JPH0297744U - - Google Patents

Info

Publication number
JPH0297744U
JPH0297744U JP505389U JP505389U JPH0297744U JP H0297744 U JPH0297744 U JP H0297744U JP 505389 U JP505389 U JP 505389U JP 505389 U JP505389 U JP 505389U JP H0297744 U JPH0297744 U JP H0297744U
Authority
JP
Japan
Prior art keywords
ion beam
ion
beam device
ion gun
gun
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP505389U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0737233Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1989005053U priority Critical patent/JPH0737233Y2/ja
Publication of JPH0297744U publication Critical patent/JPH0297744U/ja
Application granted granted Critical
Publication of JPH0737233Y2 publication Critical patent/JPH0737233Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP1989005053U 1989-01-20 1989-01-20 集束イオンビーム装置 Expired - Lifetime JPH0737233Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1989005053U JPH0737233Y2 (ja) 1989-01-20 1989-01-20 集束イオンビーム装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1989005053U JPH0737233Y2 (ja) 1989-01-20 1989-01-20 集束イオンビーム装置

Publications (2)

Publication Number Publication Date
JPH0297744U true JPH0297744U (de) 1990-08-03
JPH0737233Y2 JPH0737233Y2 (ja) 1995-08-23

Family

ID=31208093

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989005053U Expired - Lifetime JPH0737233Y2 (ja) 1989-01-20 1989-01-20 集束イオンビーム装置

Country Status (1)

Country Link
JP (1) JPH0737233Y2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1196951A (ja) * 1997-09-25 1999-04-09 Hitachi Ltd 倍率制御型荷電粒子ビーム照射装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63187542A (ja) * 1987-01-28 1988-08-03 Hitachi Ltd イオンマイクロビ−ム装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63187542A (ja) * 1987-01-28 1988-08-03 Hitachi Ltd イオンマイクロビ−ム装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1196951A (ja) * 1997-09-25 1999-04-09 Hitachi Ltd 倍率制御型荷電粒子ビーム照射装置

Also Published As

Publication number Publication date
JPH0737233Y2 (ja) 1995-08-23

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term