JPH08505435A - プラズマ補助反応性電子ビーム蒸発法 - Google Patents
プラズマ補助反応性電子ビーム蒸発法Info
- Publication number
- JPH08505435A JPH08505435A JP6510521A JP51052194A JPH08505435A JP H08505435 A JPH08505435 A JP H08505435A JP 6510521 A JP6510521 A JP 6510521A JP 51052194 A JP51052194 A JP 51052194A JP H08505435 A JPH08505435 A JP H08505435A
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- measured
- film
- reactive gas
- evaporation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 37
- 238000005566 electron beam evaporation Methods 0.000 title claims abstract description 9
- 238000001704 evaporation Methods 0.000 claims abstract description 28
- 230000008020 evaporation Effects 0.000 claims abstract description 27
- 230000004888 barrier function Effects 0.000 claims abstract description 17
- 230000003287 optical effect Effects 0.000 claims abstract description 16
- 239000000758 substrate Substances 0.000 claims abstract description 14
- 239000000463 material Substances 0.000 claims abstract description 13
- 238000000576 coating method Methods 0.000 claims abstract description 12
- 238000010521 absorption reaction Methods 0.000 claims abstract description 10
- 238000011065 in-situ storage Methods 0.000 claims abstract description 8
- 230000005540 biological transmission Effects 0.000 claims abstract description 6
- 238000005299 abrasion Methods 0.000 claims abstract description 4
- 230000008569 process Effects 0.000 claims description 17
- 239000011248 coating agent Substances 0.000 claims description 8
- 239000010408 film Substances 0.000 abstract description 40
- 238000000151 deposition Methods 0.000 abstract description 8
- 238000005259 measurement Methods 0.000 abstract description 6
- 230000009471 action Effects 0.000 abstract description 5
- 239000011521 glass Substances 0.000 abstract description 3
- 229910044991 metal oxide Inorganic materials 0.000 abstract description 2
- 150000004706 metal oxides Chemical class 0.000 abstract description 2
- 239000012788 optical film Substances 0.000 abstract description 2
- 238000004806 packaging method and process Methods 0.000 abstract description 2
- 239000004033 plastic Substances 0.000 abstract description 2
- 229920003023 plastic Polymers 0.000 abstract description 2
- 238000009776 industrial production Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 13
- 239000012528 membrane Substances 0.000 description 10
- 230000008021 deposition Effects 0.000 description 5
- 238000010894 electron beam technology Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000005284 excitation Effects 0.000 description 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 4
- 239000000203 mixture Substances 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000010494 dissociation reaction Methods 0.000 description 2
- 230000005593 dissociations Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- 238000004886 process control Methods 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 241000380131 Ammophila arenaria Species 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000004993 emission spectroscopy Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 230000013632 homeostatic process Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000012625 in-situ measurement Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000032424 nitric oxide homeostasis Effects 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000000411 transmission spectrum Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4236264A DE4236264C1 (enExample) | 1992-10-27 | 1992-10-27 | |
| DE4236264.4 | 1992-10-27 | ||
| PCT/DE1993/000748 WO1994010356A1 (de) | 1992-10-27 | 1993-08-18 | Verfahren zum plasmagestützten reaktiven elektronenstrahlbedampfen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH08505435A true JPH08505435A (ja) | 1996-06-11 |
Family
ID=6471479
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6510521A Pending JPH08505435A (ja) | 1992-10-27 | 1993-08-18 | プラズマ補助反応性電子ビーム蒸発法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US5614248A (enExample) |
| EP (1) | EP0666934B1 (enExample) |
| JP (1) | JPH08505435A (enExample) |
| DE (2) | DE4236264C1 (enExample) |
| WO (1) | WO1994010356A1 (enExample) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4343040C1 (de) * | 1993-12-16 | 1995-01-26 | Fraunhofer Ges Forschung | Barrierefolie |
| ES2166873T3 (es) * | 1996-01-10 | 2002-05-01 | Alcan Tech & Man Ag | Procedimiento y dispositivo para revestir la superficie de un substrato. |
| US6140773A (en) * | 1996-09-10 | 2000-10-31 | The Regents Of The University Of California | Automated control of linear constricted plasma source array |
| CA2241678C (en) * | 1997-06-26 | 2007-08-28 | General Electric Company | Silicon dioxide deposition by plasma activated evaporation process |
| JPH1129863A (ja) * | 1997-07-10 | 1999-02-02 | Canon Inc | 堆積膜製造方法 |
| US6261694B1 (en) | 1999-03-17 | 2001-07-17 | General Electric Company | Infrared reflecting coatings |
| US6426125B1 (en) | 1999-03-17 | 2002-07-30 | General Electric Company | Multilayer article and method of making by ARC plasma deposition |
| US6365016B1 (en) | 1999-03-17 | 2002-04-02 | General Electric Company | Method and apparatus for arc plasma deposition with evaporation of reagents |
| US6517687B1 (en) | 1999-03-17 | 2003-02-11 | General Electric Company | Ultraviolet filters with enhanced weatherability and method of making |
| US6420032B1 (en) | 1999-03-17 | 2002-07-16 | General Electric Company | Adhesion layer for metal oxide UV filters |
| US6875318B1 (en) | 2000-04-11 | 2005-04-05 | Metalbond Technologies, Llc | Method for leveling and coating a substrate and an article formed thereby |
| DE10019258C1 (de) * | 2000-04-13 | 2001-11-22 | Fraunhofer Ges Forschung | Verfahren zur Vakuumbeschichtung bandförmiger transparenter Substrate |
| US6444945B1 (en) | 2001-03-28 | 2002-09-03 | Cp Films, Inc. | Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source |
| WO2003100846A2 (de) * | 2002-05-23 | 2003-12-04 | Schott Ag | Glasmaterial für hochfrequenzanwendungen |
| US7411352B2 (en) * | 2002-09-19 | 2008-08-12 | Applied Process Technologies, Inc. | Dual plasma beam sources and method |
| AU2003299015A1 (en) * | 2002-09-19 | 2004-04-08 | Applied Process Technologies, Inc. | Beam plasma source |
| DE10347521A1 (de) | 2002-12-04 | 2004-06-24 | Leybold Optics Gmbh | Verfahren zur Herstellung Multilayerschicht und Vorrichtung zur Durchführung des Verfahrens |
| US7038389B2 (en) * | 2003-05-02 | 2006-05-02 | Applied Process Technologies, Inc. | Magnetron plasma source |
| EA020763B9 (ru) | 2008-08-04 | 2015-05-29 | Эй-Джи-Си Флет Гласс Норт Эмерике, Инк. | Источник плазмы и способы нанесения тонкопленочных покрытий с использованием плазменно-химического осаждения из газовой фазы |
| DE102009034532A1 (de) * | 2009-07-23 | 2011-02-03 | Msg Lithoglas Ag | Verfahren zum Herstellen einer strukturierten Beschichtung auf einem Substrat, beschichtetes Substrat sowie Halbzeug mit einem beschichteten Substrat |
| DE102013110722A1 (de) * | 2013-09-27 | 2015-04-02 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Plasma-ionengestütztes Beschichtungsverfahren und Plasmasonde |
| BR112017011612A2 (pt) | 2014-12-05 | 2018-01-16 | Agc Glass Europe, S.A | fonte de plasma de cátodo oco |
| EP3228161B1 (en) | 2014-12-05 | 2021-11-03 | AGC Flat Glass North America, Inc. | Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces |
| US9721764B2 (en) | 2015-11-16 | 2017-08-01 | Agc Flat Glass North America, Inc. | Method of producing plasma by multiple-phase alternating or pulsed electrical current |
| US9721765B2 (en) | 2015-11-16 | 2017-08-01 | Agc Flat Glass North America, Inc. | Plasma device driven by multiple-phase alternating or pulsed electrical current |
| US10242846B2 (en) | 2015-12-18 | 2019-03-26 | Agc Flat Glass North America, Inc. | Hollow cathode ion source |
| US10573499B2 (en) | 2015-12-18 | 2020-02-25 | Agc Flat Glass North America, Inc. | Method of extracting and accelerating ions |
| BE1029160B1 (nl) * | 2021-03-04 | 2022-10-03 | Soleras Advanced Coatings Bv | Depositie van niet-stoichiometrische metaalverbindingen |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3549416A (en) * | 1965-06-01 | 1970-12-22 | Gulf Energy & Environ Systems | Process for forming superconductive materials |
| US4024291A (en) * | 1975-06-17 | 1977-05-17 | Leybold-Heraeus Gmbh & Co. Kg | Control of vapor deposition |
| CH634424A5 (fr) * | 1978-08-18 | 1983-01-31 | Nat Res Dev | Procede et appareil de detection et de commande de depot d'une pellicule fine. |
| US4526802A (en) * | 1983-03-31 | 1985-07-02 | Clarion Co., Ltd. | Film deposition equipment |
| DE3406645A1 (de) * | 1984-02-24 | 1985-08-29 | Leybold-Heraeus GmbH, 5000 Köln | Spektralfotometeranordnung |
| US4514437A (en) * | 1984-05-02 | 1985-04-30 | Energy Conversion Devices, Inc. | Apparatus for plasma assisted evaporation of thin films and corresponding method of deposition |
| US4676646A (en) * | 1985-10-15 | 1987-06-30 | Energy Conversion Devices, Inc. | Method and apparatus for controlling thickness of a layer of an optical data storage device by measuring an optical property of the layer |
| DE3634598C2 (de) * | 1986-10-10 | 1994-06-16 | Leybold Ag | Verfahren und Vorrichtung zum reaktiven Aufdampfen von Metallverbindungen |
| US4837044A (en) * | 1987-01-23 | 1989-06-06 | Itt Research Institute | Rugate optical filter systems |
| US5055319A (en) * | 1990-04-02 | 1991-10-08 | The Regents Of The University Of California | Controlled high rate deposition of metal oxide films |
| JPH049748A (ja) * | 1990-04-27 | 1992-01-14 | Sharp Corp | ニオブ酸リチウム薄膜の評価方法およびその製造装置 |
| DE4017440C2 (de) * | 1990-05-30 | 1994-02-10 | Fraunhofer Ges Forschung | Verfahren zur Messung der Schichtdicke und des Brechungsindex einer dünnen Schicht auf einem Substrat und Vorrichtung zur Durchführung des Verfahrens |
| US5131752A (en) * | 1990-06-28 | 1992-07-21 | Tamarack Scientific Co., Inc. | Method for film thickness endpoint control |
| WO1994002832A1 (en) * | 1992-07-15 | 1994-02-03 | On-Line Technologies, Inc. | Method and apparatus for monitoring layer processing |
| US5354575A (en) * | 1993-04-16 | 1994-10-11 | University Of Maryland | Ellipsometric approach to anti-reflection coatings of semiconductor laser amplifiers |
| US5464710A (en) * | 1993-12-10 | 1995-11-07 | Deposition Technologies, Inc. | Enhancement of optically variable images |
-
1992
- 1992-10-27 DE DE4236264A patent/DE4236264C1/de not_active Expired - Fee Related
-
1993
- 1993-08-18 JP JP6510521A patent/JPH08505435A/ja active Pending
- 1993-08-18 WO PCT/DE1993/000748 patent/WO1994010356A1/de not_active Ceased
- 1993-08-18 EP EP93918891A patent/EP0666934B1/de not_active Expired - Lifetime
- 1993-08-18 DE DE59305985T patent/DE59305985D1/de not_active Expired - Fee Related
- 1993-08-18 US US08/424,418 patent/US5614248A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US5614248A (en) | 1997-03-25 |
| WO1994010356A1 (de) | 1994-05-11 |
| EP0666934B1 (de) | 1997-03-26 |
| DE59305985D1 (de) | 1997-04-30 |
| EP0666934A1 (de) | 1995-08-16 |
| DE4236264C1 (enExample) | 1993-09-02 |
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