JPH0711170Y2 - 薄膜形成装置 - Google Patents
薄膜形成装置Info
- Publication number
- JPH0711170Y2 JPH0711170Y2 JP1989118795U JP11879589U JPH0711170Y2 JP H0711170 Y2 JPH0711170 Y2 JP H0711170Y2 JP 1989118795 U JP1989118795 U JP 1989118795U JP 11879589 U JP11879589 U JP 11879589U JP H0711170 Y2 JPH0711170 Y2 JP H0711170Y2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- thin film
- film forming
- dust removing
- forming apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010409 thin film Substances 0.000 title claims description 29
- 239000000758 substrate Substances 0.000 claims description 48
- 239000000428 dust Substances 0.000 claims description 33
- 239000010408 film Substances 0.000 claims description 24
- 238000001704 evaporation Methods 0.000 claims description 6
- 230000008020 evaporation Effects 0.000 claims description 6
- 229920002379 silicone rubber Polymers 0.000 claims description 5
- 239000004945 silicone rubber Substances 0.000 claims description 5
- 239000000853 adhesive Substances 0.000 claims description 4
- 230000001070 adhesive effect Effects 0.000 claims description 4
- 229920006254 polymer film Polymers 0.000 claims description 4
- 239000002245 particle Substances 0.000 claims description 3
- 238000005192 partition Methods 0.000 claims description 3
- 238000011144 upstream manufacturing Methods 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 2
- 238000000151 deposition Methods 0.000 claims 1
- 230000002093 peripheral effect Effects 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910000889 permalloy Inorganic materials 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 229920000307 polymer substrate Polymers 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 229910002441 CoNi Inorganic materials 0.000 description 1
- 229910000684 Cobalt-chrome Inorganic materials 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 239000004840 adhesive resin Substances 0.000 description 1
- 229920006223 adhesive resin Polymers 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 239000010952 cobalt-chrome Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 238000005289 physical deposition Methods 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989118795U JPH0711170Y2 (ja) | 1989-10-12 | 1989-10-12 | 薄膜形成装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989118795U JPH0711170Y2 (ja) | 1989-10-12 | 1989-10-12 | 薄膜形成装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0359365U JPH0359365U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1991-06-11 |
| JPH0711170Y2 true JPH0711170Y2 (ja) | 1995-03-15 |
Family
ID=31666945
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989118795U Expired - Lifetime JPH0711170Y2 (ja) | 1989-10-12 | 1989-10-12 | 薄膜形成装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0711170Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002242131A (ja) * | 2001-02-15 | 2002-08-28 | Toko Guard Kk | 交通誘導ロボット |
| JP4988283B2 (ja) * | 2006-09-22 | 2012-08-01 | パナソニック株式会社 | 照明システム |
| JP2016060942A (ja) * | 2014-09-18 | 2016-04-25 | 東レエンジニアリング株式会社 | 薄膜形成装置、薄膜形成方法および薄膜付き基材 |
-
1989
- 1989-10-12 JP JP1989118795U patent/JPH0711170Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0359365U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1991-06-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |