JPH0715138Y2 - 縦型収納治具 - Google Patents
縦型収納治具Info
- Publication number
- JPH0715138Y2 JPH0715138Y2 JP1986015694U JP1569486U JPH0715138Y2 JP H0715138 Y2 JPH0715138 Y2 JP H0715138Y2 JP 1986015694 U JP1986015694 U JP 1986015694U JP 1569486 U JP1569486 U JP 1569486U JP H0715138 Y2 JPH0715138 Y2 JP H0715138Y2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- arc
- shaped
- storage jig
- holding portion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 claims description 29
- 230000002093 peripheral effect Effects 0.000 claims description 21
- 235000012431 wafers Nutrition 0.000 description 121
- 238000000034 method Methods 0.000 description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 9
- 239000007789 gas Substances 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 8
- 239000010453 quartz Substances 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 238000009792 diffusion process Methods 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000009434 installation Methods 0.000 description 5
- 239000012495 reaction gas Substances 0.000 description 5
- 238000007796 conventional method Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 238000000605 extraction Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1986015694U JPH0715138Y2 (ja) | 1986-02-07 | 1986-02-07 | 縦型収納治具 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1986015694U JPH0715138Y2 (ja) | 1986-02-07 | 1986-02-07 | 縦型収納治具 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62128633U JPS62128633U (enrdf_load_stackoverflow) | 1987-08-14 |
JPH0715138Y2 true JPH0715138Y2 (ja) | 1995-04-10 |
Family
ID=30806862
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1986015694U Expired - Lifetime JPH0715138Y2 (ja) | 1986-02-07 | 1986-02-07 | 縦型収納治具 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0715138Y2 (enrdf_load_stackoverflow) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2961167B2 (ja) * | 1988-03-18 | 1999-10-12 | 東京エレクトロン株式会社 | ボート並びにそれを用いた熱処理装置及び方法 |
JPH0648859Y2 (ja) * | 1989-03-03 | 1994-12-12 | ラムコ株式会社 | ウエハー支持具 |
JP2537563Y2 (ja) * | 1989-03-20 | 1997-06-04 | 東横化学 株式会社 | 縦型減圧気相成長装置 |
US5492229A (en) * | 1992-11-27 | 1996-02-20 | Toshiba Ceramics Co., Ltd. | Vertical boat and a method for making the same |
JP3280438B2 (ja) * | 1992-11-30 | 2002-05-13 | 東芝セラミックス株式会社 | 縦型ボート |
JP3250628B2 (ja) * | 1992-12-17 | 2002-01-28 | 東芝セラミックス株式会社 | 縦型半導体熱処理用治具 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS523731Y2 (enrdf_load_stackoverflow) * | 1971-06-21 | 1977-01-26 | ||
JPS51879A (en) * | 1974-06-21 | 1976-01-07 | Hitachi Ltd | Cvd sochi |
JPS60124031U (ja) * | 1984-01-27 | 1985-08-21 | 富士通株式会社 | 縦型炉 |
-
1986
- 1986-02-07 JP JP1986015694U patent/JPH0715138Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS62128633U (enrdf_load_stackoverflow) | 1987-08-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH0715138Y2 (ja) | 縦型収納治具 | |
JPH06224146A (ja) | 熱処理用ボート | |
JP2001035903A (ja) | ウェーハ・ハンドリング装置用組立体 | |
JP3142285B2 (ja) | イオン注入装置及び方法 | |
JPS61140432A (ja) | ウエハ−等の保持装置 | |
US20030002973A1 (en) | Wafer handling system and wafer handling method | |
KR101340244B1 (ko) | 장축 컴포넌트 로더 | |
JP2956665B2 (ja) | ウエハー搬送装置 | |
JPH06132387A (ja) | 真空吸着ステージ | |
JPH0727964B2 (ja) | 縦型収納治具 | |
KR960043011A (ko) | 플라즈마 가공중에 기판의 표면상으로 플라즈마를 집중시키도록 웨이퍼를 지지하기 위한 척조립체 및 방법 | |
KR102705519B1 (ko) | 기판 식각 처리장치 | |
JP2996355B2 (ja) | 縦型収納治具 | |
JPH0627952Y2 (ja) | ウエハトレイ・サセプタ・トレイ受台の形状 | |
JP2003181767A (ja) | 研削ホイールの装着機構 | |
CN113130369A (zh) | 晶圆夹持装置 | |
JP3265498B2 (ja) | 半導体ウェーハ用縦型炉 | |
JPS5940444Y2 (ja) | 拡散治具 | |
CN217009161U (zh) | 一种置物台 | |
JP2003332253A (ja) | 縦型ウエハボート | |
JPH04157752A (ja) | 縦型半導体製造装置におけるキャリアステージ装置 | |
JPS5914401A (ja) | 工作機械の回転軸支持フレ−ム | |
JP3886614B2 (ja) | 半導体ウェーハ移送装置 | |
KR200198450Y1 (ko) | 반도체 웨이퍼 검사장비의 척 | |
JP2001293590A (ja) | レーザ加工機の加工用パイプ支持装置とレーザ加工機の加工用パイプ支持装置の製作方法 |