JPH08148666A - Solid image pickup device, and its manufacture - Google Patents

Solid image pickup device, and its manufacture

Info

Publication number
JPH08148666A
JPH08148666A JP7199961A JP19996195A JPH08148666A JP H08148666 A JPH08148666 A JP H08148666A JP 7199961 A JP7199961 A JP 7199961A JP 19996195 A JP19996195 A JP 19996195A JP H08148666 A JPH08148666 A JP H08148666A
Authority
JP
Japan
Prior art keywords
solid
image pickup
chip
state image
cap
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7199961A
Other languages
Japanese (ja)
Other versions
JP3355881B2 (en
Inventor
Yukinobu Wataya
行展 綿谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP19996195A priority Critical patent/JP3355881B2/en
Publication of JPH08148666A publication Critical patent/JPH08148666A/en
Application granted granted Critical
Publication of JP3355881B2 publication Critical patent/JP3355881B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Solid State Image Pick-Up Elements (AREA)
  • Wire Bonding (AREA)

Abstract

PURPOSE: To provide a solid image pickup device which can easily attain the downsizing while maintaining image pickup property and reliability. CONSTITUTION: The electrode pad 4 fitted with a bump 10 provided at the margin of the image pickup region 3 of a solid image pickup element chip 1 and the lead 13 of a flexible board 6 are connected with each other, using an anisotropic conductive film 5. A transparent cap 8 is fixed on the flexible board 6, using adhesive resin 7. For the flexible board 6, the section corresponding to the image pickup region 3 is punched, and space 14 is made between the solid image pickup element cap 1 and the cap 8. This space 14 is sealed with an anisotropic conductive film 5 and adhesive resin 7.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、例えば、CCD
(Charge Coupled Device;電荷
結合素子)を用いたエリアセンサ等に適用可能な固体撮
像装置に関する。
The present invention relates to, for example, a CCD.
The present invention relates to a solid-state imaging device applicable to an area sensor or the like using a (Charge Coupled Device).

【0002】[0002]

【従来の技術】従来より、内視鏡等の用途として超小型
の固体撮像装置が用いられている。図18〜図20は、
従来の固体撮像装置の構成を示すものである。同図に示
すように、従来の固体撮像装置においては、撮像領域2
0が形成された固体撮像素子チップ21の両側部に接続
用の電極パッド22及びバンプ23が設けられ、各バン
プ23に対してTAB(Tape Automated
Bonding)テープ24のリード線25が接続さ
れる。そして、例えばガラス等からなる透明なキャップ
26を固体撮像素子チップ21上に載せ、透明な樹脂か
らなる接着剤27を固体撮像素子チップ21とキャップ
26との間に充填することにより、パッケージングを行
うようにしている。この場合、固体撮像素子チップ21
とキャップ26との空間に接着剤27を充填するのは、
水分やほこり等の侵入を防ぎ、固体撮像素子の信頼性を
確保するためである。
2. Description of the Related Art Conventionally, an ultra-small solid-state image pickup device has been used for applications such as an endoscope. 18 to 20 show
1 illustrates a configuration of a conventional solid-state imaging device. As shown in the figure, in the conventional solid-state imaging device, the imaging area 2
Electrode pads 22 and bumps 23 for connection are provided on both sides of the solid-state imaging device chip 21 on which 0 is formed, and TAB (Tape Automated
Bonding) The lead wire 25 of the tape 24 is connected. Then, a transparent cap 26 made of, for example, glass or the like is placed on the solid-state image pickup device chip 21, and an adhesive 27 made of a transparent resin is filled between the solid-state image pickup device chip 21 and the cap 26 to perform packaging. I am trying to do it. In this case, the solid-state imaging device chip 21
Filling the space between the cap 26 and the cap 27 with the adhesive 27 is
This is to prevent the intrusion of water and dust and ensure the reliability of the solid-state image sensor.

【0003】[0003]

【発明が解決しようとする課題】ところで、図20に示
すように、一般にCCDエリアセンサ等のフォトダイオ
ード28の上面には、感度を向上させるため、光の集光
を行うオンチップマイクロレンズ29が例えば屈折率
1.5〜1.6の有機材料を用いて形成される。
By the way, as shown in FIG. 20, an on-chip microlens 29 for condensing light is generally provided on the upper surface of a photodiode 28 such as a CCD area sensor in order to improve sensitivity. For example, it is formed using an organic material having a refractive index of 1.5 to 1.6.

【0004】しかしながら、このような構成を有する従
来例の場合、オンチップマイクロレンズ29の上面に接
着剤27が密着することから、この接着剤27の樹脂と
オンチップマイクロレンズ29を構成している有機材料
の屈折率の差が空気の場合に比べて小さく、その結果、
光の集光率が下がってしまい、小型化はできるが例えば
セラミック等を使用した中空構造のパッケージより感度
やスミア特性が劣化してしまうという問題があった。
However, in the case of the conventional example having such a structure, since the adhesive 27 adheres to the upper surface of the on-chip microlens 29, the resin of the adhesive 27 and the on-chip microlens 29 are formed. The difference in refractive index of organic materials is smaller than that of air, and as a result,
The light condensing rate is lowered and the size can be reduced, but there is a problem that the sensitivity and smear characteristics are deteriorated as compared with a package having a hollow structure using, for example, ceramics.

【0005】本発明はこのような従来の技術の課題を考
慮してなされたものであり、撮像特性及び信頼性を保持
しつつ、容易に小型化を達成しうる固体撮像装置及びそ
の製造方法を提供することを目的とする。
The present invention has been made in consideration of the above problems of the conventional technique, and provides a solid-state image pickup device and a method of manufacturing the same which can easily achieve miniaturization while maintaining the image pickup characteristics and reliability. The purpose is to provide.

【0006】[0006]

【課題を解決するための手段】本発明に係る固体撮像装
置は、撮像領域の周縁部に接続部を設けた固体撮像素子
チップと、この固体撮像素子チップを保護するための透
明なキャップとを有し、外部端子に接続するためのリー
ドを上述の接続部に接続するとともに、上述の撮像領域
の近くに気密的な空間が形成されるように上述の撮像領
域の周縁部と上述のキャップとの間を封止してなるもの
である。
A solid-state image pickup device according to the present invention comprises a solid-state image pickup element chip having a connection portion at a peripheral portion of an image pickup area, and a transparent cap for protecting the solid-state image pickup element chip. A lead for connecting to an external terminal is connected to the above-mentioned connecting portion, and a peripheral portion of the above-mentioned imaging region and the above-mentioned cap are formed so that an airtight space is formed near the above-mentioned imaging region. The space between them is sealed.

【0007】本発明に係る固体撮像装置は、撮像領域の
周縁部に接続部を設けた固体撮像素子チップと、この固
体撮像素子チップを保護するための透明なキャップとを
有し、外部端子に接続するためのリードを接続部に接続
するとともに、リードの固体撮像素子チップの端縁に対
応する部分上に絶縁膜を形成し、撮像領域の周縁部とキ
ャップとの間を封止してなるものである。
A solid-state image pickup device according to the present invention has a solid-state image pickup element chip provided with a connecting portion at a peripheral portion of an image pickup area and a transparent cap for protecting the solid-state image pickup element chip, and an external terminal is provided. A lead for connection is connected to the connecting portion, an insulating film is formed on a portion of the lead corresponding to an end edge of the solid-state image pickup device chip, and a gap between the peripheral portion of the image pickup region and the cap is sealed. It is a thing.

【0008】ここで、異方性導電膜によってリードを接
続部に接続することもできる。
Here, the lead can be connected to the connecting portion by the anisotropic conductive film.

【0009】また、キャリアテープ付のリードを接続部
に接続することもできる。
It is also possible to connect a lead with a carrier tape to the connecting portion.

【0010】さらに、固体撮像素子チップとキャップと
をほぼ同一の面積にすることもできる。
Further, the solid-state image pickup device chip and the cap can have substantially the same area.

【0011】さらにまた、撮像領域の上部にオンチップ
マイクロレンズを有するように構成することもできる。
Furthermore, it is also possible to have an on-chip microlens above the image pickup area.

【0012】一方、本発明に係る固体撮像装置の製造方
法は、固体撮像素子チップの撮像領域の周縁部に設けた
接続部に外部端子接続用のリードを接続し、上述の撮像
領域の近くに空間が形成されるように上述の固体撮像素
子チップ保護用の透明なキャップを配して、このキャッ
プと上述の撮像領域の周縁部との間を封止する工程を有
するものである。
On the other hand, in the method for manufacturing a solid-state image pickup device according to the present invention, a lead for external terminal connection is connected to a connecting portion provided on the peripheral portion of the image pickup region of the solid-state image pickup element chip, and the lead is provided near the above-mentioned image pickup region. A transparent cap for protecting the solid-state image pickup element chip is arranged so as to form a space, and a step of sealing between the cap and the peripheral portion of the image pickup area is included.

【0013】本発明に係る固体撮像装置の場合、固体撮
像素子チップの撮像領域の近くに気密的な空間が形成さ
れるようにこの撮像領域の周縁部とキャップとの間を封
止したことから、この空間内への水分やほこり等の侵入
が防止され、撮像領域上における結露や撮像特性の劣化
が防止される。
In the case of the solid-state image pickup device according to the present invention, the space between the peripheral edge of the solid-state image pickup element chip and the cap is sealed so that an airtight space is formed near the image pickup region. It is possible to prevent moisture, dust, and the like from entering the space, and prevent dew condensation on the imaging area and deterioration of the imaging characteristics.

【0014】また、本発明に係る固体撮像装置では、リ
ードの固体撮像素子チップの端縁に対応する部分上に絶
縁膜を形成したことから、リードと固体撮像素子チップ
端縁との電気的ショートが防止される。
Further, in the solid-state image pickup device according to the present invention, since the insulating film is formed on the portion of the lead corresponding to the edge of the solid-state image pickup element chip, the leads and the edge of the solid-state image pickup element chip are electrically short-circuited. Is prevented.

【0015】ここで、異方性導電膜によってリードを接
続部に接続するように構成すれば、これらの接続と、撮
像領域の周縁部およびキャップ間の封止とが同時に行わ
れる。
Here, if the leads are connected to the connecting portions by the anisotropic conductive film, these connections and the sealing between the peripheral portion of the image pickup region and the cap are performed at the same time.

【0016】また、キャリアテープ付のリードを接続部
に接続するように構成すれば、外部端子への接続の際
に、リードがばらけたり、リード同士が接触することは
ない。
If the leads with the carrier tape are connected to the connecting portions, the leads will not come apart or come into contact with each other when connecting to the external terminals.

【0017】さらに、固体撮像素子チップとキャップを
ほぼ同一の面積とすれば、固体撮像素子チップのサイズ
とほぼ同等の固体撮像装置が容易に得られる。
Further, if the solid-state image pickup element chip and the cap have substantially the same area, a solid-state image pickup device having a size substantially equal to the size of the solid-state image pickup element chip can be easily obtained.

【0018】さらにまた、撮像領域の上部にオンチップ
マイクロレンズLを有する固体撮像装置に本発明を適用
すれば、オンチップマイクロレンズLの上面が直接空気
に接触するため、固体撮像素子とキャップとの間に有機
材料を充填した従来例に比べてレンズ界面における屈折
率の差が大きくなり、光の集光率が向上する。
Furthermore, if the present invention is applied to a solid-state image pickup device having an on-chip microlens L above the image pickup area, since the upper surface of the on-chip microlens L directly contacts air, the solid-state image pickup element and the cap are As compared with the conventional example in which an organic material is filled in between, the difference in the refractive index at the lens interface becomes large, and the light collection rate is improved.

【0019】一方、本発明に係る固体撮像装置の製造方
法にあっては、固体撮像素子チップ1の撮像領域の周縁
部に設けた接続部4に外部端子接続用のリードを接続
し、撮像領域の近くに所定の空間が形成されるように固
体撮像素子チップ保護用の透明なキャップを配して、こ
のキャップと上述の撮像領域の周縁部との間を封止する
ことにより、単純な工程で固体撮像素子チップの撮像領
域の近くに気密的な空間を有する固体撮像装置が得られ
る。
On the other hand, in the method of manufacturing the solid-state image pickup device according to the present invention, the lead for external terminal connection is connected to the connecting portion 4 provided at the peripheral portion of the image pickup region of the solid-state image pickup element chip 1 to obtain the image pickup region. By disposing a transparent cap for protecting the solid-state image sensor chip so that a predetermined space is formed in the vicinity of the space, and sealing between the cap and the peripheral edge of the above-mentioned imaging region, a simple process can be performed. Thus, a solid-state image pickup device having an airtight space near the image pickup area of the solid-state image pickup element chip can be obtained.

【0020】[0020]

【発明の実施の形態】以下、本発明に係る固体撮像装置
及びその製造方法の実施例について図面を参照して説明
する。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of a solid-state image pickup device and a method of manufacturing the same according to the present invention will be described below with reference to the drawings.

【0021】図1は、本実施例の固体撮像装置の概略構
成を示す分解斜視図である。同図に示すように、本実施
例の固体撮像装置は、従来例と同様の固体撮像素子チッ
プ(以下単に「チップ」という。)1を有している。す
なわち、このチップ1においては、四角形状の基板2の
中央部にCCDからなる撮像領域3が形成され、その周
縁部に接続部として例えばAlからなる電極パッド4が
設けられる。本実施例においては、撮像領域3の長辺部
の両側に複数個の電極パッド4が配置される。
FIG. 1 is an exploded perspective view showing a schematic structure of the solid-state image pickup device of this embodiment. As shown in the figure, the solid-state imaging device of this embodiment has a solid-state imaging element chip (hereinafter simply referred to as “chip”) 1 similar to that of the conventional example. That is, in this chip 1, an image pickup region 3 made of CCD is formed in the central portion of a quadrangular substrate 2, and an electrode pad 4 made of, for example, Al is provided as a connecting portion on the peripheral portion thereof. In this embodiment, a plurality of electrode pads 4 are arranged on both sides of the long side of the image pickup area 3.

【0022】そして、図1に示すように、チップ1の上
には、順次、異方性導電膜5、キャリアテープとしての
フレキシブル基板6、接着樹脂7およびキャップ8が載
せられ、後述する方法によって図2〜図7に示すような
固体撮像装置1が得られる。
Then, as shown in FIG. 1, an anisotropic conductive film 5, a flexible substrate 6 as a carrier tape, an adhesive resin 7 and a cap 8 are sequentially mounted on the chip 1 by a method described later. The solid-state imaging device 1 as shown in FIGS. 2 to 7 is obtained.

【0023】ここで、図2は本実施例の固体撮像装置1
の平面図、図3は本実施例の固体撮像装置1の図1にお
けるY方向矢視図、図4Aは図2のA−B線断面図、図
4Bは図4AにおけるE部の拡大図、図4Cは図4Aに
おけるF部の拡大図、図5は本実施例の固体撮像装置1
の裏面図、図6は図2のC−D線断面図、図7は本実施
例の固体撮像装置1の図2におけるX方向矢視図であ
る。
Here, FIG. 2 shows the solid-state image pickup device 1 of this embodiment.
3 is a plan view of the solid-state imaging device 1 of the present embodiment in the direction of the arrow Y in FIG. 1, FIG. 4A is a cross-sectional view taken along the line AB of FIG. 2, and FIG. 4B is an enlarged view of a portion E in FIG. 4A. FIG. 4C is an enlarged view of part F in FIG. 4A, and FIG. 5 is a solid-state imaging device 1 of this embodiment.
6 is a sectional view taken along the line C-D of FIG. 2, and FIG. 7 is a view of the solid-state imaging device 1 of the present embodiment as viewed in the X direction in FIG.

【0024】図4Cに示すように、チップ1の撮像領域
3のフォトダイオード9の上面には、透明な有機材料
(例えばポリイミド)からなるオンチップマイクロレン
ズLが形成される。また、図4Bに示すように、各電極
パッド4には、異方性導電膜5との接続を行うためのバ
ンプ(例えばAuボールバンプ)10が形成される。
As shown in FIG. 4C, an on-chip microlens L made of a transparent organic material (for example, polyimide) is formed on the upper surface of the photodiode 9 in the image pickup area 3 of the chip 1. Further, as shown in FIG. 4B, bumps (for example, Au ball bumps) 10 for connecting to the anisotropic conductive film 5 are formed on each electrode pad 4.

【0025】異方性導電膜5は、チップ1とほぼ同一の
大きさを有し、撮像領域3に対応する部分が打ち抜かれ
ている。この異方性導電膜5は、例えば樹脂からなる粘
着剤11中に導電性粒子12が分散されているもので、
数十μmの厚みを有している。 なお、異方性導電膜5
は、あらかじめフレキシブル基板6に接着するように構
成してもよい。
The anisotropic conductive film 5 has almost the same size as the chip 1, and the portion corresponding to the image pickup region 3 is punched out. The anisotropic conductive film 5 includes conductive particles 12 dispersed in an adhesive 11 made of resin,
It has a thickness of several tens of μm. The anisotropic conductive film 5
May be adhered to the flexible substrate 6 in advance.

【0026】フレキシブル基板6は、厚み数十μmの樹
脂(例えばポリイミド等)からなり、長尺の四角形状に
形成されている。そして、図1に示すように、チップ1
の撮像領域3に対応する部分が打ち抜かれている。図5
及び図6に示すように、フレキシブル基板6は、その短
辺部の長さ(幅)がチップ1の長辺部の長さとほぼ同じ
か又は若干これより短くなるように形成される。そし
て、フレキシブル基板6の長辺部に対してチップ1のの
長辺部が直交するようにフレキシブル基板6が重ねられ
る。
The flexible substrate 6 is made of a resin (for example, polyimide) having a thickness of several tens of μm and is formed in a long rectangular shape. Then, as shown in FIG.
The portion corresponding to the image pickup area 3 is punched out. Figure 5
Further, as shown in FIG. 6, the flexible substrate 6 is formed such that the length (width) of its short side portion is substantially the same as or slightly shorter than the length of the long side portion of the chip 1. Then, the flexible substrate 6 is stacked so that the long side portion of the chip 1 is orthogonal to the long side portion of the flexible substrate 6.

【0027】図5に示すように、フレキシブル基板6の
一方の面には、その長手方向に沿って平行に外部端子接
続用のリード13が複数本形成される。このリード13
は、銅箔の上にAu,Sn等のめっきが施されたものか
ら構成される。また、隣接するリード13の間隔は、チ
ップ1上に形成される電極パッド4の間隔と同一となる
ように形成される。
As shown in FIG. 5, on one surface of the flexible substrate 6, a plurality of leads 13 for connecting external terminals are formed in parallel along the longitudinal direction thereof. This lead 13
Is composed of a copper foil plated with Au, Sn, or the like. Further, the interval between the adjacent leads 13 is formed to be the same as the interval between the electrode pads 4 formed on the chip 1.

【0028】フレキシブル基板6の上には、例えばエポ
キシ樹脂等の接着樹脂7によってキャップ8が接着され
る。この接着樹脂7の厚みは数μm〜数十μmであり、
フレキシブル基板6又はキャップ8上に塗布される。な
お、接着樹脂7は、熱硬化型又は紫外線硬化型のいずれ
であってもよい。
A cap 8 is adhered onto the flexible substrate 6 with an adhesive resin 7 such as an epoxy resin. The thickness of the adhesive resin 7 is several μm to several tens of μm,
It is applied on the flexible substrate 6 or the cap 8. The adhesive resin 7 may be either a thermosetting type or an ultraviolet curing type.

【0029】キャップ8は、光学ガラス、プラスチック
等の透明部材からなり、チップ1とほぼ同じ大きさを有
している。
The cap 8 is made of a transparent material such as optical glass or plastic and has a size substantially the same as the chip 1.

【0030】次に、本実施例の固体撮像装置の製造方法
の一例について説明する。まず、上述の構成を有するチ
ップ1とフレキシブル基板6との間に異方性導電膜5を
挟み、例えば160°、40秒、50Kgf/cm2
条件で熱圧着を行う。この場合、TABのインナーリー
ドボンディングで使用されているギャングボンダー等を
用いてフレキシブル基板6のリード13とチップ1のバ
ンプ10との位置合わせを行い、ヒートブロックを用い
て異方性導電膜5の全面を均一に加熱・加圧する。この
ような熱圧着の結果、例えば図4Bに示すように、異方
性導電膜5中の導電粒子12がフレキシブル基板6のリ
ード13とチップ1のバンプ13に接触し、これらが電
気的に接続される。
Next, an example of a method of manufacturing the solid-state image pickup device of this embodiment will be described. First, the anisotropic conductive film 5 is sandwiched between the chip 1 having the above structure and the flexible substrate 6, and thermocompression bonding is performed under the conditions of, for example, 160 °, 40 seconds, and 50 Kgf / cm 2 . In this case, the lead 13 of the flexible substrate 6 and the bump 10 of the chip 1 are aligned using the gang bonder or the like used in the inner lead bonding of the TAB, and the anisotropic conductive film 5 is formed using the heat block. Uniformly heats and pressurizes the entire surface. As a result of such thermocompression bonding, for example, as shown in FIG. 4B, the conductive particles 12 in the anisotropic conductive film 5 come into contact with the leads 13 of the flexible substrate 6 and the bumps 13 of the chip 1, and these are electrically connected. To be done.

【0031】その後、キャップ8を接着樹脂7を介して
フレキシブル基板6の上に載せ、熱圧着又は紫外線の照
射により接着樹脂7を硬化させてキャップ8をフレキシ
ブル基板6上に固定する。なお、熱圧着を行う場合に
は、チップ1のカラーフィルタ(図示せず)等の劣化が
起こらない温度(例えば160°C以下)で圧着を行う
ことが必要である。
Thereafter, the cap 8 is placed on the flexible substrate 6 via the adhesive resin 7, and the adhesive resin 7 is cured by thermocompression bonding or irradiation of ultraviolet rays to fix the cap 8 on the flexible substrate 6. When thermocompression bonding is performed, it is necessary to perform the pressure bonding at a temperature (for example, 160 ° C. or lower) at which the color filter (not shown) of the chip 1 does not deteriorate.

【0032】上述の方法によって製造した本実施例の固
体撮像装置の場合、図4A及び図6に示すように、チッ
プ1の撮像領域3の上面とキャップ8との間に数十〜百
数十μmのギャップが形成される。そして、図3及び図
6に示すように、フレキシブル基板6とチップ1との間
に形成される空間14は、全周にわたって異方性導電膜
5および接着樹脂7により密封される。
In the case of the solid-state image pickup device of this embodiment manufactured by the above-mentioned method, as shown in FIGS. 4A and 6, between the upper surface of the image pickup region 3 of the chip 1 and the cap 8 is several tens to several hundreds tens. A μm gap is formed. Then, as shown in FIGS. 3 and 6, the space 14 formed between the flexible substrate 6 and the chip 1 is sealed with the anisotropic conductive film 5 and the adhesive resin 7 over the entire circumference.

【0033】このような構成を有する本実施例の固体撮
像装置においては、チップ1のフォトダイオード9上の
オンチップマイクロレンズLの上面が直接空気に接触す
るため、レンズの界面における屈折率の差を大きく取る
ことができ、その結果、中空構造のセラミックパッケー
ジと同じ感度やスミア特性を得ることができる。
In the solid-state image pickup device of the present embodiment having such a configuration, since the upper surface of the on-chip microlens L on the photodiode 9 of the chip 1 is in direct contact with the air, the difference in refractive index at the interface between the lenses. Can be made large, and as a result, the same sensitivity and smear characteristics as those of the ceramic package having a hollow structure can be obtained.

【0034】また、本実施例の固体撮像装置において
は、チップ1の撮像領域3の近くの空間14が完全に密
封され、この空間14内への水分やほこり等の侵入が防
止されるため、撮像領域3上における結露や撮像特性の
劣化を防止して信頼性を確保することができる。
Further, in the solid-state image pickup device of the present embodiment, the space 14 near the image pickup area 3 of the chip 1 is completely sealed and moisture and dust are prevented from entering the space 14, It is possible to prevent the dew condensation on the imaging region 3 and the deterioration of the imaging characteristics to ensure the reliability.

【0035】さらに、キャップ8もチップ1とほぼ同一
の大きさにすることができるので、パッケージのサイズ
をほぼチップサイズ程度まで小型化することができる。
Further, since the cap 8 can be made substantially the same size as the chip 1, the size of the package can be reduced to about the chip size.

【0036】加えて、本実施例の製造方法によれば、単
純な工程でチップ1の撮像領域3の近くに気密的な空間
14を有する固体撮像装置が得られるので、撮像特性及
び信頼性の高い固体撮像装置を安価に製造することがで
きる。
In addition, according to the manufacturing method of the present embodiment, a solid-state image pickup device having the airtight space 14 near the image pickup region 3 of the chip 1 can be obtained by a simple process, so that the image pickup characteristic and reliability can be improved. A high solid-state imaging device can be manufactured at low cost.

【0037】上述したように、本実施例の固体撮像装置
では、異方性導電膜5を介してフレキシブル基板6のリ
ード13と固体撮像素子チップ1の電極パッド4上のバ
ンプ10が接続される。この異方性導電膜5の熱圧着を
行った場合、電極パッド4上のバンプ10はもちろん導
電粒子12を介してフレキシブル基板6のリード13と
電気的に接続されるが、それ以外にも圧着時の圧力が高
かったり、フレキシブル基板6が反っていたりすると固
体撮像素子チップ1の端縁部(いわゆるエッジ部)とリ
ード13とが直接、または導電粒子12を介して接触す
る恐れがある。
As described above, in the solid-state image pickup device of this embodiment, the leads 13 of the flexible substrate 6 and the bumps 10 on the electrode pads 4 of the solid-state image pickup element chip 1 are connected via the anisotropic conductive film 5. . When the thermo-compression bonding of the anisotropic conductive film 5 is performed, the bumps 10 on the electrode pads 4 are electrically connected to the leads 13 of the flexible substrate 6 through the conductive particles 12 as well. If the pressure at this time is high or the flexible substrate 6 is warped, the edge portion (so-called edge portion) of the solid-state imaging element chip 1 and the lead 13 may come into contact with each other directly or through the conductive particles 12.

【0038】固体撮像素子チップ1の端縁部はダイシン
グ時の切り代であるダイシングストレートがあり、この
部分はおおかたの場合、Siそのものである。固体撮像
素子チップ1のSi部分は通常基板電位を印加している
ため、この端縁部分を電極パッド4に接続されたリード
13とが接触すると、電気的ショートを発生させてしま
い不良品となってしまう。
The edge portion of the solid-state image pickup device chip 1 has a dicing straight, which is a cutting margin during dicing, and this portion is, in most cases, Si itself. Since the Si portion of the solid-state image pickup device chip 1 is normally applied with the substrate potential, if this edge portion comes into contact with the lead 13 connected to the electrode pad 4, an electrical short circuit is generated and it becomes a defective product. Will end up.

【0039】図8〜図10は、上述の点を改善した本発
明の他の実施例を示す。なお、図8はこの実施例の固体
撮像装置の平面図、図9は裏面図、図10は要部の断面
図である。
8 to 10 show another embodiment of the present invention in which the above points are improved. 8 is a plan view of the solid-state image pickup device of this embodiment, FIG. 9 is a rear view, and FIG. 10 is a cross-sectional view of a main part.

【0040】この実施例の固体撮像装置は、前述した図
1〜図4に示す実施例の固体撮像装置において、更に、
固体撮像素子チップ1の端縁、より詳しくは端縁を含む
領域、すなわちチップ端縁を中心にその両側に跨る領域
に対応した部分のフレキシブル基板6のリード13上に
薄膜の絶縁膜(例えば薄膜ポリイミドフィルム、その他
等)31を形成し、チップ絶縁とフレキシブル基板6の
リード13との接触を防ぐように構成する。
The solid-state image pickup device of this embodiment is the same as the solid-state image pickup device of the embodiment shown in FIGS.
A thin insulating film (for example, a thin film) is formed on the lead 13 of the flexible substrate 6 in a portion corresponding to an edge of the solid-state imaging device chip 1, more specifically, a region including the edge, that is, a region extending from the chip edge to both sides thereof. (Polyimide film, etc.) 31 is formed to prevent contact between the chip insulation and the leads 13 of the flexible substrate 6.

【0041】この場合、フレキシブル基板6のチップ端
縁を含む領域に対応する部分のリード13上に薄膜の絶
縁膜を形成し、その上から異方性導電膜5を形成するよ
うにしている。
In this case, a thin insulating film is formed on the lead 13 in a portion corresponding to the region including the chip edge of the flexible substrate 6, and the anisotropic conductive film 5 is formed thereon.

【0042】本例の絶縁膜31は、図8及び図9に示す
ように、チップ1の両端縁に対応して、夫々フレキシブ
ル基板6の全幅にわたって帯状に被着形成される。
As shown in FIGS. 8 and 9, the insulating film 31 of this example is formed in a strip shape over the entire width of the flexible substrate 6 so as to correspond to both edges of the chip 1.

【0043】絶縁膜31の形成に際しては、フレキシブ
ル基板6のリード13側の面上に絶縁膜31を形成する
部分が開口されたフォトレジストマスクを形成し、この
開口内に液状の絶縁物質を流し込み硬化させ(例えば紫
外線照射硬化、熱をかけて硬化等)、その後、フォトレ
ジストマスクを除去することにより、所望の領域上に絶
縁膜31を形成することができる。
At the time of forming the insulating film 31, a photoresist mask having an opening for forming the insulating film 31 is formed on the surface of the flexible substrate 6 on the lead 13 side, and a liquid insulating substance is poured into the opening. The insulating film 31 can be formed on a desired region by curing (for example, ultraviolet irradiation curing, heat curing, etc.) and then removing the photoresist mask.

【0044】ここで、バンプ10の高さを例えば30μ
m、異方性導電膜5の厚みを25μmとすると、少なく
とも10μm以下の絶縁膜31にする必要がある。絶縁
膜31が10μmを越える厚みになると、絶縁膜31の
厚みによってバンプ10とリード13との圧着を妨げ、
逆にオープン不良を発生させてしまう。また、絶縁膜3
1は、少なくとも圧着温度以上の耐熱性が必要となる。
このようにすればフレキシブル基板6のリード13とチ
ップ端縁が接触することもなく良好な接続を行うことが
できる。図8〜図10におけるその他の構成は、前述の
図1〜図4の固体撮像装置と同様であるので、同一符号
を付して重複説明を省略する。
Here, the height of the bump 10 is, for example, 30 μm.
m and the thickness of the anisotropic conductive film 5 is 25 μm, the insulating film 31 needs to be at least 10 μm or less. When the insulating film 31 has a thickness of more than 10 μm, the thickness of the insulating film 31 hinders the pressure bonding between the bump 10 and the lead 13.
On the contrary, it causes an open defect. Also, the insulating film 3
In No. 1, heat resistance of at least the pressure bonding temperature is required.
In this way, good connection can be achieved without the leads 13 of the flexible substrate 6 and the edges of the chip coming into contact with each other. Other configurations in FIGS. 8 to 10 are similar to those of the solid-state imaging device in FIGS. 1 to 4 described above, and therefore, the same reference numerals are given and duplicate description is omitted.

【0045】この実施例の固体撮像装置によれば、フレ
キシブル基板6のチップ端縁に対応する部分のリード1
3上に絶縁膜31が形成されるので、加圧力が大きかっ
たり、フレキシブル基板6が反っていたりしても、絶縁
膜31によってフレキシブル基板6のリード13とチッ
プ端縁との直接接触、あるいは異方性導電膜5の導電粒
子12を介しての電気的接触が防止され、固体撮像装置
としての信頼性を向上することができる。
According to the solid-state image pickup device of this embodiment, the lead 1 of the portion corresponding to the chip edge of the flexible substrate 6 is used.
Since the insulating film 31 is formed on the insulating layer 3, even if the applied pressure is large or the flexible substrate 6 is warped, the insulating film 31 makes direct contact between the leads 13 of the flexible substrate 6 and the edge of the chip or different. Electrical contact between the conductive film 5 and the anisotropic conductive film 5 is prevented, and the reliability of the solid-state imaging device can be improved.

【0046】図11〜図13は本発明の更に他の実施例
を示す。本例は、フレキシブル基板6を2分し、その夫
々のフレキシブル基板6A,6Bを固体撮像素子チップ
1の電極パッド4がある長辺部の両側部分だけに配置
し、それ以外のチップ周辺部分、即ち短辺部では透明キ
ャップ8とチップ1とを直接接着樹脂(図1に示す枠状
に形成された接着樹脂)7によって機械的に接合して構
成する。そして、本例においても、固体撮像素子チップ
1の端縁を含む領域に対応したフレキシブル基板6A,
6Bのリード13上に薄膜の絶縁膜31を形成する。
11 to 13 show still another embodiment of the present invention. In this example, the flexible substrate 6 is divided into two parts, and the respective flexible substrates 6A and 6B are arranged only on both sides of the long side where the electrode pad 4 of the solid-state imaging device chip 1 is present, and other peripheral parts of the chip, That is, in the short side portion, the transparent cap 8 and the chip 1 are mechanically joined by the direct adhesive resin (the adhesive resin formed in the frame shape shown in FIG. 1) 7. Also in this example, the flexible substrate 6A corresponding to the region including the edge of the solid-state image sensor chip 1,
A thin insulating film 31 is formed on the lead 13 of 6B.

【0047】その他の構成は、図1〜図4と同様である
ので対応する部分に同一符号を付して重複説明を省略す
る。
Since the other structure is the same as that of FIGS. 1 to 4, the corresponding portions are designated by the same reference numerals and the duplicate description thereof will be omitted.

【0048】かかる実施例の固体撮像装置においても、
チップ1の撮像領域3の近くの空間14が完全に気密封
止され、中空構造のパッケージが実現される。そして、
本例においても、チップ1端縁に対応するリード13上
に絶縁膜31が形成されることにより、チップ1端縁と
フレキシブル基板6のリード13との電気的ショートが
防止され、信頼性の高い固体撮像装置が得られる。
Also in the solid-state image pickup device of this embodiment,
The space 14 near the imaging region 3 of the chip 1 is completely hermetically sealed, and a hollow structure package is realized. And
Also in this example, since the insulating film 31 is formed on the lead 13 corresponding to the edge of the chip 1, an electrical short between the edge of the chip 1 and the lead 13 of the flexible substrate 6 is prevented, and the reliability is high. A solid-state imaging device is obtained.

【0049】尚、上例の絶縁膜31は、チップ端縁の全
体にかかるようにフレキシブル基板6の全幅にわたって
帯状に形成したが、その他、図14に示すように、チッ
プ端縁にかかるリード13上のみに選択的に絶縁膜31
を形成するようにしても、十分に役目を果たすことがで
きる。
Although the insulating film 31 in the above example is formed in a strip shape over the entire width of the flexible substrate 6 so as to cover the entire chip edge, in addition, as shown in FIG. Insulating film 31 only on top
Even if it is formed, it can sufficiently fulfill its role.

【0050】また、本発明は、フレキシブル基板6とし
てTABテープを用いる場合にも適用できる。この場
合、TABテープと固体撮像素子チップのバンプとを直
接熱圧着する方式、又はTABテープを異方性薄膜を介
して固体撮像素子チップに接続する方式等が考えられ
る。
The present invention can also be applied to the case where a TAB tape is used as the flexible substrate 6. In this case, a method in which the TAB tape and the bumps of the solid-state imaging element chip are directly thermocompression bonded, a method in which the TAB tape is connected to the solid-state imaging element chip via an anisotropic thin film, and the like can be considered.

【0051】なお、本発明は上述の各実施例に限られる
ことなく、種々の変形を行うことができる。
The present invention is not limited to the above embodiments, but various modifications can be made.

【0052】例えば、図15に示すように、固体撮像装
置を組み立てた後、フレキシブル基板6をチップ1の端
部の近くでほぼ直角に折り曲げて固定すれば、さらに固
体撮像装置の小型化が可能になる。この場合、フレキシ
ブル基板6としては、折り曲げ易い材質のものを選ぶこ
とが好ましい。
For example, as shown in FIG. 15, by assembling the solid-state imaging device and then bending and fixing the flexible substrate 6 at a substantially right angle near the end of the chip 1, the size of the solid-state imaging device can be further reduced. become. In this case, the flexible substrate 6 is preferably made of a material that can be easily bent.

【0053】また、フレキシブル基板6を折り曲げた後
にその部分が元に戻る場合には、例えば図16に示すよ
うに、チップ1の端部とフレキシブル基板6とを接着剤
で固定するか、図17に示すように、折り曲げるべき部
分において例えば銅からなる接続部材16を用いてリー
ド13同士を接続するように構成すれば、フレキシブル
基板6をほぼ直角に折り曲げることが可能になる。これ
ら図15、図16及び図17の例は、前述の絶縁膜31
を設ける場合にも適用できることは勿論である。
When the flexible substrate 6 is folded and then returned to its original position, the ends of the chip 1 and the flexible substrate 6 are fixed with an adhesive as shown in FIG. As shown in FIG. 6, if the leads 13 are connected to each other by using the connecting member 16 made of, for example, copper at the portion to be bent, the flexible substrate 6 can be bent at a substantially right angle. These examples of FIG. 15, FIG. 16 and FIG.
Needless to say, the present invention can also be applied to the case of providing.

【0054】さらに、上述の実施例によれば、チップ1
の上面とキャップ8とのギャップが数十μm±数μmと
非常に狭く、しかも精度良く設計できるため、キャップ
8の代わりに、オプティカルローパスフィルタ、マイク
ロレンズ、赤外カットフィルタ等をフレキシブル基板6
の上に接着することもできる。これにより、例えばビデ
オカメラ等に実装した場合の小型化を図ることができ
る。
Furthermore, according to the embodiment described above, the chip 1
Since the gap between the upper surface of the cap 8 and the cap 8 is very narrow, such as several tens μm ± several μm, and can be designed with high precision, an optical low-pass filter, a microlens, an infrared cut filter, etc. are used instead of the cap 8 for the flexible substrate 6.
It can also be glued on. As a result, it is possible to achieve miniaturization when mounted on, for example, a video camera.

【0055】さらにまた、上述の実施例においてはフレ
キシブル基板6を用いて接続を行うようにしたが、本発
明はこれに限られず、他のキャリアテープ付のリードを
用いたり、またリード線を直接チップ1のバンプに接続
することもできる。ただし、フレキシブル基板6を用い
れば、製造及び配線がきわめて容易になるとともに、リ
ード13同士の接触が防止されるので、信頼性が高まる
という利点がある。
Furthermore, in the above-mentioned embodiment, the flexible substrate 6 is used for connection, but the present invention is not limited to this, and other leads with carrier tape may be used, or the lead wires may be directly connected. It can also be connected to the bumps of the chip 1. However, if the flexible substrate 6 is used, manufacturing and wiring are extremely easy, and contact between the leads 13 is prevented, so that there is an advantage that reliability is improved.

【0056】一方、製造方法についても、上述の実施例
に限られず、種々の変更が可能である。例えば、フレキ
シブル基板6のそれぞれの面に半硬化の異方性導電膜5
と接着樹脂7とを貼り付け、一度に打ち抜くようにすれ
ば、工数の削減を図ることができる。さらに、このフレ
キシブル基板6をチップ1の上に載せ、その上にキャッ
プ8を載せて熱圧着を行えば、一回の圧着工程で封止を
行うことができ、大幅な工数の削減を図ることができ
る。なお、接着樹脂7の代わりに異方性導電膜5を用い
て接着を行うことも可能である。
On the other hand, the manufacturing method is not limited to the above-mentioned embodiment, and various changes can be made. For example, the semi-cured anisotropic conductive film 5 is formed on each surface of the flexible substrate 6.
By sticking the adhesive resin 7 and the adhesive resin 7 and punching them all at once, the number of steps can be reduced. Furthermore, if the flexible substrate 6 is placed on the chip 1, and the cap 8 is placed on the chip 1 to perform thermocompression bonding, sealing can be performed in a single pressure bonding step, and the number of man-hours can be significantly reduced. You can It is also possible to use the anisotropic conductive film 5 instead of the adhesive resin 7 for adhesion.

【0057】[0057]

【発明の効果】以上説明したように、本発明に係る固体
撮像装置においては、固体撮像素子の撮像領域の近くに
気密的な空間が形成されるように撮像領域の周縁部とキ
ャップとの間を封止したことにより、撮像領域上におけ
る結露や撮像特性の劣化を防止して信頼性を確保するこ
とができる。
As described above, in the solid-state image pickup device according to the present invention, between the peripheral portion of the image pickup region and the cap so that an airtight space is formed near the image pickup region of the solid-state image pickup element. By sealing the above, it is possible to prevent dew condensation on the image pickup area and deterioration of the image pickup characteristic to ensure reliability.

【0058】また、撮像領域の周縁部の接続部に接続す
るリードに対し、そのリードの固体撮像素子チップ端縁
に対応する部分上に絶縁膜を形成したことにより、リー
ドと固体撮像素子チップ端縁との電気的ショートが阻止
され、更なる信頼性を確保することができる。
Further, by forming an insulating film on a portion of the lead which is connected to the connection portion at the peripheral portion of the image pickup region and which corresponds to the edge of the solid-state image pickup element chip, the lead and the solid-state image pickup element chip end are formed. An electrical short with the edge is prevented, and further reliability can be ensured.

【0059】この場合、異方性導電膜によってリードを
接続部に接続するように構成すれば、これらの接続と撮
像領域の周縁部およびキャップ間の封止とが同時に行わ
れるため、製造の容易化及び工数の削減を図ることがで
きる。
In this case, if the lead is connected to the connecting portion by the anisotropic conductive film, the connection and the sealing between the peripheral portion of the imaging region and the cap are performed at the same time, which facilitates manufacturing. And reduction of man-hours.

【0060】また、キャリアテープ付のリードを接続部
に接続するように構成すれば、外部端子への接続時にお
けるリードのばらけやリード同士の接触を防止できるの
で、基板に実装する際の信頼性を確保することができ
る。
Further, if the leads with the carrier tape are connected to the connecting portions, it is possible to prevent loosening of the leads and contact between the leads when connecting to the external terminals, so that the reliability when mounting on the substrate is improved. It is possible to secure the sex.

【0061】さらに、固体撮像素子チップとキャップを
ほぼ同一の面積とすれば、チップのサイズとほぼ同等の
固体撮像装置が容易に得られるため、装置の小型化を図
ることができる。
Further, if the solid-state image pickup element chip and the cap have substantially the same area, a solid-state image pickup device having a chip size substantially equal to that of the chip can be easily obtained, so that the size of the device can be reduced.

【0062】さらにまた、撮像領域の上部にオンチップ
マイクロレンズを有する固体撮像装置に本発明を適用す
れば、固体撮像素子とキャップとの間に有機材料を充填
した従来例に比べて光の集光率を向上させることができ
るので、セラミックパッケージを用いた固体撮像装置と
同等の撮像特性を有する小型の固体撮像装置を得ること
ができる。
Furthermore, when the present invention is applied to a solid-state image pickup device having an on-chip microlens above the image pickup region, it is possible to collect light more than the conventional example in which an organic material is filled between the solid-state image pickup element and the cap. Since the light efficiency can be improved, it is possible to obtain a small-sized solid-state image pickup device having the same image pickup characteristics as the solid-state image pickup device using the ceramic package.

【0063】加えて、本発明に係る固体撮像装置の製造
方法によれば、固体撮像素子チップの撮像領域の周縁部
に設けた接続部に外部端子接続用のリードを接続し、撮
像領域の近くに所定の空間が形成されるように固体撮像
素子チップ保護用の透明なキャップを配して、このキャ
ップと上述の撮像領域の周縁部との間を封止することに
より、単純な工程で固体撮像素子チップの撮像領域の近
くに気密的な空間を有する固体撮像装置が得られ、その
結果、撮像特性及び信頼性の高い固体撮像装置を安価に
製造することができる。
In addition, according to the method of manufacturing the solid-state image pickup device of the present invention, the lead for external terminal connection is connected to the connection portion provided at the peripheral portion of the image pickup region of the solid-state image pickup element chip, and near the image pickup region. By disposing a transparent cap for protecting the solid-state image sensor chip so that a predetermined space is formed in the space, and sealing between the cap and the peripheral edge of the above-mentioned image sensing area, a solid process is performed in a simple process. A solid-state image pickup device having an airtight space near the image pickup area of the image pickup element chip is obtained, and as a result, a solid-state image pickup device having high image pickup characteristics and reliability can be manufactured at low cost.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係る固体撮像装置の実施例の概略構成
を示す分解斜視図である。
FIG. 1 is an exploded perspective view showing a schematic configuration of an embodiment of a solid-state imaging device according to the present invention.

【図2】同実施例の全体を示す平面図である。FIG. 2 is a plan view showing the whole of the embodiment.

【図3】同実施例の図1におけるY方向矢視図である。FIG. 3 is a view in the Y direction of FIG. 1 of the embodiment.

【図4】A 図2のA−B線断面図である。 B 図4AにおけるE部の拡大図である。 C 図4AにおけるF部の拡大図である。4 is a cross-sectional view taken along the line AB of FIG. 4B is an enlarged view of a portion E in FIG. 4A. 4C is an enlarged view of part F in FIG. 4A. FIG.

【図5】同実施例の全体を示す裏面図である。FIG. 5 is a rear view showing the whole of the embodiment.

【図6】図2のC−D線断面図である。FIG. 6 is a sectional view taken along line CD of FIG.

【図7】同実施例の図2におけるX方向矢視図である。FIG. 7 is a view on arrow in the X direction in FIG. 2 of the embodiment.

【図8】本発明に係る固体撮像装置の他の実施例を示す
全体の平面図である。
FIG. 8 is an overall plan view showing another embodiment of the solid-state imaging device according to the present invention.

【図9】同実施例の全体の裏面図である。FIG. 9 is a rear view of the whole of the embodiment.

【図10】同実施例の要部の断面図である。FIG. 10 is a cross-sectional view of a main part of the embodiment.

【図11】本発明に係る固体撮像装置の他の実施例を示
す全体の平面図である。
FIG. 11 is an overall plan view showing another embodiment of the solid-state imaging device according to the present invention.

【図12】同実施例の全体の裏面図である。FIG. 12 is an overall back view of the embodiment.

【図13】同実施例の要部の断面図である。FIG. 13 is a sectional view of an essential part of the embodiment.

【図14】本発明に係る固体撮像装置の他の実施例を示
す全体の裏面図である。
FIG. 14 is an overall rear view showing another embodiment of the solid-state imaging device according to the present invention.

【図15】本発明に係る固体撮像装置の他の実施例の全
体を示す断面図である。
FIG. 15 is a sectional view showing the whole of another embodiment of the solid-state imaging device according to the present invention.

【図16】本発明に係る固体撮像装置のさらに他の実施
例を示す要部断面図である。
FIG. 16 is a cross-sectional view of a main part showing still another embodiment of the solid-state imaging device according to the present invention.

【図17】本発明に係る固体撮像装置のさらに他の実施
例を示す要部断面図である。
FIG. 17 is a cross-sectional view of main parts showing still another embodiment of the solid-state imaging device according to the present invention.

【図18】従来の固体撮像装置の全体を示す平面図であ
る。
FIG. 18 is a plan view showing an entire conventional solid-state imaging device.

【図19】図18のa−b線断面図である。19 is a cross-sectional view taken along the line ab of FIG.

【図20】従来の固体撮像装置の要部を示す断面図であ
る。
FIG. 20 is a sectional view showing a main part of a conventional solid-state imaging device.

【符号の説明】[Explanation of symbols]

1 固体撮像素子チップ 2 基板 3 撮像領域 4 電極パッド(接続部) 5 異方性導電膜 6,6A,6B フレキシブル基板(キャリアテープ) 7 接着樹脂 8 キャップ 9 フォトダイオード 10 バンプ 11 粘着剤 12 導電粒子 13 リード 14 空間 L オンチップマイクロレンズ 31 絶縁膜 1 Solid-state imaging device chip 2 Substrate 3 Imaging area 4 Electrode pad (connecting part) 5 Anisotropic conductive film 6, 6A, 6B Flexible substrate (carrier tape) 7 Adhesive resin 8 Cap 9 Photodiode 10 Bump 11 Adhesive 12 Conductive particles 13 lead 14 space L on-chip micro lens 31 insulating film

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 撮像領域の周縁部に接続部を設けた固体
撮像素子チップと、この固体撮像素子チップを保護する
ための透明なキャップとを有し、外部端子に接続するた
めのリードを上記接続部に接続するとともに、上記撮像
領域の近くに気密的な空間が形成されるように上記撮像
領域の周縁部と上記キャップとの間を封止してなること
を特徴とする固体撮像装置。
1. A solid-state image sensor chip having a connection portion provided at a peripheral portion of an image-capturing area, and a transparent cap for protecting the solid-state image sensor chip, and a lead for connecting to an external terminal. A solid-state image pickup device, characterized in that it is connected to a connection portion and is sealed between a peripheral portion of the image pickup region and the cap so that an airtight space is formed near the image pickup region.
【請求項2】 撮像領域の周縁部に接続部を設けた固体
撮像素子チップと、この固体撮像素子チップを保護する
ための透明なキャップとを有し、外部端子に接続するた
めのリードを上記接続部に接続するとともに、上記リー
ドの上記固体撮像素子チップの端縁に対応する部分上に
絶縁膜を形成し、 上記撮像領域の周縁部と上記キャップとの間を封止して
なることを特徴とする固体撮像装置。
2. A solid-state image sensor chip having a connection portion provided at a peripheral portion of an image-capturing area, and a transparent cap for protecting the solid-state image sensor chip, and a lead for connecting to an external terminal as described above. In addition to connecting to the connection portion, an insulating film is formed on a portion of the lead corresponding to an edge of the solid-state image pickup device chip, and a gap between the peripheral portion of the image pickup region and the cap is sealed. A characteristic solid-state imaging device.
【請求項3】 異方性導電膜によってリードを接続部に
接続したことを特徴とする請求項1又は2記載の固体撮
像装置。
3. The solid-state imaging device according to claim 1, wherein the lead is connected to the connection portion by an anisotropic conductive film.
【請求項4】 キャリアテープ付のリードを接続部に接
続したことを特徴とする請求項1、2又は3記載の固体
撮像装置。
4. The solid-state image pickup device according to claim 1, wherein a lead with a carrier tape is connected to the connecting portion.
【請求項5】 固体撮像素子チップとキャップとがほぼ
同一の面積であることを特徴とする請求項1〜4のいず
れかに記載の固体撮像装置。
5. The solid-state image pickup device according to claim 1, wherein the solid-state image pickup element chip and the cap have substantially the same area.
【請求項6】 撮像領域の上部にオンチップマイクロレ
ンズを有していることを特徴とする請求項1〜5のいず
れかに記載の固体撮像装置。
6. The solid-state imaging device according to claim 1, further comprising an on-chip microlens above the imaging area.
【請求項7】 固体撮像素子チップの撮像領域の周縁部
に設けた接続部に外部端子接続用のリードを接続し、上
記撮像領域の近くに空間が形成されるように上記固体撮
像素子チップ保護用の透明なキャップを配して、このキ
ャップと上記撮像領域の周縁部との間を封止する工程を
有することを特徴とする固体撮像装置の製造方法。
7. The solid-state image sensor chip protection, wherein a lead for connecting an external terminal is connected to a connecting portion provided at a peripheral portion of an image-pickup region of the solid-state image sensor chip so that a space is formed near the image-pickup region. A method for manufacturing a solid-state image pickup device, comprising: disposing a transparent cap for use in the case, and sealing between the cap and a peripheral portion of the image pickup region.
JP19996195A 1994-09-21 1995-08-04 Solid-state imaging device and manufacturing method thereof Expired - Lifetime JP3355881B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19996195A JP3355881B2 (en) 1994-09-21 1995-08-04 Solid-state imaging device and manufacturing method thereof

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP6-227041 1994-09-21
JP22704194 1994-09-21
JP19996195A JP3355881B2 (en) 1994-09-21 1995-08-04 Solid-state imaging device and manufacturing method thereof

Publications (2)

Publication Number Publication Date
JPH08148666A true JPH08148666A (en) 1996-06-07
JP3355881B2 JP3355881B2 (en) 2002-12-09

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Country Status (1)

Country Link
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US6142930A (en) * 1997-01-13 2000-11-07 Asahi Kogaku Kogyo Kabushiki Kaisha Electronic endoscope having compact construction
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