JPH07152038A - Forming method of spacer for liquid crystal panel - Google Patents
Forming method of spacer for liquid crystal panelInfo
- Publication number
- JPH07152038A JPH07152038A JP20195694A JP20195694A JPH07152038A JP H07152038 A JPH07152038 A JP H07152038A JP 20195694 A JP20195694 A JP 20195694A JP 20195694 A JP20195694 A JP 20195694A JP H07152038 A JPH07152038 A JP H07152038A
- Authority
- JP
- Japan
- Prior art keywords
- spacer
- liquid crystal
- crystal panel
- forming
- dots
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Liquid Crystal (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、液晶パネルを構成する
２枚の基板間に介在して両基板を支持する液晶パネルス
ペーサーの形成方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of forming a liquid crystal panel spacer for supporting both substrates by interposing them between two substrates constituting a liquid crystal panel.
【０００２】[0002]
【従来技術】液晶パネルは、配向膜、画素電極、薄膜ト
ランジスタ、ＭＩＭ形成素子及びマトリックス配線等を
備える下側基板と配向膜、電極、カラーフィルター等を
備える上側基板とを対向させ、両基板間に液晶を封入し
て構成されている。そして、従来は液晶層の厚さを決定
するために、いずれかの基板上（両方の基板の場合も有
る）に透明で円筒状もしくは粒状の微小なスペーサーを
形成し、このスペーサーを挟み込んで両方の基板を張り
合わせていた。従来のスペーサーの形成方法は、ガラス
ビーズ等を散布する方法が一般的であった。この場合、
スペーサーを均一に散布することが困難で、面内でスペ
ーサー密度の差が生じ、これによる基板間のギャップム
ラが発生し、表示ムラを発生させる原因となっていた。2. Description of the Related Art In a liquid crystal panel, a lower substrate having an alignment film, pixel electrodes, thin film transistors, MIM forming elements, matrix wiring, etc. is opposed to an upper substrate having an alignment film, electrodes, color filters, etc. It is configured by enclosing a liquid crystal. Then, conventionally, in order to determine the thickness of the liquid crystal layer, a transparent, cylindrical or granular minute spacer is formed on one of the substrates (there may be both substrates), and this spacer is sandwiched between both substrates. The substrates were stuck together. As a conventional spacer forming method, a method of spraying glass beads or the like is generally used. in this case,
It is difficult to evenly disperse the spacers, and there is a difference in the spacer density within the plane, which causes unevenness in the gap between the substrates, which causes unevenness in display.
【０００３】特開平３−８９３２０や特開平５−１１２
５６には感光性樹脂を用いたフォトリソ法により所望の
場所にスペーサーを形成する方法も開示されているが、
これらの方法では、感光性樹脂層を基板全面上に設け、
フォトリソ法により基板自身を処理し、スペーサーパタ
ーンを形成するので、その感光樹脂層形成時やフォトリ
ソ工程でスペーサーと接する配向膜にダメージを与える
場合があった。JP-A-3-89320 and JP-A-5-112
56 also discloses a method of forming a spacer at a desired position by a photolithography method using a photosensitive resin,
In these methods, a photosensitive resin layer is provided on the entire surface of the substrate,
Since the substrate itself is processed by the photolithography method to form the spacer pattern, the alignment film in contact with the spacer may be damaged during the formation of the photosensitive resin layer or during the photolithography process.
【０００４】特開平２−２１０３２９号公報には配向膜
を形成した基板にフォトポリマーシートを張り付け、パ
ターン露光、現像によりスペーサードットを形成し、そ
の後、配向処理を行う方法が開示されている。この方法
では、液晶基板上でスペーサードットを形成しているの
で、スペーサードット形成不良は、液晶基板全体を使用
不可にし、液晶基板自身の歩留りを悪化させ、また、ス
ペーサードットの形成後に配向処理を行うので、配向処
理時に、形成したスペーサードットの脱落やスペーサー
ドット周囲の配向膜面に十分な配向処理ができない場合
があった。Japanese Unexamined Patent Publication (Kokai) No. 2-210329 discloses a method in which a photopolymer sheet is attached to a substrate on which an alignment film is formed, spacer dots are formed by pattern exposure and development, and then alignment treatment is performed. In this method, since the spacer dots are formed on the liquid crystal substrate, defective formation of the spacer dots renders the entire liquid crystal substrate unusable, deteriorating the yield of the liquid crystal substrate itself, and also performing alignment treatment after forming the spacer dots. Since this is performed, there are cases in which the formed spacer dots are removed during the alignment treatment, or sufficient alignment treatment cannot be performed on the alignment film surface around the spacer dots.
【０００５】[0005]
【発明が解決しようとする課題】本発明の目的は、簡便
な工程で、 液晶基板の歩留まりを向上させ、 配向膜を侵す恐れが無い、 スペーサーを形成する方法を提供することにある。SUMMARY OF THE INVENTION It is an object of the present invention to provide a method of forming a spacer by a simple process, which improves the yield of a liquid crystal substrate and does not damage the alignment film.
【０００６】[0006]
【課題を解決するための手段】本発明の目的は、少なく
とも一方の基板上に配向処理が施された配向膜を有す
る、液晶パネルを構成する２枚の基板間に介在して、両
基板を支持するスペーサーの形成方法において、 仮支持体上に実質的に厚みが均一な複数の小点を有す
る転写シートの該 小点と該配向膜とを密着させる工
程、 該仮支持体を剥離し、該配向膜上に該小点を転写する
工程、 を含むことを特徴とする液晶パネル用スペーサーの形成
方法により達成された。以下に本発明を詳細に説明す
る。SUMMARY OF THE INVENTION An object of the present invention is to interpose two substrates, which are provided on at least one substrate and which has an alignment film subjected to an alignment treatment, between two substrates constituting a liquid crystal panel. In the method for forming a spacer to be supported, a step of bringing the alignment film into close contact with the dots of a transfer sheet having a plurality of dots having a substantially uniform thickness on the temporary support, peeling off the temporary support, And a step of transferring the small dots onto the alignment film, the method comprising the steps of: forming a spacer for a liquid crystal panel. The present invention will be described in detail below.
【０００７】本発明に用いられる液晶パネルを構成する
基板としては、公知の種々の材料が用いられる。具体的
には、ガラス基板、プラスチック基板等が挙げられる。
本発明に用いられる配向膜としては、公知の種々の材料
が用いられ、具体的にはポリイミド系の材料が挙げられ
る。本発明に用いられる配向処理の方法としては、公知
の種々の方法が用いられる。具体的には、ラビング法等
が挙げられる。Various known materials are used as the substrate constituting the liquid crystal panel used in the present invention. Specific examples include a glass substrate and a plastic substrate.
As the alignment film used in the present invention, various known materials are used, and specifically, a polyimide material can be used. Various known methods can be used as the method of the alignment treatment used in the present invention. Specific examples include a rubbing method.
【０００８】本発明で用いられる、仮支持体上に実質的
に厚みが均一な小点を有する転写シートを作成するに
は、仮支持体上に小点を印刷する印刷法、仮支持体上の
パターン化した導電層上に電着で小点を形成する電着
法、フォトポリマーを用いたフォトリソ法等の、種々の
方法が挙げられる。In order to prepare a transfer sheet having dots having substantially uniform thickness on the temporary support used in the present invention, a printing method of printing dots on the temporary support, a printing method on the temporary support is used. There are various methods such as an electrodeposition method of forming small dots on the patterned conductive layer by electrodeposition and a photolithography method using a photopolymer.
【０００９】これらの中では、仮支持体上に少なくとも
光重合性樹脂層を設けた感光性シートを用いて、フォト
リソ法で作成するのが好ましい。[0009] Among these, it is preferable to use a photosensitive sheet provided with at least a photopolymerizable resin layer on a temporary support to prepare by a photolithography method.
【００１０】この方法では、仮支持体上に実質的に厚み
が均一な小点を有する転写シートは仮支持体上に少なく
とも光重合性樹脂層を設けた基本構成を有する感光性シ
ートを用いて作成される。感光性シート材料に使用する
仮支持体としては、可撓性のあるプラスチックフィルム
を使用することができ、中では、厚さ２０〜２００μｍ
のポリエチレンテレフタレートフィルムが特に好まし
い。また、仮支持体剥離時の静電気防止のために、この
仮支持体には帯電防止処理を施すことが好ましく、その
方法としては特願平３−１５３２２７号明細書およびそ
の中で引用されている公報に記載された、種々の材料を
使用することができる。In this method, a transfer sheet having small dots having a substantially uniform thickness on a temporary support is prepared by using a photosensitive sheet having a basic structure in which at least a photopolymerizable resin layer is provided on the temporary support. Created. As the temporary support used for the photosensitive sheet material, a flexible plastic film can be used, in which the thickness is 20 to 200 μm.
Particularly preferred is the polyethylene terephthalate film. In order to prevent static electricity when the temporary support is peeled off, this temporary support is preferably subjected to an antistatic treatment, and the method is cited in Japanese Patent Application No. 3-153227 and its description. Various materials described in the publication can be used.
【００１１】光重合性樹脂層としては特公昭５６−４０
８２４号公報、特願平２−２３５３６２号明細書および
その中で引用されている公報に記載された、種々の光重
合性組成物を用いることができる。その光重合性樹脂層
の厚みは最終的に所望のスペーサーの厚みと同じ様にす
る。好ましくは０．５〜１５μｍ、特に好ましくは２〜
１０μｍである。これらの中にはスペーサーによる光散
乱を防止する目的で、必要に応じて顔料等の着色剤を少
なくとも１種類以上添加してもよい。それらとしては、
特願平３−１５３２２７号明細書およびその中で引用さ
れている公報に記載された、種々の着色剤が用いられ
る。特に光散乱防止の為には色相的に黒色となる、ある
いは、黒色に近い着色剤が好ましい。それらとしては、
カーボンブラック等の顔料や特願平５−１１０４８７号
明細書に記載の複数の顔料混合等が挙げられる。それら
は可視光領域の光学濃度が１〜３になるように添加する
のが好ましい。As the photopolymerizable resin layer, Japanese Patent Publication No. 56-40
Various photopolymerizable compositions described in Japanese Patent Application No. 824, Japanese Patent Application No. 2-235362 and the publications cited therein can be used. The thickness of the photopolymerizable resin layer is finally set to be the same as the thickness of the desired spacer. Preferably 0.5 to 15 μm, particularly preferably 2 to
It is 10 μm. In order to prevent light scattering by the spacers, at least one kind of coloring agent such as pigment may be added to these. As for them,
Various coloring agents described in Japanese Patent Application No. 3-153227 and the publications cited therein are used. In particular, in order to prevent light scattering, a colorant having a hue of black or close to black is preferable. As for them,
Examples thereof include pigments such as carbon black and a mixture of a plurality of pigments described in Japanese Patent Application No. 5-110487. It is preferable to add them so that the optical density in the visible light region is 1 to 3.
【００１２】さらに、光重合感度の低下防止の目的で光
重合性樹脂層の上に特公昭５６−４０８２４号公報中に
記載されている酸素を遮断する水溶性樹脂層を設けた
り、保護、および酸素遮断の目的で厚さ２〜１００μｍ
のカバーフィルムを光重合性樹脂層上や水溶性樹脂層上
に設けてもよい。また、仮支持体と光重合性樹脂層の間
に下塗り層を設けてもよい。Further, for the purpose of preventing a decrease in photopolymerization sensitivity, a water-soluble resin layer for blocking oxygen, which is described in Japanese Patent Publication No. 56-40824, is provided on the photopolymerizable resin layer, and protection and 2-100 μm thick for the purpose of blocking oxygen
The cover film may be provided on the photopolymerizable resin layer or the water-soluble resin layer. An undercoat layer may be provided between the temporary support and the photopolymerizable resin layer.
【００１３】本発明のパターン露光、現像は公知の方
法、たとえば特願平３−１５３２２７号明細書およびそ
の中で引用されている公報に記載された、種々の方法が
用いられる。For the pattern exposure and development of the present invention, known methods such as various methods described in Japanese Patent Application No. 3-153227 and the publications cited therein can be used.
【００１４】上述の様な感光性シートを用い、パターン
露光、現像により仮支持体上に実質的に厚みが均一な小
点を有する転写シートを形成する。その小点の形状は、
支持体に平行な任意の面における断面積が約０．８〜７
００μｍ2の範囲にある柱状である。断面積が約０．８
未満μｍ2あるいは７００μｍ2を越えると、表示品質が
低下する。Using the photosensitive sheet as described above, a transfer sheet having small dots having a substantially uniform thickness is formed on the temporary support by pattern exposure and development. The shape of the dot is
The cross-sectional area in any plane parallel to the support is about 0.8 to 7
The columnar shape is in the range of 00 μm 2 . Cross section is about 0.8
Exceeding the less [mu] m 2 or 700 .mu.m 2, the display quality is degraded.
【００１５】実技的には、直径約１〜３０μｍの円柱状
あるいは一辺が約０．９〜２６μｍの角柱、断面積が約
０．８〜７００μｍ2である楕円等、対象性の高い断面
を有する柱を、均一な間隔で設けることが好ましい。Practically, it has a highly symmetric cross section such as a column having a diameter of about 1 to 30 μm, a prism having a side of about 0.9 to 26 μm, and an ellipse having a cross section of about 0.8 to 700 μm 2. It is preferable to provide the pillars at even intervals.
【００１６】小点の数は、小点をＲ，Ｇ，Ｂの画素の上
に設ける場合には、１画素当たりの小点が５個以下とな
るようにパターンを作成することが好ましい。５個を越
えると、表示品質の低下をもたらす。また、ブラックマ
トリクス（ＢＭ）部のみに小点を形成する場合は、全小
点の総和面積がＢＭ部面積を越えない範囲で小点の数を
決定することが好ましい。As for the number of small dots, when the small dots are provided on the R, G, and B pixels, it is preferable to form the pattern so that the number of small dots is 5 or less per pixel. When the number exceeds 5, the display quality is deteriorated. Further, when the small dots are formed only in the black matrix (BM) part, it is preferable to determine the number of small dots within a range in which the total area of all the small dots does not exceed the area of the BM part.
【００１７】その仮支持体の該小点形成面と配向膜、画
素電極、薄膜トランジスタ、ＭＩＭ形成素子及びマトリ
ックス配線等を備える下側基板や配向膜、電極、カラー
フィルター等を備える上側基板等と張り合わせ、仮支持
体のみを剥離することにより該小点を該基板上に転写
し、この小点が後にスペーサーとして機能する。従っ
て、従来の方法の様にスペーサー密度の面内差も発生せ
ず、また、該基板をフォトリソ工程処理することがない
ので、配向膜等にダメージを与えることも無い。仮支持
体と基板を張り合わせる際に位置合わせを行うことによ
り、ＢＭ部のみに小点を形成することも可能である。さ
らに、本発明の該小点転写時に仮支持体上の該小点表面
と該基板とは接触するが、仮支持体の該小点非形成部は
該小点部の厚み分だけ該基板表面から離れ、該基板表面
と接触しない。従って、転写工程により該基板上の配向
膜等にダメージを与えることが無い。更に、仮支持体上
での該小点の形成状態を検査し、良品だけを使用するこ
とにより液晶基板のロスを最低限に抑えられ、歩留りが
向上する。以下、実施例に基づき、本発明を更に詳細に
説明するが、本発明は、これらに限定されるものではな
い。The small dot forming surface of the temporary support is bonded to a lower substrate provided with an alignment film, a pixel electrode, a thin film transistor, a MIM forming element, a matrix wiring and the like, and an upper substrate provided with an alignment film, an electrode, a color filter and the like. , The small dots are transferred onto the substrate by peeling off only the temporary support, and these small dots later function as spacers. Therefore, unlike the conventional method, no in-plane difference in spacer density occurs, and since the substrate is not subjected to the photolithography process, the alignment film or the like is not damaged. It is also possible to form the small dots only in the BM portion by performing the alignment when the temporary support and the substrate are attached to each other. Furthermore, the small dot surface on the temporary support is brought into contact with the substrate during the small dot transfer of the present invention, but the small dot non-formation portion of the temporary support is the surface of the substrate by the thickness of the small dot part. Away from the substrate surface and does not contact the substrate surface. Therefore, the transfer process does not damage the alignment film or the like on the substrate. Further, by inspecting the formation state of the small dots on the temporary support and using only good products, the loss of the liquid crystal substrate can be suppressed to the minimum and the yield is improved. Hereinafter, the present invention will be described in more detail based on Examples, but the present invention is not limited thereto.
【００１８】[0018]
実施例１ 特開平３−８９３２０号公報を参考にして、ゲート電
極、画素電極、ソース電極、絶縁膜、ドレイン電極、パ
ッシベーション層、および配向膜を形成したガラス基板
を作成した。その後、上記配向膜にラビングによる配向
処理を行った。Example 1 A glass substrate on which a gate electrode, a pixel electrode, a source electrode, an insulating film, a drain electrode, a passivation layer, and an alignment film were formed was prepared with reference to JP-A-3-89320. Then, the alignment film was subjected to an alignment treatment by rubbing.
【００１９】一方、下記構成の感光性シート材料を作成
した。７５μｍのポリエチレンテレフタレートフィルム
上に、乾燥膜厚７μｍになる様に下記処方１液を塗布
し、光重合性樹脂層を形成した。On the other hand, a photosensitive sheet material having the following constitution was prepared. The following formulation 1 solution was applied onto a 75 μm polyethylene terephthalate film so that the dry film thickness was 7 μm, to form a photopolymerizable resin layer.
【００２０】 処方１ ベンジルメタクリレート／メタクリル酸共重合体（モル比７３／２７、 粘度＝０．１２（メチルエチルケトン中、２５℃）） ６０ｇ ペンタエリスルトールテトラアクリレート ５０ｇ ミヒラーズケトン ２．４ｇ ロフィンダイマー ２．５ｇ メチルセロソルブアセテート ５６０ｇ メチルエチルケトン ２８０ｇFormulation 1 Benzyl methacrylate / methacrylic acid copolymer (molar ratio 73/27, viscosity = 0.12 (in methyl ethyl ketone, 25 ° C.)) 60 g Pentaerythritol tetraacrylate 50 g Michler's ketone 2.4 g Lophine dimer 2.5 g Methyl cellosolve acetate 560g Methyl ethyl ketone 280g
【００２１】更にその上に乾燥膜厚１．５μｍになるよ
うにポリビニルアルコール（ＰＶＡ２０５：クラレ
（株）製）水溶液を塗布し、酸素遮断層を形成した。Further, an aqueous solution of polyvinyl alcohol (PVA205: manufactured by Kuraray Co., Ltd.) was applied thereon to form a dry film thickness of 1.5 μm to form an oxygen barrier layer.
【００２２】この感光性シートを用いて以下の様にスペ
ーサーを作成した。上記感光性シートのポリビニルアル
コール層から直径１０μｍ、ピッチ５０μｍの円ドット
状の光透過部を有するマスクを介して露光し、その後ｐ
Ｈ１０．８のアルカリ水溶液で現像して未露光部を除去
した。その結果、仮支持体状に直径１０μｍ、ピッチ５
０μｍの円柱ドット状の厚さ７μｍのパターンが形成さ
れた。その後、上記下側基板の配向膜上に形成されたド
ットが接するように大成ラミネータ社製ラミネータ（Ｖ
Ｐ−ＩＩ型）を用い、加熱温度１１０℃、ローラー圧力
２ｋｇ／ｃｍ、搬送速度０．３ｍ／分で張り合わせた。
次いで仮支持体を剥離し、ドットパターンのみを下側基
板上に転写した。このようにして、下側基板の配向膜上
に厚さ７μｍ、直径１０μｍ、ピッチ５０μｍの円柱ド
ット状スペーサーを形成した。この様に作成されたスペ
ーサーは間隔の精度が高く、強度も十分であり、配向膜
へのダメージも無く、良好な物であった。Using this photosensitive sheet, spacers were prepared as follows. The polyvinyl alcohol layer of the above-mentioned photosensitive sheet is exposed through a mask having circular dot-shaped light transmitting portions having a diameter of 10 μm and a pitch of 50 μm, and then exposed to p.
The unexposed portion was removed by developing with an alkaline aqueous solution of H10.8. As a result, the temporary support had a diameter of 10 μm and a pitch of 5
A 0 μm cylindrical dot-shaped pattern having a thickness of 7 μm was formed. After that, the laminator (V, manufactured by Taisei Laminator Co., Ltd.) so that the dots formed on the alignment film of the lower substrate contact each other.
(P-II type), and the lamination was performed at a heating temperature of 110 ° C., a roller pressure of 2 kg / cm, and a conveying speed of 0.3 m / min.
Then, the temporary support was peeled off, and only the dot pattern was transferred onto the lower substrate. Thus, cylindrical dot-shaped spacers having a thickness of 7 μm, a diameter of 10 μm and a pitch of 50 μm were formed on the alignment film of the lower substrate. The spacers thus produced were high in accuracy of spacing, sufficient in strength, and free from damage to the alignment film, and were good.
【００２３】実施例２ 実施例１のポリビニルアルコールの酸素遮断層を形成せ
ず、光重合性樹脂層上に厚さ１２μｍのポリプロピレン
フィルムを積層した感光性シートを用い、露光は該ポリ
プロピレンフィルム側から実施例１と同様に行い、次い
でポリプロピレンフィルムを剥離し、実施例１と同様に
現像し、仮支持体状に直径１０μｍ、ピッチ５０μｍの
ドット状の厚さ７μｍのパターンが形成された。その
後、実施例１と同様な工程で液晶基板上にスペーサーを
形成した。得られたスペーサーは実施例１と同様に間隔
の精度が高く、強度も十分であり、配向膜へのダメージ
も無く、良好な物であった。Example 2 A photosensitive sheet prepared by laminating a polypropylene film having a thickness of 12 μm on a photopolymerizable resin layer without forming an oxygen barrier layer of polyvinyl alcohol of Example 1 was used, and exposure was performed from the polypropylene film side. The same procedure as in Example 1 was carried out, the polypropylene film was then peeled off, and development was carried out in the same manner as in Example 1 to form a dot-shaped pattern having a diameter of 10 μm and a pitch of 50 μm and a thickness of 7 μm on the temporary support. After that, spacers were formed on the liquid crystal substrate in the same process as in Example 1. The obtained spacers were high in accuracy of spacing, sufficient in strength, and free from damage to the alignment film as in Example 1, and were good.
【００２４】実施例３ 実施例２のポリプロピレンフィルムを剥離してから露
光、現像を行った以外は実施例２と同様に液晶基板上に
スペーサーを形成した。この場合、光重合性樹脂層の感
度が低下しているので露光時に実施例２に較べ、１０倍
の露光エネルギーを与えた。得られたスペーサーは実施
例１と同様に間隔の精度が高く、強度も十分であり、配
向膜へのダメージも無く、良好な物であった。Example 3 A spacer was formed on a liquid crystal substrate in the same manner as in Example 2 except that the polypropylene film of Example 2 was peeled off, and then exposed and developed. In this case, since the sensitivity of the photopolymerizable resin layer was lowered, exposure energy was applied 10 times as high as that in Example 2 during exposure. The obtained spacers were high in accuracy of spacing, sufficient in strength, and free from damage to the alignment film as in Example 1, and were good.
【００２５】実施例４ 実施例１の処方１の代りに以下の処方２の塗布液を用い
た以外は実施例１と同様にして液晶基板上にスペーサー
を作成した。Example 4 A spacer was formed on a liquid crystal substrate in the same manner as in Example 1 except that the coating solution of the following formulation 2 was used instead of the formulation 1 of the example 1.
【００２６】 処方２ ベンジルメタクリレート／メタクリル酸共重合体（モル比７３／２７、 粘度＝０．１２（メチルエチルケトン中、２５℃）） ６０ｇ ペンタエリスルトールテトラアクリレート ５０ｇ ミヒラーズケトン ２．４ｇ ロフィンダイマー ２．５ｇ カーボンブラック １０．０ｇ メチルセロソルブアセテート ５６０ｇ メチルエチルケトン ２８０ｇFormulation 2 Benzyl methacrylate / methacrylic acid copolymer (molar ratio 73/27, viscosity = 0.12 (in methyl ethyl ketone, 25 ° C.)) 60 g pentaerythritol tetraacrylate 50 g Michler's ketone 2.4 g Lophine dimer 2.5 g Carbon black 10.0 g Methyl cellosolve acetate 560 g Methyl ethyl ketone 280 g
【００２７】得られた黒色（光学濃度２．５）のスペー
サーは実施例１と同様に間隔の精度が高く、強度も十分
であり、配向膜へのダメージも無く、良好な物であっ
た。The black spacer (optical density 2.5) obtained was a good one with high accuracy of spacing, sufficient strength and no damage to the alignment film as in Example 1.
【００２８】実施例５ 実施例１の処方１の代わりに、以下の処方３の塗布液を
用いた以外は実施例１と同様に液晶基板上にスペーサー
を作成した。 処方３ ベンジルメタクリレート／メタクリル酸共重合体（モル比７３／２７、 粘度＝０．１２（メチルエチルケトン中、２５℃）） ６０ｇ ペンタエリスルトールテトラアクリレート ５０ｇ ミヒラーズケトン ２．４ｇ ロフィンダイマー ２．５ｇ ピグメントレッド１７７ ２．０ｇ ピグメントブルー１５：６ １．５ｇ ピグメントイエロー１３９ １．５ｇ ピグメントバイオレット２３ ０．５ｇ カーボンブラック １．０ｇ メチルセロソルブアセテート ５６０ｇ メチルエチルケトン ２８０ｇ 得られた黒色スペーサーは実施例１と同様に間隔の精度
が高く、強度も十分であり、配向膜へのダメージも無
く、良好なものであった。Example 5 A spacer was formed on a liquid crystal substrate in the same manner as in Example 1 except that the following coating solution of Formulation 3 was used instead of Formulation 1 of Example 1. Formulation 3 Benzyl methacrylate / methacrylic acid copolymer (molar ratio 73/27, viscosity = 0.12 (in methyl ethyl ketone, 25 ° C.)) 60 g pentaerythritol tetraacrylate 50 g Michler's ketone 2.4 g Lophine dimer 2.5 g Pigment Red 177 2.0 g Pigment Blue 15: 6 1.5 g Pigment Yellow 139 1.5 g Pigment Violet 23 0.5 g Carbon Black 1.0 g Methyl Cellosolve Acetate 560 g Methyl Ethyl Ketone 280 g The black spacers obtained have the same precision as in Example 1. The film was high, had sufficient strength, and had no damage to the alignment film, and was good.
【００２９】[0029]
【発明の効果】本発明によれば、スペーサーが簡便な方
法で形成可能であり、配向膜等にダメージを与えること
も無い。また、仮支持体上にスペーサーを形成すること
により、その段階で良品のみを選択することができ、液
晶パネルの歩留りが向上する。According to the present invention, the spacer can be formed by a simple method and does not damage the alignment film or the like. Further, by forming the spacer on the temporary support, only non-defective products can be selected at that stage, and the yield of the liquid crystal panel is improved.
Claims (6)
された配向膜を有する、液晶パネルを構成する２枚の基
板間に介在して、両基板を支持するスペーサーの形成方
法において、 仮支持体上に実質的に厚みが均一な複数の小点を有す
る転写シートの該小点と該配向膜とを密着させる工程、 該仮支持体を剥離し、該配向膜上に該小点を転写する
工程、 を含むことを特徴とする液晶パネル用スペーサーの形成
方法。1. A method of forming a spacer for supporting both substrates by interposing them between two substrates constituting a liquid crystal panel, which has an alignment film subjected to an alignment treatment on at least one of the substrates. A step of bringing the alignment film into close contact with the dots of a transfer sheet having a plurality of dots having a substantially uniform thickness on the body, peeling the temporary support, and transferring the dots to the alignment film And a step of forming a spacer for a liquid crystal panel.
的に厚みが均一な小点を有する転写シートが、仮支持体
上に少なくとも光重合性樹脂層を設けた感光性シートを
用い、 該感光性シートにパターン露光する工程、 現像により未露光部を除去し、仮支持体上に小点のパ
ターンを形成する工程、により形成されたことを特徴と
する液晶パネル用スペーサーの形成方法。2. The transfer sheet according to claim 1, wherein a transfer sheet having small dots having a substantially uniform thickness on the temporary support is a photosensitive sheet provided with at least a photopolymerizable resin layer on the temporary support. A method for forming a spacer for a liquid crystal panel, comprising: a step of pattern-exposing the photosensitive sheet; a step of removing an unexposed portion by development to form a pattern of small dots on a temporary support. .
５〜１５μｍ、支持体に平行な任意の面における断面積
が約０．８〜７００μｍ2の範囲にある柱状であること
を特徴とする液晶パネル用スペーサーの形成方法。3. The small dot according to claim 1, wherein the small point has a thickness of 0.
A method for forming a spacer for a liquid crystal panel, characterized in that the spacer has a columnar shape having a cross-sectional area of 5 to 15 μm and an arbitrary plane parallel to the support in a range of about 0.8 to 700 μm 2 .
厚みが０．５〜１５μｍであることを特徴とする液晶パ
ネル用スペーサーの形成方法。4. The method for forming a spacer for a liquid crystal panel according to claim 2, wherein the thickness of the photopolymerizable resin layer is 0.5 to 15 μm.
に遮光性を有しており、その領域の光学濃度が１〜３で
あることを特徴とする液晶パネル用スペーサーの形成方
法。5. The method for forming a spacer for a liquid crystal panel according to claim 1, wherein the dot has a light-shielding property in a visible light region and the optical density of the region is 1 to 3.
可視光領域の光学濃度が１〜３であることを特徴とする
液晶パネル用スペーサーの形成方法。6. The method for forming a spacer for a liquid crystal panel according to claim 2, wherein the optical density of the visible light region of the photopolymerizable resin layer is 1 to 3.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20195694A JP3685821B2 (en) | 1993-10-07 | 1994-08-26 | Method for forming spacer for liquid crystal panel |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25177793 | 1993-10-07 | ||
| JP5-251777 | 1993-10-07 | ||
| JP20195694A JP3685821B2 (en) | 1993-10-07 | 1994-08-26 | Method for forming spacer for liquid crystal panel |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH07152038A true JPH07152038A (en) | 1995-06-16 |
| JP3685821B2 JP3685821B2 (en) | 2005-08-24 |
Family
ID=26513099
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20195694A Expired - Fee Related JP3685821B2 (en) | 1993-10-07 | 1994-08-26 | Method for forming spacer for liquid crystal panel |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3685821B2 (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997050016A1 (en) * | 1996-06-27 | 1997-12-31 | Minnesota Mining And Manufacturing Company | Process and materials for imagewise placement of uniform spacers in flat panel displays |
| EP0827008A2 (en) * | 1996-08-31 | 1998-03-04 | Samsung Display Devices Co., Ltd. | A flat panel display device and a manufacturing method therefor |
| KR19980017847A (en) * | 1996-08-31 | 1998-06-05 | 손욱 | Color liquid crystal display panel and its manufacturing method |
| KR19980017846A (en) * | 1996-08-31 | 1998-06-05 | 손욱 | LCD panel and manufacturing method thereof |
| KR20030003651A (en) * | 2001-06-29 | 2003-01-10 | 데이타 스토리지 인스티튜트 | Flat panel display and method of manufacture |
| JP2007213104A (en) * | 2007-05-28 | 2007-08-23 | Sony Corp | Liquid crystal display device and method for manufacturing liquid crystal display device |
| JP2016177190A (en) * | 2015-03-20 | 2016-10-06 | 三菱化学株式会社 | Photosensitive coloring composition for forming colored spacer, cured product, colored spacer, and image display device |
-
1994
- 1994-08-26 JP JP20195694A patent/JP3685821B2/en not_active Expired - Fee Related
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997050016A1 (en) * | 1996-06-27 | 1997-12-31 | Minnesota Mining And Manufacturing Company | Process and materials for imagewise placement of uniform spacers in flat panel displays |
| US5710097A (en) * | 1996-06-27 | 1998-01-20 | Minnesota Mining And Manufacturing Company | Process and materials for imagewise placement of uniform spacers in flat panel displays |
| US5976698A (en) * | 1996-06-27 | 1999-11-02 | 3M Innovative Properties Company | Process and materials for imagewise placement of uniform spacers in flat panel displays |
| EP0827008A2 (en) * | 1996-08-31 | 1998-03-04 | Samsung Display Devices Co., Ltd. | A flat panel display device and a manufacturing method therefor |
| KR19980017847A (en) * | 1996-08-31 | 1998-06-05 | 손욱 | Color liquid crystal display panel and its manufacturing method |
| KR19980017846A (en) * | 1996-08-31 | 1998-06-05 | 손욱 | LCD panel and manufacturing method thereof |
| EP0827008A3 (en) * | 1996-08-31 | 1998-11-18 | Samsung Display Devices Co., Ltd. | A flat panel display device and a manufacturing method therefor |
| US6124918A (en) * | 1996-08-31 | 2000-09-26 | Samsung Display Devices, Co., Ltd. | Method of manufacturing plasma display panel |
| KR20030003651A (en) * | 2001-06-29 | 2003-01-10 | 데이타 스토리지 인스티튜트 | Flat panel display and method of manufacture |
| JP2007213104A (en) * | 2007-05-28 | 2007-08-23 | Sony Corp | Liquid crystal display device and method for manufacturing liquid crystal display device |
| JP4655064B2 (en) * | 2007-05-28 | 2011-03-23 | ソニー株式会社 | Manufacturing method of liquid crystal display device |
| JP2016177190A (en) * | 2015-03-20 | 2016-10-06 | 三菱化学株式会社 | Photosensitive coloring composition for forming colored spacer, cured product, colored spacer, and image display device |
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| Publication number | Publication date |
|---|---|
| JP3685821B2 (en) | 2005-08-24 |
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