JPH065661Y2 - 電流密度分布測定装置 - Google Patents
電流密度分布測定装置Info
- Publication number
- JPH065661Y2 JPH065661Y2 JP5168989U JP5168989U JPH065661Y2 JP H065661 Y2 JPH065661 Y2 JP H065661Y2 JP 5168989 U JP5168989 U JP 5168989U JP 5168989 U JP5168989 U JP 5168989U JP H065661 Y2 JPH065661 Y2 JP H065661Y2
- Authority
- JP
- Japan
- Prior art keywords
- current
- density distribution
- current density
- cup
- distribution measuring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000010884 ion-beam technique Methods 0.000 claims description 15
- 238000010586 diagram Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 235000012431 wafers Nutrition 0.000 description 5
- 238000005530 etching Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 1
Landscapes
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5168989U JPH065661Y2 (ja) | 1989-05-02 | 1989-05-02 | 電流密度分布測定装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5168989U JPH065661Y2 (ja) | 1989-05-02 | 1989-05-02 | 電流密度分布測定装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02141878U JPH02141878U (enrdf_load_stackoverflow) | 1990-11-29 |
JPH065661Y2 true JPH065661Y2 (ja) | 1994-02-09 |
Family
ID=31571346
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5168989U Expired - Lifetime JPH065661Y2 (ja) | 1989-05-02 | 1989-05-02 | 電流密度分布測定装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH065661Y2 (enrdf_load_stackoverflow) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4504880B2 (ja) * | 2005-07-08 | 2010-07-14 | 株式会社日立ハイテクノロジーズ | 真空排気系を利用したシリンダを用いたイオンビーム電流測定機構 |
US7453070B2 (en) * | 2006-06-29 | 2008-11-18 | Varian Semiconductor Associates, Inc. | Methods and apparatus for beam density measurement in two dimensions |
-
1989
- 1989-05-02 JP JP5168989U patent/JPH065661Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH02141878U (enrdf_load_stackoverflow) | 1990-11-29 |
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