JPH065661Y2 - 電流密度分布測定装置 - Google Patents

電流密度分布測定装置

Info

Publication number
JPH065661Y2
JPH065661Y2 JP5168989U JP5168989U JPH065661Y2 JP H065661 Y2 JPH065661 Y2 JP H065661Y2 JP 5168989 U JP5168989 U JP 5168989U JP 5168989 U JP5168989 U JP 5168989U JP H065661 Y2 JPH065661 Y2 JP H065661Y2
Authority
JP
Japan
Prior art keywords
current
density distribution
current density
cup
distribution measuring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP5168989U
Other languages
English (en)
Japanese (ja)
Other versions
JPH02141878U (enrdf_load_stackoverflow
Inventor
進 小野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Elionix Inc
Original Assignee
Elionix Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Elionix Inc filed Critical Elionix Inc
Priority to JP5168989U priority Critical patent/JPH065661Y2/ja
Publication of JPH02141878U publication Critical patent/JPH02141878U/ja
Application granted granted Critical
Publication of JPH065661Y2 publication Critical patent/JPH065661Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
JP5168989U 1989-05-02 1989-05-02 電流密度分布測定装置 Expired - Lifetime JPH065661Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5168989U JPH065661Y2 (ja) 1989-05-02 1989-05-02 電流密度分布測定装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5168989U JPH065661Y2 (ja) 1989-05-02 1989-05-02 電流密度分布測定装置

Publications (2)

Publication Number Publication Date
JPH02141878U JPH02141878U (enrdf_load_stackoverflow) 1990-11-29
JPH065661Y2 true JPH065661Y2 (ja) 1994-02-09

Family

ID=31571346

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5168989U Expired - Lifetime JPH065661Y2 (ja) 1989-05-02 1989-05-02 電流密度分布測定装置

Country Status (1)

Country Link
JP (1) JPH065661Y2 (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4504880B2 (ja) * 2005-07-08 2010-07-14 株式会社日立ハイテクノロジーズ 真空排気系を利用したシリンダを用いたイオンビーム電流測定機構
US7453070B2 (en) * 2006-06-29 2008-11-18 Varian Semiconductor Associates, Inc. Methods and apparatus for beam density measurement in two dimensions

Also Published As

Publication number Publication date
JPH02141878U (enrdf_load_stackoverflow) 1990-11-29

Similar Documents

Publication Publication Date Title
US7923701B2 (en) Charged particle beam equipment
JPH065661Y2 (ja) 電流密度分布測定装置
KR100808701B1 (ko) 표면의 물리적 특성을 측정하기 위한 장치 및 그 패턴 생성장치
JPH10283974A (ja) イオン注入方法および装置
DE2741048A1 (de) Optoelektronisches messgeraet mit mehreren sensoren und verfahren zum messen der ebenheit von oberflaechen mit diesem geraet
CN115597504A (zh) 用于机器视觉量测的激光同轴度的校准装置及校准方法
JP2002042709A (ja) 走査型電子顕微鏡の校正方法
CN215524516U (zh) 一种光影法晶片尺寸测量仪
JP3407468B2 (ja) イオンビームの平行化調整方法
JP3941706B2 (ja) 調整方法と冶具
JP3973016B2 (ja) 剥離強度検査装置
JP2001176953A (ja) 半導体ウエハ搬送装置受け渡し部の寸法測定器、その寸法測定器を用いた測定・調整方法及び校正用装置
JP3022649B2 (ja) 半導体検査装置
JPH08122055A (ja) 表面粗さ形状測定機のワーク傾斜調整方法及びその 装置
JPH0253723B2 (enrdf_load_stackoverflow)
JP3419662B2 (ja) 仕事関数測定方法、仕事関数測定装置、及び試料ホルダ
JPS6214372B2 (enrdf_load_stackoverflow)
JP2003014446A (ja) 反り測定装置
JP3909592B2 (ja) 平板基板の部分歪み測定方法及び部分歪み測定装置、並びに表示用パネルの製造方法
CN212989559U (zh) 硅片寿命测试系统
JPS63312057A (ja) 切断装置における傾き検出方法
KR900001985B1 (ko) 반도체 디바이스 측정장치
JPH0376213A (ja) 荷電粒子線の断面径測定方法および装置
KR100229499B1 (ko) 평면도 측정장치
JPH10122837A (ja) 形鋼のオンライン測定装置の校正方法および装置、並びに校正治具搭載用架台