JPH0650538Y2 - 基板加熱装置 - Google Patents
基板加熱装置Info
- Publication number
- JPH0650538Y2 JPH0650538Y2 JP1989000037U JP3789U JPH0650538Y2 JP H0650538 Y2 JPH0650538 Y2 JP H0650538Y2 JP 1989000037 U JP1989000037 U JP 1989000037U JP 3789 U JP3789 U JP 3789U JP H0650538 Y2 JPH0650538 Y2 JP H0650538Y2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- heating
- substrate mounting
- heat stage
- heat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989000037U JPH0650538Y2 (ja) | 1989-01-05 | 1989-01-05 | 基板加熱装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989000037U JPH0650538Y2 (ja) | 1989-01-05 | 1989-01-05 | 基板加熱装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0294251U JPH0294251U (enrdf_load_stackoverflow) | 1990-07-26 |
JPH0650538Y2 true JPH0650538Y2 (ja) | 1994-12-21 |
Family
ID=31198705
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1989000037U Expired - Lifetime JPH0650538Y2 (ja) | 1989-01-05 | 1989-01-05 | 基板加熱装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0650538Y2 (enrdf_load_stackoverflow) |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6179769A (ja) * | 1984-09-28 | 1986-04-23 | Nec Corp | ウエハ温度制御装置 |
JPS63274768A (ja) * | 1987-05-06 | 1988-11-11 | Tokuda Seisakusho Ltd | 真空処理装置 |
-
1989
- 1989-01-05 JP JP1989000037U patent/JPH0650538Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH0294251U (enrdf_load_stackoverflow) | 1990-07-26 |
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