JPH0754999Y2 - 縦型プラズマ処理機のリアクター - Google Patents
縦型プラズマ処理機のリアクターInfo
- Publication number
- JPH0754999Y2 JPH0754999Y2 JP1989056559U JP5655989U JPH0754999Y2 JP H0754999 Y2 JPH0754999 Y2 JP H0754999Y2 JP 1989056559 U JP1989056559 U JP 1989056559U JP 5655989 U JP5655989 U JP 5655989U JP H0754999 Y2 JPH0754999 Y2 JP H0754999Y2
- Authority
- JP
- Japan
- Prior art keywords
- reactor
- plasma processing
- heat radiation
- skylight
- cap
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000005855 radiation Effects 0.000 claims description 25
- 238000007789 sealing Methods 0.000 claims description 8
- 230000017525 heat dissipation Effects 0.000 description 23
- 235000012431 wafers Nutrition 0.000 description 21
- 238000004380 ashing Methods 0.000 description 6
- 238000005530 etching Methods 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 230000003028 elevating effect Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 238000009832 plasma treatment Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989056559U JPH0754999Y2 (ja) | 1989-05-17 | 1989-05-17 | 縦型プラズマ処理機のリアクター |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989056559U JPH0754999Y2 (ja) | 1989-05-17 | 1989-05-17 | 縦型プラズマ処理機のリアクター |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02146426U JPH02146426U (enrdf_load_stackoverflow) | 1990-12-12 |
| JPH0754999Y2 true JPH0754999Y2 (ja) | 1995-12-18 |
Family
ID=31580495
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989056559U Expired - Lifetime JPH0754999Y2 (ja) | 1989-05-17 | 1989-05-17 | 縦型プラズマ処理機のリアクター |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0754999Y2 (enrdf_load_stackoverflow) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5860552A (ja) * | 1981-10-05 | 1983-04-11 | Tokyo Denshi Kagaku Kabushiki | 縦型自動プラズマ処理装置 |
| JPS6226028U (enrdf_load_stackoverflow) * | 1985-07-29 | 1987-02-17 |
-
1989
- 1989-05-17 JP JP1989056559U patent/JPH0754999Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02146426U (enrdf_load_stackoverflow) | 1990-12-12 |
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