JPH0737233Y2 - 集束イオンビーム装置 - Google Patents

集束イオンビーム装置

Info

Publication number
JPH0737233Y2
JPH0737233Y2 JP1989005053U JP505389U JPH0737233Y2 JP H0737233 Y2 JPH0737233 Y2 JP H0737233Y2 JP 1989005053 U JP1989005053 U JP 1989005053U JP 505389 U JP505389 U JP 505389U JP H0737233 Y2 JPH0737233 Y2 JP H0737233Y2
Authority
JP
Japan
Prior art keywords
ion beam
electrode
aperture
central hole
focused
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1989005053U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0297744U (de
Inventor
守一 小西
正明 滝沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP1989005053U priority Critical patent/JPH0737233Y2/ja
Publication of JPH0297744U publication Critical patent/JPH0297744U/ja
Application granted granted Critical
Publication of JPH0737233Y2 publication Critical patent/JPH0737233Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP1989005053U 1989-01-20 1989-01-20 集束イオンビーム装置 Expired - Lifetime JPH0737233Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1989005053U JPH0737233Y2 (ja) 1989-01-20 1989-01-20 集束イオンビーム装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1989005053U JPH0737233Y2 (ja) 1989-01-20 1989-01-20 集束イオンビーム装置

Publications (2)

Publication Number Publication Date
JPH0297744U JPH0297744U (de) 1990-08-03
JPH0737233Y2 true JPH0737233Y2 (ja) 1995-08-23

Family

ID=31208093

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989005053U Expired - Lifetime JPH0737233Y2 (ja) 1989-01-20 1989-01-20 集束イオンビーム装置

Country Status (1)

Country Link
JP (1) JPH0737233Y2 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3354846B2 (ja) * 1997-09-25 2002-12-09 株式会社日立製作所 倍率制御型荷電粒子ビーム照射装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63187542A (ja) * 1987-01-28 1988-08-03 Hitachi Ltd イオンマイクロビ−ム装置

Also Published As

Publication number Publication date
JPH0297744U (de) 1990-08-03

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term