JPH087625Y2 - 減圧ｃｖｄ装置 - Google Patents
減圧ｃｖｄ装置Info
- Publication number
- JPH087625Y2 JPH087625Y2 JP3208386U JP3208386U JPH087625Y2 JP H087625 Y2 JPH087625 Y2 JP H087625Y2 JP 3208386 U JP3208386 U JP 3208386U JP 3208386 U JP3208386 U JP 3208386U JP H087625 Y2 JPH087625 Y2 JP H087625Y2
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- reaction chamber
- exhaust
- inner tube
- connection flange
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004518 low pressure chemical vapour deposition Methods 0.000 title description 6
- 239000007789 gas Substances 0.000 claims description 19
- 239000012495 reaction gas Substances 0.000 claims description 10
- 239000007795 chemical reaction product Substances 0.000 description 15
- 235000012431 wafers Nutrition 0.000 description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 239000010453 quartz Substances 0.000 description 8
- 229910052710 silicon Inorganic materials 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 230000007547 defect Effects 0.000 description 4
- 239000013078 crystal Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 230000006837 decompression Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3208386U JPH087625Y2 (ja) | 1986-03-05 | 1986-03-05 | 減圧ｃｖｄ装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3208386U JPH087625Y2 (ja) | 1986-03-05 | 1986-03-05 | 減圧ｃｖｄ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62145325U JPS62145325U (enExample) | 1987-09-12 |
| JPH087625Y2 true JPH087625Y2 (ja) | 1996-03-04 |
Family
ID=30838413
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3208386U Expired - Lifetime JPH087625Y2 (ja) | 1986-03-05 | 1986-03-05 | 減圧ｃｖｄ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH087625Y2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20240106229A (ko) * | 2022-12-29 | 2024-07-08 | 고려대학교 산학협력단 | 모듈 교체형 챔버 |
-
1986
- 1986-03-05 JP JP3208386U patent/JPH087625Y2/ja not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20240106229A (ko) * | 2022-12-29 | 2024-07-08 | 고려대학교 산학협력단 | 모듈 교체형 챔버 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62145325U (enExample) | 1987-09-12 |
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