JPH0749789Y2 - 電子ビ−ム露光装置 - Google Patents

電子ビ−ム露光装置

Info

Publication number
JPH0749789Y2
JPH0749789Y2 JP1986178981U JP17898186U JPH0749789Y2 JP H0749789 Y2 JPH0749789 Y2 JP H0749789Y2 JP 1986178981 U JP1986178981 U JP 1986178981U JP 17898186 U JP17898186 U JP 17898186U JP H0749789 Y2 JPH0749789 Y2 JP H0749789Y2
Authority
JP
Japan
Prior art keywords
piston rod
wafer
beam exposure
cylinder
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1986178981U
Other languages
English (en)
Japanese (ja)
Other versions
JPS6382935U (US06168655-20010102-C00055.png
Inventor
義雄 渡辺
義暢 小野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP1986178981U priority Critical patent/JPH0749789Y2/ja
Publication of JPS6382935U publication Critical patent/JPS6382935U/ja
Application granted granted Critical
Publication of JPH0749789Y2 publication Critical patent/JPH0749789Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
JP1986178981U 1986-11-19 1986-11-19 電子ビ−ム露光装置 Expired - Lifetime JPH0749789Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1986178981U JPH0749789Y2 (ja) 1986-11-19 1986-11-19 電子ビ−ム露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1986178981U JPH0749789Y2 (ja) 1986-11-19 1986-11-19 電子ビ−ム露光装置

Publications (2)

Publication Number Publication Date
JPS6382935U JPS6382935U (US06168655-20010102-C00055.png) 1988-05-31
JPH0749789Y2 true JPH0749789Y2 (ja) 1995-11-13

Family

ID=31121623

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1986178981U Expired - Lifetime JPH0749789Y2 (ja) 1986-11-19 1986-11-19 電子ビ−ム露光装置

Country Status (1)

Country Link
JP (1) JPH0749789Y2 (US06168655-20010102-C00055.png)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4802025B2 (ja) * 2006-03-29 2011-10-26 株式会社ニューフレアテクノロジー 基板のアース機構及び荷電粒子ビーム描画装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60167245A (ja) * 1984-02-10 1985-08-30 Hitachi Ltd 試料保持装置

Also Published As

Publication number Publication date
JPS6382935U (US06168655-20010102-C00055.png) 1988-05-31

Similar Documents

Publication Publication Date Title
JPH08236604A (ja) 静電チャックおよびその使用方法
JPH0749789Y2 (ja) 電子ビ−ム露光装置
JP3230821B2 (ja) プッシャーピン付き静電チャック
JPS635900B2 (US06168655-20010102-C00055.png)
JPH06297371A (ja) 吸着機構
JP2754817B2 (ja) ウエーハハンドリング装置
JPS62215116A (ja) 多カツプ式負圧吸着装置
JPH06349868A (ja) 半導体素子吸着装置
JPH06270087A (ja) 真空吸着装置
JPH05343507A (ja) 静電吸着方法
JP2550787B2 (ja) 半導体装置の製造装置
JPH0516088A (ja) 吸着保持具
CN220484674U (zh) 一种电解水芯片抓取设备
JPH01310554A (ja) 半導体ウエハ処理装置のウエハ保持機構
JPS6013740U (ja) 試料保持装置
JPH06132388A (ja) ウエハ保持機構
JP2551780B2 (ja) 部品吸着装置
JPH06252062A (ja) 静電チャック試料台
JPS61188039A (ja) 吸着ロツク機構
JPH025531Y2 (US06168655-20010102-C00055.png)
JP2557433B2 (ja) ペレットマウント装置
JPH0610611Y2 (ja) 電子顕微鏡等の試料装置
JPS5987134U (ja) 半導体製造装置
JPH0632376A (ja) 保管箱及びそのキャップ開閉制御方法
JPH06163671A (ja) 真空ピンセット及び真空供給治具