JPH01217302A - Substrate for color filter - Google Patents
Substrate for color filterInfo
- Publication number
- JPH01217302A JPH01217302A JP63041858A JP4185888A JPH01217302A JP H01217302 A JPH01217302 A JP H01217302A JP 63041858 A JP63041858 A JP 63041858A JP 4185888 A JP4185888 A JP 4185888A JP H01217302 A JPH01217302 A JP H01217302A
- Authority
- JP
- Japan
- Prior art keywords
- color filter
- shielding film
- light
- light shielding
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title claims description 42
- 238000000034 method Methods 0.000 claims abstract description 27
- 239000011347 resin Substances 0.000 claims abstract description 16
- 229920005989 resin Polymers 0.000 claims abstract description 16
- 238000004043 dyeing Methods 0.000 claims abstract description 15
- 239000000463 material Substances 0.000 abstract description 12
- 229920001187 thermosetting polymer Polymers 0.000 abstract description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract description 3
- 230000032798 delamination Effects 0.000 abstract 2
- 239000000975 dye Substances 0.000 abstract 2
- 238000007641 inkjet printing Methods 0.000 abstract 2
- 239000001045 blue dye Substances 0.000 abstract 1
- 239000001046 green dye Substances 0.000 abstract 1
- 239000001044 red dye Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 39
- 239000004973 liquid crystal related substance Substances 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 8
- 239000002184 metal Substances 0.000 description 6
- 239000011159 matrix material Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- TUSDEZXZIZRFGC-UHFFFAOYSA-N 1-O-galloyl-3,6-(R)-HHDP-beta-D-glucose Natural products OC1C(O2)COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC1C(O)C2OC(=O)C1=CC(O)=C(O)C(O)=C1 TUSDEZXZIZRFGC-UHFFFAOYSA-N 0.000 description 1
- 239000001263 FEMA 3042 Substances 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- LRBQNJMCXXYXIU-PPKXGCFTSA-N Penta-digallate-beta-D-glucose Natural products OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-PPKXGCFTSA-N 0.000 description 1
- 241000872198 Serjania polyphylla Species 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 239000005018 casein Substances 0.000 description 1
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 1
- 235000021240 caseins Nutrition 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 235000018102 proteins Nutrition 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- LRBQNJMCXXYXIU-NRMVVENXSA-N tannic acid Chemical compound OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-NRMVVENXSA-N 0.000 description 1
- 229940033123 tannic acid Drugs 0.000 description 1
- 235000015523 tannic acid Nutrition 0.000 description 1
- 229920002258 tannic acid Polymers 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Ink Jet (AREA)
- Optical Filters (AREA)
Abstract
Description
【発明の詳細な説明】
［発明の目的］
（産業上の利用分野）
この発明は、例えば液晶表示装置に用いられるカラーフ
ィルター基板に関する。DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Application Field) The present invention relates to a color filter substrate used in, for example, a liquid crystal display device.
（従来の技術）
従来より、ポリシリコン、非晶質シリコン（ａ−３ｉ
）及びテルル等の薄膜１〜ランジスタ（ＴｈｉｎＦｉｌ
ｍ Ｔｒａｎｓｉｓｔｏｒ、 ＴＦＴ） 、或いはＭＩ
Ｍ（Ｍｅｔａｌ−Ｉｎｓｕｌａｔｏｒ−ト１ｅｔａｌ
）素子等の非線形素子を用いたアクティブマトリックス
形液晶表示装置は、例えば特開昭５６−２５７１４号公
報や特開昭５６−２５７７７号公報等に開示され広く知
られている。(Conventional technology) Conventionally, polysilicon, amorphous silicon (a-3i
) and tellurium etc. thin film 1 to transistor (ThinFil
mTransistor, TFT) or MI
M(Metal-Insulator-to1etal
Active matrix type liquid crystal display devices using non-linear elements such as ) elements are disclosed in, for example, Japanese Patent Application Laid-Open No. 56-25714 and Japanese Patent Application Laid-Open No. 56-25777, and are widely known.
この種の液晶表示装置につき、例えばＴＰＴを用いた場
合について説明する。Regarding this type of liquid crystal display device, a case where TPT is used, for example, will be described.
即ら、これは通常、一方の基板上では信号線群と走査線
群からなる７１〜リツクス配線の各交点にＴＰＴが設け
られた形になってあり、そのソース電極或いはドレイン
電極の一方が画素電極に接続されている。また、他方の
基板上では、画素電極に対応する領域に例えば赤（Ｒ）
、緑（Ｇ）、青（Ｂ）のカラーフィルタを配置し、残り
の格子状の領域をブラックマトリックスとしての遮光膜
で覆うとともに、続いて全面には対向電極か形成されて
いる。そして、これらの２枚の基板の間には液晶が挟持
されており、更に２枚の基板の外面にはそれぞれ偏光板
か設（プられている。That is, this is usually in the form of a TPT provided on one substrate at each intersection of 71 to 60x wiring consisting of a group of signal lines and a group of scanning lines, and one of the source electrode or drain electrode of the TPT is provided as a pixel. connected to the electrode. Furthermore, on the other substrate, for example, red (R) is applied to the area corresponding to the pixel electrode.
, green (G), and blue (B) color filters are arranged, and the remaining grid-like area is covered with a light-shielding film as a black matrix, and a counter electrode is subsequently formed on the entire surface. A liquid crystal is sandwiched between these two substrates, and a polarizing plate is provided on the outer surface of each of the two substrates.
ここで、遮光膜を有するカラーフィルタの従来の形成方
法について述べる。まず７．先立って形成する遮光膜の
材料としては、従来、金属が考えられていた。一般に、
金属からなる遮光膜の製造方法は次の通りである。即ち
、光透過性基板を洗浄した後、スパッタリング装置内に
設置し、例えば３クロム金属を０．１〜０．２μｍの厚
さに蒸着させる。続いて、レジストを塗布し、所定のパ
ターンを有するマスクを用いて露光・現像し、エツチン
グ後にレジストを剥離して、遮光膜が完成する。Here, a conventional method for forming a color filter having a light-shielding film will be described. First 7. Conventionally, metal has been considered as the material for the light-shielding film that is formed in advance. in general,
The method for manufacturing a light shielding film made of metal is as follows. That is, after cleaning the light-transmissive substrate, it is placed in a sputtering apparatus and, for example, trichrome metal is vapor-deposited to a thickness of 0.1 to 0.2 μm. Subsequently, a resist is applied, exposed and developed using a mask having a predetermined pattern, and after etching, the resist is peeled off to complete the light-shielding film.
次に、光透過性基板の遮光膜形成面の全面に感光性染色
基材を塗布し、所定のパターンを有するマスクを用いて
露光する。そして、遮光膜の所定の開口部分の染色基材
を架橋重合反応させた後に現像し、更に、赤染色槽に浸
して赤染色を行えば、赤（Ｒ）のカラーフィルターが得
られる。以後、この作業を２回繰り返すことにより、緑
（Ｇ）と青（Ｂ）のカラーフィルターが得られる。Next, a photosensitive dyed base material is applied to the entire surface of the light-transmitting substrate on which the light-shielding film is formed, and exposed using a mask having a predetermined pattern. Then, a red (R) color filter is obtained by subjecting the dyed base material in a predetermined opening of the light-shielding film to a crosslinking polymerization reaction, developing it, and further dyeing it red by immersing it in a red dyeing tank. Thereafter, by repeating this operation twice, green (G) and blue (B) color filters are obtained.
しかしながら、この方法では遮光膜付のカラーフィルタ
ー基板を得るのに、４回のレジスト塗布、エツチング及
びレジスト剥離等のフォトリソグラフィー工程を必要と
するため、製造上複雑である。However, this method requires photolithography steps such as resist coating, etching, and resist peeling four times in order to obtain a color filter substrate with a light-shielding film, which is complicated in production.
また、金属からなる遮光膜を形成する際に使用するよう
なスパッタ装置は製造設備として高価なものでおり、安
価なカラーフィルター基板を提供することが困難である
。Furthermore, sputtering equipment used to form a light-shielding film made of metal is an expensive manufacturing facility, making it difficult to provide inexpensive color filter substrates.
そこで、カラーフィルターの形成工程を簡略化するため
に、例えば特開昭５９−７５２０５号公報に記載されて
いるように、インクジェット法を用いるものか提案され
ている。インクジェット法は近年、プリンターのカラー
印刷に多く用いられており、３色のパターン配置を同時
に行うことができる。Therefore, in order to simplify the process of forming a color filter, it has been proposed to use an inkjet method, as described in, for example, Japanese Patent Application Laid-open No. 75205/1983. In recent years, the inkjet method has been widely used for color printing by printers, and it is possible to arrange patterns in three colors at the same time.
（発明が解決しようとする課題）
しかしなから、あらかじめブラックマトリックスとして
金属からなる遮光膜が形成された基板にインクジェット
法によりカラーフィルターを形成することを想定した場
合、遮光膜の開口部にインクが入るが、インクの金属に
対する密着性が悪いため、例えば信頼性試験等を行なっ
た場合に、カラーフィルターが遮光膜の部分より剥離す
ることがあった。(Problem to be solved by the invention) However, when it is assumed that a color filter is formed by an inkjet method on a substrate on which a light-shielding film made of metal is formed as a black matrix in advance, ink may leak into the openings of the light-shielding film. However, due to the poor adhesion of the ink to metal, the color filter sometimes peeled off from the light-shielding film when conducting reliability tests, for example.
この発明は、このような従来の事情に鑑みてなされたも
のである。This invention was made in view of such conventional circumstances.
「発明の構成Ｊ
（課題を解決するための手段）
この発明は、光透過性基板上に所定の規則性がある開口
部を有する樹脂膜を形成した後、この樹脂膜を黒色染料
で染色してなる遮光膜とし、上述の開口部にカラーフィ
ルターをインクジェット法により形成してなるカラーフ
ィルター基板である。``Structure J of the Invention (Means for Solving the Problems) This invention involves forming a resin film having openings with a predetermined regularity on a light-transmitting substrate, and then dyeing this resin film with a black dye. This is a color filter substrate in which a color filter is formed in the above-mentioned opening by an inkjet method.
（作用）
この発明は、合成染色基材を黒色染料で黒化染色して遮
光膜とすることによって、カラーフィルターの材料であ
るインクと遮光膜との密着性を向上させることができる
。この結果、カラーフィルターの形成方法として、信頼
性について特に□心配することなく、製造工程を簡略化
することが可能なインクジェット法を採用することがで
きる。(Function) This invention can improve the adhesion between the ink, which is the material of the color filter, and the light-shielding film by dyeing the synthetic dyed base material black with a black dye to form a light-shielding film. As a result, as a method for forming a color filter, it is possible to employ an inkjet method that can simplify the manufacturing process without worrying particularly about reliability.
（実施例〉 以下、この発明の詳細を図面を参照□して説明する。(Example> The details of this invention will be explained below with reference to the drawings.
第１図はこの発明の一実施例を得るための製造工程を説
明するための図でおる。まず、第１図＜ａ＞に示すよう
に、例えばガラスからなる光透過性基板（１）上に、感
光性染色基材（２）をスピンナー或いはロールコータ−
で塗布する。ここで、感光性染色基材（２）は天然タン
パク質（ゼラチン或いはカゼイン）より染色性が優れて
いる合成品が望ましく、ＪＤＳ−５０９（日本合成ゴム
社製）或いはＲ６’３３Ｌ’１ （日本生薬社製〉等が
適している。また、感光性染色基材（２〉の膜厚は０．
８〜１．２μｍ程度あればよい。次に、マスクを用いた
露光、即ち感光性染色基材（２）に紫外光を照射し、架
橋反応により第１図（ｂ）に示すようにＪ感光性染色基
材（２〉の潜像（３）を形成する。この際、画像表示の
有効領域外の一部に、位置合わせ部（図示せず）も同時
に潜像（３）として形成される。続いて、感光性染色基
材（２）の現像を行い、′第１図（’Ｃ）に示すように
、所定の規則性がある開口部（４〉を有する樹脂膜（５
）と、位置合わせ部（図示せず）を樹脂膜（５）として
形成する。そして、樹脂膜（５）をポストベーキングし
た後、染料としてブラック１８１（日本生薬社製＞０．
２５％及び試薬として酢酸１．０％を含有する黒色染色
槽に浸し、６０′Ｃて１５分間染色する。こうして、染
色処理を行なって、第１図（ｄ＞に示すように、遮光膜
（６）及び位置合わせ部（図示せず）を形成する。FIG. 1 is a diagram for explaining the manufacturing process for obtaining an embodiment of the present invention. First, as shown in FIG. 1 <a>, a photosensitive dyeing base material (2) is coated on a light-transmitting substrate (1) made of, for example, glass using a spinner or a roll coater.
Apply with. Here, the photosensitive dyeing substrate (2) is preferably a synthetic product that has better dyeing properties than natural proteins (gelatin or casein), such as JDS-509 (manufactured by Japan Synthetic Rubber Co., Ltd.) or R6'33L'1 (manufactured by Nihon Gosei Rubber Co., Ltd.). The film thickness of the photosensitive dyed substrate (2) is suitable.
It is sufficient to have a thickness of about 8 to 1.2 μm. Next, the photosensitive dyed substrate (2) is exposed to light using a mask, that is, the photosensitive dyed substrate (2) is irradiated with ultraviolet light, and a latent image of the J photosensitive dyed substrate (2) is formed by a crosslinking reaction as shown in FIG. 1(b). (3) is formed.At this time, a positioning portion (not shown) is also formed as a latent image (3) at the same time in a part outside the effective area of image display.Subsequently, the photosensitive dyed substrate ( 2) is developed, and as shown in Figure 1 ('C), a resin film (5) having openings (4) with a predetermined regularity is formed.
) and a positioning portion (not shown) are formed as a resin film (5). After post-baking the resin film (5), black 181 (manufactured by Nihon Koyaku Co., Ltd. >0.
25% and 1.0% acetic acid as reagent, and stained for 15 minutes at 60'C. In this manner, a dyeing process is performed to form a light-shielding film (6) and a positioning portion (not shown) as shown in FIG. 1(d).
この遮光膜（６）（訳染料を吸着することにより、樹脂
膜（５）のときに比べ膜厚が増大する。例えば、光学濃
度が２程度の場合は１．５μｍ、光学濃度が２．５程度
の場合は２．０μｍに達する。By adsorbing this light-shielding film (6) dye, the film thickness increases compared to the resin film (5). For example, when the optical density is about 2, it is 1.5 μm, and when the optical density is about 2.5 In some cases, it reaches 2.0 μm.
そして、第２図は光学濃度が２．５程度になるように染
色した遮光膜（６）の分光透過率を示す図で必り、縦軸
は透過率（％）、横軸は波長（ｎｍ）を表している。同
図かられかるように、遮光膜（６）は／１００〜７００
ｎｍの各波長の光を十分に遮蔽することができる。Figure 2 shows the spectral transmittance of the light shielding film (6) dyed to have an optical density of about 2.5, where the vertical axis is the transmittance (%) and the horizontal axis is the wavelength (nm). ). As can be seen from the figure, the light shielding film (6) is /100 to 700.
It is possible to sufficiently block light of each wavelength of nm.
次に、タンニン酸と吐酒石が各々１％含まれた溶液に５
０’Ｃで数分間浸漬させて固着処理を行った後、第１図
（ｅ）に示すように、表面を平滑化するためのアクリル
系の熱硬化透明樹脂（７）を全面に塗布し、ベーキング
処理を行う。そして、イングジエツ１〜法により、第１
図（ｆ）に示すように、赤（Ｒ）、緑（Ｇ）及び青（Ｂ
）の染料を所定の開口部（４）に相当する部分に形成し
て、カラーフィルター（８）を得る。更に、カラーフィ
ルター（８）を構成するインクをベーキングにより固定
し、第１図（Ｃｌ）に示すように、透明導電膜形成のた
めのオーバーコート層（９）を塗布し固化させることに
より、所望のカラーフィルター基板が得られる。Next, add 5% to a solution containing 1% each of tannic acid and tartarite.
After immersing it at 0'C for several minutes to fix it, as shown in Figure 1(e), an acrylic thermosetting transparent resin (7) was applied to the entire surface to smooth the surface. Perform baking process. Then, according to Ingjietsu 1~ method, the first
As shown in figure (f), red (R), green (G) and blue (B
) is formed in the portion corresponding to the predetermined opening (4) to obtain a color filter (8). Furthermore, the ink constituting the color filter (8) is fixed by baking, and as shown in FIG. A color filter substrate is obtained.
第３図は第１図におＣプるカラーフィルター（８）を形
成する際に用いる装置の一例を示す概略図で必る。同図
において、光透過性基板（１）はベルｌ−コンベア（図
示せず〉で吸着ステージ（１０）で搬送され、まず、外
形寸法から機械的に第１次の位置決めが行われ、吸着ス
テージ（１０）に吸着固定される。そして、第１図にお
ける遮光膜（６）と同じ材料からなり且つこれと同時に
形成された位置合わせ部（１１）に光が光透過性基板（
１）の−主面側から照射され、光透過性基板（１）の他
生面側に存在する受光手段（１２）例えば光センサによ
り電気信号として検出される。FIG. 3 is a schematic diagram showing an example of the apparatus used when forming the color filter (8) shown in FIG. 1. In the same figure, a light-transmitting substrate (1) is conveyed to a suction stage (10) by a bell conveyor (not shown), first, primary positioning is performed mechanically based on the external dimensions, and then the suction stage (10).Then, the light passes through the light-transmitting substrate (11) made of the same material as the light-shielding film (6) in Fig. 1 and formed at the same time.
1) is irradiated from the negative main surface side and detected as an electrical signal by a light receiving means (12), for example, an optical sensor, present on the other surface side of the light-transmitting substrate (1).
この電気信号はコントローラー（１３）に送られ、コン
トローラー（１３）からは、吸着ステージ（１０）に位
置（×、Ｙ及びＯ）の微調整信号が返送され、光透過性
基板（１）はミクロンオーダーの精度で正しい位置に設
置される。インクインジェクター（１／’１．）の赤（
Ｒ）、緑（Ｇ）及び青（Ｂ）の各ノズルは、所定のピッ
チに配列されており、３色のインクを同時に吐き出しで
きるように構成されている。そして、インクインジェク
ター（１４）は、コントローラー（１３）及びファンク
ションジエネエレータ−（１５）からの信号に従って、
第１図にあける所定の規則性がおる開口部（４）に、所
定の色調に調合されたインクを吐き出していく。この吐
き出されたインクは、第１図にあける熱硬化透明樹脂（
７）に吸着されてカラーフィルター（８）が得られる。This electrical signal is sent to the controller (13), and the controller (13) sends back a fine adjustment signal for the position (x, Y, and O) to the suction stage (10), and the light-transmissive substrate (1) is It is installed in the correct position with the precision of the order. Ink injector (1/'1.) red (
The nozzles for R), green (G), and blue (B) are arranged at a predetermined pitch and are configured to eject ink of three colors at the same time. The ink injector (14) then operates according to the signals from the controller (13) and the function generator (15).
Ink mixed in a predetermined color tone is discharged into the openings (4) with a predetermined regularity as shown in FIG. This discharged ink is absorbed into the thermosetting transparent resin (see Figure 1).
7) to obtain a color filter (8).
なお、液晶表示装置に用いるカラーフィルター（８）の
画素数は、３・〜４吋クラスで１０万個程度であり、３
色同時にインクジェット法でカラーフィルター（８）を
形成するのに要する時間は、３０〜４０秒で１枚のカラ
ーフィルター基板が完成する程度である。The number of pixels of the color filter (8) used in the liquid crystal display device is approximately 100,000 in the 3- to 4-inch class;
The time required to simultaneously form the color filter (8) by the inkjet method is about 30 to 40 seconds to complete one color filter substrate.
この実施例では、遮光膜（６）として樹脂膜（５〉を黒
色染料で染色したものを用いているため、カラーフィル
ター（８）の材料であるインクとアクリル系の熱硬化透
明樹脂（７）及び遮光膜（６）との密着性が従来に比べ
向上し、−３０’Ｃから８０°Ｃまでの温度にわたる熱
衝撃を与える信頼性試験等においても、カラーフィルタ
ー（８）が光透過性基板（１）から剥離することがなく
なった。また、遮光膜（６）の形成に染色技術を用いて
いるため、スパッタリング装置といった高価な設備が不
要になり、コストを抑えることができる。更に、カラー
フィルター（８）の形成方法としてインクジェット法を
採用していて、ただ１回のフ′Ａ［・リソグラフィー工
程で寸法精度を維持する１こめ、３回の）４トリソグラ
フイー工程を必要とする染色法を用いた場合に比べ、製
造工程を大幅に簡略化することができ量産性に優れてい
る。In this example, since a resin film (5) dyed with black dye is used as the light-shielding film (6), the ink and acrylic thermosetting transparent resin (7) that are the materials of the color filter (8) are used. The adhesion with the light-shielding film (6) has been improved compared to conventional ones, and the color filter (8) has been shown to be able to adhere to the light-transmitting substrate even in reliability tests where thermal shock is applied at temperatures ranging from -30'C to 80°C. It no longer peels off from (1).Also, since dyeing technology is used to form the light-shielding film (6), expensive equipment such as sputtering equipment is no longer required, reducing costs.Furthermore, the color The inkjet method is adopted as the method for forming the filter (8), and the dyeing process requires only one 4-trithography process (1 to maintain dimensional accuracy in the lithography process, and 3 times). The manufacturing process can be greatly simplified compared to the case where the method is used, and it is superior in mass production.
また、カラーフィルター基板は染色膜（６）と同じ材料
からなる位置合わせ部（１１）を有していて、この位置
合わせ部（１１）を目安に受光手段（１２）の働きによ
り、インクインジェクター（１４）の位置を設定してい
るため、３色のインクをカラーフィルター付基板の所望
の位置に的確に吐き出すことができる。Further, the color filter substrate has a positioning part (11) made of the same material as the dyed film (6), and using this positioning part (11) as a guide, the ink injector ( 14), the three colors of ink can be accurately ejected to desired positions on the color filter-equipped substrate.
なお、第４図はこの実施例により得られたカラーフィル
ター基板（２０）を用いてなる液晶表示装置の一例を示
す概略断面図であり、この形成方法について同図を用い
て説明する。即ち、カラーフィルター基板（２０）のオ
ーバーコート層（９）上に透明導電膜からなる共通電極
（２１）等を形成するとともに、新たに光透過性基板（
２２）上にマトリックス配線（２３＞、画素電極（２４
）及びスイッチング素子（図示せず）等が形成されてな
るアレイ基板（２５）を用意する。そして、カラーフィ
ルター基板（２０）とアレイ基板（２５）を、各々のカ
ラーフィルター（８）と画素電極（２４＞ 、及び遮光
膜（６）とマトリックス配線（２３）の部分が対向する
ようにして重ね合わせ、この間隙には液晶層（２６）を
挟持する。更に、カラーフィルター付基板（２０）とア
レイ基板（２４）の外面にはそれぞれ、偏光板（２７＞
。Note that FIG. 4 is a schematic cross-sectional view showing an example of a liquid crystal display device using the color filter substrate (20) obtained in this example, and a method for forming this will be explained using the same figure. That is, a common electrode (21) made of a transparent conductive film, etc. is formed on the overcoat layer (9) of the color filter substrate (20), and a new light-transmissive substrate (20) is formed.
22) Matrix wiring (23>, pixel electrode (24)
), switching elements (not shown), and the like are prepared. Then, the color filter substrate (20) and the array substrate (25) are arranged so that the color filter (8) and the pixel electrode (24) and the light shielding film (6) and the matrix wiring (23) face each other. The liquid crystal layer (26) is sandwiched in the gap. Furthermore, a polarizing plate (27) is placed on the outer surface of the color filter-equipped substrate (20) and the array substrate (24), respectively.
.
（２８）を被着することにより、所望の液晶表示装置が
得られ、表示を行うときは、例えばカラーフィルター基
板（２０〉側から照明を施すとよい。By depositing (28), a desired liquid crystal display device can be obtained, and when displaying, it is preferable to provide illumination from, for example, the color filter substrate (20> side).
「発明の効果］
この発明は遮光膜に合成染色基材を用い、且つカラーフ
ィルターの形成方法としてインクジェット法を用いるこ
とにより、カラーフィルターが悪条件下で遮光膜より剥
離することがなくなるため、量産性及び信頼性が高いカ
ラーフィルター基板が得られる。"Effects of the Invention" This invention uses a synthetic dyed base material for the light-shielding film and uses an inkjet method as the method for forming the color filter, so that the color filter does not peel off from the light-shielding film under adverse conditions, making it easy to mass-produce. A color filter substrate with high performance and reliability can be obtained.
第１図はこの発明の一実施例を得るための製造工程を説
明するための断面図、第２図はこの発明における遮光膜
の分光透過率を示した図、第３図はこの発明におけるカ
ラーフィルターを得る際に用いる装置の一例を示す概略
図、第４図はこの発明の一実施例から構成されるの液晶
表示装置の一例を示す断面図である。
（１）・・・・・・光透過性基板
（４）・・・・・・開口部
（５）・・・・・・樹脂膜
（６）・・・・・・遮光膜
（８）・・・・・・カラーフィルター
代理人 弁理士 則 近 憲 佑 ′同
竹 花 喜久男
へ へFIG. 1 is a cross-sectional view for explaining the manufacturing process for obtaining an embodiment of the present invention, FIG. 2 is a diagram showing the spectral transmittance of the light-shielding film in this invention, and FIG. FIG. 4 is a schematic diagram showing an example of an apparatus used to obtain a filter, and FIG. 4 is a sectional view showing an example of a liquid crystal display device constructed from an embodiment of the present invention. (1)...Light-transmitting substrate (4)...Opening (5)...Resin film (6)...Light-shielding film (8) ...Color Filter Representative Patent Attorney Nori Chika To Kikuo Takehana
Claims (1)
ある開口部を有するように形成され且つ樹脂膜を黒色染
料で染色してなる遮光膜と、前記開口部にインクジェッ
ト法により形成されたカラーフィルターとを備えたこと
を特徴とするカラーフィルター基板。a light-transmitting substrate; a light-shielding film formed on the light-transmitting substrate to have openings with a predetermined regularity and formed by dyeing a resin film with black dye; and a light-shielding film formed on the opening by an inkjet method. A color filter substrate comprising a color filter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4185888A JP2597626B2 (en) | 1988-02-26 | 1988-02-26 | Color filter substrate, method of manufacturing color filter substrate, and liquid crystal display device using color filter substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4185888A JP2597626B2 (en) | 1988-02-26 | 1988-02-26 | Color filter substrate, method of manufacturing color filter substrate, and liquid crystal display device using color filter substrate |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8206459A Division JPH0933718A (en) | 1996-07-18 | 1996-07-18 | Color filter substrate, its production, liquid crystal display device using the color filter substrate, and color filter substrate producing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01217302A true JPH01217302A (en) | 1989-08-30 |
| JP2597626B2 JP2597626B2 (en) | 1997-04-09 |
Family
ID=12619947
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4185888A Expired - Fee Related JP2597626B2 (en) | 1988-02-26 | 1988-02-26 | Color filter substrate, method of manufacturing color filter substrate, and liquid crystal display device using color filter substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2597626B2 (en) |
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| WO1995002839A1 (en) * | 1993-07-15 | 1995-01-26 | Nippon Kayaku Kabushiki Kaisha | Method for manufacturing color filter |
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| EP0665449A1 (en) * | 1994-01-28 | 1995-08-02 | Canon Kabushiki Kaisha | Color filter, production process thereof, and liquid crystal panel |
| JPH07318723A (en) * | 1994-03-31 | 1995-12-08 | Canon Inc | Production of color filter, producing device therefor, color filter, liquid crystal display device and device equipped with this liquid crystal display device |
| JPH07318724A (en) * | 1994-03-31 | 1995-12-08 | Canon Inc | Correcting method of color filter, correcting device therefor, color filter, liquid crystal display device, and device equipped with this liquid crystal display device |
| EP0703471A2 (en) | 1994-09-21 | 1996-03-27 | Canon Kabushiki Kaisha | Color filter, production process thereof, and liquid crystal display panel equipped with the color filter |
| EP0704722A2 (en) | 1994-09-30 | 1996-04-03 | Canon Kabushiki Kaisha | Color filter, production process thereof, liquid crystal display panel and information processor equipped with the panel |
| US5593757A (en) * | 1994-06-17 | 1997-01-14 | Canon Kabushiki Kaisha | Production process of color filter and color filter produced thereby |
| JPH0921909A (en) * | 1994-05-20 | 1997-01-21 | Canon Inc | Production of color filter and color filter and liquid crystal display device as well as device having this liquid crystal display device |
| US5681675A (en) * | 1994-05-18 | 1997-10-28 | Kabushiki Kaisha Toshiba | Fabricating method of liquid crystal display apparatus |
| US5736278A (en) * | 1995-06-20 | 1998-04-07 | Canon Kabushiki Kaisha | Color filter having light screening resin layer and filter resin layer |
| US5952129A (en) * | 1995-09-28 | 1999-09-14 | Seiko Epson Corporation | Method of making a color filter |
| US5956063A (en) * | 1994-09-14 | 1999-09-21 | Canon Kabushiki Kaisha | Color filter, display device using color filter, apparatus comprising display device, ink-jet head, and color filter manufacturing method and apparatus |
| EP0947859A1 (en) | 1998-03-31 | 1999-10-06 | Canon Kabushiki Kaisha | Ink, color filter, liquid crystal panel, and computer, and process for producing color filter |
| US5976734A (en) * | 1997-06-02 | 1999-11-02 | Canon Kabushiki Kaisha | Preparation process of color liquid crystal display device |
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| US6063174A (en) * | 1997-09-22 | 2000-05-16 | Canon Kabushiki Kaisha | Ink for use in ink-jet recording, color filter, liquid crystal panel, computer and method for producing color filter |
| USRE36711E (en) * | 1992-06-01 | 2000-05-23 | Lg Electronics Inc. | Method of fabricating a liquid crystal display |
| US6127072A (en) * | 1997-06-02 | 2000-10-03 | Canon Kabushiki Kaisha | Production of color filter by forming light-screening layer and irradiating resin layer to achieve ink-accepting property |
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| US6120943A (en) * | 1994-05-18 | 2000-09-19 | Kabushiki Kaisha Toshiba | Fabricating method of liquid crystal display apparatus |
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| US5976734A (en) * | 1997-06-02 | 1999-11-02 | Canon Kabushiki Kaisha | Preparation process of color liquid crystal display device |
| US6224201B1 (en) | 1997-07-28 | 2001-05-01 | Canon Kabushiki Kaisha | Ink jet recording apparatus provided with an improved ink supply route |
| US6143450A (en) * | 1997-09-05 | 2000-11-07 | Canon Kabushiki Kaisha | Color filter substrate manufacturing method, color filter substrate manufactured by this manufacturing method, and liquid crystal element using this color filter substrate |
| US6063174A (en) * | 1997-09-22 | 2000-05-16 | Canon Kabushiki Kaisha | Ink for use in ink-jet recording, color filter, liquid crystal panel, computer and method for producing color filter |
| US6203604B1 (en) | 1998-03-31 | 2001-03-20 | Canon Kabushiki Kaisha | Ink, color filter, liquid crystal panel, and computer, and process for producing color filter |
| US6248482B1 (en) | 1998-03-31 | 2001-06-19 | Canon Kabushiki Kaisha | Ink, color filter, liquid crystal panel, and computer, and process for producing color filter |
| EP0947859A1 (en) | 1998-03-31 | 1999-10-06 | Canon Kabushiki Kaisha | Ink, color filter, liquid crystal panel, and computer, and process for producing color filter |
| US6270930B1 (en) | 1998-07-30 | 2001-08-07 | Canon Kabushiki Kaisha | Production apparatus and production process for color filter, and liquid crystal display device using color filter produced thereby |
| US6394578B1 (en) | 1998-09-02 | 2002-05-28 | Canon Kabushiki Kaisha | Production process of color filter, liquid crystal display device using the color filter produced by the production process, and ink-jet head |
| EP0984303A1 (en) | 1998-09-02 | 2000-03-08 | Canon Kabushiki Kaisha | Production process of color filter, liquid crystal display device using the color filter produced by the production process, and ink-jet head |
| US6309783B1 (en) | 1998-12-22 | 2001-10-30 | Canon Kabushiki Kaisha | Color filter and method of manufacturing the same |
| US6399257B1 (en) | 1999-03-10 | 2002-06-04 | Canon Kabushiki Kaisha | Color filter manufacturing method, color filter manufactured by the method, and liquid crystal device employing the color filter |
| US6533852B2 (en) | 2000-01-31 | 2003-03-18 | Canon Kabushiki Kaisha | Recording ink, method for ink jet recording, method for producing color filter, color filter, method for producing liquid crystal display panel, liquid crystal display panel, and yellow ink |
| US6667795B2 (en) * | 2000-05-23 | 2003-12-23 | Canon Kabushiki Kaisha | Head unit, display device panel manufacturing apparatus for manufacturing panel for display device using the head unit, manufacturing method thereof, manufacturing method of liquid crystal display device having color filter, and device having the liquid crystal display device |
| WO2007125917A1 (en) | 2006-04-24 | 2007-11-08 | Toyo Ink Manufacturing Co., Ltd. | Non-aqueous ink-jet ink, ink composition for ink-jet recording, and color filter substrate |
| CN104614893A (en) * | 2015-03-03 | 2015-05-13 | 京东方科技集团股份有限公司 | Display substrate and manufacturing method thereof as well as display device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2597626B2 (en) | 1997-04-09 |
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