JPH0648843Y2 - 半導体処理用移送装置 - Google Patents
半導体処理用移送装置Info
- Publication number
- JPH0648843Y2 JPH0648843Y2 JP6440085U JP6440085U JPH0648843Y2 JP H0648843 Y2 JPH0648843 Y2 JP H0648843Y2 JP 6440085 U JP6440085 U JP 6440085U JP 6440085 U JP6440085 U JP 6440085U JP H0648843 Y2 JPH0648843 Y2 JP H0648843Y2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor
- transfer
- cartridge
- transfer means
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 title claims description 49
- 235000012431 wafers Nutrition 0.000 description 89
- 238000005229 chemical vapour deposition Methods 0.000 description 28
- 239000003921 oil Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 7
- 238000003780 insertion Methods 0.000 description 5
- 230000037431 insertion Effects 0.000 description 5
- 239000000428 dust Substances 0.000 description 4
- 230000007257 malfunction Effects 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 238000007599 discharging Methods 0.000 description 3
- 230000003028 elevating effect Effects 0.000 description 3
- 238000001816 cooling Methods 0.000 description 2
- 230000001965 increasing effect Effects 0.000 description 2
- 230000035939 shock Effects 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000010485 coping Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
Landscapes
- Intermediate Stations On Conveyors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6440085U JPH0648843Y2 (ja) | 1985-04-30 | 1985-04-30 | 半導体処理用移送装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6440085U JPH0648843Y2 (ja) | 1985-04-30 | 1985-04-30 | 半導体処理用移送装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61179749U JPS61179749U (enExample) | 1986-11-10 |
| JPH0648843Y2 true JPH0648843Y2 (ja) | 1994-12-12 |
Family
ID=30595449
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6440085U Expired - Lifetime JPH0648843Y2 (ja) | 1985-04-30 | 1985-04-30 | 半導体処理用移送装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0648843Y2 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0810680B2 (ja) * | 1987-05-08 | 1996-01-31 | 東京エレクトロン東北株式会社 | 熱処理用ボ−ト |
-
1985
- 1985-04-30 JP JP6440085U patent/JPH0648843Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61179749U (enExample) | 1986-11-10 |
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