JPH06228282A - Epoxy resin composition and sealed semiconductor device - Google Patents

Epoxy resin composition and sealed semiconductor device

Info

Publication number
JPH06228282A
JPH06228282A JP4197693A JP4197693A JPH06228282A JP H06228282 A JPH06228282 A JP H06228282A JP 4197693 A JP4197693 A JP 4197693A JP 4197693 A JP4197693 A JP 4197693A JP H06228282 A JPH06228282 A JP H06228282A
Authority
JP
Japan
Prior art keywords
resin
inorganic filler
epoxy resin
component
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4197693A
Other languages
Japanese (ja)
Inventor
Koichi Ibuki
浩一 伊吹
Kazuhiro Sawai
和弘 沢井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Chemical Corp
Original Assignee
Toshiba Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Chemical Corp filed Critical Toshiba Chemical Corp
Priority to JP4197693A priority Critical patent/JPH06228282A/en
Publication of JPH06228282A publication Critical patent/JPH06228282A/en
Pending legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PURPOSE:To obtain the subject composition, improved in wettability of the interface between a resin and an inorganic filler, excellent in moisture resistance, moldability and fluidity and having high reliability by using a resin containing the inorganic filler uniformly dispersed in an epoxy resin. CONSTITUTION:The objective composition comprises a resin prepared by uniformly dispersing and mixing (B) a part or all of an inorganic filler to be blended (preferably silica powder or alumina) in (A) an epoxy resin and (C) a phenolic resin as essential components. This composition comprises 30-95wt.% resin prepared by dispersing and mixing the component (B) in the component (A) and 25-90wt.% component (B) based on the whole resin composition. In order to prepare the composition as a molding material, the component (A) is usually heated above the melting point and completely melted with an extruder, etc., and the part of the component (B) is subsequently added to stir the resultant mixture at >=100 deg.C for 20min. The resin and the component (C) are pulverized and the residual component (B) and other components are then uniformly mixed therewith. The obtained mixture is thermally kneaded and further cooled, solidified and subsequently pulverized.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、耐湿性、成形性等に優
れ、電子又は電気部品の封止等に好適なエポキシ樹脂組
成物、その製造方法および半導体封止装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition which is excellent in moisture resistance, moldability and the like and is suitable for sealing electronic or electric parts, a method for producing the same, and a semiconductor sealing device.

【0002】[0002]

【従来の技術】従来、ダイオード、トランジスタ、集積
回路等の電子部品においては、熱硬化性樹脂を用いて封
止する方法が行われてきた。この封止方法は、ガラス、
金属、セラミックを用いたハーメチックシール方式に比
較して経済的に有利なため、広く実用化されている。封
止樹脂としては、熱硬化性樹脂の中でも信頼性および価
格の点から、エポキシ樹脂が最も一般的に用いられてい
る。エポキシ樹脂には、酸無水物、芳香族アミン、ノボ
ラック型フェノール樹脂等の硬化剤が用いられるが、こ
れらの中でもノボラック型フェノール樹脂を硬化剤とし
たエポキシ樹脂は、他の硬化剤を利用したものに比べ
て、成形性、耐湿性に優れ、毒性がなく、かつ安価であ
るため、半導体封止用樹脂として広く使用されている。
また、充填剤としては、一般的に溶融シリカ粉末や結晶
性シリカ粉末が前述の硬化剤と共に使用されている。
2. Description of the Related Art Conventionally, thermosetting resins have been used for sealing electronic parts such as diodes, transistors and integrated circuits. This sealing method is made of glass,
Since it is economically advantageous as compared with the hermetic seal method using metal or ceramic, it is widely used. Among thermosetting resins, epoxy resins are most commonly used as the sealing resin from the viewpoints of reliability and price. Hardeners such as acid anhydrides, aromatic amines, and novolac-type phenolic resins are used as epoxy resins. Among these, epoxy resins using novolac-type phenolic resins as hardeners are those that use other curing agents. Compared with, it is widely used as a resin for semiconductor encapsulation because it is excellent in moldability and moisture resistance, has no toxicity, and is inexpensive.
As the filler, fused silica powder or crystalline silica powder is generally used together with the above-mentioned curing agent.

【0003】近年、微細な無機質充填剤の多用および無
機質充填剤の高充填により、充填剤の表面積が大きくな
っている。そのため充填剤界面の濡れが不十分になって
おり、また、微細な充填剤の多用から充填剤の凝集物を
造りやすく、均一な分散ができずに封止樹脂中に凝集物
が生じ、流動性が悪くなり、吸湿性が高くなり、またバ
リ等のため成形性に劣る欠点があった。
In recent years, the surface area of fillers has increased due to the frequent use of fine inorganic fillers and the high filling of inorganic fillers. As a result, the wetting of the filler interface is insufficient, and it is easy to form agglomerates of the filler due to the heavy use of fine fillers, and it is not possible to uniformly disperse the agglomerates in the encapsulation resin, causing fluidization. However, there are drawbacks such as poor moldability, high hygroscopicity, and poor moldability due to burrs and the like.

【0004】[0004]

【発明が解決しようとする課題】本発明は、上記の欠点
を解消するためになされたもので、樹脂と無機質充填剤
の界面の濡れ性を向上させ、無機質充填剤を均一に分散
させることにより吸湿性を少なくし、耐湿性、成形性、
流動性の優れた信頼性の高いエポキシ樹脂組成物および
半導体封止装置を提供しようとするものである。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned drawbacks by improving the wettability of the interface between the resin and the inorganic filler and uniformly dispersing the inorganic filler. Hygroscopicity is reduced, moisture resistance, moldability,
It is intended to provide a highly reliable epoxy resin composition having excellent fluidity and a semiconductor sealing device.

【0005】[0005]

【課題を解決するための手段】本発明者らは、上記の目
的を達成しようと鋭意研究を重ねた結果、エポキシ樹脂
中に無機質充填剤を均一に分散させた樹脂を用いること
によって、上記目的が達成できることを見いだし、本発
明を完成させたものである。
Means for Solving the Problems As a result of intensive studies aimed at achieving the above object, the present inventors have found that the use of a resin in which an inorganic filler is uniformly dispersed in an epoxy resin makes it possible to achieve the above object. The present invention has been completed by discovering that the above can be achieved.

【0006】すなわち、本発明は、(A)(a )エポキ
シ樹脂に(b )配合すべき無機質充填剤の一部又は全部
を均一に分散混合した樹脂[(a )+(b )]および
(B)フェノール樹脂を必須成分とし、全体の樹脂組成
物に対して、前記(A)樹脂の[(a )+(b)]を30
〜95重量%、また(b )無機質充填剤を25〜90重量%の
割合で含有してなることを特徴とするエポキシ樹脂組成
物およぴその製造方法である。また、このエポキシ樹脂
組成物の硬化物で、半導体チップが封止されてなること
を特徴とする半導体封止装置である。
That is, according to the present invention, resins ((a) + (b)) and ((A) (a) epoxy resin (b) in which a part or all of the inorganic filler to be blended are uniformly mixed and mixed. B) Phenolic resin is an essential component, and [(a) + (b)] of the above (A) resin is added to the whole resin composition by 30%.
To 95% by weight and (b) an inorganic filler in a proportion of 25 to 90% by weight, and an epoxy resin composition and a method for producing the same. A semiconductor encapsulation device is obtained by encapsulating a semiconductor chip with a cured product of this epoxy resin composition.

【0007】以下、本発明を詳細に説明する。The present invention will be described in detail below.

【0008】本発明に用いる(A)樹脂としては、(a
)エポキシ樹脂に(b )配合すべき無機質充填剤の一
部又は全部を均一に分散混合した樹脂である。ここで用
いる(a )エポキシ樹脂としては、その分子中にエポキ
シ基を少なくとも 2個有する化合物である限り、分子構
造、分子量等に制限されることなく、一般に使用されて
いるものを広く使用することができる。例えば、ビスフ
ェノール型等の芳香族系、シクロヘクサン誘導体等の脂
環族系、さらに次の一般式で示されるエポキシノボラッ
ク系等の樹脂が挙げられる。
The resin (A) used in the present invention includes (a)
) A resin obtained by uniformly dispersing and mixing a part or all of the inorganic filler to be blended with (b) in the epoxy resin. As the (a) epoxy resin used here, as long as it is a compound having at least two epoxy groups in the molecule, it is not limited by molecular structure, molecular weight, etc., and widely used ones can be widely used. You can Examples thereof include resins such as bisphenol type aromatic resins, cyclohexan derivatives and other alicyclic resins, and epoxy novolac resins represented by the following general formula.

【0009】[0009]

【化1】 (但し、式中R1 は水素原子、ハロゲン原子又はアルキ
ル基を、R2 は水素原子又はアルキル基を、n は 1以上
の整数を表す)これらのエポキシ樹脂は単独又は混合し
て使用することができる。
[Chemical 1] (In the formula, R 1 represents a hydrogen atom, a halogen atom or an alkyl group, R 2 represents a hydrogen atom or an alkyl group, and n represents an integer of 1 or more.) These epoxy resins may be used alone or in combination. You can

【0010】また(A)に用いる(b )無機質充填剤と
しては、一般に使用されているものが広く使用される。
これらの無機質充填剤としては、例えば、シリカ粉末、
アルミナ、三酸化アンチモン、タルク、炭酸カルシウ
ム、チタンホワイト、クレー、ベンガラ、ガラス繊維、
炭素繊維等が挙げられ、特にシリカ粉末およびアルミナ
が好ましく用いられる。無機質充填剤の配合割合は、全
体の樹脂組成物に対して25〜90重量%含有するように配
合することが好ましい。その割合が25重量%未満では樹
脂組成物の耐湿性、耐熱性、機械的特性および成形性に
劣り、また90重量%を超えると極端に流動性が悪くな
り、成形性に劣り好ましくない。
As the inorganic filler (b) used in (A), generally used ones are widely used.
Examples of these inorganic fillers include silica powder,
Alumina, antimony trioxide, talc, calcium carbonate, white titanium, clay, red iron oxide, glass fiber,
Examples thereof include carbon fiber, and silica powder and alumina are particularly preferably used. The blending ratio of the inorganic filler is preferably 25 to 90% by weight based on the total resin composition. If the proportion is less than 25% by weight, the resin composition will be inferior in moisture resistance, heat resistance, mechanical properties and moldability, and if it exceeds 90% by weight, the fluidity will be extremely deteriorated and moldability will be inferior.

【0011】この(A)樹脂は、(a )エポキシ樹脂を
融点以上に加熱して完全に溶融し、次に(b )無機質充
填剤を加えて20分以上攪拌して、無機質充填剤を均一に
分散混合させてつくる。この場合に無機質充填剤はその
全部でもまたその一部でもよい。
The resin (A) is obtained by heating (a) the epoxy resin to its melting point or higher to completely melt it, then adding (b) the inorganic filler and stirring the mixture for 20 minutes or more to homogenize the inorganic filler. It is made by dispersing and mixing. In this case, the inorganic filler may be the whole or a part thereof.

【0012】この樹脂の配合割合は、全体の樹脂組成物
に対して30〜95重量%配合することが望ましい。この配
合が30重量%未満では樹脂組成物の吸湿性が高く耐湿性
に劣り、また95重量%を超えると流動性が悪くなり成形
性に劣るので好ましくない。
[0012] It is desirable that the proportion of this resin is 30 to 95% by weight based on the total resin composition. If the amount is less than 30% by weight, the resin composition has high hygroscopicity and poor moisture resistance, and if the amount is more than 95% by weight, fluidity is poor and moldability is poor, which is not preferable.

【0013】本発明に用いる(B)フェノール樹脂とし
ては、フェノール、アルキルフェノール等のフェノール
類とホルムアルデヒドあるいはパラホルムアルデヒドと
を反応させて得られるノボラック型フェノール樹脂およ
びこれらの変性樹脂、例えばエポキシ化もしくはブチル
化ノボラック型フェノール樹脂が挙げられ、これらは単
独又は混合して使用することができる。フェノール樹脂
の配合割合は、前記(A)樹脂中のエポキシ樹脂のエポ
キシ基(x )と(B)のフェノール樹脂のフェノール性
水酸基(y )とのモル比[(x )/(y )]が 0.1〜10
の範囲内であることが望ましい。モル比が 0.1未満もし
くは10を超えると耐湿性、成形作業性および硬化物の電
気特性が悪くなり、いずれの場合も好ましくない。
Examples of the (B) phenol resin used in the present invention include novolak type phenol resins obtained by reacting phenols such as phenol and alkylphenol with formaldehyde or paraformaldehyde, and modified resins thereof, for example, epoxidized or butylated. Novolak type phenolic resins are mentioned, and these can be used alone or in combination. The mixing ratio of the phenol resin is such that the molar ratio [(x) / (y)] of the epoxy group (x) of the epoxy resin in the resin (A) and the phenolic hydroxyl group (y) of the phenol resin of (B) is 0.1 ~ 10
It is desirable to be within the range. If the molar ratio is less than 0.1 or more than 10, the moisture resistance, the molding workability and the electrical properties of the cured product deteriorate, which is not preferable in any case.

【0014】本発明のエポキシ樹脂組成物は、(A)
(a )エポキシ樹脂に(b )配合すべき無機質充填剤の
一部又は全部を均一に分散混合して樹脂[(a )+(b
)]および(B)のフェノール樹脂を必須成分とする
が、本発明の目的に反しない限度において、また必要に
応じて、例えば天然ワックス、合成ワックス、直鎖脂肪
酸の金属塩、酸アミド類、エステル類、パラフィン類等
の離型剤、塩素化パラフィン、ブロムトルエン、ヘキサ
ブロムベンゼン、三酸化アンチモン等の難燃剤、カーボ
ンブラック、ベンガラ等の着色剤、種々の硬化剤等を適
宜、添加配合することができる。
The epoxy resin composition of the present invention comprises (A)
The resin [(a) + (b) is prepared by uniformly dispersing and mixing a part or all of the inorganic filler to be blended with the epoxy resin (a) (b).
)] And (B) as the essential components, but to the extent that the objects of the present invention are not impaired, and if necessary, for example, natural wax, synthetic wax, metal salts of straight chain fatty acids, acid amides, Release additives such as esters and paraffins, flame retardants such as chlorinated paraffin, bromtoluene, hexabromobenzene, antimony trioxide, colorants such as carbon black and red iron oxide, various curing agents, etc. are appropriately added and blended. be able to.

【0015】本発明のエポキシ樹脂組成物の成形材料と
しての製造方法は、無機質充填剤をエポキシ樹脂中に加
熱混合し、均一に分散混合させた樹脂を使用すればよ
く、特にほかの工程について限定されるものではない。
しかし、通常次のようにして製造する。エポキシ樹脂の
融点以上の温度に加温できる装置(容器)、例えば、強
力ニーダ、加熱反応釜、押出機、加熱ロール等を使用
し、この中にエポキシ樹脂を仕込み融点以上に加温して
完全に溶融させた後、エポキシ樹脂に対して25〜90重量
%の無機質充填剤の一部を投入し、好ましくは 100℃以
上で20分間攪拌して、均一に分散混合させた樹脂をつく
る。この樹脂とフェノール樹脂とを粉砕し、残りの無機
質充填剤およびその他の成分を所定の組成比に選択した
原料組成分をミキサー等によって十分均一に混合した
後、更に熱ロール、押出機、又はニーダ等によって加熱
混練処理を行い、冷却固化するのを待って適当な大きさ
に粉砕して成形材料を製造する。ここでは、エポキシ樹
脂中に無機質充填剤を分散混合し、次いでフェノール樹
脂をその他の成分を配合する方法を説明したが、エポキ
シ樹脂製造工程において無機質充填剤を均一に分散混合
した樹脂を作っておき、必要に応じて必要量および他成
分と配合混練してもよい。製造方法として重要なこと
は、エポキシ樹脂中に無機質充填剤を均一に分散混合し
て樹脂を得る工程と、その樹脂とフェノール樹脂および
その他の成分を配合混練する工程を具備することであ
る。こうして得られた成形材料は半導体装置をはじめと
する電子部品あるいは電気部品の封止、被覆、絶縁等に
適用すれば、優れた特性と信頼性を付与させることがで
きる。
In the method for producing the epoxy resin composition of the present invention as a molding material, a resin in which an inorganic filler is heat-mixed in an epoxy resin and uniformly dispersed and mixed may be used, and the other steps are particularly limited. It is not something that will be done.
However, it is usually manufactured as follows. Use a device (container) that can heat to a temperature above the melting point of the epoxy resin, such as a strong kneader, a heating reaction kettle, an extruder, a heating roll, etc. After being melted, a part of the inorganic filler is added to the epoxy resin in an amount of 25 to 90% by weight, and the mixture is stirred preferably at 100 ° C. or higher for 20 minutes to prepare a resin uniformly dispersed and mixed. The resin and the phenol resin are pulverized, and the remaining inorganic filler and other components are mixed sufficiently uniformly with a raw material composition selected in a predetermined composition ratio by a mixer or the like, and then a hot roll, an extruder, or a kneader. The mixture is heated and kneaded by a method such as the above, waits for it to cool and solidify, and then it is pulverized to an appropriate size to produce a molding material. Here, the method of dispersing and mixing the inorganic filler in the epoxy resin and then blending the phenol resin with other components was explained, but a resin in which the inorganic filler is uniformly dispersed and mixed is prepared in the epoxy resin manufacturing process. If necessary, it may be mixed and kneaded with the required amount and other components. What is important as a manufacturing method is to have a step of uniformly dispersing and mixing an inorganic filler in an epoxy resin to obtain a resin, and a step of blending and kneading the resin with a phenol resin and other components. When the molding material thus obtained is applied to sealing, coating, insulation, etc. of electronic parts or electric parts such as semiconductor devices, excellent properties and reliability can be imparted.

【0016】本発明の半導体封止装置は、上述したエポ
キシ樹脂組成物を用いて、半導体チップを封止すること
により容易に製造することができる。封止を行う半導体
チップとしては、例えば、集積回路、大規模集積回路、
トランジスタ、サイリスタ、ダイオード等で特に限定さ
れるものではない。封止の最も一般的な方法としては、
低圧トランスファー成形法があるが、射出成形、圧縮成
形、注形等による封止も可能である。エポキシ樹脂組成
物は封止の際に加熱して硬化させ、最終的にはこの組成
物によって封止された半導体封止装置が得られる。加熱
による硬化は、150 ℃以上に加熱して硬化させることが
望ましい。
The semiconductor encapsulation device of the present invention can be easily manufactured by encapsulating a semiconductor chip using the epoxy resin composition described above. As the semiconductor chip to be sealed, for example, an integrated circuit, a large-scale integrated circuit,
It is not particularly limited to transistors, thyristors, diodes and the like. The most common method of sealing is
Although there is a low-pressure transfer molding method, sealing by injection molding, compression molding, casting, etc. is also possible. The epoxy resin composition is heated and cured during encapsulation, and finally a semiconductor encapsulation device encapsulated with this composition is obtained. For curing by heating, it is desirable to heat and cure at 150 ° C or higher.

【0017】[0017]

【作用】本発明のエポキシ樹脂組成物において、エポキ
シ樹脂中に無機質充填剤を均一に分散混合することによ
って凝集物の生成を少なくし、無機質充填剤と樹脂との
界面の濡れ性および流動性を向上させ、また成形性を向
上させ吸湿量を低減させることができた。
In the epoxy resin composition of the present invention, the inorganic filler is uniformly dispersed and mixed in the epoxy resin to reduce the formation of aggregates, and to improve the wettability and fluidity of the interface between the inorganic filler and the resin. It was possible to improve the moldability, improve the moldability, and reduce the amount of moisture absorption.

【0018】[0018]

【実施例】次に本発明を実施例によって説明するが、本
発明はこれらの実施例よって限定されるものではない。
以下の実施例及び比較例において「%」とは「重量%」
を意味する。
EXAMPLES The present invention will now be described with reference to examples, but the present invention is not limited to these examples.
In the following Examples and Comparative Examples, "%" means "% by weight"
Means

【0019】[樹脂の製造]クレゾールノボラックエポ
キシ樹脂(エポキシ当量 215)30%を押出機に入れて 1
20℃に加熱する。クレゾールノボラックエポキシ樹脂が
完全に溶融した後、無機質充填剤70%を加えて20分間加
熱混練して、無機質充填剤を均一に分散した樹脂(E−
F樹脂という)をつくった。
[Production of resin] 30% of cresol novolac epoxy resin (epoxy equivalent 215) was put in an extruder.
Heat to 20 ° C. After the cresol novolac epoxy resin was completely melted, 70% of the inorganic filler was added and the mixture was heated and kneaded for 20 minutes to obtain a resin (E-
We made F resin).

【0020】実施例1 E−F樹脂67%とノボラック型フェノール樹脂(フェノ
ール当量 107)10%をφ2mm 程度に粉砕し、溶融シリカ
粉末18%およびその他の成分 5%を常温で混合し、更に
90〜100 ℃で混練冷却して成形材料を製造した。
Example 1 67% of EF resin and 10% of novolak type phenolic resin (phenol equivalent 107) were pulverized to about 2 mm in diameter, 18% of fused silica powder and 5% of other components were mixed at room temperature, and further,
A molding material was manufactured by kneading and cooling at 90 to 100 ° C.

【0021】実施例2 E−F樹脂50%とノボラック型フェノール樹脂(フェノ
ール当量 107)10%をφ2mm 程度に粉砕し、溶融シリカ
粉末35%およびその他の成分 5%を常温で混合し、更に
90〜100 ℃で混練冷却した後粉砕して成形材料を製造し
た。
Example 2 50% of EF resin and 10% of novolac type phenolic resin (phenol equivalent 107) were pulverized to about 2 mm in diameter, 35% of fused silica powder and 5% of other components were mixed at room temperature, and further,
The mixture was kneaded and cooled at 90 to 100 ° C. and then pulverized to produce a molding material.

【0022】比較例1 クレゾールノボラックエポキシ樹脂(エポキシ当量 21
5)20%に、ノボラック型フェノール樹脂(フェノール
当量 107))10%、溶融シリカ粉末65%およびその他の
成分 5%を常温で混合し、更に90〜100 ℃で混練冷却し
て成形材料を製造した。
Comparative Example 1 Cresol novolac epoxy resin (epoxy equivalent 21
5) 20%, novolak type phenolic resin (phenol equivalent 107) 10%, fused silica powder 65% and other components 5% are mixed at room temperature, and further kneaded and cooled at 90 to 100 ° C to produce a molding material. did.

【0023】比較例2 クレゾールノボラックエポキシ樹脂(エポキシ当量 21
5)15%に、ノボラック型フェノール樹脂(フェノール
当量 107)10%、溶融シリカ粉末70%およびその他の成
分 5%を常温で混合し、更に90〜 100℃で混練冷却した
後粉砕して成形材料を製造した。
Comparative Example 2 Cresol novolac epoxy resin (epoxy equivalent 21
5) Mix 15% with 10% novolac type phenolic resin (phenol equivalent 107), 70% fused silica powder and 5% other components at room temperature, knead and cool at 90-100 ° C, and then crush and mold. Was manufactured.

【0024】実施例1〜2及び比較例1〜2で製造した
成形材料を用いて 175℃に加熱した金型内にトランスフ
ァー成形して半導体チップを封止し、加熱硬化させて半
導体封止装置を製造した。成形材料及び半導体封止装置
について、諸試験を行ったのでその結果を表1に示し
た。本発明のエポキシ樹脂組成物及び半導体封止装置
は、耐湿性、成形性に優れており、本発明の効果を確認
することができた。
Using the molding materials produced in Examples 1 and 2 and Comparative Examples 1 and 2, transfer molding is performed in a mold heated to 175 ° C. to seal the semiconductor chip, and the semiconductor chip is cured by heating to mold the semiconductor sealing device. Was manufactured. Various tests were conducted on the molding material and the semiconductor encapsulation device, and the results are shown in Table 1. The epoxy resin composition and semiconductor encapsulation device of the present invention have excellent moisture resistance and moldability, and the effects of the present invention could be confirmed.

【0025】[0025]

【表1】 *1 :トランスファー成形により直径50mm、厚さ3mm の
成形品をつくり、これを127℃, 2.5気圧の飽和水蒸気
中に24時間放置し、増加した重量によって測定した。 *2 :吸水率の場合と同様な成形品をつくり、175 ℃で
8時間後硬化を行い、適当な大きさの試験片とし、熱機
械分析装置を用いて測定した。 *3 :JIS−K−6911により測定した。 *4 :成形材料を用いて、 2本のアルミニウム配線を有
する半導体チップを、通常の42アロイフレームに接着
し、170 ℃で 3分間の条件でトランスファー成形した
後、さらに 180℃, 8時間エイジングさせた。こうして
得た成形品の 100個について、120 ℃の高圧水蒸気中で
PCTを行い、アルミニウム腐食による50%断線(不良
発生)の起こる時間を評価した。 *5 :30×25×5mm の成形品の底面に25×25×3mm の銅
板を埋め込み、−40℃と+200 ℃の恒温槽へ各30分間ず
つ入れ15サイクル繰り返した後、樹脂クラックを調査し
た。
[Table 1] * 1: A molded product with a diameter of 50 mm and a thickness of 3 mm was made by transfer molding, left to stand in saturated steam at 127 ° C and 2.5 atm for 24 hours, and measured by the increased weight. * 2: At 175 ° C, make a molded product similar to that of water absorption
After 8 hours of curing, a test piece having an appropriate size was prepared and measured using a thermomechanical analyzer. * 3: Measured according to JIS-K-6911. * 4: A semiconductor chip with two aluminum wirings is bonded to a normal 42 alloy frame using a molding material, transfer molded at 170 ° C for 3 minutes, and then aged at 180 ° C for 8 hours. It was 100 pieces of the molded articles thus obtained were subjected to PCT in high-pressure steam at 120 ° C., and the time at which 50% disconnection (defect occurrence) due to aluminum corrosion occurred was evaluated. * 5: A 25 x 25 x 3 mm copper plate was embedded in the bottom of a 30 x 25 x 5 mm molded product, placed in a constant temperature bath at -40 ° C and + 200 ° C for 30 minutes each, repeated 15 cycles, and then examined for resin cracks. .

【0026】[0026]

【発明の効果】以上の説明及び表1から明らかなよう
に、本発明のエポキシ樹脂組成物の製造方法によれば、
樹脂と無機質充填剤の界面の濡れ性を向上させ、無機質
充填剤を均一に分散させることにより吸湿性を少なく
し、耐湿性、成形性、流動性の優れたエポキシ樹脂組成
物が得られ、この組成物を用いることによって信頼性の
高い半導体封止装置が製造できたものである。
As is clear from the above description and Table 1, according to the method for producing an epoxy resin composition of the present invention,
Improving the wettability of the interface between the resin and the inorganic filler, reducing the hygroscopicity by uniformly dispersing the inorganic filler, moisture resistance, moldability, an epoxy resin composition having excellent fluidity is obtained. A highly reliable semiconductor encapsulation device could be manufactured by using the composition.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 (A)(a )エポキシ樹脂に(b )配合
すべき無機質充填剤の一部又は全部を均一に分散混合し
た樹脂[(a )+(b )]および(B)フェノール樹脂
を必須成分とし、全体の樹脂組成物に対して、前記
(A)樹脂[(a )+(b )]を30〜95重量%、また
(b )無機質充填剤を25〜90重量%の割合で含有してな
ることを特徴とするエポキシ樹脂組成物。
1. A resin [(a) + (b)] and (B) a phenol resin in which a part or all of an inorganic filler to be compounded with (b) an epoxy resin (a) is uniformly mixed. In an amount of 30 to 95% by weight of (A) resin [(a) + (b)] and 25 to 90% by weight of (b) inorganic filler, based on the total resin composition. An epoxy resin composition comprising:
【請求項2】 (A)(a )エポキシ樹脂に(b )配合
すべき無機質充填剤の一部又は全部を均一に分散混合し
た樹脂[(a )+(b )]および(B)フェノール樹脂
を必須成分とし、全体の樹脂組成物に対して、前記
(A)樹脂[(a )+(b )]を30〜95重量%、また
(b )無機質充填剤を25〜90重量%の割合で含有するエ
ポキシ樹脂組成物の硬化物で、半導体チップが封止され
てなることを特徴とする半導体封止装置。
2. A resin [(a) + (b)] and (B) a phenol resin in which a part or all of the inorganic filler to be blended with (a) (a) an epoxy resin (b) is uniformly dispersed and mixed. In an amount of 30 to 95% by weight of (A) resin [(a) + (b)] and 25 to 90% by weight of (b) inorganic filler, based on the total resin composition. A semiconductor encapsulation device, which is obtained by encapsulating a semiconductor chip with a cured product of the epoxy resin composition contained in 1.
【請求項3】 (a )エポキシ樹脂を溶融し(b )配合
すべき無機質充填剤の一部又は全部を加えて均一に分散
混合した樹脂[(a )+(b )]とする工程と、前記樹
脂[(a )+(b )]と(B)フェノール樹脂を混合混
練する工程を有することを特徴とするエポキシ樹脂組成
物の製造方法。
3. A process of (a) melting an epoxy resin, (b) adding a part or all of an inorganic filler to be blended and uniformly dispersing and mixing the resin [(a) + (b)], and A method for producing an epoxy resin composition, comprising the step of mixing and kneading the resin [(a) + (b)] and the phenol resin (B).
JP4197693A 1993-02-05 1993-02-05 Epoxy resin composition and sealed semiconductor device Pending JPH06228282A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4197693A JPH06228282A (en) 1993-02-05 1993-02-05 Epoxy resin composition and sealed semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4197693A JPH06228282A (en) 1993-02-05 1993-02-05 Epoxy resin composition and sealed semiconductor device

Publications (1)

Publication Number Publication Date
JPH06228282A true JPH06228282A (en) 1994-08-16

Family

ID=12623232

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4197693A Pending JPH06228282A (en) 1993-02-05 1993-02-05 Epoxy resin composition and sealed semiconductor device

Country Status (1)

Country Link
JP (1) JPH06228282A (en)

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