JPH06460Y2 - シリンダ型気相成長装置 - Google Patents
シリンダ型気相成長装置Info
- Publication number
- JPH06460Y2 JPH06460Y2 JP14680988U JP14680988U JPH06460Y2 JP H06460 Y2 JPH06460 Y2 JP H06460Y2 JP 14680988 U JP14680988 U JP 14680988U JP 14680988 U JP14680988 U JP 14680988U JP H06460 Y2 JPH06460 Y2 JP H06460Y2
- Authority
- JP
- Japan
- Prior art keywords
- gas supply
- gas
- reaction tube
- baffle
- cylinder type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14680988U JPH06460Y2 (ja) | 1988-11-10 | 1988-11-10 | シリンダ型気相成長装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14680988U JPH06460Y2 (ja) | 1988-11-10 | 1988-11-10 | シリンダ型気相成長装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0266682U JPH0266682U (pl) | 1990-05-21 |
JPH06460Y2 true JPH06460Y2 (ja) | 1994-01-05 |
Family
ID=31416642
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14680988U Expired - Lifetime JPH06460Y2 (ja) | 1988-11-10 | 1988-11-10 | シリンダ型気相成長装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH06460Y2 (pl) |
-
1988
- 1988-11-10 JP JP14680988U patent/JPH06460Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH0266682U (pl) | 1990-05-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH03287770A (ja) | 枚葉式常圧cvd装置 | |
JPH06460Y2 (ja) | シリンダ型気相成長装置 | |
JPH03255618A (ja) | 縦型cvd装置 | |
JP2734197B2 (ja) | 気相成長装置 | |
JPH062882B2 (ja) | 微粒子製造装置 | |
JPH02283696A (ja) | 化学気相成長装置 | |
JP2792886B2 (ja) | 化学気相成長装置 | |
JPH0530350Y2 (pl) | ||
JPH0772352B2 (ja) | 化学蒸着装置及び化学蒸着方法 | |
JP2020503441A (ja) | チタン粉末製造装置及び方法 | |
JPH03105854A (ja) | リチウム負極の製造法 | |
JPH04211115A (ja) | Rfプラズマcvd装置ならびに該装置による薄膜形成方法 | |
JP2582105Y2 (ja) | 化学気相成長装置 | |
JPH0437901Y2 (pl) | ||
JPS5943988B2 (ja) | 超微粒子膜の製造方法および製造装置 | |
JPS58174568A (ja) | 金属化合物被膜の形成方法 | |
JPH02214112A (ja) | 薄膜製造装置 | |
CN116043327A (zh) | 一种用于延长气相生长基座内热场寿命的结构 | |
JPH03211279A (ja) | 化学気相成長装置 | |
JPH01165120A (ja) | エツチング装置 | |
JPH0331475A (ja) | Cvd法による金属薄膜の成膜方法 | |
JPH06103668B2 (ja) | 気相成長装置 | |
JP2838929B2 (ja) | 化学気相成長装置 | |
JPS5972718A (ja) | 縦型気相成長装置 | |
JP2000256829A (ja) | ガスデポジション装置および方法 |