JPH0266682U - - Google Patents
Info
- Publication number
- JPH0266682U JPH0266682U JP14680988U JP14680988U JPH0266682U JP H0266682 U JPH0266682 U JP H0266682U JP 14680988 U JP14680988 U JP 14680988U JP 14680988 U JP14680988 U JP 14680988U JP H0266682 U JPH0266682 U JP H0266682U
- Authority
- JP
- Japan
- Prior art keywords
- gas supply
- reaction tube
- supply nozzle
- buttful
- hanger
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010926 purge Methods 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 3
- 239000002184 metal Substances 0.000 claims 1
- 238000001947 vapour-phase growth Methods 0.000 claims 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14680988U JPH06460Y2 (ja) | 1988-11-10 | 1988-11-10 | シリンダ型気相成長装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14680988U JPH06460Y2 (ja) | 1988-11-10 | 1988-11-10 | シリンダ型気相成長装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0266682U true JPH0266682U (pl) | 1990-05-21 |
| JPH06460Y2 JPH06460Y2 (ja) | 1994-01-05 |
Family
ID=31416642
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14680988U Expired - Lifetime JPH06460Y2 (ja) | 1988-11-10 | 1988-11-10 | シリンダ型気相成長装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06460Y2 (pl) |
-
1988
- 1988-11-10 JP JP14680988U patent/JPH06460Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH06460Y2 (ja) | 1994-01-05 |