JPH06506266A - 光透過性導電性酸化物 - Google Patents

光透過性導電性酸化物

Info

Publication number
JPH06506266A
JPH06506266A JP4508757A JP50875792A JPH06506266A JP H06506266 A JPH06506266 A JP H06506266A JP 4508757 A JP4508757 A JP 4508757A JP 50875792 A JP50875792 A JP 50875792A JP H06506266 A JPH06506266 A JP H06506266A
Authority
JP
Japan
Prior art keywords
gas
sputtering
light
fluorine
stabilizing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4508757A
Other languages
English (en)
Japanese (ja)
Inventor
トラン，ナン　ティー．
ギルバート，ジェームズ　アール．
Original Assignee
ミネソタ　マイニング　アンド　マニュファクチャリング　カンパニー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ミネソタ　マイニング　アンド　マニュファクチャリング　カンパニー filed Critical ミネソタ　マイニング　アンド　マニュファクチャリング　カンパニー
Publication of JPH06506266A publication Critical patent/JPH06506266A/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C03C17/2453—Coating containing SnO2
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/23—Mixtures
    • C03C2217/231—In2O3/SnO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/24—Doped oxides
    • C03C2217/241—Doped oxides with halides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Photovoltaic Devices (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
JP4508757A 1991-04-08 1992-02-28 光透過性導電性酸化物 Pending JPH06506266A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US07/682,542 US5135581A (en) 1991-04-08 1991-04-08 Light transmissive electrically conductive oxide electrode formed in the presence of a stabilizing gas
US682,542 1991-04-08
PCT/US1992/001632 WO1992017620A1 (en) 1991-04-08 1992-02-28 Light transmissive electrically conductive oxide

Publications (1)

Publication Number Publication Date
JPH06506266A true JPH06506266A (ja) 1994-07-14

Family

ID=24740148

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4508757A Pending JPH06506266A (ja) 1991-04-08 1992-02-28 光透過性導電性酸化物

Country Status (6)

Country Link
US (1) US5135581A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
EP (1) EP0579712A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPH06506266A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CA (1) CA2104770A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
TW (1) TW217458B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
WO (1) WO1992017620A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7041391B2 (en) 1996-03-22 2006-05-09 Canon Kabushiki Kaisha Method for forming thin films
JP2013060632A (ja) * 2011-09-14 2013-04-04 National Central Univ 純すずターゲット材料がマグネトロンスパッタ法を利用したフッ素ドープ酸化すず薄膜の製造方法
JP2013082954A (ja) * 2011-10-06 2013-05-09 National Central Univ 純金属ターゲットで反応性スパッタリング方法を用いて作製されたフッ化物及びフッ素をドープした酸化物薄膜

Families Citing this family (45)

* Cited by examiner, † Cited by third party
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JPH05148634A (ja) * 1991-11-22 1993-06-15 Nec Corp スパツタリング装置
JP2912506B2 (ja) * 1992-10-21 1999-06-28 シャープ株式会社 透明導電膜の形成方法
US5911856A (en) * 1993-09-03 1999-06-15 Canon Kabushiki Kaisha Method for forming thin film
US5473456A (en) * 1993-10-27 1995-12-05 At&T Corp. Method for growing transparent conductive gallium-indium-oxide films by sputtering
US5397920A (en) * 1994-03-24 1995-03-14 Minnesota Mining And Manufacturing Company Light transmissive, electrically-conductive, oxide film and methods of production
JPH09260695A (ja) * 1996-03-19 1997-10-03 Canon Inc 光起電力素子アレーの製造方法
JP3514408B2 (ja) * 1996-09-12 2004-03-31 キヤノン株式会社 透明導電膜をスパッタ形成する方法
SE509933C2 (sv) * 1996-09-16 1999-03-22 Scandinavian Solar Ab Sätt och anordning att framställa ett spektralselektivt absorberande skikt till solkollektorer samt framställt skikt
US6093290A (en) * 1997-05-14 2000-07-25 Canon Kabushiki Kaisha Method of generating a reciprocating plurality of magnetic fluxes on a target
JP2000017437A (ja) * 1998-07-01 2000-01-18 Sony Corp 成膜装置
US20020084455A1 (en) * 1999-03-30 2002-07-04 Jeffery T. Cheung Transparent and conductive zinc oxide film with low growth temperature
US6240622B1 (en) * 1999-07-09 2001-06-05 Micron Technology, Inc. Integrated circuit inductors
WO2001048830A1 (en) * 1999-12-24 2001-07-05 Koninklijke Philips Electronics N.V. ELECTRO-OPTICAL DEVICE HAVING AN ITO LAYER, A SiN LAYER AND AN INTERMEDIATE SILICON OXIDE LAYER
US6368470B1 (en) 1999-12-29 2002-04-09 Southwall Technologies, Inc. Hydrogenating a layer of an antireflection coating
DE10023459A1 (de) * 2000-05-12 2001-11-15 Balzers Process Systems Gmbh Indium-Zinn-Oxid (ITO)-Schicht und Verfahren zur Herstellung derselben
KR100778835B1 (ko) * 2000-12-28 2007-11-22 엘지.필립스 엘시디 주식회사 액정표시장치의 제조방법
KR100776505B1 (ko) * 2000-12-30 2007-11-16 엘지.필립스 엘시디 주식회사 액정표시장치의 화소전극 제조 방법
DE10224990B3 (de) * 2002-06-05 2004-03-11 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Abscheidung transparenter leitfähiger Schichten
DE102004026231B4 (de) * 2004-05-28 2019-01-31 Osram Opto Semiconductors Gmbh Verfahren zur Herstellung eines Bereichs mit reduzierter elektrischer Leitfähigkeit innerhalb einer Halbleiterschicht und optoelektronisches Halbleiterbauelement
US7431992B2 (en) * 2004-08-09 2008-10-07 Ppg Industries Ohio, Inc. Coated substrates that include an undercoating
JP4733990B2 (ja) * 2005-02-01 2011-07-27 株式会社昭和真空 スパッタ装置
US7466376B2 (en) * 2005-03-22 2008-12-16 Konarka Technologies, Inc. Photovoltaic cell
US7597964B2 (en) * 2005-08-02 2009-10-06 Guardian Industries Corp. Thermally tempered coated article with transparent conductive oxide (TCO) coating
US8298380B2 (en) 2006-05-23 2012-10-30 Guardian Industries Corp. Method of making thermally tempered coated article with transparent conductive oxide (TCO) coating in color compression configuration, and product made using same
US7601558B2 (en) * 2006-10-24 2009-10-13 Applied Materials, Inc. Transparent zinc oxide electrode having a graded oxygen content
JP5099893B2 (ja) * 2007-10-22 2012-12-19 日東電工株式会社 透明導電性フィルム、その製造方法及びそれを備えたタッチパネル
CN102239564A (zh) * 2008-11-05 2011-11-09 欧瑞康太阳能股份公司(特吕巴赫) 太阳能电池器件及其制造方法
JP5168406B2 (ja) * 2009-03-18 2013-03-21 富士電機株式会社 太陽電池モジュール
WO2011057189A1 (en) * 2009-11-08 2011-05-12 First Solar, Inc. Back contact deposition using water-doped gas mixtures
US9862640B2 (en) 2010-01-16 2018-01-09 Cardinal Cg Company Tin oxide overcoat indium tin oxide coatings, coated glazings, and production methods
US10060180B2 (en) 2010-01-16 2018-08-28 Cardinal Cg Company Flash-treated indium tin oxide coatings, production methods, and insulating glass unit transparent conductive coating technology
US10000411B2 (en) 2010-01-16 2018-06-19 Cardinal Cg Company Insulating glass unit transparent conductivity and low emissivity coating technology
US11155493B2 (en) 2010-01-16 2021-10-26 Cardinal Cg Company Alloy oxide overcoat indium tin oxide coatings, coated glazings, and production methods
WO2011088330A2 (en) 2010-01-16 2011-07-21 Cardinal Cg Company High quality emission control coatings, emission control glazings, and production methods
US10000965B2 (en) 2010-01-16 2018-06-19 Cardinal Cg Company Insulating glass unit transparent conductive coating technology
EP2360290A1 (en) * 2010-02-11 2011-08-24 Applied Materials, Inc. Method for producing an ITO layer and sputtering system
WO2012083220A2 (en) * 2010-12-16 2012-06-21 The Regents Of The University Of California Generation of highly n-type, defect passivated transition metal oxides using plasma fluorine insertion
JP2014095099A (ja) * 2012-11-07 2014-05-22 Sumitomo Metal Mining Co Ltd 透明導電膜積層体及びその製造方法、並びに薄膜太陽電池及びその製造方法
EP2918699A1 (de) * 2014-03-14 2015-09-16 Justus-Liebig-Universität Gießen Verfahren zur Herstellung von Metalloxid-Halbleiterschichten und Verwendung von solchen Metalloxid-Halbleiterschichten in elektronischen Bauteilen
CN207552434U (zh) * 2017-12-14 2018-06-29 米亚索乐装备集成（福建）有限公司 一种用于太阳能电池的溅射镀膜装置
US20200010948A1 (en) * 2018-07-05 2020-01-09 Beijing Apollo Ding Rong Solar Technology Co., Ltd. Shielded sputter deposition apparatus and method
US11131018B2 (en) * 2018-08-14 2021-09-28 Viavi Solutions Inc. Coating material sputtered in presence of argon-helium based coating
US11028012B2 (en) 2018-10-31 2021-06-08 Cardinal Cg Company Low solar heat gain coatings, laminated glass assemblies, and methods of producing same
CN109830561B (zh) * 2019-02-20 2021-09-03 成都中建材光电材料有限公司 一种碲化镉薄膜太阳能电池组件及其制备方法
US20220115503A1 (en) * 2020-10-12 2022-04-14 Board Of Regents, The University Of Texas System Methods of Design and Use of High Mobility P-Type Metal Oxides

Family Cites Families (9)

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Publication number Priority date Publication date Assignee Title
BE515314A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1949-04-18
US3477936A (en) * 1967-06-29 1969-11-11 Ppg Industries Inc Sputtering of metals in an atmosphere of fluorine and oxygen
US3506556A (en) * 1968-02-28 1970-04-14 Ppg Industries Inc Sputtering of metal oxide films in the presence of hydrogen and oxygen
DE2930373A1 (de) * 1979-07-26 1981-02-19 Siemens Ag Verfahren zum herstellen transparenter, elektrisch leitender indiumoxid (in tief 2 o tief 3 )-schichten
US4532537A (en) * 1982-09-27 1985-07-30 Rca Corporation Photodetector with enhanced light absorption
US4623601A (en) * 1985-06-04 1986-11-18 Atlantic Richfield Company Photoconductive device containing zinc oxide transparent conductive layer
JPH0645888B2 (ja) * 1985-12-17 1994-06-15 キヤノン株式会社 堆積膜形成法
US4940495A (en) * 1988-12-07 1990-07-10 Minnesota Mining And Manufacturing Company Photovoltaic device having light transmitting electrically conductive stacked films
US4990286A (en) * 1989-03-17 1991-02-05 President And Fellows Of Harvard College Zinc oxyfluoride transparent conductor

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7041391B2 (en) 1996-03-22 2006-05-09 Canon Kabushiki Kaisha Method for forming thin films
JP2013060632A (ja) * 2011-09-14 2013-04-04 National Central Univ 純すずターゲット材料がマグネトロンスパッタ法を利用したフッ素ドープ酸化すず薄膜の製造方法
JP2013082954A (ja) * 2011-10-06 2013-05-09 National Central Univ 純金属ターゲットで反応性スパッタリング方法を用いて作製されたフッ化物及びフッ素をドープした酸化物薄膜

Also Published As

Publication number Publication date
CA2104770A1 (en) 1992-10-09
WO1992017620A1 (en) 1992-10-15
TW217458B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-12-11
EP0579712A1 (en) 1994-01-26
US5135581A (en) 1992-08-04

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