JPS6296255U - - Google Patents
Info
- Publication number
- JPS6296255U JPS6296255U JP18719885U JP18719885U JPS6296255U JP S6296255 U JPS6296255 U JP S6296255U JP 18719885 U JP18719885 U JP 18719885U JP 18719885 U JP18719885 U JP 18719885U JP S6296255 U JPS6296255 U JP S6296255U
- Authority
- JP
- Japan
- Prior art keywords
- anode
- hole
- ion gun
- cathode
- extracting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012212 insulator Substances 0.000 claims description 2
- 238000010884 ion-beam technique Methods 0.000 claims 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18719885U JPS6296255U (de) | 1985-12-06 | 1985-12-06 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18719885U JPS6296255U (de) | 1985-12-06 | 1985-12-06 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6296255U true JPS6296255U (de) | 1987-06-19 |
Family
ID=31137454
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18719885U Pending JPS6296255U (de) | 1985-12-06 | 1985-12-06 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6296255U (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016051441A1 (ja) * | 2014-09-29 | 2016-04-07 | 株式会社日立製作所 | イオンビーム装置および試料観察方法 |
-
1985
- 1985-12-06 JP JP18719885U patent/JPS6296255U/ja active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016051441A1 (ja) * | 2014-09-29 | 2016-04-07 | 株式会社日立製作所 | イオンビーム装置および試料観察方法 |
JPWO2016051441A1 (ja) * | 2014-09-29 | 2017-08-10 | 株式会社日立製作所 | イオンビーム装置および試料観察方法 |
US10340117B2 (en) | 2014-09-29 | 2019-07-02 | Hitachi, Ltd. | Ion beam device and sample observation method |