JP2001183513A - Color filter, its manufacturing method, and color liquid crystal display device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a high quality color filter with improved aligning in spacer formation and improved controlling of spacer thickness, its manufacturing method and a color liquid crystal display device utilizing the same. SOLUTION: A protective layer and the spacer are composed of the same negative photosensitive resin. The manufacturing method comprises a step to form a color filter pattern of plural colors with a specified pattern on a substrate, a step to coat it with the first layer of the negative photosensitive resin and heat it to form the transparent protective layer to cover the color filter pattern, a step to expose the full surface of the negative photosensitive resin layer, a step to coat it with the second layer of the negative photosensitive resin and heat it to form post spacers, a step to expose the second layer of the negative photosensitive resin via a photomask with the desired pattern, a step to form the desired pattern to form the post spacer by developing the second layer of the negative photosensitive resin and a heating step to harden the first and second layers of the photosensitive resin.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter used in a color liquid crystal display device, and more particularly to a liquid crystal layer provided with a columnar spacer on the surface of a color filter substrate for the purpose of defining a gap between the substrates. Color filter having improved display quality by increasing the control accuracy of the gap between the color filters, a method of manufacturing the same, and a color liquid crystal display device using the same

[0002]

2. Description of the Related Art In recent years, color liquid crystal display devices have attracted attention as flat panel displays. One of them is
Black matrix (BM) and multiple colors (usually,
A color filter having a coloring layer composed of red (R), green (G), and blue (B) (three primary colors);
There is a TFT type color liquid crystal display device in which a semiconductor drive element array substrate having a semiconductor drive element such as an element is provided with a predetermined gap and a liquid crystal is injected into the gap to form a liquid crystal layer.

In such a color liquid crystal display device, the gap between the two substrates is the thickness of the liquid crystal layer (cell gap). If the cell gap is uneven, luminance unevenness and color unevenness occur in the color liquid crystal display device. Since the display quality is significantly impaired, it is desirable that the thickness of the liquid crystal layer is as uniform as possible in the plane of the substrate.

Conventionally, in a liquid crystal display device, spherical beads made of glass or plastic having a predetermined particle size are dispersed on a substrate, and then the substrates are adhered to each other. Has been stipulated.

Recently, attention has been paid to a horizontal electric field type color liquid crystal display device in which the direction of an electric field applied to the liquid crystal is parallel to the plane of the substrate because the viewing angle (viewing angle) of a screen can be widened. Although the viewing angle of this method is wider than that of a conventional vertical electric field type display device, it has a disadvantage that the aperture ratio of a pixel is reduced due to a different electrode structure and a large number of light-shielding portions. For this reason, the influence of the beads on the display characteristics is increasing.

[0006]

The above-described method of controlling the gap between the color filter using beads and the semiconductor drive element array substrate has the following problems.

When beads are used as spacers, if they are uniformly dispersed on the substrate surface and the dispersion density is not appropriate,
A uniform gap is not formed over the entire surface of the color liquid crystal display device.

In general, when the amount of dispersion (density) of beads is increased, the dispersion of the gap can be reduced, but the number of spacers existing on the display pixel portion also increases. As a result, the beads become foreign matters of the liquid crystal material in the display region, and the alignment of the liquid crystal molecules is disturbed, thereby causing a problem that the display performance is deteriorated.

Further, since beads existing in the pixel region transmit light when black display is performed, there is also a problem that the beads become luminescent spots to significantly lower the contrast ratio.

[0010] When the amount of dispersion of beads is reduced, the variation of the gap becomes large, and there is a problem that the gap cannot be controlled with high accuracy.

Particularly, in a color liquid crystal display device in a liquid crystal mode driven by a lateral electric field, if the gap unevenness becomes large, color unevenness and luminance unevenness occur, so that good display quality cannot be obtained, and precise gap control is required. ing.

In recent years, the size of color liquid crystal display devices has been increased, and it has become difficult to develop a technology for uniform dispersion on a substrate surface and to develop a dispersion device. Therefore, simple cell gap regulation means is required.

As means for solving the above problems,
There has been proposed a liquid crystal display device in which a gap is controlled by forming a spacer on a substrate instead of dispersing beads (Japanese Patent Laid-Open No. 10-48636). In the present proposal, when a color filter pattern is formed from a photosensitive R, G, B colored resist material in a pixel region on a color filter substrate, three colors are laminated at predetermined positions in a black matrix region and the thickness is smaller than the filter pattern. A spacer pattern having a shape is formed.

At this time, in order to laminate three colors, it is necessary to align the pattern for each color. In the future, the liquid crystal display device is required to be increased in size, and it is extremely difficult to increase the positioning accuracy on a large-area substrate, which is disadvantageous in terms of the cost of the exposure apparatus.

A color filter in which spacers are similarly formed has been proposed (JP-A-10-282333).
issue). In this proposal, after a filter pattern is formed on a color filter substrate, a protective layer and a spacer of the filter are formed by development. That is, after the photosensitive resin layer is formed, exposure and development are performed to develop a film thickness corresponding to the thickness of the spacer, development is stopped in the middle of the photosensitive resin layer, and the protective layer and the spacer are formed. is there. In this method, it is necessary to stop the development in the middle of the photosensitive resin layer, so that the margin of the development process time is narrow, and it can be said that it is very difficult to control the spacer thickness.

Accordingly, the present invention provides a transparent protective layer for covering a color filter pattern and flattening the surface.
Provided is a high-quality color filter with improved alignment of spacer formation and control of spacer thickness in a color filter substrate having columnar spacers formed on transparent protection, a method of manufacturing the same, and a color liquid crystal display device using the same. Is to do.

[0017]

The object of the present invention is to provide a protective layer and a spacer which are made of the same negative photosensitive resin, cover a color filter pattern and flatten the surface, and a transparent protective layer. This is achieved by a color filter substrate having columnar spacers formed on the protection.

Another object of the present invention is to form a color filter pattern in order to easily control the thickness of the columnar spacer, and to form a first negative layer in order to form a transparent protective layer covering the color filter pattern. A step of applying and heating a negative photosensitive resin, a step of exposing the entire surface of the negative photosensitive resin layer, and a step of applying and heating a second layer of negative photosensitive resin to form a columnar spacer. Exposing the negative photosensitive resin of the second layer through a photomask having a desired pattern, and developing the negative photosensitive resin of the second layer to form a desired pattern to be a columnar spacer And a heating step for curing one or two layers of the photosensitive resin.

[0019]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The preferred embodiments of the present invention will be described below.

FIG. 1 is a sectional view showing an example of an embodiment of the color filter of the present invention.

The color filter shown in FIG. 1 shows an embodiment suitable for a color liquid crystal display device particularly in a horizontal electric field driving mode.

The color filter of the present invention comprises a substrate 1 and a black matrix 2 and a filter pattern of blue 3, green 4, and red 5 formed on the substrate 1, and is transparently protected so as to cover the black matrix and the filter pattern. Layer 6 is formed. Further, a transparent columnar spacer 7 is formed at a predetermined portion of the black matrix.

As a substrate constituting the above color filter, a transparent risotto material such as quartz glass, Pyrex glass, synthetic quartz plate or the like which is not portable, or a rubbing property such as a transparent resin film or an optical resin plate is used. A transparent flexible material having the same can be used. In particular, alkali-free glass containing no alkali component in the glass is suitable for a color filter for a color liquid crystal display device using an active matrix system.

The black matrix is provided between the display pixel portions and outside the display area. The black matrix is formed by forming a metal thin film of chromium or the like by a sputtering method, a vacuum deposition method, or the like, and then forming a thin film of the thin film, and containing light-shielding particles such as light-shielding particles of carbon fine particles and metal oxides. The photosensitive resin layer may be formed, and the photosensitive resin layer may be formed by patterning. In particular, the method of forming a black matrix with a photosensitive resin layer that can be developed with an aqueous alkali solution is excellent in that only an aqueous alkali solution that is easy to treat is used and no harmful chrome waste liquid is discharged.

The filter pattern, in which blue 3, green 4, and red 5 are arranged in a pattern, can be formed by a pigment dispersion method using a photosensitive resin containing a desired coloring material. It can be formed by a known method such as a method, an electrodeposition method, and a transfer method.

The transparent protective layer 6 flattens the surface of the color filter to suppress the variation in the height of the spacers, and covers the entire filter pattern to form an ionic impurity, particularly an ionic impurity contained in the pigment. To the liquid crystal layer. In particular, a transparent protective layer is indispensable for a color filter of a horizontal electric field liquid crystal mode.

The thickness of the transparent protective layer can be set in consideration of the light transmittance of the material to be used and the flatness of the surface of the color filter, and is usually 2.0 μm or less.

The columnar spacer 7 uses a color filter as a TFT.
This is to define the gap between the liquid crystal layers when they are bonded to the array substrate.

The columnar spacer is 1-5 times thicker than the transparent protective layer.
It has a certain height so as to protrude in the range of about μm, and the protruding amount can be appropriately set from the thickness and the like required for the liquid crystal layer of the color liquid crystal display device.

The formation density of the spacer can be appropriately set in consideration of the thickness unevenness of the liquid crystal layer, the aperture ratio, the shape and material of the spacer, and the like.

For example, even a single set of blue, green and red patterns has a necessary and sufficient spacer function.

Although the spacer has a cylindrical shape in the illustrated example, it is not limited to this. In particular, a truncated-cone shape has a small deformation with respect to a load applied when a cell gap is formed, and can be said to be a suitable shape.

The negative photosensitive resin used in the present invention will be described.

The negative photosensitive resin is mainly composed of an acrylic resin having transparency in a wavelength region of 400 nm or more.
Preferable examples include a resin having an epoxy-based photosensitive group or a component soluble in an aqueous alkali solution, such as light transmittance required for a transparent protective layer, mechanical strength required for a spacer, and the like. The photosensitive agent contained in the photosensitive resin includes a DeepUV photosensitive agent having a maximum photosensitive region at a wavelength of 300 nm or less, and a wavelength of 300 nm to 400 n.
It is composed of two types of UV photosensitive agents having the maximum photosensitive area in m.

Preferred examples of the Deep UV photosensitive agent include an acid generator, especially an onium salt or tri (methanesulfonyl-oxy) benzene.

The preferred compounding ratio of the Deep UV photosensitive agent is as follows:
The amount is preferably 0.1 to 10 parts by weight, more preferably 0.3 to 5 parts by weight, based on 100 parts by weight of the photosensitive resin composition.

FIG. 2 is a sectional view showing another example of the embodiment of the color filter of the present invention.

The color filter shown in FIG. 2 shows a mode suitable for a color liquid crystal display device other than in the horizontal electric field driving mode. In the present invention, the transparent electrode 8 (ITO electrode) is formed on the transparent protective layer except for the portion where the columnar spacer is formed.

FIG. 3 is a sectional view showing another example of the embodiment of the color filter of the present invention.

The color filter shown in FIG. 3 shows a mode suitable for a color liquid crystal display device other than in the horizontal electric field driving mode. The ITO electrode 9 is formed except for the top of the columnar spacer.

After forming an alignment layer on the color filter of the present invention and subjecting it to an alignment treatment, it is bonded to a TFT array substrate, and a gap is defined between the color filter and the TFT array substrate by the height of the spacer. Can be.

Next, a method of manufacturing a color filter substrate according to the present invention will be described with reference to the process chart of FIG.

A primary color filter pattern of black matrix 2, blue 3, green 4, and red 5 is formed in a predetermined pattern on the substrate 1 (a).

Next, a first layer of negative photosensitive resin 6 for covering the color filter pattern is applied,
(B).

Next, the entire surface of the negative photosensitive resin layer 6 is
pUV exposure and then a second layer of negative photosensitive resin 10
And heating in the range of 80-120 ° C (c).

Next, the second layer of negative photosensitive resin is exposed to UV through a photomask having a desired pattern and developed to form a desired pattern 7 serving as a columnar spacer on the upper portion of the black matrix (d). .

Next, one or two layers of photosensitive resin were added to 190-2.
The color filter substrate having the protective layer and the columnar spacers is obtained by heating and thermosetting within the range of 40 ° C.

Next, another method of manufacturing a color filter substrate according to the present invention will be described with reference to the process chart of FIG.

A color filter substrate having the protective layer and the columnar spacers according to the above steps is formed (ad).

Next, the entire surface of the protective layer and the columnar spacer is covered with IT.
A transparent electrode 11 made of O is formed (e).

Next, a pattern of the photoresist 12 is formed so that the tops of the columnar spacers are exposed (f).

Next, the ITO is removed by wet etching,
The columnar spacer is exposed (g).

Next, by removing the photoresist,
A color filter in which the ITO transparent electrode 8 exposing the columnar spacer is formed on the surface is obtained (h).

Next, another method of manufacturing a color filter substrate according to the present invention will be described with reference to the process chart of FIG.

A color filter substrate having a protective layer and columnar spacers by the above-described steps is formed (ad).

Next, the entire surface of the protective layer and the columnar spacer is covered with IT.
A transparent electrode 11 made of O is formed (e).

Next, a pattern of the photoresist 12 is formed so that the tops of the columnar spacers are exposed (f).

Next, the ITO is removed by wet etching,
Only the top of the columnar spacer is exposed (g).

Next, by removing the photoresist,
A color filter in which the ITO transparent electrode 9 exposing only the top of the columnar spacer is formed on the surface is obtained (h).

(Examples) The present invention will be specifically described below with reference to examples.

First, a black matrix, blue, green, and red primary color filter pattern formed on a glass substrate was prepared by the following operation.

This substrate is referred to as preCF in the following examples.
Described as a substrate.

Using a photosensitive resist for forming a resin black matrix manufactured by Tokyo Ohka Kogyo Co., Ltd. on a glass substrate used for TFT, coating, pre-baking, exposure, development, rinsing, Post-baking was performed to form a black matrix pattern.

The formed film thickness was 1.5 μm.

Next, using a photosensitive resist for forming a red filter pattern of Fuji Film Ohlin Co., Ltd.,
Coating, pre-baking, exposure, development, rinsing, and post-baking were performed by a usual photolithography technique to form a red filter pattern.

The formed film thickness was 1.6 μm.

Next, using a photosensitive resist for forming a green filter pattern of Fuji Film Ohlin Co., Ltd., coating, pre-baking, exposure, development, rinsing, and post-baking are performed by a usual photolithography technique to form a green filter pattern. Formed.

The formed film thickness was 1.6 μm.

Next, using a photosensitive resist for forming a red filter pattern of Fuji Film Ohlin Co., Ltd.,
Coating, pre-baking, exposure, development, rinsing, and post-baking were performed by a usual photolithography technique to form a red filter pattern.

The formed film thickness was 1.6 μm.

Next, with the monomer structure shown in Chemical Formulas 1 to 6,
A copolymer acrylic photosensitive polymer having the following composition ratios, soluble in an aqueous alkali solution, and having an epoxy functional group was prepared. The average weight molecular weight was about 30,000 each.

[0072]

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[0073]

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[0074]

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[0075]

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[0076]

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[0077]

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[0078]

[Table 1]

Example 1 20 parts by weight of polymer 1, 6 parts by weight of dipentaerythritol hexaacrylate, 1 part by weight of methacryloxymethyltriethoxysilane, radical polymerization initiator (2-methyl-1 (4- (methylthio) phenyl) Photosensitive resin composition 100 comprising 2) parts by weight of) -2-morpholinopropan-1-one, 50 parts by weight of propylene glycol monomethyl ether acetate and 21 parts by weight of cyclohexanone
A photosensitive resin composition 1 was prepared by adding 5 parts by weight of an acid generator, triphenylsulfonium triflate, as a Deep UV photosensitive agent to the parts by weight.

Next, the photosensitive resin composition 1 is applied to a preCF substrate, prebaked (at 90 ° C./30 minutes, in air), and the entire surface of the substrate is exposed with a Deep UV lamp (exposure intensity: 200 mJ / 256 nm measurement). cm2).

Further, the photosensitive resin composition 1 is coated thereon, pre-baked (90 ° C./30 minutes, in air), and then coated with a mask capable of forming a desired spacer pattern.
Exposure using a V exposure machine (Exposure intensity: 500 mJ / cm at 365 nm measurement)
2) I did. Thus, a layer serving as a protective film covering the color filter pattern was formed.

Next, development was performed at room temperature with an alkaline aqueous solution (alkali developer NMD-3 manufactured by Tokyo Ohka Kogyo Co., Ltd.).
A columnar spacer pattern was obtained. At this time, De
The photosensitive resin composition layer exposed to epUV was resistant to an alkali developing solution, and did not dissolve even when the developing time was changed from 60 s to 600 s. For this reason, it was possible to allow a margin for the development time when developing the columnar spacer pattern.

Next, post bake (200 ° C./30 minutes, Air
In the middle), the color filter substrate was heated and cured at a time to form a protective film (thickness: 1.6 μm) covering the color filter pattern and a columnar spacer pattern (height: 4.0 μm).

The formed spacer pattern has a diameter of 15 μm.
It has a columnar shape.

Examples 2 to 4 By using polymers 2 to 4 in Table 1, the same operation as in Example 1 was carried out to obtain a color filter substrate on which a protective film covering the color filter pattern and a columnar spacer pattern were formed.

Examples 5 to 8 For each of the color filter substrates obtained in Examples 1 to 4, an ITO film having a thickness of 150 nm was formed on the entire surface by sputtering.

Next, a positive resist film of Tokyo Ohka Kogyo Co., Ltd. was formed excluding the spacer pattern portion. next,
A 25% aqueous solution of HBr was prepared, and the exposed ITO film was dissolved and removed using the resist film as a mask.

Next, the resist film was removed using butyl acetate.

As a result, an ITO film having a 150 nm-thickness ITO film with the spacer pattern portion exposed was formed.
A color filter substrate with a film was obtained.

Examples 9 to 12 For each of the color filter substrates obtained in Examples 1 to 4, an ITO film was formed over the entire surface by sputtering to a thickness of 150 nm.

Next, a positive resist film of Tokyo Ohka Kogyo Co., Ltd. was formed thicker than in Examples 5 to 8 so that only the top of the spacer pattern was exposed. Next, HBr
Was prepared, and the exposed ITO film was dissolved and removed using the resist film as a mask.

Next, the resist film was removed using butyl acetate.

As a result, a color filter substrate with an ITO film having a 150 nm-thick ITO film in which only the top of the spacer pattern was exposed was obtained.

Examples 13 to 16 For each of the color filter substrates obtained in Examples 1 to 4, a polyimide alignment film having a thickness of 100 nm was formed thereon and subjected to an alignment treatment.

Next, the substrate is bonded to the TFT substrate on which the TFT element of the horizontal electric field driving mode is formed, the periphery of the substrate is sealed with a sealing material for a liquid crystal panel, and the liquid crystal for the horizontal electric field driving mode is sealed between the bonded substrates. did. As a result, a color liquid crystal display device in which the gap between the substrates was defined by the spacer was obtained.

In the obtained color liquid crystal display device, the cell gap was uniform due to the spacer pattern, no color unevenness or luminance unevenness occurred, and good display quality was obtained.

Examples 17 to 24 For each of the color filter substrates obtained in Examples 5 to 12, a polyimide alignment film having a thickness of 100 nm was formed thereon and subjected to an alignment treatment.

Next, the substrate was bonded to a TFT substrate on which a TFT element in the TN drive mode was formed, the periphery of the substrate was sealed with a sealing material for a liquid crystal panel, and liquid crystal for the TN drive mode was sealed between the bonded substrates. As a result, a color liquid crystal display device in which the gap between the substrates was defined by the spacer was obtained.

In the obtained color liquid crystal display device, the cell gap was uniform due to the spacer pattern, no color unevenness or luminance unevenness occurred, and good display quality was obtained.

[0100]

As described above in detail, by using the present invention, a transparent protective layer for covering a color filter pattern and flattening the surface, and a columnar spacer formed on the transparent protective layer are provided. In the color filter substrate having
It is possible to obtain a high-quality color filter having improved spacer formation alignment and spacer thickness control, a method of manufacturing the same, and a color liquid crystal display device using the same.

[Brief description of the drawings]

FIG. 1 is a sectional view showing an example of an embodiment of a color filter of the present invention.

FIG. 2 is a sectional view showing another example of the embodiment of the color filter of the present invention.

FIG. 3 is a sectional view showing another example of the embodiment of the color filter of the present invention.

FIG. 4 is a process chart showing one example of a method for manufacturing a color filter substrate of the present invention.

FIG. 5 is a process chart showing another example of the method for manufacturing a color filter substrate of the present invention.

FIG. 6 is a process chart showing another example of the method for manufacturing a color filter substrate of the present invention.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 ... Substrate, 2 ... Black matrix pattern, 3 ... Blue filter pattern, 4 ... Green filter pattern, 5 ... Red filter pattern, 6 ... Transparent protective layer, 7
... spacer pattern, 8 ... transparent electrode (ITO electrode), 9
... Transparent electrode (ITO electrode), 10 ... Photosensitive resin, 11 ...
Transparent electrode, 12 ... photoresist.

Continued on the front page (72) Inventor Shinji Sekiguchi 292, Yoshida-cho, Totsuka-ku, Yokohama-shi, Kanagawa Prefecture Inside Hitachi, Ltd.Production Technology Laboratory (72) Inventor Tomoyuki Sugitani 3300, Hayano, Mobara-shi, Chiba Display Group, Hitachi, Ltd. (72) Inventor Takumi Kuji 3300 Hayano, Mobara-shi, Chiba F-term in the Display Group, Hitachi, Ltd. 2H091 FA02Y FA35Y FB04 FB08 FB13 FC02 FC22 FC23 FC26 FD04 GA08 GA13 GA16 HA07 LA03 LA15

Claims (8)

[Claims] 1. A substrate, a color filter pattern of a plurality of colors formed in a predetermined pattern on the substrate, a transparent protective layer for covering the color filter pattern and flattening the surface, A color filter substrate having a columnar spacer formed in the above, wherein the protective layer and the spacer are made of the same negative photosensitive resin. 2. A substrate, a color filter pattern of a plurality of colors formed in a predetermined pattern on the substrate, a transparent protective layer for covering the color filter pattern and flattening the surface, and A columnar spacer formed on the
A color filter substrate having a transparent electrode formed on a transparent protective layer except for a portion where a columnar spacer is formed, wherein the protective layer and the spacer are made of the same negative photosensitive resin. 3. A step of forming a plurality of color filter patterns in a predetermined pattern on a substrate, and applying a first negative photosensitive resin to form a transparent protective layer covering the color filter patterns. And a step of heating, a step of exposing the entire surface of the negative photosensitive resin layer, a step of applying a second layer of negative photosensitive resin to form a columnar spacer and heating, and a step of forming a desired pattern. Exposing the second layer of negative photosensitive resin through a photomask;
A color process comprising a step of developing a negative photosensitive resin in a layer to form a desired pattern to be a columnar spacer, and a heating step for curing one or two layers of the photosensitive resin. Manufacturing method of filter substrate. 4. A step of forming a plurality of color filter patterns in a predetermined pattern on a substrate, and applying a first negative photosensitive resin to form a transparent protective layer covering the color filter patterns. And a step of heating, a step of exposing the entire surface of the negative photosensitive resin layer, a step of applying a second layer of negative photosensitive resin to form a columnar spacer and heating, and a step of forming a desired pattern. Exposing the second layer of negative photosensitive resin through a photomask;
Developing the negative photosensitive resin of the layer, forming a desired pattern to be a columnar spacer, heating step for curing the photosensitive resin of one or two layers, and forming a transparent electrode on these surfaces. A method for producing a color filter substrate, comprising: a step of forming an electrode layer to be formed; and a step of wet-etching and removing the electrode layer to expose a transparent electrode and a columnar spacer not covered with the transparent electrode. 5. The method for producing a color filter substrate according to claim 3, wherein the light source for exposing the entire surface of the first negative photosensitive resin layer is short-wavelength light having a wavelength of 300 nm or less. 6. The photosensitive agent contained in the negative photosensitive resin has a maximum photosensitive area at a wavelength of 300 nm or less.
5. The method for manufacturing a color filter substrate according to claim 3, wherein the method comprises two types: an epUV photosensitive agent and a UV photosensitive agent having a photosensitive region at a wavelength of 300 nm to 400 nm. 7. A color liquid crystal display device in which a columnar spacer is provided on the surface of a color filter substrate to define a gap between the substrates, wherein the color filter substrate is the color filter according to claim 1 or 2. Color liquid crystal display. 8. A method for manufacturing a color liquid crystal display device in which a columnar spacer is provided on the surface of a color filter substrate to define a gap between the substrates, wherein the color filter substrate is provided.
Or a method for manufacturing a color liquid crystal display device formed by the method for manufacturing a color filter substrate according to item 4.