JP2001235754A - Liquid crystal display device and its manufacturing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To realize a liquid crystal display device wherein a process for forming a spacer is simplified. SOLUTION: The liquid crystal display device is provided with a color filter substrate, a light shielding film provided on the color filter substrate, a color filter layer formed at an opening part of the light shielding film, a protective film provided on the color filter layer and a spacer provided on the protective film and the protective film and the spacer are formed by a transferring film having two layers.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and more particularly to a liquid crystal display device in which a pair of insulating substrates are opposed to each other via a spacer material at a fixed gap, and a liquid crystal composition is held in the gap.

[0002]

2. Description of the Related Art In recent years, liquid crystal display devices have been widely used from small display devices to display terminals such as so-called OA equipment. This liquid crystal display device basically has a so-called liquid crystal panel (also called a liquid crystal cell) in which a layer (liquid crystal layer) of a liquid crystal composition is sandwiched between a pair of insulating substrates made of a transparent glass plate, a plastic substrate, or the like. ), And selectively applying voltages to various electrodes for pixel formation formed on the insulating substrate of the liquid crystal panel to change the orientation direction of liquid crystal molecules constituting the liquid crystal composition in a predetermined pixel portion. The type of formation (simple matrix), the various electrodes and the active element for pixel selection are formed, and the active element is selected, whereby the liquid crystal molecules of the pixel between the pixel electrode connected to the active element and the reference electrode are formed. (Active matrix) in which pixels are formed by changing the alignment direction.

In general, an active matrix type liquid crystal display device is a so-called vertical electric field type in which an electric field for changing the orientation of a liquid crystal layer is applied between an electrode formed on one substrate and an electrode formed on the other substrate. Is adopted.

On the other hand, a so-called in-plane switching (IPS) liquid crystal display device in which the direction of an electric field applied to a liquid crystal layer is substantially parallel to the substrate surface has been put to practical use. As a disclosure of the in-plane switching mode liquid crystal display device, there is known a device in which a very wide viewing angle is obtained by using a comb electrode on one of two substrates (Japanese Patent Publication No. 63-21).
907, U.S. Pat. No. 4,345,249).

[0005] In a liquid crystal panel used in this type of liquid crystal display device, a spacer is interposed between a pair of insulating substrates to be filled with a liquid crystal composition so that the gap is maintained at a predetermined value.

The conventional spacer uses a spherical spacer made of a resin or glass-based material, or performs a surface treatment such as a coloring agent, an adhesive, or an alignment agent on the inner surface of the insulating substrate on the electrode substrate side. It is generally sprayed by electrostatic spraying or semi-dry spraying.

In place of the above spherical spacer, a predetermined pattern is formed on at least a part of a region (non-pixel portion) shielded by a light shielding portion (a light shielding film, a black matrix) by a photolithography technique or a printing technique. It has also been proposed to form a columnar spacer (projection) as described in
-325298, JP-A-8-286194).

In general, when color display is performed by a liquid crystal display device, a color filter substrate using a color filter that transmits red, blue, and green light is used. A protective film is formed on the color filter substrate for the purpose of protecting the color filter substrate from contamination of the liquid crystal composition. A method using a transfer film is described in JP-A-11-277666 as a method for forming a protective film.

[0009]

When the spherical spacers are scattered, there is a problem that the spacers cannot be selectively arranged and the spacers are provided even on the pixel electrodes. The spacer formed by selectively forming protrusions on the non-pixel portion of the electrode substrate by a photolithography technique or a printing method does not have a problem such as a spherical spacer because its arrangement position is further fixed in the non-pixel portion. . However, no consideration is given to the manufacturing process of the spacer. That is, when the spacer is formed by the photolithography technique or the printing method, there is a problem that the process is longer than the method of spraying the spacer.

[0010]

In a liquid crystal display device,
A color filter substrate, a light-shielding film provided on the color filter substrate, a color filter layer formed in an opening of the light-shielding film, and a protective film provided on the color filter layer.
A spacer provided on the protective film is provided, and the protective film and the spacer are formed by a two-layer transfer film.

[0011]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described below in detail with reference to examples.

FIG. 1 is a schematic view showing a part of a color filter substrate for explaining one embodiment of a liquid crystal display device according to the present invention. FIG. 1A is a cross-sectional view taken along line AA of FIG. 1B. FIG. 1B is a plan view, and FIG.
It is the figure seen from the upper part in the figure of (a).

In FIG. 1, 1 is a spacer, 2 is a color filter, 3 is a black mask, 4 is a protective film (however, it is omitted in FIG. 1B for clarity), and 5 is a transparent substrate. A black mask 3 is formed on a transparent substrate 5. The black mask 3 is made of a black resin or a metal film, and has a light shielding function. The color filter 2 is provided in an opening of the black mask 3. The color filter 2 is formed by coloring a resin with a pigment or a dye, and transmits light of a specific wavelength.

In this embodiment, a protective film 4 is formed so as to cover the color filter 2 and the black mask 3. The protective film 4 is also called an overcoat film,
It protects the surface of the color filter 2 and the black mask 3, and protects the liquid crystal composition from contamination of the color filter components. The end 2 of the color filter 2
B overlaps the black mask 3 and the color filter 2 and the black mask 3 have a difference in film thickness.
A step occurs at the end 2B of the color filter 2. The protective film 4 also has the effect of covering the color filter 2 and the black mask 3, thereby filling the step formed by the color filter 2 and the black mask 3 and flattening the same.

The spacer 1 is formed on the protective film 4. The spacer 1 is for maintaining a constant interval between the color filter substrate and a substrate (not shown) provided opposite thereto, and a liquid crystal composition is held in a gap formed by the spacer 1. As shown in the schematic plan view of FIG. 1B, the position where the spacer 1 is formed is on the black mask 3. Since the spacer 1 is hidden by the black mask 3, the spacer 1 is inconspicuous when the liquid crystal display device displays an image. Although only one spacer 1 is shown in FIG. 1, a large number of spacers are formed in a matrix on the entire surface of the color filter substrate so as to keep a constant interval.

After the formation of the spacer, an alignment film is formed, and an alignment process for rubbing the alignment film with a cloth or the like is performed. However, there is a problem that rubbing cannot be performed uniformly due to protrusions of the spacer. Therefore, in the schematic plan view of FIG. 1B, the positions where the spacers 1 are formed are formed at positions where uneven portions of the rubbing are hidden by the black mask as much as possible in the rubbing treatment of the alignment film. That is, when rubbing is performed in the direction indicated by the arrow RA in FIG. 1B, most of the non-uniform rubbing generated from the spacer 1 in the direction of the arrow can be hidden by the black mask 3.

Further, as described above, since the spacer 1 has a role of keeping the interval at which the liquid crystal composition is held constant, a high precision is required for its height. That is, if the height of the spacer is not constant, the thickness of the liquid crystal layer varies. When the thickness of the liquid crystal layer varies, there arises a problem that the display quality deteriorates due to the variation in the optical path length of the light passing through the liquid crystal layer. Therefore, the spacer 1
When forming a layer of the material, it is necessary to uniformly form the thickness of the layer.

As described above, in order to form the spacer 1, it is necessary to form a large number of spacers at specific positions with high precision. For that purpose, a method of forming a layer to be a material of the spacer 1 with a uniform thickness and patterning it into a specific shape is used. Further, as described above, it is necessary to form the protective film 4 together with the spacer 1 on the color filter substrate.

Hereinafter, a process for forming the spacer 1 and a process for forming the protective film 4 will be described.

FIG. 2 shows a process of forming the protective film 4 together with the spacer 1 on the color filter substrate. In FIG. 2, a first layer film serving as a material of a protective film is formed by a film transfer method. In the film transfer method, a film made of a specific material is previously formed on a film, and a film having a constant thickness can be formed at a specific portion by transferring the film from the film.

In FIG. 2A, a substrate on which a black mask 3 and a color filter 2 are formed is prepared, and pre-cleaning and drying are performed. Next, in FIG. 2B, a first layer film is formed on the black mask 3 and the color filter 2 by a film transfer method. Further, the first layer film is cured by heating or the like to form a protective film. Next, in FIG. 2C, pre-cleaning and drying are performed on the substrate on which the protective film is formed, and then a solution-like spacer material is dropped and applied on the substrate, and the spacer material is further dried to form a second layer. Is formed. Next, FIG.
In (d), the spacer 1 is formed by patterning the second layer film.

In the step shown in FIG. 2, a film transfer method is used for forming a protective film instead of dropping and applying a solution-like protective film material on a substrate, which is conventionally performed. By using the film transfer method, it is possible to shorten the steps of applying and drying the solution protective film material as compared with the conventional method.

However, in the step shown in FIG. 2, in order to form the protective film 4 and the spacer 1 separately, after forming the black mask 3 and the color filter 2, the protective film is formed first, and then the spacer is formed. You. Therefore, in order to form a protective film, it is necessary to perform a step of transferring a material and a step of curing, and to form a spacer, it is necessary to perform a step of applying a material and a step of drying.

Considering a method of simultaneously forming the first layer material and the second layer material in order to omit the process,
In the case of using a conventional method in which a material in the form of a solution is applied dropwise onto a substrate and then the material is dried to form a film, the material in the first layer and the material in the second layer are in a solution state. However, there arises a problem that they are mixed when applied. Therefore, a method is used in which a two-layer transfer film is used, a material for the protective film is formed on the first layer and a material for the spacer is formed on the second layer in advance, and two layers are simultaneously transferred from the film to the substrate.

FIG. 3 shows a cross-sectional structure of the transfer film 100 having two layers. 102 is a protective film layer, 1A is a spacer 1
Is a second resin film forming the protective film 4, 103A is a release agent layer, 105 is a cushion layer, and 106 is a base film.

The base film 106 is a film having a thickness of about 50 μm and serves as a base material for forming other layers. A cushion layer 105 having a thickness of about 20 μm is provided on a base film 106. The cushion layer 105 has a role of protecting the first resin film 4A and the second resin film 1A when the transfer film 100 is heated and pressed. Reference numeral 103 denotes a release agent layer, and after transfer, the base film 106 and the cushion layer 10
5 to facilitate removal of the second resin film 1A.
The release agent layer 103 is sandwiched between the and the cushion layer 105. The protective film layer 102 has a function of preventing the attachment of foreign substances and the like until the transfer film 100 is used.

FIG. 4 shows a process of forming the materials of the protective film 4 and the spacer 1 at one time using a two-layer transfer film.
In FIG. 4A, a substrate on which a black mask 3 and a color filter 2 are formed is prepared, and pre-cleaning and drying are performed. Next, in FIG. 4B, two transfer films are laminated on the color filter substrate while heating and pressing while peeling off the protective film layer 102 of the transfer film. In FIG. 4B, the cushion layer 105 and the release agent layer 103 are omitted for easy understanding. Next, in FIG. 4C, the base film 106 and the cushion layer 105 are separated from the release agent layer 10.
Remove all three. Thus, the material of the first layer and the material of the second layer are simultaneously transferred onto the black mask 3 and the color filter 2 from the two-layer transfer film. First
By forming the material of the layer and the material of the second layer at the same time, it is not necessary to form the material layer twice, and one step of applying or transferring the material can be omitted.

However, the first layer has a purpose of forming a protective film, and the second layer has a purpose of forming a spacer. Therefore, even if the first layer and the second layer are formed at the same time and the number of steps can be reduced, if there is a problem in the formation of the protective film and the spacer, a method of forming the first layer and the second layer at the same time is required. Cannot be used.

Hereinafter, after forming the first layer and the second layer,
A method for patterning the second layer will be described.

As a patterning method, a method of removing a portion other than a specific portion of the material of the second layer with a removing agent is used.
First, a second layer film is formed on a color filter substrate in a state where it can be removed with a removing agent, and the properties are changed so that it becomes difficult to remove a specific portion with the removing agent. After that, unnecessary portions are removed using a removing agent to form spacers at desired positions and shapes.

When removing the material of the second layer, if the material of the first layer is also removed by the same remover, the first layer cannot be used as a protective film and is deteriorated by the remover. In such a case, the reliability decreases.

However, since the first layer not only functions as a protective film but also as a planarizing film, the first layer has flexibility to fill a step between the color filter and the black mask, and has close contact with the color filter and the black mask. Sex is also necessary. In order to prevent the spacer from easily peeling off or moving on the protective film, an adhesive force between the protective film and the spacer is required.

FIG. 5 is a schematic diagram for explaining the concept of the molecular weight of the resin and its properties. A resin having a molecular weight distribution indicated by DA in the figure is soft because of its small molecular weight, but is easily removed by the removing agent because it easily reacts with the removing agent. In the figure, the resin having a distribution of DB has a molecular weight of such a degree that it is difficult to remove with a removing agent, but has a molecular weight distribution such that it has flexibility and adhesion. In the figure, the resin having a distribution of DC is a resin that has undergone a polymerization reaction and has been polymerized.

FIG. 6 is a schematic diagram showing a method for patterning a two-layer film by utilizing the difference in the molecular weight of the resin. In FIG. 6A, the resin of the distribution DB of FIG. 5 is used for the first layer,
The second layer is formed by laminating the first layer and the second layer using a resin having distribution DA. In FIG. 6B, energy E is applied to a specific portion of the second layer of resin to cause the polymerization reaction to proceed, thereby changing the resin to a resin having a molecular weight of the distribution DB. FIG.
In (c), the resin having the molecular weight of the distribution DA is removed, and the resin having the molecular weight of the distribution DA is removed using a removing agent which is difficult to remove the resin having the molecular weight of the distribution DB. FIG.
In (d), the energy of E 'is applied to both the first and second layers of the resin to further advance the polymerization reaction to increase the molecular weight, and both layers are changed to a resin having a molecular weight of distributed DC. At this time, the polymerization reaction progresses also at the boundary between the first and second layers of the resin, and the resin changes from a resin having a molecular weight of distribution DB to a resin having a molecular weight of distribution DC. For this reason, the adhesiveness at the boundary between the first and second resin layers becomes good.

When the resin described with reference to FIG. 6 is used, a protective film having good adhesion to the color filter substrate and also having flexibility as a flat film has good adhesion with the protective film, and the pattern can be formed with high precision. It is possible to obtain a textured spacer.

Next, FIG. 7 shows a case where the resin having the distribution DA of FIG. 5 is used for both the first layer and the second layer. In FIG. 7A, both the first layer and the second layer are formed by laminating the first layer and the second layer using the resin having the distribution DA of FIG. FIG.
In (b), the energy E is applied to the specific pattern portion of the resin of the second layer to cause the polymerization reaction to proceed, thereby changing the resin to a resin having the molecular weight of the distribution DB. In FIG. 7 (c), energy E is applied to a specific portion of the resin of the first layer to cause a polymerization reaction to proceed, thereby changing the resin to a resin having a molecular weight of distribution DB. In FIG. 7D, a resin having a molecular weight of distribution DA is removed using a removing agent. In FIG. 7 (e), the energy of E 'is applied to both the first and second resin layers to further promote the polymerization reaction to increase the molecular weight, and both layers are changed to resins having a molecular weight of distributed DC. In this case, as compared with the case described with reference to FIG. 6, the resin of the first layer as a material of the protective film has good adhesion to the color filter substrate and has excellent flexibility as a flat film.

In FIG. 8, a first layer is a thermosetting resin, and a second layer is a photocurable resin using a two-layer transfer film. After forming a two-layer resin film, the second layer is exposed and developed. A step of forming a protective film and a spacer by forming a spacer by heating and curing both the first layer and the second layer after that is performed.

First, in FIG. 8A, the first and second layers of resin are formed on the color filter substrate at once by using a transfer film. Next, in FIG. 8B, the resin of the second layer is exposed to light W using the mask 6. The resin of the second layer is exposed according to the mask pattern, and the exposed portion is light-cured. In FIG. 8C, development is performed using an alkaline developer. The portion of the second layer resin that has not been photocured is dissolved and removed in a developer, and the exposed and photocured portion remains to form the spacer 1. As the resin of the first layer, which is the material of the protective film 4, a resin that is not removed by development is selected. In this case, the resin of the first layer may be one that does not dissolve or deteriorate in an alkaline developer, and does not necessarily have to have the same molecular weight as the resin of the second layer that has been photocured. After the development, the resin of the first layer and the resin of the second layer are both heated and thermoset. Although the resin of the second layer is a photocurable resin, it generally cures by heating because a part of the resin composition contains a thermosetting component. It is also effective to use a photocurable thermosetting resin for the resin of the second layer, or to add a cross-linking agent that causes a cross-linking reaction to proceed to the resin of the second layer, but it is not limited thereto. For example, a cured product of a generally known radiation-sensitive resin composition containing an unsaturated double bond, such as an acrylic resin, can be used as the first layer of the photocurable resin. In addition, as the thermosetting resin of the second layer, a cured product of a resin composition whose polymerization reaction is accelerated by generally known heating, such as an epoxy resin and an imide resin, can be used.

In the process shown in FIG. 8, two layers of materials can be simultaneously formed on the color filter substrate, so that the process for one layer can be shortened and the spacer can be formed accurately. In particular, when a transfer film with a larger area than the color filter substrate is created and cut and used, a multilayer film for multiple color filter substrates must be created at once, which is effective in mass production. is there.

When the protective film is formed of a two-layer transfer film, the flatness of the protective film is poor, and a step due to a difference in film thickness between the color filter layer 2 and the black mask 3 occurs in the protective film 4. Therefore, the thickness of the spacer 1 is corrected in consideration of the step of the protective film 4.

FIG. 9 shows a process of exposing the entire surface of the first layer after exposing the second layer. Since the second layer resin is present on the first layer, the second layer is also exposed in order to expose the first layer. Therefore, the wavelength range in which the resin of the second layer is exposed is different from the wavelength range in which the resin of the first layer is exposed.

FIG. 10 shows the absorption intensities of photosensitive agents having different wavelength ranges. The photosensitive agent PA has a distribution of absorption intensity in the wavelength region WA, and the photosensitive agent PB has a distribution of absorption intensity in the wavelength region WB.
As shown in FIG. 10, the photosensitive agent PA has less photosensitive absorption in the wavelength range WB. Therefore, the wavelength range WB is
Irradiates light, the radical-releasing light absorption is small.
If the amount of generated radicals is not sufficient, the photopolymerization reaction does not proceed, and the resin to which the photosensitive agent PA is added does not become a polymer, that is, the so-called photocuring reaction does not proceed. It should be noted that, even when the photopolymerization reaction proceeds, there is no problem as long as the range is soluble in the developer as described later.

In FIG. 9A, a negative photosensitive resin to which a photosensitive agent PA is added is used for the first layer, and the photosensitive agent P is used for the second layer.
A negative photosensitive resin to which B is added is used. Using a filter from a light source having a specific wavelength distribution, light in a wavelength range WB is separated and irradiated. The specific portion of the second layer is exposed to light in the wavelength range WB according to the pattern of the mask 6. FIG. 9B
After exposing the second layer, the first layer and the second layer are entirely exposed to light in the wavelength range WA.

Even if the photosensitive agent PA added to the first layer has photosensitivity in the wavelength range WB, the resin of the first layer is entirely exposed in FIG. There is no problem to leave. On the other hand, the photosensitive agent PB added to the second layer has a wavelength range WA.
9B, when the entire surface is exposed as shown in FIG. 9B, the second layer is also exposed at the same time, and the photosensitive agent PB emits a radical proportional to the absorption intensity and the polymerization reaction proceeds. At this time, it is necessary that the amount of radicals released is such that the resin can be removed with a removing agent.

FIG. 11 shows the amount of radical release and the residual film ratio with respect to the absorption intensity of the photosensitive agent PB of the second layer. FIG.
As shown in FIG. 1, when the amount of released radicals is equal to or less than ER, the increase in molecular weight does not proceed sufficiently, the radical becomes soluble in the developer, and the resin of the second layer can be removed.

When a photocurable resin is used for both the first and second layers of the resin, it is difficult to completely separate the photosensitive wavelength ranges of the photosensitive agents in the two layers. There is a problem that remains without being removed. However, when a photocurable resin is used for both layers, the resin of the same main component can be used for the first layer and the second layer, which facilitates film production and handling.

As a photosensitive agent having a different photosensitive wavelength range, for example, Irga is used in a wavelength range of 200 nm to 360 nm.
cure 2959 (1- [4- (2-hydroxyethoxy) -phenyl] -2-hydroxy-2-methyl-1
-Propan-1-one) (manufactured by Ciba Specialty Chemicals Co., Ltd.) and the like.
In the wavelength region of ~ 450 nm, Irgacure 90
7 (2-methyl-1 [4- (methylthio) phenyl]-
2-morpholinopropan-1-one) (manufactured by Ciba Specialty Chemicals Co., Ltd.) and the like can be used. For example, in a wavelength region of 400 nm to 500 nm,
As a composite photosensitive material, 2,2′-bis (o-chlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-, together with a sensitizing dye having an absorption at a wavelength of 400 to 500 nm. Bis (o-chlorophenyl) -4,
4 ′, 5,5′-tetra (p-carbethoxyphenyl) biimidazole, 2,2′-bis (o-chlorophenyl) -4,4 ′, 5,5′-tetra (p-bromophenyl) biimidazole Hexaarylbiimidazoles such as 2,2'-bis (o-chlorophenyl) -4,4 ', 5,5'-tetra (o, p-dichlorophenyl) biimidazole, and 2-mercaptobenzthiazole;
A composite photopolymerization initiator comprising an organic thiol compound such as 2-mercaptobenzoxazole or 2-mercaptobenzimidazole, or dicyclopentadienyl-Ti
-Bis-2,6-difluoro-3- (pyrrol-1-yl) -phenyl-1-yl, dicyclopentadienyl-
Ti-bis-2,3,5,6-tetrafluorophenyl-1-yl, di-cyclopentadienyl-Ti-bis-
A composite photopolymerization initiator comprising a titanocene compound such as 2,3,4,5,6-pentafluorophenyl-1-yl and a dialkylaminophenyl compound such as ethyl p-diethylaminobenzoate and Michler's ketone can be used. .

The first film is a protective film, and is preferably not colored because it covers the color filter layer. Therefore, the photosensitive agent used for the first layer film is
A photosensitizer having low absorption in the visible region is selected.

In order to select a photosensitive agent having a small absorption in the visible region as the photosensitive agent of the first layer, the photosensitive wavelength of the photosensitive agent used in the first layer is changed to the photosensitive wavelength of the photosensitive agent used in the second layer. It is conceivable that the wavelength is shorter than the wavelength. In this case, the first
If the photosensitive agent of the second layer is selected to have absorption even at the photosensitive wavelength of the photosensitive agent of the second layer, the first layer can be exposed when the second layer is exposed. However, since organic substances generally have absorption in the ultraviolet region, it is desirable to use a longer wavelength side photosensitive agent for the lower first layer in consideration of light transmittance.

FIG. 12 is a schematic sectional view of the liquid crystal display of the present invention. Reference numeral 5 denotes a transparent substrate, on which the above-described spacer 1, protective film 4, color filter 2, and black mask 3 are provided. TFT so as to face the transparent substrate 5
(Thin Film Transistor) Substrate 1
The transparent substrate 5 is also called a color filter substrate in order to distinguish it from the TFT substrate 15 on which the TFT 5 is provided. FIG.
2, the configuration of the TFT (thin film transistor) is omitted. 12 is a pixel electrode, 11 is a signal line (scanning signal line or video signal line), 14 is an insulating film, 16 is an alignment film provided on the TFT substrate 15 side, and 17 is provided on the color filter substrate 5 side. It is an alignment film. Color filter substrate 5
The liquid crystal layer 13 is provided in a gap between the TFT substrate 15 and the TFT. The spacer 1 has a role of maintaining the gap. As shown in FIG. 12, the protective film 4 has a step due to a difference in film thickness between the color filter 2 and the black mask 3. Therefore, the film thickness of the spacer 1 is corrected in consideration of the step. Since there is also a step between the signal line 11 and the pixel electrode 12, the thickness of the spacer 1 is corrected in consideration of the shape of the TFT substrate 15 side.

FIG. 13 shows a method of exposing a spacer to a pattern using a black mask of a color filter substrate. As shown in FIG. 13A, a hole 7 serving as a photomask is formed at a position where a spacer of a black mask is formed, and in FIG. 13B, exposure is performed from a direction indicated by an arrow WB. In FIG. 13C, the entire surface is exposed as indicated by an arrow WA. In FIG. 13D, development is performed to form a spacer and a protective film. When exposure is performed by the method shown in FIG. 13, since the distance between the opening for exposure and the resin of the second layer is short, variation in light intensity due to diffraction around the opening is suppressed, and the accuracy of the spacer shape is improved. Further, the photomask required in the conventional process is not required, and the exposure apparatus can have a simple configuration that does not need to have a photomask alignment function.

[0052]

As described above, according to the liquid crystal display device using the color filter substrate according to the present invention, the interval between the liquid crystal layers is formed with high accuracy, and a liquid crystal display device with high display quality can be realized. It is possible. Further, it is possible to realize a liquid crystal display device in which the distance between the liquid crystal layers is high precision and the manufacturing process is simplified.

[Brief description of the drawings]

FIG. 1 is a schematic diagram illustrating a color filter substrate of a liquid crystal display device according to the present invention.

FIG. 2 is a schematic view illustrating a process of manufacturing a color filter substrate of a liquid crystal display device according to the present invention.

FIG. 3 is a schematic sectional view of a transfer film used for manufacturing a liquid crystal display device according to the present invention.

FIG. 4 is a schematic view showing a state in which a transfer film is transferred in a manufacturing process of the liquid crystal display device according to the present invention.

FIG. 5 is a schematic diagram illustrating the concept of the molecular weight and properties of a resin.

FIG. 6 is a schematic view illustrating a method of patterning a color filter substrate of a liquid crystal display according to the present invention.

FIG. 7 is a schematic view illustrating a method of patterning a color filter substrate of a liquid crystal display according to the present invention.

FIG. 8 is a schematic view illustrating a method of patterning a color filter substrate of a liquid crystal display according to the present invention.

FIG. 9 is a schematic view illustrating a method of patterning a color filter substrate of a liquid crystal display according to the present invention.

FIG. 10 is a conceptual diagram schematically showing the absorption intensity of a photosensitive agent.

FIG. 11 is a schematic diagram showing a radical release amount of a photosensitive agent and a residual film ratio after development.

FIG. 12 is a schematic sectional view illustrating a liquid crystal display device according to the present invention.

FIG. 13 is a schematic view illustrating a method of patterning a color filter substrate of a liquid crystal display device using a black mask according to the present invention.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 ... Spacer, 2 ... Color filter, 3 ... Black mask, 4 ... Protective film, 15 ... Transparent substrate, 6 ... Photomask,
7: holes provided in a black film, 11: signal lines, 12: pixel electrodes, 13: liquid crystal layer, 14: insulating film, 15: TFT side substrate, 16, 17: alignment film

 ────────────────────────────────────────────────── ─── Continued on the front page (72) Inventor Kazumi Kanasaka 3681 Hayano, Mobara-shi, Chiba F-term in Hitachi Device Engineering Co., Ltd. (reference) 2H048 BA11 BA43 BA48 BB02 BB08 BB24 BB37 2H089 LA09 LA10 LA16 MA03X NA13 NA14 QA12 QA14 TA05 TA12 TA13 2H091 FA02Y FA35Y FC01 FC22 FC23 GA08 GA16 LA12 LA13

Claims (10)

[Claims] A first substrate, a second substrate, a liquid crystal layer disposed between the first and second substrates, and a first substrate facing the second substrate. Light-shielding film provided on the side, an opening formed in the light-shielding film, a color filter layer formed in the opening, a protective film provided in the color filter layer, and a spacer provided in the protective film Wherein the protective film and the spacer are formed by a two-layer transfer film. 2. A liquid crystal display device according to claim 1, wherein the transfer film forming the protective film is a resin which is cured by heat, and the transfer film which forms the spacer is a resin which is cured by light. 3. A liquid crystal display panel having two opposing surfaces, a spacer for holding a gap between the two surfaces, a liquid crystal layer disposed in the gap, and a color provided on the liquid crystal display panel. A filter layer, and a protective film provided on the color filter layer, wherein the spacer is provided on the protective film, the protective film is a first transfer film made of a thermosetting resin, and the spacer is a photocurable resin. A liquid crystal display device formed of a second transfer film made of a resin. 4. A first substrate, a second substrate, a liquid crystal layer sandwiched between the first and second substrates, a black matrix provided on the first substrate, and a black matrix of the black matrix. It has a color filter layer formed in the opening, a protective film provided in the color filter layer, and a spacer provided in the protective film, wherein the protective film and the spacer are formed of two layers of a photocurable resin. A liquid crystal display device characterized in that the photosensitive material of the first photocurable resin forming the protective film and the photosensitive material of the second photocurable resin forming the spacer react in different wavelength regions. 5. A first substrate, a second substrate, a liquid crystal layer sandwiched between the first and second substrates, a light-shielding film provided on the first substrate, and a light-shielding film provided on the first substrate. A first opening having the formed opening, a color filter layer formed in the opening, a protective film provided in the color filter layer, and a spacer provided in the protective film; And a second transfer film comprising a second transfer film forming a spacer. The second transfer film is exposed to light in a first wavelength region in a spacer shape using a mask. A liquid crystal display device characterized in that: 6. The method according to claim 5, wherein after exposing the second transfer film with light in a first wavelength region, exposing the first transfer film and the second transfer film with light in a second wavelength region. A liquid crystal display device comprising: 7. A step of preparing a color filter substrate, a step of laminating a two-layer transfer film on the color filter substrate, a step of providing a mask on the two-layer transfer film, and a step of providing a mask on the transfer film provided with the mask. A step of irradiating light to partially expose the transfer film, a step of developing the exposed and light-cured transfer film according to the mask pattern with a remover, and a step of heating and curing the transfer film patterned by the development. A method for manufacturing a liquid crystal display device. 8. The method according to claim 7, wherein after exposing the second transfer film to light in the first wavelength region, the first transfer film and the second transfer film are separated by the second transfer film. A method for manufacturing a liquid crystal display device, comprising exposing to light in a wavelength region. 9. A first substrate, a second substrate, a liquid crystal layer sandwiched between the first and second substrates, a light shielding film provided on the first substrate, and a light shielding film provided on the first substrate. An opening formed, a color filter layer formed in the opening, a protective film provided in the color filter layer, and a spacer provided in the protective film, wherein the protective film is a first film Wherein the spacer is formed of a second film, and the protective film has a step at an end of the color filter layer. 10. The liquid crystal display device according to claim 9, wherein the thickness of the spacer is corrected in consideration of a step of the protective film.