JP4691886B2 - Epoxy resin composition and semiconductor device - Google Patents
Epoxy resin composition and semiconductor device Download PDFInfo
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- JP4691886B2 JP4691886B2 JP2004035782A JP2004035782A JP4691886B2 JP 4691886 B2 JP4691886 B2 JP 4691886B2 JP 2004035782 A JP2004035782 A JP 2004035782A JP 2004035782 A JP2004035782 A JP 2004035782A JP 4691886 B2 JP4691886 B2 JP 4691886B2
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- 229920000647 polyepoxide Polymers 0.000 title claims description 51
- 239000003822 epoxy resin Substances 0.000 title claims description 50
- 239000004065 semiconductor Substances 0.000 title claims description 34
- 239000000203 mixture Substances 0.000 title claims description 33
- 150000001875 compounds Chemical class 0.000 claims description 13
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 13
- 239000011256 inorganic filler Substances 0.000 claims description 13
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 13
- 239000005011 phenolic resin Substances 0.000 claims description 12
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 10
- 238000005538 encapsulation Methods 0.000 claims description 7
- 238000007789 sealing Methods 0.000 claims description 6
- 125000001424 substituent group Chemical group 0.000 claims description 4
- 125000001624 naphthyl group Chemical group 0.000 claims description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 2
- 239000007822 coupling agent Substances 0.000 description 15
- 229910000679 solder Inorganic materials 0.000 description 12
- 229920005989 resin Polymers 0.000 description 10
- 239000011347 resin Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 9
- 239000004593 Epoxy Substances 0.000 description 5
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- -1 dicyclopentadiene modified phenol Chemical class 0.000 description 5
- 238000000465 moulding Methods 0.000 description 5
- 125000002529 biphenylenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C12)* 0.000 description 4
- 238000013329 compounding Methods 0.000 description 4
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 4
- 229920003986 novolac Polymers 0.000 description 4
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 4
- USFPINLPPFWTJW-UHFFFAOYSA-N tetraphenylphosphonium Chemical compound C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 USFPINLPPFWTJW-UHFFFAOYSA-N 0.000 description 4
- 238000001721 transfer moulding Methods 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 3
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 3
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 3
- JRNGUTKWMSBIBF-UHFFFAOYSA-N naphthalene-2,3-diol Chemical compound C1=CC=C2C=C(O)C(O)=CC2=C1 JRNGUTKWMSBIBF-UHFFFAOYSA-N 0.000 description 3
- 230000002195 synergetic effect Effects 0.000 description 3
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 2
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000005350 fused silica glass Substances 0.000 description 2
- 229940074391 gallic acid Drugs 0.000 description 2
- 235000004515 gallic acid Nutrition 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229940079877 pyrogallol Drugs 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 2
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical compound S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 description 2
- 239000011800 void material Substances 0.000 description 2
- 239000001993 wax Substances 0.000 description 2
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- ZYAASQNKCWTPKI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propan-1-amine Chemical compound CO[Si](C)(OC)CCCN ZYAASQNKCWTPKI-UHFFFAOYSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- PJANXHGTPQOBST-VAWYXSNFSA-N Stilbene Natural products C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000001343 alkyl silanes Chemical class 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- GHXRKGHKMRZBJH-UHFFFAOYSA-N boric acid Chemical class OB(O)O.OB(O)O GHXRKGHKMRZBJH-UHFFFAOYSA-N 0.000 description 1
- 239000004203 carnauba wax Substances 0.000 description 1
- 235000013869 carnauba wax Nutrition 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- YQGOWXYZDLJBFL-UHFFFAOYSA-N dimethoxysilane Chemical compound CO[SiH2]OC YQGOWXYZDLJBFL-UHFFFAOYSA-N 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000033444 hydroxylation Effects 0.000 description 1
- 238000005805 hydroxylation reaction Methods 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- UJNZOIKQAUQOCN-UHFFFAOYSA-N methyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C)C1=CC=CC=C1 UJNZOIKQAUQOCN-UHFFFAOYSA-N 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- XCOASYLMDUQBHW-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)butan-1-amine Chemical compound CCCCNCCC[Si](OC)(OC)OC XCOASYLMDUQBHW-UHFFFAOYSA-N 0.000 description 1
- GKTNLYAAZKKMTQ-UHFFFAOYSA-N n-[bis(dimethylamino)phosphinimyl]-n-methylmethanamine Chemical compound CN(C)P(=N)(N(C)C)N(C)C GKTNLYAAZKKMTQ-UHFFFAOYSA-N 0.000 description 1
- FZZQNEVOYIYFPF-UHFFFAOYSA-N naphthalene-1,6-diol Chemical compound OC1=CC=CC2=CC(O)=CC=C21 FZZQNEVOYIYFPF-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- IYMSIPPWHNIMGE-UHFFFAOYSA-N silylurea Chemical class NC(=O)N[SiH3] IYMSIPPWHNIMGE-UHFFFAOYSA-N 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 235000021286 stilbenes Nutrition 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical class [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
- XAEWLETZEZXLHR-UHFFFAOYSA-N zinc;dioxido(dioxo)molybdenum Chemical compound [Zn+2].[O-][Mo]([O-])(=O)=O XAEWLETZEZXLHR-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
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- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Description
本発明は、半導体封止用エポキシ樹脂組成物、及びこれを用いた半導体装置に関するものである。 The present invention relates to an epoxy resin composition for semiconductor encapsulation and a semiconductor device using the same.
ＩＣ、ＬＳＩ等の半導体素子の封止方法として、エポキシ樹脂組成物のトランスファー成形が低コスト、大量生産に適しており、採用されて久しく、信頼性の点でもエポキシ樹脂や硬化剤であるフェノール樹脂の改良により特性の向上が図られてきた。しかし、近年の電子機器の小型化、軽量化、高性能化の市場動向において、半導体の高集積化も年々進み、また半導体装置の表面実装化が促進されるなかで、半導体封止用エポキシ樹脂組成物への要求は益々厳しいものとなってきている。このため、従来からのエポキシ樹脂組成物では解決出来ない問題点も出てきている。
その最大の問題点は、表面実装の採用により半導体装置が半田浸漬或いは半田リフロー工程で急激に２００℃以上の高温にさらされ、吸湿した水分が爆発的に気化する際の応力により、半導体装置内、特に半導体素子、リードフレーム、インナーリード上の金メッキや銀メッキ等の各種メッキされた各接合部分とエポキシ樹脂組成物の硬化物の界面で剥離が生じたりして、信頼性が著しく低下する現象である。
As a sealing method for semiconductor elements such as IC and LSI, transfer molding of an epoxy resin composition is suitable for mass production at low cost and has been adopted for a long time, and a phenol resin that is an epoxy resin or a curing agent in terms of reliability. Improvements have been made to improve the characteristics. However, due to the recent trend toward smaller, lighter, and higher performance electronic devices, semiconductors have been increasingly integrated and the surface mounting of semiconductor devices has been promoted. The demand for compositions has become increasingly severe. For this reason, the problem which cannot be solved with the conventional epoxy resin composition has also come out.
The biggest problem is that by adopting surface mounting, the semiconductor device is suddenly exposed to a high temperature of 200 ° C. or higher during the solder dipping or solder reflow process, and the moisture absorbed in the semiconductor device is stressed by the explosion. In particular, a phenomenon in which reliability is remarkably reduced due to peeling at the interface between various plated joints such as gold plating and silver plating on semiconductor elements, lead frames, and inner leads and the cured product of the epoxy resin composition. It is.
半田処理による信頼性低下を改善するために、エポキシ樹脂組成物中の無機質充填材の充填量を増加させることで低吸湿化、高強度化、低熱膨張化を達成し耐半田性を向上させ、低溶融粘度の樹脂を使用して、成形時に低粘度で高流動性を維持させる手法がある（例えば、特許文献１参照。）。この手法を用いることにより耐半田性がかなり改良されるが、無機充填材の充填割合の増加と共に、流動性が犠牲になり、エポキシ樹脂組成物がパッケージ内に十分に充填されず、空隙が生じやすくなる欠点があった。またメッキ部分とエポキシ樹脂組成物の界面での剥離を防止する為、アミノシランやメルカプトシラン等の各種カップリング剤を添加して流動性と耐半田性の両立を図る手法も提案されている（例えば、特許文献２参照。）が、この方法でも十分に良好な半導体封止用エポキシ樹脂組成物は得られるには至っていない。このようなことから、無機充填材の配合量を高めても流動性及び充填性を損なわず、信頼性を満足させる更なる技術が求められていた。 In order to improve reliability degradation due to solder processing, increase the amount of inorganic filler in the epoxy resin composition to achieve low moisture absorption, high strength, low thermal expansion, improve solder resistance, There is a technique in which a low melt viscosity resin is used to maintain a high fluidity with a low viscosity during molding (see, for example, Patent Document 1). Although solder resistance is considerably improved by using this method, as the filling rate of the inorganic filler increases, fluidity is sacrificed, and the epoxy resin composition is not sufficiently filled in the package, resulting in voids. There was a drawback that made it easier. In addition, in order to prevent peeling at the interface between the plated portion and the epoxy resin composition, a method for achieving both flowability and solder resistance by adding various coupling agents such as aminosilane and mercaptosilane has been proposed (for example, However, a sufficiently good epoxy resin composition for encapsulating a semiconductor has not been obtained even by this method. For this reason, there has been a demand for a further technique that satisfies the reliability without sacrificing fluidity and filling properties even when the blending amount of the inorganic filler is increased.
本発明は、流動性、充填性に優れた半導体封止用エポキシ樹脂組成物、及びこれを用いて得られる耐半田性、信頼性に優れた半導体装置を提供するものである。 The present invention provides an epoxy resin composition for semiconductor encapsulation excellent in fluidity and filling properties, and a semiconductor device excellent in solder resistance and reliability obtained by using the epoxy resin composition.
本発明は、
［１］（Ａ）エポキシ樹脂、（Ｂ）フェノール樹脂、（Ｃ）硬化促進剤、（Ｄ）無機充填材（ただし球状アルミナを除く）、（Ｅ）一般式（１）で表されるシランカップリング剤、及び（Ｆ）ナフタレン環に２個以上の隣接した水酸基を有し、かつ該水酸基以外の置換基を有しない化合物を必須成分とすることを特徴とする半導体封止用エポキシ樹脂組成物、
である。
The present invention
[1] (A) epoxy resin, (B) phenol resin, (C) curing accelerator, (D) inorganic filler (except for spherical alumina ), (E) silane cup represented by general formula (1) An epoxy resin composition for semiconductor encapsulation, comprising as an essential component a ring agent and (F) a compound having two or more adjacent hydroxyl groups in the naphthalene ring and having no substituent other than the hydroxyl group ,
It is.
本発明に従うと、無機充填材を高充填しても流動性、充填性に優れた半導体封止用エポキシ樹脂組成物が得られ、これを用いて半導体素子等を封止成形することにより耐半田性、信頼性に優れた半導体装置が得られる。 According to the present invention, an epoxy resin composition for semiconductor encapsulation that is excellent in fluidity and filling properties even when highly filled with an inorganic filler is obtained. By using this, a semiconductor element or the like is encapsulated and solder-resistant. A semiconductor device excellent in reliability and reliability can be obtained.
本発明は、エポキシ樹脂、フェノール樹脂、硬化促進剤、及び無機充填材を主成分とするエポキシ樹脂組成物において、二級アミンを有するシランカップリング剤、及び芳香環に２個以上の隣接した水酸基を有し、かつ該水酸基以外の置換基を有するか、または有しない化合物を必須成分として添加することにより、無機充填材を高充填しても流動性、充填性に優れた半導体封止用エポキシ樹脂組成物が得られ、これを用いて半導体素子等を封止成形することにより耐半田性、信頼性に優れた半導体装置が得られるものである。 The present invention relates to an epoxy resin composition mainly composed of an epoxy resin, a phenol resin, a curing accelerator, and an inorganic filler, a silane coupling agent having a secondary amine, and two or more adjacent hydroxyl groups in the aromatic ring. And an epoxy for semiconductor encapsulation having excellent fluidity and filling property even when highly filled with an inorganic filler, by adding a compound having or not having a substituent other than the hydroxyl group as an essential component A resin composition is obtained, and a semiconductor device having excellent solder resistance and reliability can be obtained by sealing and molding a semiconductor element or the like using the resin composition.
本発明に用いるエポキシ樹脂としては、１分子内にエポキシ基を２個以上有するモノマー、オリゴマー、ポリマー全般を言い、その分子量、分子構造は特に限定するものではないが、例えばビフェニル型エポキシ樹脂、ビスフェノール型エポキシ樹脂、スチルベン型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、トリフェノールメタン型エポキシ樹脂、アルキル変性トリフェノールメタン型エポキシ樹脂、トリアジン核含有エポキシ樹脂、ジシクロペンタジエン変性フェノール型エポキシ樹脂、フェノールアラルキル型エポキシ樹脂（フェニレン骨格、ビフェニレン骨格等を有する）等が挙げられ、これらは単独でも混合して用いても差し支えない。 The epoxy resin used in the present invention refers to monomers, oligomers, and polymers in general having two or more epoxy groups in one molecule, and the molecular weight and molecular structure are not particularly limited. For example, biphenyl type epoxy resin, bisphenol Type epoxy resin, stilbene type epoxy resin, phenol novolak type epoxy resin, cresol novolak type epoxy resin, triphenolmethane type epoxy resin, alkyl-modified triphenolmethane type epoxy resin, triazine nucleus-containing epoxy resin, dicyclopentadiene modified phenol type epoxy Examples thereof include resins and phenol aralkyl type epoxy resins (having a phenylene skeleton, a biphenylene skeleton, etc.), and these may be used alone or in combination.
本発明に用いるフェノール樹脂としては、１分子内にフェノール性水酸基を２個以上有するモノマー、オリゴマー、ポリマー全般を言い、その分子量、分子構造を特に限定するものではないが、例えばフェノールノボラック樹脂、クレゾールノボラック樹脂、ジシクロペンタジエン変性フェノール樹脂、テルペン変性フェノール樹脂、トリフェノールメタン型樹脂、フェノールアラルキル樹脂（フェニレン骨格、ビフェニレン骨格等を有する）等が挙げられ、これらは単独でも混合して用いても差し支えない。 The phenol resin used in the present invention includes monomers, oligomers, and polymers in general having two or more phenolic hydroxyl groups in one molecule, and its molecular weight and molecular structure are not particularly limited. For example, phenol novolak resin, cresol Examples thereof include novolak resins, dicyclopentadiene-modified phenol resins, terpene-modified phenol resins, triphenolmethane type resins, phenol aralkyl resins (having a phenylene skeleton, a biphenylene skeleton, etc.), and these may be used alone or in combination. Absent.
エポキシ樹脂とフェノール樹脂の配合量としては、全エポキシ樹脂のエポキシ基数と全フェノール樹脂のフェノール性水酸基数の比が０．８〜１．３であることが好ましく、この範囲を外れると、エポキシ樹脂組成物の硬化性の低下、或いは硬化物のガラス転移温度の低下、耐湿信頼性の低下等が生じる可能性がある。 As a compounding quantity of an epoxy resin and a phenol resin, it is preferable that the ratio of the number of epoxy groups of all epoxy resins and the number of phenolic hydroxyl groups of all phenol resins is 0.8 to 1.3. There is a possibility that the curability of the composition is lowered, the glass transition temperature of the cured product is lowered, and the moisture resistance reliability is lowered.
本発明で用いられる硬化促進剤としては、エポキシ基とフェノール性水酸基の反応を促進するものであれば特に限定しないが、例えば、１，８−ジアザビシクロ（５，４，０）ウンデセン−７等のジアザビシクロアルケン及びその誘導体、トリブチルアミン、ベンジルジメチルアミン等のアミン系化合物、２−メチルイミダゾール等のイミダゾール化合物、トリフェニルホスフィン、メチルジフェニルホスフィン等の有機ホスフィン類、テトラフェニルホスホニウム・テトラフェニルボレート、テトラフェニルホスホニウム・テトラ安息香酸ボレート、テトラフェニルホスホニウム・テトラナフトイックアシッドボレート、テトラフェニルホスホニウム・テトラナフトイルオキシボレート、テトラフェニルホスホニウム・テトラナフチルオキシボレート等のテトラ置換ホスホニウム・テトラ置換ボレート等が挙げられ、これらは１種類を単独で用いても２種類以上を併用してもよい。 The curing accelerator used in the present invention is not particularly limited as long as it accelerates the reaction between an epoxy group and a phenolic hydroxyl group. For example, 1,8-diazabicyclo (5,4,0) undecene-7 is used. Diazabicycloalkene and its derivatives, amine compounds such as tributylamine and benzyldimethylamine, imidazole compounds such as 2-methylimidazole, organic phosphines such as triphenylphosphine and methyldiphenylphosphine, tetraphenylphosphonium tetraphenylborate, Tetraphenylphosphonium ・ tetrabenzoic acid borate, tetraphenylphosphonium ・ tetranaphthoic acid borate, tetraphenylphosphonium ・ tetranaphthoyloxyborate, tetraphenylphosphonium ・ tetranaphthyloxy Tetra-substituted phosphonium tetra-substituted borate borate, and the like. These may be used in combination of two or more be used one kind alone.
本発明に用いる無機充填材としては、一般に半導体封止用エポキシ樹脂組成物に使用されているものを用いることができる。例えば、溶融シリカ、結晶シリカ、タルク、窒化珪素等が挙げられ、最も好適に使用されるものとしては、球状の溶融シリカである。これらの無機充填剤は、単独でも混合して用いても差し支えない。無機充填材の配合量は、特に限定されないが、全エポキシ樹脂組成物中８０〜９４重量％が好ましい。下限値を下回ると十分な耐半田性が得られない可能性があり、上限値を超えると十分な流動性が得られない可能性がある。 As an inorganic filler used for this invention, what is generally used for the epoxy resin composition for semiconductor sealing can be used. For example, fused silica, crystalline silica, talc, silicon nitride and the like can be mentioned, and the most preferably used is spherical fused silica. These inorganic fillers may be used alone or in combination. Although the compounding quantity of an inorganic filler is not specifically limited, 80 to 94 weight% is preferable in all the epoxy resin compositions. If the lower limit is not reached, sufficient solder resistance may not be obtained, and if the upper limit is exceeded, sufficient fluidity may not be obtained.
本発明においては、一般式（１）で表されるシランカップリング剤と、芳香環に２個以上の隣接した水酸基を有し、かつ該水酸基以外の置換基を有するか、または有しない化合物（Ｆ）（以下化合物（Ｆ）と称する）とを、併用することが必須である。一般式（１）で表されるシランカップリング剤及び化合物（Ｆ）は、共に単独でも流動性と充填性を向上させる効果があるものの、両者を併用するとその相乗効果により、顕著に流動性と充填性が向上する効果が得られる。一般式（１）で表されるシランカップリング剤と、化合物（Ｆ）のどちらか一方だけ配合していても、流動性及び充填性が十分でない。 In the present invention, a silane coupling agent represented by the general formula (1) and a compound having two or more adjacent hydroxyl groups on the aromatic ring and having or not having a substituent other than the hydroxyl group ( F) (hereinafter referred to as compound (F)) must be used in combination. Although both the silane coupling agent represented by the general formula (1) and the compound (F) have the effect of improving the fluidity and the filling property even when used alone, the synergistic effect when both are used together significantly increases the fluidity. The effect of improving the filling property is obtained. Even if only one of the silane coupling agent represented by the general formula (1) and the compound (F) is blended, the fluidity and filling properties are not sufficient.
本発明において用いられる一般式（１）で表されるシランカップリング剤としては、例えば、Ｎ−フェニルγアミノプロピルトリメトキシシラン、Ｎ−フェニルγアミノプロピルトリエトキシシラン、Ｎ−フェニルγアミノプロピルメチルジメトキシシラン、Ｎ−ブチルγアミノプロピルトリメトキシシラン、Ｎ−β（アミノエチル）γアミノプロピルトリメトキシシラン、Ｎ−β（アミノエチル）γアミノプロピルメチルジメトキシシラン等が挙げられ、最も好適に使用されるものとしては、Ｎ−フェニルγアミノプロピルトリメトキシシラン等である。一般式（１）で表されるシランカップリング剤は１種類を単独で使用しても２種類以上を併用してもよい。また配合量は、特に限定されないが、全エポキシ樹脂組成物中０．０１〜１重量％が望ましく、より好ましくは０.０５〜０．８重量％である。上記の下限値を下回ると化合物（Ｆ）との相乗効果による期待するような粘度特性および流動特性が得られない可能性があり、上限値を超えると硬化性が低下する可能性がある。 Examples of the silane coupling agent represented by the general formula (1) used in the present invention include N-phenyl γ aminopropyl trimethoxy silane, N-phenyl γ aminopropyl triethoxy silane, and N-phenyl γ aminopropyl methyl. Dimethoxysilane, N-butylγaminopropyltrimethoxysilane, N-β (aminoethyl) γaminopropyltrimethoxysilane, N-β (aminoethyl) γaminopropylmethyldimethoxysilane, and the like can be mentioned, and these are most preferably used. Examples thereof include N-phenyl γ aminopropyltrimethoxysilane and the like. The silane coupling agent represented by the general formula (1) may be used alone or in combination of two or more. Moreover, although a compounding quantity is not specifically limited, 0.01 to 1 weight% is desirable in all the epoxy resin compositions, More preferably, it is 0.05 to 0.8 weight%. If the lower limit value is not reached, viscosity properties and flow properties as expected due to the synergistic effect with the compound (F) may not be obtained, and if the upper limit value is exceeded, curability may be reduced.
本発明において用いられる化合物（Ｆ）としては、例えば、カテコール、ピロガロール、没食子酸、没食子酸エステル、１，２−ジヒドロキシナフタレン、２，３−ジヒドロキシナフタレンおよびこれらの誘導体が挙げられる。これらのうち母核がナフタレン環である化合物（１，２−ジヒドロキシナフタレン、２，３−ジヒドロキシナフタレンおよびその誘導体）が好ましい。これらの化合物（Ｆ）は１種類を単独で使用しても２種以上併用してもよい。化合物（Ｆ）の配合量は全エポキシ樹脂組成物中０．０１〜１重量％が望ましく、より好ましくは０．０５〜０．８重量％である。下限値未満だと一般式（１）で表されるシランカップリング剤との相乗効果による期待するような粘度特性および流動特性が得られない可能性があり、上限値を越えるとエポキシ樹脂組成物の硬化が阻害され、また硬化物の物性が劣り、半導体封止樹脂としての性能が悪化する可能性があるので好ましくない。 Examples of the compound (F) used in the present invention include catechol, pyrogallol, gallic acid, gallic acid ester, 1,2-dihydroxynaphthalene, 2,3-dihydroxynaphthalene and derivatives thereof. Of these, compounds in which the mother nucleus is a naphthalene ring (1,2-dihydroxynaphthalene, 2,3-dihydroxynaphthalene and derivatives thereof) are preferable. These compounds (F) may be used alone or in combination of two or more. The compounding amount of the compound (F) is preferably 0.01 to 1% by weight, more preferably 0.05 to 0.8% by weight, based on the total epoxy resin composition. If it is less than the lower limit, there is a possibility that viscosity characteristics and flow characteristics as expected due to a synergistic effect with the silane coupling agent represented by the general formula (1) may not be obtained, and if the upper limit is exceeded, an epoxy resin composition This is not preferable because the curing of the resin is inhibited, the physical properties of the cured product are inferior, and the performance as a semiconductor sealing resin may be deteriorated.
本発明のエポキシ樹脂組成物は、エポキシ樹脂、フェノール樹脂、硬化促進剤、無機充填材、一般式（１）で表されるシランカップリング剤、及び化合物（Ｆ）を必須成分とし、更にこれ以外に必要に応じて、一般式（１）で表される以外のアミノシラン、エポキシシラン、メルカプトシラン、アルキルシラン、ウレイドシラン、ビニルシラン等のシランカップリング剤や、チタネートカップリング剤、アルミニウムカップリング剤、アルミニウム／ジルコニウムカップリング剤等のカップリング剤、カーボンブラック等の着色剤、天然ワックス、合成ワックス等の離型剤及び、ゴム等の低応力添加剤、臭素化エポキシ樹脂や三酸化アンチモン、水酸化アルミニウム、水酸化マグネシウム、ほう酸亜鉛、モリブデン酸亜鉛、フォスファゼン等の難燃剤等の添加剤を適宜配合しても差し支えない。 The epoxy resin composition of the present invention comprises, as essential components, an epoxy resin, a phenol resin, a curing accelerator, an inorganic filler, a silane coupling agent represented by the general formula (1), and the compound (F). As needed, silane coupling agents such as aminosilanes, epoxy silanes, mercaptosilanes, alkyl silanes, ureido silanes, vinyl silanes other than those represented by the general formula (1), titanate coupling agents, aluminum coupling agents, Coupling agents such as aluminum / zirconium coupling agents, colorants such as carbon black, mold release agents such as natural wax and synthetic wax, low-stress additives such as rubber, brominated epoxy resins, antimony trioxide, and hydroxylation Aluminum, magnesium hydroxide, zinc borate, zinc molybdate, phosphazene, etc. No problem be properly compounded additives such as flame retardants.
また、本発明のエポキシ樹脂組成物は、ミキサー等を用いて原料を充分に均一に混合した後、更に熱ロール又はニーダー等で溶融混練し、冷却後粉砕して得られる。
本発明のエポキシ樹脂組成物を用いて、半導体素子等の各種の電子部品を封止し、半導体装置を製造するには、トランスファーモールド、コンプレッションモールド、インジェクションモールド等の従来からの成形方法で硬化成形すればよい。
The epoxy resin composition of the present invention can be obtained by mixing the raw materials sufficiently uniformly using a mixer or the like, then melt-kneading with a hot roll or a kneader, cooling and pulverizing.
The epoxy resin composition of the present invention is used to encapsulate various electronic components such as semiconductor elements, and to manufacture semiconductor devices by conventional molding methods such as transfer molding, compression molding, and injection molding. do it.
以下に本発明の実施例を示すが、本発明はこれらに限定されるものではない。配合割合は重量部とする。
なお、実施例、及び比較例で用いたカップリング剤について、以下に示す。
カップリング剤１：式（２）で示されるカップリング剤（信越化学（株）製、ＫＢＭ−５７３）
In addition, it shows below about the coupling agent used by the Example and the comparative example.
Coupling agent 1: coupling agent represented by formula (2) (manufactured by Shin-Etsu Chemical Co., Ltd., KBM-573)
カップリング剤２：式（３）で示されるカップリング剤（信越化学（株）製、Ｘ１２−８０６）
カップリング剤３：式（４）で示されるカップリング剤（信越化学（株）製、ＫＢＭ−４０３）
カップリング剤４：式（５）で示されるカップリング剤（信越化学（株）製、ＫＢＥ−９０３）
実施例１
エポキシ樹脂１：ビフェニル型エポキシ樹脂（ジャパンエポキシレジン（株）製、ＹＸ−４０００、エポキシ当量１９０ｇ／ｅｑ、融点１０５℃、以下、Ｅ−１という）
４５重量部
Example 1
Epoxy resin 1: biphenyl type epoxy resin (manufactured by Japan Epoxy Resin Co., Ltd., YX-4000, epoxy equivalent 190 g / eq, melting point 105 ° C., hereinafter referred to as E-1)
45 parts by weight
フェノール樹脂１：フェノールアラルキル樹脂（三井化学（株）製、ＸＬＣ−ＬＬ、水酸基当量１６５ｇ／ｅｑ、軟化点７９℃、以下Ｈ−１という） ３９重量部 Phenol resin 1: Phenol aralkyl resin (manufactured by Mitsui Chemicals, Inc., XLC-LL, hydroxyl group equivalent 165 g / eq, softening point 79 ° C., hereinafter referred to as H-1) 39 parts by weight
トリフェニルホスフィン ２重量部
溶融球状シリカ（平均粒径２１μｍ） ９００重量部
カップリング剤１ ３重量部
２，３−ジヒドロキシナフタレン ３重量部
カーボンブラック ３重量部
カルナバワックス ５重量部
をミキサーにて混合し、熱ロールを用いて、９５℃で８分間混練して冷却後粉砕し、エポキシ樹脂組成物を得た。得られたエポキシ樹脂組成物を、以下の方法で評価した。結果を表１に示す。
Triphenylphosphine 2 parts by weight Fused spherical silica (average particle size 21 μm) 900 parts by weight Coupling agent 1 3 parts by weight 2,3-dihydroxynaphthalene 3 parts by weight Carbon black 3 parts by weight Carnauba wax 5 parts by weight The mixture was kneaded at 95 ° C. for 8 minutes using a hot roll, cooled and pulverized to obtain an epoxy resin composition. The obtained epoxy resin composition was evaluated by the following methods. The results are shown in Table 1.
評価方法
スパイラルフロー：ＥＭＭＩ−１−６６に準じたスパイラルフロー測定用金型を用いて、金型温度１７５℃、圧力６．９ＭＰa、硬化時間１２０秒で測定した。単位はｃｍ。
充填性（ボイド）：低圧トランスファー成形機を用いて成形温度１７５℃、圧力９．３ＭＰa、硬化時間１２０秒で１６０ｐＱＦＰを成形したものを、超音波探傷装置で観察し内部のボイドの評価を行った。○はボイドなし。△は一部にボイドあり。×は全面にボイドあり。
硬化性:キュラストメーター（オリエンテック（株）製、ＪＳＲキュラストメーターIV
ＰＳ型）を用い、１７５℃、４５秒後のトルクを測定した。この値の大きい方が硬化性は良好である。単位はＮ・ｍ。
耐半田クラック：低圧トランスファー成形機を用いて、成形温度１７５℃、圧力８．３ＭＰａ、硬化時間１２０秒で、８０ｐＱＦＰ（Ｃｕフレーム、チップサイズ６．０ｍｍ×６．０ｍｍ）を成形し、アフターベークとして１７５℃、８時間加熱処理した後、８５℃、相対湿度８５％で１２０時間の加湿処理を行った後、２６０℃のＩＲリフロー処理をした。パッケージ内部の剥離とクラックを超音波探傷機で確認した。１０個のパッケージ中の不良パッケージ数を示す。
Evaluation method Spiral flow: Using a spiral flow measurement mold according to EMMI-1-66, measurement was performed at a mold temperature of 175 ° C., a pressure of 6.9 MPa, and a curing time of 120 seconds. The unit is cm.
Fillability (Void): 160pQFP molded with a low-pressure transfer molding machine at a molding temperature of 175 ° C, a pressure of 9.3 MPa, and a curing time of 120 seconds was observed with an ultrasonic flaw detector and the internal voids were evaluated. . ○ is no void. △ has some voids. X indicates voids on the entire surface.
Curability: Curast meter (Orientec Co., Ltd., JSR Curast Meter IV
PS type), and the torque after 45 seconds at 175 ° C. was measured. The larger this value, the better the curability. The unit is N · m.
Solder crack resistance: Using a low-pressure transfer molding machine, 80pQFP (Cu frame, chip size 6.0 mm × 6.0 mm) was molded at a molding temperature of 175 ° C., a pressure of 8.3 MPa, and a curing time of 120 seconds. After heat treatment at 175 ° C. for 8 hours, a humidification treatment was performed at 85 ° C. and a relative humidity of 85% for 120 hours, followed by an IR reflow treatment at 260 ° C. Peeling and cracks inside the package were confirmed with an ultrasonic flaw detector. The number of defective packages among the 10 packages is shown.
実施例２〜５、７〜１０、参考例６、比較例１〜７
表１、表２の配合に従い、実施例１と同様にしてエポキシ樹脂組成物を得て、実施例１と同様にして評価した。結果を表１、表２に示す。
実施例１以外で用いた原材料を以下に示す。
エポキシ樹脂２：ビフェニレン骨格を有するフェノールアラルキル型エポキシ樹脂（日本化薬（株）製、ＮＣ３０００Ｐ、軟化点５８℃、エポキシ当量２７３、以下、Ｅ−２という。）
Example 2 ～5,7 10, Reference Example 6, Comparative Examples 1 to 7
According to the composition of Table 1 and Table 2, an epoxy resin composition was obtained in the same manner as in Example 1 and evaluated in the same manner as in Example 1. The results are shown in Tables 1 and 2.
The raw materials used other than Example 1 are shown below.
Epoxy resin 2: phenol aralkyl type epoxy resin having a biphenylene skeleton (manufactured by Nippon Kayaku Co., Ltd., NC3000P, softening point 58 ° C., epoxy equivalent 273, hereinafter referred to as E-2)
フェノール樹脂２：ビフェニレン骨格を有するフェノールアラルキル樹脂（明和化成（株）製、ＭＥＨ−７８５１ＳＳ、軟化点１０７℃、水酸基当量２０４、以下、Ｈ−２という。） Phenol resin 2: Phenol aralkyl resin having a biphenylene skeleton (Maywa Kasei Co., Ltd., MEH-7851SS, softening point 107 ° C., hydroxyl equivalent 204, hereinafter referred to as H-2)
１，２−ジヒドロキシナフタレン
ピロガロール
１，６−ジヒドロキシナフタレン
1,2-dihydroxynaphthalene pyrogallol 1,6-dihydroxynaphthalene
本発明に従うと、無機充填材を高充填しても流動性、充填性に優れた半導体封止用エポキシ樹脂組成物が得られ、これを用いて半導体素子等を封止成形することにより耐半田性、信頼性に優れた半導体装置が得られるので、特に表面実装型の半導体装置の製造用として好適に用いることができる。 According to the present invention, an epoxy resin composition for semiconductor encapsulation that is excellent in fluidity and filling properties even when highly filled with an inorganic filler is obtained. By using this, a semiconductor element or the like is encapsulated and solder-resistant. Since a semiconductor device excellent in reliability and reliability can be obtained, it can be suitably used particularly for manufacturing a surface mount type semiconductor device.
Claims (2)
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| JP2004035782A JP4691886B2 (en) | 2004-02-12 | 2004-02-12 | Epoxy resin composition and semiconductor device |
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| US7431990B2 (en) * | 2004-05-27 | 2008-10-07 | Sumitomo Bakelite Co | Resin composition for encapsulating semiconductor chip and semiconductor device therewith |
| JP4956982B2 (en) * | 2005-12-13 | 2012-06-20 | 住友ベークライト株式会社 | Epoxy resin composition for semiconductor encapsulation and semiconductor device |
| JP4946030B2 (en) * | 2005-12-16 | 2012-06-06 | 住友ベークライト株式会社 | Epoxy resin composition and semiconductor device |
| KR100678683B1 (en) | 2005-12-30 | 2007-02-02 | 제일모직주식회사 | Epoxy resin composition for encapsulating semiconductor device |
| MY148755A (en) | 2007-03-23 | 2013-05-31 | Sumitomo Bakelite Co | Semiconductor-encapsulating resin composition and semiconductor device |
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