止樹脂中に無機充填材
を高い比率で含有させ、かつ、ジシクロペンタジエン型
エポキシ樹脂を全エポキシ樹脂中に高い比率で含有させ
ても、成形性が優れ、かつ、リードフレームと樹脂硬化
物との接着性が高い封止ができる封止樹脂が求められて
いる。
However, if the sealing resin contains a high proportion of the inorganic filler and the dicyclopentadiene type epoxy resin contains a high proportion of the total epoxy resin to improve the moisture absorption solder heat resistance, the moldability is improved. Of the lead frame and the cured resin due to the temperature cycle exposed when the semiconductor device is actually used. It is presumed that the adhesiveness of these is low, but cracks were sometimes generated. Therefore, even if the sealing resin contains a high proportion of the inorganic filler and the dicyclopentadiene type epoxy resin contains a high proportion of the total epoxy resin, the moldability is excellent, and the lead frame and the resin are cured. There is a demand for a sealing resin that can be sealed with high adhesiveness to objects.

【0007】[0007]

【発明が解決しようとする課題】本発明は、上記問題点
を改善するために成されたもので、封止樹脂中に無機充
填材を高い比率で含有させ、かつ、ジシクロペンタジエ
ン型エポキシ樹脂を全エポキシ樹脂中に高い比率で含有
させた封止樹脂であって、リードフレームと樹脂硬化物
との接着性、及び成形性が共に優れた封止樹脂を提供す
ることを目的とする。また、この封止樹脂を用いたリー
ドフレームと樹脂硬化物との接着性、及び成形性が共に
優れた半導体装置を提供することを目的とする。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, in which a sealing resin contains a high proportion of an inorganic filler and a dicyclopentadiene type epoxy resin. It is an object of the present invention to provide an encapsulating resin which is a high-encapsulating encapsulating resin in all epoxy resins and which is excellent in both the adhesiveness between the lead frame and the cured resin and the moldability. Another object of the present invention is to provide a semiconductor device having excellent adhesiveness and moldability between a lead frame using this sealing resin and a cured resin product.

【0008】[0008]

【課題を解決するための手段】本発明の請求項1に係る
封止樹脂(封止材用エポキシ樹脂組成物)は、エポキシ
樹脂、硬化剤、無機充填材及びシランカップリング剤を
配合してなる封止樹脂であって、封止樹脂100重量部
中に、無機充填材を70〜95重量部含有し、かつ、全
エポキシ樹脂100重量部中に、ジシクロペンタジエン
型エポキシ樹脂を40〜100重量部含有する封止樹脂
において、シランカップリング剤として、下記式(a)
で表されるシラン化合物及び下記式(b)で表されるシ
ラン化合物を配合していることを特徴とする。
A sealing resin (epoxy resin composition for a sealing material) according to claim 1 of the present invention comprises an epoxy resin, a curing agent, an inorganic filler and a silane coupling agent. Which is 70 to 95 parts by weight of the inorganic filler in 100 parts by weight of the sealing resin, and 40 to 100 parts of the dicyclopentadiene type epoxy resin in 100 parts by weight of the total epoxy resin. In the encapsulating resin which is contained by weight, the following formula (a) is used as a silane coupling agent.
And a silane compound represented by the following formula (b) are blended.

【0009】[0009]

【化3】 Embedded image

【0010】[0010]

【化4】 Embedded image

【0011】本発明の請求項2に係る封止樹脂は、請求
項1記載の封止樹脂において、無機充填材が、シリカを
含有していることを特徴とする。
The sealing resin according to a second aspect of the present invention is the sealing resin according to the first aspect, wherein the inorganic filler contains silica.

【0012】本発明の請求項3に係る半導体装置は、請
求項1又は請求項2記載の封止樹脂を用いて、リードフ
レームに搭載された半導体素子を封止してなる。
A semiconductor device according to claim 3 of the present invention is obtained by encapsulating a semiconductor element mounted on a lead frame using the encapsulating resin according to claim 1 or 2.

【0013】本発明によると、上記式(a)及び上記式
(b)で表されるシランカップリング剤を封止樹脂に配
合しているため、無機充填材を、封止樹脂100重量部
中に70〜95重量部含有し、かつ、全エポキシ樹脂1
00重量部中に、ジシクロペンタジエン型エポキシ樹脂
を40〜100重量部含有した封止樹脂であっても、こ
れらのシランカップリング剤が、無機充填材とリードフ
レームとの密着力、及び成形性を改善するため、リード
フレームと樹脂硬化物との接着性、及び成形性が共に優
れた封止ができる。
According to the present invention, since the silane coupling agent represented by the above formula (a) and the above formula (b) is compounded in the sealing resin, the inorganic filler is added in 100 parts by weight of the sealing resin. 70 to 95 parts by weight and total epoxy resin 1
Even in a sealing resin containing 40 to 100 parts by weight of a dicyclopentadiene type epoxy resin in 00 parts by weight, these silane coupling agents have an adhesive force between an inorganic filler and a lead frame, and moldability. In order to improve the above, it is possible to perform sealing with excellent adhesiveness and moldability between the lead frame and the cured resin.

【0014】[0014]

【発明の実施の形態】本発明の封止樹脂は、少なくとも
ジシクロペンタジエン型エポキシ樹脂、硬化剤、無機充
填材及びシランカップリング剤として、上記式(a)で
表されるシラン化合物及び上記式(b)で表されるシラ
ン化合物を配合してなる。上記式(a)で表されるシラ
ン化合物及び上記式(b)で表されるシラン化合物を共
に配合していることが重要であり、これらのシランカッ
プリング剤を配合していない場合又は一方のみ配合して
いる場合は、リードフレームとの接着性が低下したり成
形性が低下する。なお、上記式(a)で表されるシラン
化合物の内、下記式(c)で表されるN−フェニル−γ
−アミノプロピルトリメトキシシランを用い、上記式
(b)で表されるシラン化合物の内、下記式(d)で表
されるγ−メルカプトプロピルトリメトキシシランを用
いた場合、接着性及び成形性を改良する効果が大きく好
ましい。
BEST MODE FOR CARRYING OUT THE INVENTION The encapsulating resin of the present invention comprises a silane compound represented by the above formula (a) and the above formula as at least a dicyclopentadiene type epoxy resin, a curing agent, an inorganic filler and a silane coupling agent. It is prepared by blending the silane compound represented by (b). It is important that the silane compound represented by the above formula (a) and the silane compound represented by the above formula (b) are blended together. If these silane coupling agents are not blended or only one of them is blended. When it is mixed, the adhesiveness with the lead frame is lowered and the formability is lowered. Among the silane compounds represented by the above formula (a), N-phenyl-γ represented by the following formula (c)
-When using aminopropyltrimethoxysilane and using γ-mercaptopropyltrimethoxysilane represented by the following formula (d) among the silane compounds represented by the above formula (b), adhesiveness and moldability are improved. The effect of improvement is large and preferable.

【0015】[0015]

【化5】 Embedded image

【0016】[0016]

【化6】 [Chemical 6]

【0017】なお、上記式(a)で表されるシランカッ
プリング剤及び上記式(b)で表されるシランカップリ
ング剤を、無機充填材100重量部に対して、それぞれ
0.05〜1.5重量部、より好ましくは0.1〜1.
0重量部配合していることが好ましい。0.05重量部
未満の場合は、接着性や成形性を改良する効果が小さ
く、1.5重量部を越える場合は、樹脂硬化物の強度が
低下し問題となる。
The silane coupling agent represented by the above formula (a) and the silane coupling agent represented by the above formula (b) are each contained in an amount of 0.05 to 1 with respect to 100 parts by weight of the inorganic filler. 0.5 parts by weight, more preferably 0.1-1.
It is preferable that 0 part by weight is blended. When the amount is less than 0.05 parts by weight, the effect of improving the adhesiveness and moldability is small, and when the amount is more than 1.5 parts by weight, the strength of the cured resin product decreases, which is a problem.

【0018】なお、シランカップリング剤としては、上
記式(a)で表されるシラン化合物及び上記式(b)で
表されるシラン化合物のみを配合していることに限定す
るものではなく、更に必要に応じて、γ−ウレイドプロ
ピルトリメトキシシラン等の、上記式(a)で表される
化合物以外のアミノシランや、γ−グリシドキシプロピ
ルトリメトキシシラン等のエポキシシラン等を配合して
いてもよい。また、これらのシランカップリング剤は、
封止樹脂に直接添加してもよいが、あらかじめ無機充填
材に直接噴霧する方法や、シランカップリング剤を溶か
した溶液に無機充填材を浸漬する方法等により無機充填
材をシランカップリング剤で処理したのち、封止樹脂に
添加する方法の場合、封止樹脂に直接添加する場合と比
較して、樹脂硬化物とリードフレームとの接着性の改良
や、成形性を改良する効果を確実に得ることができ好ま
しい。
The silane coupling agent is not limited to the one containing only the silane compound represented by the above formula (a) and the silane compound represented by the above formula (b). If necessary, an aminosilane other than the compound represented by the above formula (a), such as γ-ureidopropyltrimethoxysilane, or an epoxysilane such as γ-glycidoxypropyltrimethoxysilane may be added. Good. In addition, these silane coupling agents,
Although it may be added directly to the sealing resin, the inorganic filler can be directly sprayed onto the inorganic filler, or the inorganic filler can be immersed in a solution in which the silane coupling agent is dissolved by a silane coupling agent. After the treatment, the method of adding to the encapsulating resin surely improves the adhesiveness between the resin cured product and the lead frame and the effect of improving the moldability as compared with the case of directly adding to the encapsulating resin. It is possible to obtain and is preferable.

【0019】本発明で使用する無機充填材としては特に
限定するものではなく、例えば結晶シリカ、非晶質シリ
カ、アルミナ、マグネシア、酸化チタン、炭酸カルシウ
ム、炭酸マグネシウム、窒化ケイ素、タルク、ケイ酸カ
ルシウム等が挙げられる。上記無機充填材は、単独で用
いても、2種類以上を併用してもよい。なお、無機充填
材を、封止樹脂100重量部中に、70〜95重量部含
有することが重要である。無機充填材が70重量部未満
の場合、樹脂硬化物の吸湿量が増加し、吸湿ハンダ耐熱
性が低下する場合があり問題となり、95重量部を越え
る場合、封止樹脂の粘度が高くなり、封止する際の成形
性が低下し問題となる。なお、無機充填材として結晶シ
リカ又は非晶質シリカ等のシリカを用いた場合、樹脂硬
化物の線膨張係数が小さくなり、半導体素子の線膨張係
数に近づくため好ましい。
The inorganic filler used in the present invention is not particularly limited, and examples thereof include crystalline silica, amorphous silica, alumina, magnesia, titanium oxide, calcium carbonate, magnesium carbonate, silicon nitride, talc, calcium silicate. Etc. The inorganic filler may be used alone or in combination of two or more. It is important that the inorganic filler is contained in 70 to 95 parts by weight in 100 parts by weight of the sealing resin. If the amount of the inorganic filler is less than 70 parts by weight, the amount of moisture absorption of the cured resin may increase and the heat resistance of the moisture-absorbing solder may decrease, which is a problem. If it exceeds 95 parts by weight, the viscosity of the encapsulating resin increases, Formability at the time of sealing is lowered, which is a problem. It is preferable to use silica such as crystalline silica or amorphous silica as the inorganic filler because the linear expansion coefficient of the cured resin becomes small and approaches the linear expansion coefficient of the semiconductor element.

【0020】本発明で使用するエポキシ樹脂としてはジ
シクロペンタジエン型エポキシ樹脂を、全エポキシ樹脂
100重量部中に40〜100重量部含有することが重
要である。40重量部未満の場合は、吸湿率が上昇して
吸湿ハンダ耐熱性が低下する場合がある。なお、ジシク
ロペンタジエン型エポキシ樹脂としては、例えば、下記
式(e),式(f)で表わされる化合物等が挙げられ
る。なお、式(e)中pは、0又は正の数を表し、式
(f)中qは、0又は正の数を表す。なお、下記式
(e)で表されるエポキシ樹脂が、吸湿ハンダ耐熱性を
改良する効果が大きく好ましい。
As the epoxy resin used in the present invention, it is important that the dicyclopentadiene type epoxy resin is contained in an amount of 40 to 100 parts by weight based on 100 parts by weight of the total epoxy resin. If it is less than 40 parts by weight, the moisture absorption rate may increase and the moisture absorption solder heat resistance may decrease. Examples of the dicyclopentadiene type epoxy resin include compounds represented by the following formulas (e) and (f). In addition, p in Formula (e) represents 0 or a positive number, and q in Formula (f) represents 0 or a positive number. In addition, the epoxy resin represented by the following formula (e) is preferable because it has a great effect of improving the moisture absorption solder heat resistance.

【0021】[0021]

【化7】 Embedded image

【0022】[0022]

【化8】 Embedded image

【0023】本発明で使用するエポキシ樹脂としてはジ
シクロペンタジエン型エポキシ樹脂のみに限定するもの
ではなく、ジシクロペンタジエン型エポキシ樹脂を、全
エポキシ樹脂100重量部中に40重量部以上含有する
ように配合した場合、例えばクレゾールノボラック型エ
ポキシ樹脂、ビスフェノールA型エポキシ樹脂、フェノ
ールノボラック型エポキシ樹脂、ビフェニル型エポキシ
樹脂、線状脂肪族エポキシ樹脂、脂環式エポキシ樹脂等
を併用することができ、これらを単独で用いても、2種
類以上を併用してもよい。なお、ビフェニル型エポキシ
樹脂を併用すると、更に吸湿ハンダ耐熱性が向上して好
ましい。
The epoxy resin used in the present invention is not limited to the dicyclopentadiene type epoxy resin, but the dicyclopentadiene type epoxy resin may be contained in an amount of 40 parts by weight or more based on 100 parts by weight of the total epoxy resin. When blended, for example, cresol novolac type epoxy resin, bisphenol A type epoxy resin, phenol novolac type epoxy resin, biphenyl type epoxy resin, linear aliphatic epoxy resin, alicyclic epoxy resin, etc. can be used in combination. They may be used alone or in combination of two or more. In addition, it is preferable to use a biphenyl type epoxy resin in combination, because the moisture absorption solder heat resistance is further improved.

【0024】本発明で使用する硬化剤としては、エポキ
シ樹脂と反応して硬化させるものであれば特に限定する
ものではなく、例えばフェノールノボラック樹脂、クレ
ゾールノボラック樹脂、ナフトールノボラック樹脂、ア
ラルキル型フェノール樹脂等の各種ノボラック樹脂、無
水フタル酸、無水ピロメット酸等の酸無水物、ジアミノ
ジフェニルメタン、メタフェニレンジアミン等の芳香族
アミン等が挙げられる。上記硬化剤は、単独で用いて
も、2種類以上を併用してもよく、その配合量として
は、通常エポキシ樹脂に対して、当量比で0.5〜1.
5の範囲で配合される。なお、下記式(g)で表わされ
るアラルキル型フェノール樹脂を用いた場合、樹脂の吸
湿率が低くなるため、吸湿ハンダ耐熱性が向上し好まし
い。なお、式(g)中rは0又は正の整数を表す。アラ
ルキル型フェノール樹脂は、フェノール、クレゾール等
のフェノール類と、アラルキルエーテル類との反応で得
られる樹脂である。
The curing agent used in the present invention is not particularly limited as long as it can be cured by reacting with an epoxy resin, and examples thereof include phenol novolac resin, cresol novolac resin, naphthol novolac resin and aralkyl type phenol resin. Various novolak resins, acid anhydrides such as phthalic anhydride and pyromellitic anhydride, aromatic amines such as diaminodiphenylmethane and metaphenylenediamine. The above curing agents may be used alone or in combination of two or more, and the compounding amount thereof is usually 0.5 to 1.
It is mixed in the range of 5. When the aralkyl-type phenol resin represented by the following formula (g) is used, the moisture absorption of the resin becomes low, and the moisture absorption solder heat resistance is improved, which is preferable. In the formula (g), r represents 0 or a positive integer. The aralkyl-type phenol resin is a resin obtained by reacting phenols such as phenol and cresol with aralkyl ethers.

【0025】[0025]

【化9】 Embedded image

【0026】また、硬化剤として上記式(g)で表わさ
れるアラルキル型フェノール樹脂のフェノール部をα−
ナフトールに代えた、下記式(h)で表わされるフェノ
ール樹脂を含有する場合も、樹脂の吸湿率が低くなるた
め、吸湿ハンダ耐熱性が向上し好ましい。なお、式
(h)中sは0又は正の整数を表す。
Further, the phenol portion of the aralkyl type phenol resin represented by the above formula (g) is used as a curing agent in α-
When a phenol resin represented by the following formula (h) is contained instead of naphthol, the moisture absorption rate of the resin is lowered, and the moisture absorption solder heat resistance is improved, which is preferable. In the formula (h), s represents 0 or a positive integer.

【0027】[0027]

【化10】 Embedded image

【0028】本発明の封止樹脂には、必要に応じて、硬
化促進剤、離型剤、着色剤、低応力化剤及び難燃剤等を
配合させることもできる。硬化促進剤としては例えば、
1,8−ジアザ−ビシクロ(5,4,0)ウンデセン−
7、トリエチレンジアミン、ベンジルジメチルアミン等
の三級アミン化合物、2−メチルイミダゾール、2−エ
チル−4−メチルイミダゾール、2−フェニルイミダゾ
ール、2−フェニル−4−メチルイミダゾール等のイミ
ダゾール化合物、トリフェニルホスフィン、トリブチル
ホスフィン等の有機ホスフィン化合物等が挙げられる。
離型剤としては例えば、カルナバワックス、ステアリン
酸、モンタン酸、カルボキシル基含有ポリオレフィン等
が挙げられる。着色剤としては例えば、カーボンブラッ
ク、酸化チタン等が挙げられる。低応力化剤としては例
えば、シリコーンゲル、シリコーンゴム、シリコーンオ
イル等が挙げられる。難燃剤としては例えば、三酸化ア
ンチモン、ハロゲン化合物、リン化合物等が挙げられ
る。これらの硬化促進剤、離型剤、着色剤、低応力化剤
及び難燃剤等は2種類以上を併用することもできる。
If necessary, the encapsulating resin of the present invention may contain a curing accelerator, a release agent, a coloring agent, a stress reducing agent, a flame retardant and the like. Examples of the curing accelerator include
1,8-diaza-bicyclo (5,4,0) undecene-
7, tertiary amine compounds such as triethylenediamine and benzyldimethylamine, imidazole compounds such as 2-methylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, triphenylphosphine And organic phosphine compounds such as tributylphosphine.
Examples of the release agent include carnauba wax, stearic acid, montanic acid, carboxyl group-containing polyolefin and the like. Examples of the colorant include carbon black and titanium oxide. Examples of the stress reducing agent include silicone gel, silicone rubber, silicone oil and the like. Examples of the flame retardant include antimony trioxide, halogen compounds, phosphorus compounds and the like. Two or more kinds of these curing accelerators, release agents, colorants, stress reducing agents, flame retardants and the like can be used in combination.

【0029】本発明の封止樹脂は、均一に混合され、混
練されていることが好ましい。混練の方法としては例え
ば、ロール、ニーダー、ミキサー等を用いて加熱して行
われ、その後冷却、粉砕するなどの方法で封止樹脂は製
造される。
The sealing resin of the present invention is preferably uniformly mixed and kneaded. As a method of kneading, for example, a sealing resin is manufactured by heating using a roll, a kneader, a mixer, or the like, and then cooling, pulverizing, or the like.

【0030】[0030]

【実施例】【Example】

(実施例1〜7、比較例1〜3)封止樹脂として、下記
の3種類のエポキシ樹脂、3種類の硬化剤、3種類のシ
ランカップリング剤、無機充填材、硬化促進剤、着色
剤、難燃剤及び離型剤を表1及び表2に示す重量比で配
合した。
(Examples 1 to 7 and Comparative Examples 1 to 3) As sealing resins, the following three types of epoxy resins, three types of curing agents, three types of silane coupling agents, inorganic fillers, curing accelerators, and colorants. The flame retardant and the release agent were blended in the weight ratios shown in Tables 1 and 2.

【0031】・エポキシ樹脂ア:上記式(e)で表され
る、エポキシ当量が260のジシクロペンタジエン型エ
ポキシ樹脂[大日本インキ社製、商品名HP7200] ・エポキシ樹脂イ:エポキシ当量が192のビフェニル
型エポキシ樹脂[油化シェル社製、商品名YX4000
H] ・エポキシ樹脂ウ:エポキシ当量が400のテトラブロ
モビスフェノールA型エポキシ樹脂 ・硬化剤カ:上記式(g)で表される、水酸基当量17
0のアラルキル型フェノール樹脂[三井東圧化学社製、
商品名ミレックスXL−225−3L] ・硬化剤キ:上記式(h)で表される、水酸基当量21
0のフェノール樹脂[新日鉄化学社製、商品名SN18
0] ・硬化剤ク:水酸基当量105のフェノールノボラック
樹脂[荒川化学社製、商品名タマノール752] ・シランカップリング剤サ:上記式(c)で表されるN
−フェニル−γ−アミノプロピルトリメトキシシラン
[信越化学工業社製、商品名KBM573] ・シランカップリング剤シ:上記式(d)で表されるγ
−メルカプトプロピルトリメトキシシラン[東芝シリコ
ーン社製、商品名TSL8380E] ・シランカップリング剤ス:エポキシシラン[東レダウ
コーニング社製、商品名SH6040] ・無機充填剤:非晶質シリカ[電気化学工業社製、商品
名FB74] ・硬化促進剤:トリフェニルホスフィン ・着色剤:カーボンブラック ・難燃剤:三酸化アンチモン ・離型剤:カルナバワックス
Epoxy resin a: a dicyclopentadiene type epoxy resin represented by the above formula (e) and having an epoxy equivalent of 260 [manufactured by Dainippon Ink and Chemicals, HP7200]. Epoxy resin a: Epoxy equivalent of 192. Biphenyl type epoxy resin [Yuka 4000, trade name YX4000
H] -Epoxy resin C: Tetrabromobisphenol A type epoxy resin having an epoxy equivalent of 400-Curing agent f: Hydroxyl equivalent 17 represented by the above formula (g)
0 aralkyl type phenol resin [Mitsui Toatsu Chemicals,
Product name Milex XL-225-3L] -Curing agent K: Hydroxyl equivalent 21 represented by the above formula (h)
0 phenolic resin [Nippon Steel Chemical Co., Ltd., trade name SN18
0] -Curing agent C: Phenol novolac resin having a hydroxyl equivalent of 105 [Arakawa Chemical Co., Ltd., trade name Tamanol 752] -Silane coupling agent: N represented by the above formula (c)
-Phenyl-γ-aminopropyltrimethoxysilane [manufactured by Shin-Etsu Chemical Co., Ltd., trade name KBM573] Silane coupling agent Si: γ represented by the above formula (d)
-Mercaptopropyltrimethoxysilane [Toshiba Silicone, trade name TSL8380E] -Silane coupling agent: epoxy silane [Toray Dow Corning, trade name SH6040] -Inorganic filler: amorphous silica [Denki Kagaku Kogyo Co., Ltd. Product name: FB74] -Curing accelerator: triphenylphosphine-Colorant: carbon black-Flame retardant: antimony trioxide-Release agent: carnauba wax

【0032】[0032]

【表1】 [Table 1]

【0033】[0033]

【表2】 [Table 2]

【0034】なお、上記シランカップリング剤は、あら
かじめ無機充填剤に直接噴霧して表面処理した後、配合
した。上記の各原料を混合した後、加熱ロールを用い
て、温度85℃で5分間混練し、次いで冷却した。その
後、粉砕して封止樹脂を得た。
The above-mentioned silane coupling agent was blended after being directly sprayed directly on the inorganic filler for surface treatment. After mixing each of the above raw materials, the mixture was kneaded with a heating roll at a temperature of 85 ° C. for 5 minutes and then cooled. Then, it was pulverized to obtain a sealing resin.

【0035】(評価)実施例1〜7及び比較例1〜3で
得られた封止樹脂を用いて、評価用サンプルを下記の方
法で作製し、その評価用サンプルの、密着性、成形性、
吸湿ハンダ耐熱性及び吸湿率を下記の方法で測定した。
(Evaluation) Using the sealing resins obtained in Examples 1 to 7 and Comparative Examples 1 to 3, an evaluation sample was prepared by the following method, and the adhesion and moldability of the evaluation sample were evaluated. ,
Moisture absorption Solder heat resistance and moisture absorption were measured by the following methods.

【0036】密着性は、銀メッキを全面に施した厚み
0.5mmの銅板の片面に、プリン型評価用サンプル
を、トランスファー成形機を用いて、170℃の温度で
90秒成形した後、175℃の温度で6時間、後硬化し
て作製した。次いでこの評価用サンプルを、プッシュプ
ルゲージを用いて剪断方向に引っ張り、破断したときの
強度を求めた。
The adhesion was measured by molding a pudding-type evaluation sample on one surface of a 0.5 mm-thick copper plate plated with silver on the entire surface at a temperature of 170 ° C. for 90 seconds using a transfer molding machine, and then 175 It was made by post-curing at a temperature of ° C for 6 hours. Next, this evaluation sample was pulled in the shearing direction using a push-pull gauge, and the strength at the time of breaking was determined.

【0037】成形性は、9.6×9.6×0.4mmの
半導体素子を厚み150μmの銀メッキを施した銅合金
製のリードフレームに銀ペーストで接着した後、15×
19×1.8mmの60ピンQFP型評価用サンプル
(半導体装置)を、密着性の評価用サンプルと同様にし
て作製した。次いでこの評価用サンプル10個の内部の
気泡残留を、超音波探査装置(キャノン社製、M−70
0II)を用いて観察し、直径0.3mm以上の気泡が
残留したものを不良として求めた。
The moldability is 15 × after a semiconductor element of 9.6 × 9.6 × 0.4 mm is bonded to a lead frame made of silver-plated copper alloy having a thickness of 150 μm with a silver paste.
A 19 × 1.8 mm 60-pin QFP type evaluation sample (semiconductor device) was prepared in the same manner as the adhesion evaluation sample. Next, the residual air bubbles inside the 10 evaluation samples were analyzed by an ultrasonic probe (manufactured by Canon Inc., M-70).
0II) and observed bubbles having a diameter of 0.3 mm or more remained as defective.

【0038】吸湿ハンダ耐熱性は、成形性の評価用サン
プルと同様の60ピンQFP型評価用サンプルを同様に
作製した。次いでこの評価用サンプル10個を85℃/
85%RHの条件で72時間処理した後、250℃のハ
ンダに10秒浸漬した。次いで評価用サンプルを半分に
切断し、切断面を研磨した後、顕微鏡でクラックの発生
の大きさを観察した。クラックの大きさが75μm以上
のものを不良として求めた。
Regarding the heat resistance to moisture-absorbed solder, a 60-pin QFP type evaluation sample similar to the moldability evaluation sample was prepared. Then, 10 of these evaluation samples were used at 85 ° C /
After treating for 72 hours under the condition of 85% RH, it was immersed in solder at 250 ° C. for 10 seconds. Next, the evaluation sample was cut in half, the cut surface was polished, and the size of cracks was observed with a microscope. Those having a crack size of 75 μm or more were determined as defective.

【0039】吸湿率は、直径50mm厚み3mmの円盤
型評価用サンプルを、密着性の評価用サンプルと同様に
して作製した後、125℃の温度で16時間乾燥し、次
いで85℃/85%RHの条件で72時間処理した後、
125℃の温度で16時間乾燥した直後の重量との差を
測定して増加率を計算して求めた。
Regarding the moisture absorption rate, a disk-type evaluation sample having a diameter of 50 mm and a thickness of 3 mm was prepared in the same manner as the adhesion evaluation sample, dried at a temperature of 125 ° C. for 16 hours, and then 85 ° C./85% RH. After treating for 72 hours under the conditions of
The increase rate was calculated by calculating the difference from the weight immediately after drying at a temperature of 125 ° C. for 16 hours.

【0040】(結果)結果は表1及び表2に示したよう
に、各実施例は比較例1と比較して、密着性が良好であ
り、各実施例は比較例2及び比較例3と比較して、成形
性が良好であることが確認された。すなわち、各実施例
は密着性及び成形性が共に良好であることが確認され
た。また、各実施例は各比較例と比較して、吸湿ハンダ
耐熱性及び吸湿率が同等か、やや優れることが確認され
た。
(Results) As shown in Tables 1 and 2, the adhesion of each Example is better than that of Comparative Example 1, and each Example is compared with Comparative Examples 2 and 3. By comparison, it was confirmed that the moldability was good. That is, it was confirmed that each Example had good adhesiveness and moldability. Further, it was confirmed that each of the examples has the same or slightly better moisture absorption solder heat resistance and moisture absorption rate as compared with each comparative example.

【0041】[0041]

【発明の効果】本発明の請求項1及び請求項2に係る封
止樹脂は、上記式(a)及び上記式(b)で表されるシ
ランカップリング剤を封止樹脂に配合しているため、封
止樹脂中に無機充填材を高い比率で含有させ、かつ、ジ
シクロペンタジエン型エポキシ樹脂を全エポキシ樹脂中
に高い比率で含有させた封止樹脂であっても、この封止
樹脂を用いて封止をすると、リードフレームと樹脂硬化
物との接着性、及び成形性が共に優れた封止品が得られ
る。
The encapsulating resin according to claims 1 and 2 of the present invention comprises the silane coupling agent represented by the above formula (a) and the above formula (b) in the encapsulating resin. Therefore, even if the sealing resin contains a high proportion of the inorganic filler in the sealing resin and the dicyclopentadiene type epoxy resin in a high proportion of the total epoxy resin, When used for sealing, a sealed product having excellent adhesiveness between the lead frame and the cured resin and moldability is obtained.

【0042】本発明の請求項3に係る半導体装置は、リ
ードフレームと樹脂硬化物との接着性、及び成形性が共
に優れた半導体装置となる。
The semiconductor device according to the third aspect of the present invention is a semiconductor device which is excellent in both the adhesiveness between the lead frame and the resin cured product and the moldability.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 H01L 23/31 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 6 Identification code Agency reference number FI Technical display location H01L 23/31

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 エポキシ樹脂、硬化剤、無機充填材及び
シランカップリング剤を配合してなる封止材用エポキシ
樹脂組成物であって、封止材用エポキシ樹脂組成物10
0重量部中に、無機充填材を70〜95重量部含有し、
かつ、全エポキシ樹脂100重量部中に、ジシクロペン
タジエン型エポキシ樹脂を40〜100重量部含有する
封止材用エポキシ樹脂組成物において、シランカップリ
ング剤として、下記式(a)で表されるシラン化合物及
び下記式(b)で表されるシラン化合物を配合している
ことを特徴とする封止材用エポキシ樹脂組成物。 【化1】 (式中R1 ,R3 ,R4 は水素又は炭素数1〜12の一
価の炭化水素基、R2は炭素数1〜12の二価の炭化水
素基、nは1〜3の整数を表す。) 【化2】 (式中R5 は炭素数1〜12の二価の炭化水素基、
6 ,R7 は水素又は炭素数1〜12の一価の炭化水素
基、mは1〜3の整数を表す。)
1. An epoxy resin composition for a sealing material, which comprises an epoxy resin, a curing agent, an inorganic filler and a silane coupling agent, the epoxy resin composition for a sealing material 10.
70 to 95 parts by weight of an inorganic filler is contained in 0 parts by weight,
In addition, in the epoxy resin composition for encapsulant containing 40 to 100 parts by weight of dicyclopentadiene type epoxy resin in 100 parts by weight of total epoxy resin, it is represented by the following formula (a) as a silane coupling agent. An epoxy resin composition for a sealing material, which comprises a silane compound and a silane compound represented by the following formula (b). Embedded image (In the formula, R 1 , R 3 and R 4 are hydrogen or a monovalent hydrocarbon group having 1 to 12 carbon atoms, R 2 is a divalent hydrocarbon group having 1 to 12 carbon atoms, and n is an integer of 1 to 3 Is represented.) (In the formula, R 5 is a divalent hydrocarbon group having 1 to 12 carbon atoms,
R 6 and R 7 represent hydrogen or a monovalent hydrocarbon group having 1 to 12 carbon atoms, and m represents an integer of 1 to 3. )
【請求項2】 無機充填材が、シリカを含有しているこ
とを特徴とする請求項1記載の封止材用エポキシ樹脂組
成物。
2. The epoxy resin composition for a sealing material according to claim 1, wherein the inorganic filler contains silica.
【請求項3】 請求項1又は請求項2記載の封止材用エ
ポキシ樹脂組成物を用いて、リードフレームに搭載され
た半導体素子を封止してなる半導体装置。
3. A semiconductor device obtained by encapsulating a semiconductor element mounted on a lead frame using the epoxy resin composition for encapsulant according to claim 1 or 2.
JP6694796A 1996-03-22 1996-03-22 Epoxy resin composition for sealing material and semiconductor device using the same Expired - Fee Related JP3267144B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6694796A JP3267144B2 (en) 1996-03-22 1996-03-22 Epoxy resin composition for sealing material and semiconductor device using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6694796A JP3267144B2 (en) 1996-03-22 1996-03-22 Epoxy resin composition for sealing material and semiconductor device using the same

Publications (2)

Publication Number Publication Date
JPH09255852A true JPH09255852A (en) 1997-09-30
JP3267144B2 JP3267144B2 (en) 2002-03-18

Family

ID=13330727

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6694796A Expired - Fee Related JP3267144B2 (en) 1996-03-22 1996-03-22 Epoxy resin composition for sealing material and semiconductor device using the same

Country Status (1)

Country Link
JP (1) JP3267144B2 (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002241585A (en) * 2001-02-19 2002-08-28 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device
JP2002249643A (en) * 2001-02-23 2002-09-06 Matsushita Electric Works Ltd Epoxy resin composition for sealing semiconductor
JP2004107584A (en) * 2002-09-20 2004-04-08 Hitachi Chem Co Ltd Epoxy resin molding material for encapsulation and electronic part device provided with element
JP2005225971A (en) * 2004-02-12 2005-08-25 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device
JP2005281597A (en) * 2004-03-30 2005-10-13 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device
JPWO2004074344A1 (en) * 2003-02-18 2006-06-01 住友ベークライト株式会社 Epoxy resin composition and semiconductor device
JP2009029926A (en) * 2007-07-26 2009-02-12 Panasonic Electric Works Co Ltd Resin composition for sealing photo-semiconductor, and photo-semiconductor device
US7544727B2 (en) 2000-09-25 2009-06-09 Hitachi Chemical Co., Ltd. Encapsulant of epoxy resin, curing agent, and secondary aminosilane coupling agent or phosphate

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7544727B2 (en) 2000-09-25 2009-06-09 Hitachi Chemical Co., Ltd. Encapsulant of epoxy resin, curing agent, and secondary aminosilane coupling agent or phosphate
JP2002241585A (en) * 2001-02-19 2002-08-28 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device
JP2002249643A (en) * 2001-02-23 2002-09-06 Matsushita Electric Works Ltd Epoxy resin composition for sealing semiconductor
JP4734731B2 (en) * 2001-02-23 2011-07-27 パナソニック電工株式会社 Method for producing epoxy resin composition for semiconductor encapsulation
JP2004107584A (en) * 2002-09-20 2004-04-08 Hitachi Chem Co Ltd Epoxy resin molding material for encapsulation and electronic part device provided with element
JPWO2004074344A1 (en) * 2003-02-18 2006-06-01 住友ベークライト株式会社 Epoxy resin composition and semiconductor device
KR100982123B1 (en) * 2003-02-18 2010-09-14 스미토모 베이클리트 컴퍼니 리미티드 Epoxy resin composition and semiconductor device
JP4692885B2 (en) * 2003-02-18 2011-06-01 住友ベークライト株式会社 Epoxy resin composition and semiconductor device
JP2005225971A (en) * 2004-02-12 2005-08-25 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device
JP4691886B2 (en) * 2004-02-12 2011-06-01 住友ベークライト株式会社 Epoxy resin composition and semiconductor device
JP2005281597A (en) * 2004-03-30 2005-10-13 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device
JP2009029926A (en) * 2007-07-26 2009-02-12 Panasonic Electric Works Co Ltd Resin composition for sealing photo-semiconductor, and photo-semiconductor device

Also Published As

Publication number Publication date
JP3267144B2 (en) 2002-03-18

Similar Documents

Publication Publication Date Title
JP4692885B2 (en) Epoxy resin composition and semiconductor device
JP3267144B2 (en) Epoxy resin composition for sealing material and semiconductor device using the same
JPH07268186A (en) Epoxy resin composition
JPH062799B2 (en) Epoxy resin composition for semiconductor encapsulation
JP3317115B2 (en) Epoxy resin composition for sealing material, method for producing the same, and inorganic filler
JP3003887B2 (en) Resin composition for semiconductor encapsulation
JP2991849B2 (en) Epoxy resin composition
JP2963260B2 (en) Epoxy resin composition
JP3235798B2 (en) Epoxy resin composition
JPH06107911A (en) Resin composition for semiconductor sealing use
JP3982344B2 (en) Epoxy resin composition for semiconductor encapsulation and semiconductor device
JP3235799B2 (en) Epoxy resin composition
JP3093051B2 (en) Epoxy resin composition
JP2843247B2 (en) Epoxy resin composition
JP3011807B2 (en) Epoxy resin composition
JP2000186183A (en) Epoxy resin composition for sealing and semiconductor device
JPH06184272A (en) Epoxy resin composition
JPH09208807A (en) Epoxy resin composition for sealing material and semiconductor device using the same
JP3305098B2 (en) Epoxy resin composition
JP2793449B2 (en) Epoxy resin composition
JP3093050B2 (en) Epoxy resin composition
JP2004059700A (en) Epoxy resin composition for encapsulation and semiconductor device
JP3568654B2 (en) Epoxy resin composition
JPH10147628A (en) Epoxy resin composition for sealing semiconductor
JP2004155841A (en) Sealing resin composition, and semiconductor sealing device

Legal Events

Date Code Title Description
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20011211

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080111

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090111

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090111

Year of fee payment: 7

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090111

Year of fee payment: 7

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100111

Year of fee payment: 8

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100111

Year of fee payment: 8

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110111

Year of fee payment: 9

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120111

Year of fee payment: 10

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120111

Year of fee payment: 10

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130111

Year of fee payment: 11

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130111

Year of fee payment: 11

LAPS Cancellation because of no payment of annual fees