JPH08505435A - プラズマ補助反応性電子ビーム蒸発法 - Google Patents

プラズマ補助反応性電子ビーム蒸発法

Info

Publication number
JPH08505435A
JPH08505435A JP6510521A JP51052194A JPH08505435A JP H08505435 A JPH08505435 A JP H08505435A JP 6510521 A JP6510521 A JP 6510521A JP 51052194 A JP51052194 A JP 51052194A JP H08505435 A JPH08505435 A JP H08505435A
Authority
JP
Japan
Prior art keywords
plasma
measured
film
reactive gas
evaporation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6510521A
Other languages
English (en)
Japanese (ja)
Inventor
ズィークフリードゥ シッラー
フォルケル キリヒホーフ
ゲルハードゥ ツァイスィッヒ
ニコラス シッラー
クラウス グーディッケ
マンフレッドゥ ノイマン
Original Assignee
フラウンホッファー−ゲゼルシャフト ツァ フェルダールング デァ アンゲヴァンテン フォアシュンク エー．ファオ．
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by フラウンホッファー−ゲゼルシャフト ツァ フェルダールング デァ アンゲヴァンテン フォアシュンク エー．ファオ． filed Critical フラウンホッファー−ゲゼルシャフト ツァ フェルダールング デァ アンゲヴァンテン フォアシュンク エー．ファオ．
Publication of JPH08505435A publication Critical patent/JPH08505435A/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP6510521A 1992-10-27 1993-08-18 プラズマ補助反応性電子ビーム蒸発法 Pending JPH08505435A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE4236264.4 1992-10-27
DE4236264A DE4236264C1 (enExample) 1992-10-27 1992-10-27
PCT/DE1993/000748 WO1994010356A1 (de) 1992-10-27 1993-08-18 Verfahren zum plasmagestützten reaktiven elektronenstrahlbedampfen

Publications (1)

Publication Number Publication Date
JPH08505435A true JPH08505435A (ja) 1996-06-11

Family

ID=6471479

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6510521A Pending JPH08505435A (ja) 1992-10-27 1993-08-18 プラズマ補助反応性電子ビーム蒸発法

Country Status (5)

Country Link
US (1) US5614248A (enExample)
EP (1) EP0666934B1 (enExample)
JP (1) JPH08505435A (enExample)
DE (2) DE4236264C1 (enExample)
WO (1) WO1994010356A1 (enExample)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4343040C1 (de) * 1993-12-16 1995-01-26 Fraunhofer Ges Forschung Barrierefolie
DE59608441D1 (de) * 1996-01-10 2002-01-24 Alcan Tech & Man Ag Verfahren und Vorrichtung zum Beschichten einer Substratfläche
US6140773A (en) * 1996-09-10 2000-10-31 The Regents Of The University Of California Automated control of linear constricted plasma source array
CA2241678C (en) * 1997-06-26 2007-08-28 General Electric Company Silicon dioxide deposition by plasma activated evaporation process
JPH1129863A (ja) * 1997-07-10 1999-02-02 Canon Inc 堆積膜製造方法
US6420032B1 (en) 1999-03-17 2002-07-16 General Electric Company Adhesion layer for metal oxide UV filters
US6426125B1 (en) 1999-03-17 2002-07-30 General Electric Company Multilayer article and method of making by ARC plasma deposition
US6261694B1 (en) 1999-03-17 2001-07-17 General Electric Company Infrared reflecting coatings
US6517687B1 (en) 1999-03-17 2003-02-11 General Electric Company Ultraviolet filters with enhanced weatherability and method of making
US6365016B1 (en) 1999-03-17 2002-04-02 General Electric Company Method and apparatus for arc plasma deposition with evaporation of reagents
US6875318B1 (en) 2000-04-11 2005-04-05 Metalbond Technologies, Llc Method for leveling and coating a substrate and an article formed thereby
DE10019258C1 (de) * 2000-04-13 2001-11-22 Fraunhofer Ges Forschung Verfahren zur Vakuumbeschichtung bandförmiger transparenter Substrate
US6444945B1 (en) 2001-03-28 2002-09-03 Cp Films, Inc. Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source
JP2005535108A (ja) 2002-05-23 2005-11-17 ショット アーゲー 高周波用途に適した導体構成を有する構成要素を製造する方法
US7327089B2 (en) * 2002-09-19 2008-02-05 Applied Process Technologies, Inc. Beam plasma source
US7411352B2 (en) * 2002-09-19 2008-08-12 Applied Process Technologies, Inc. Dual plasma beam sources and method
DE10347521A1 (de) 2002-12-04 2004-06-24 Leybold Optics Gmbh Verfahren zur Herstellung Multilayerschicht und Vorrichtung zur Durchführung des Verfahrens
US7038389B2 (en) * 2003-05-02 2006-05-02 Applied Process Technologies, Inc. Magnetron plasma source
KR101602517B1 (ko) * 2008-08-04 2016-03-10 에이지씨 플랫 글래스 노스 아메리카, 인코퍼레이티드 Ｐｅｃｖｄ를 이용한 박막 코팅을 증착하기 위한 플라즈마 소스 및 방법
DE102009034532A1 (de) * 2009-07-23 2011-02-03 Msg Lithoglas Ag Verfahren zum Herstellen einer strukturierten Beschichtung auf einem Substrat, beschichtetes Substrat sowie Halbzeug mit einem beschichteten Substrat
DE102013110722A1 (de) * 2013-09-27 2015-04-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Plasma-ionengestütztes Beschichtungsverfahren und Plasmasonde
ES2900321T3 (es) 2014-12-05 2022-03-16 Agc Flat Glass Na Inc Fuente de plasma que utiliza un recubrimiento de reducción de macropartículas y procedimiento para usar una fuente de plasma que utiliza un recubrimiento de reducción de macropartículas para la deposición de recubrimientos de película delgada y modificación de superficies
MX2017007356A (es) 2014-12-05 2018-04-11 Agc Flat Glass Europe S A Fuente de plasma del catodo hueco.
US9721764B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Method of producing plasma by multiple-phase alternating or pulsed electrical current
US9721765B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
US10242846B2 (en) 2015-12-18 2019-03-26 Agc Flat Glass North America, Inc. Hollow cathode ion source
US10573499B2 (en) 2015-12-18 2020-02-25 Agc Flat Glass North America, Inc. Method of extracting and accelerating ions
BE1029160B1 (nl) * 2021-03-04 2022-10-03 Soleras Advanced Coatings Bv Depositie van niet-stoichiometrische metaalverbindingen

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3549416A (en) * 1965-06-01 1970-12-22 Gulf Energy & Environ Systems Process for forming superconductive materials
US4024291A (en) * 1975-06-17 1977-05-17 Leybold-Heraeus Gmbh & Co. Kg Control of vapor deposition
JPS55500588A (enExample) * 1978-08-18 1980-09-04
US4526802A (en) * 1983-03-31 1985-07-02 Clarion Co., Ltd. Film deposition equipment
DE3406645A1 (de) * 1984-02-24 1985-08-29 Leybold-Heraeus GmbH, 5000 Köln Spektralfotometeranordnung
US4514437A (en) * 1984-05-02 1985-04-30 Energy Conversion Devices, Inc. Apparatus for plasma assisted evaporation of thin films and corresponding method of deposition
US4676646A (en) * 1985-10-15 1987-06-30 Energy Conversion Devices, Inc. Method and apparatus for controlling thickness of a layer of an optical data storage device by measuring an optical property of the layer
DE3634598C2 (de) * 1986-10-10 1994-06-16 Leybold Ag Verfahren und Vorrichtung zum reaktiven Aufdampfen von Metallverbindungen
US4837044A (en) * 1987-01-23 1989-06-06 Itt Research Institute Rugate optical filter systems
US5055319A (en) * 1990-04-02 1991-10-08 The Regents Of The University Of California Controlled high rate deposition of metal oxide films
JPH049748A (ja) * 1990-04-27 1992-01-14 Sharp Corp ニオブ酸リチウム薄膜の評価方法およびその製造装置
DE4017440C2 (de) * 1990-05-30 1994-02-10 Fraunhofer Ges Forschung Verfahren zur Messung der Schichtdicke und des Brechungsindex einer dünnen Schicht auf einem Substrat und Vorrichtung zur Durchführung des Verfahrens
US5131752A (en) * 1990-06-28 1992-07-21 Tamarack Scientific Co., Inc. Method for film thickness endpoint control
WO1994002832A1 (en) * 1992-07-15 1994-02-03 On-Line Technologies, Inc. Method and apparatus for monitoring layer processing
US5354575A (en) * 1993-04-16 1994-10-11 University Of Maryland Ellipsometric approach to anti-reflection coatings of semiconductor laser amplifiers
US5464710A (en) * 1993-12-10 1995-11-07 Deposition Technologies, Inc. Enhancement of optically variable images

Also Published As

Publication number Publication date
WO1994010356A1 (de) 1994-05-11
EP0666934B1 (de) 1997-03-26
DE59305985D1 (de) 1997-04-30
US5614248A (en) 1997-03-25
DE4236264C1 (enExample) 1993-09-02
EP0666934A1 (de) 1995-08-16

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