JPS60152522A - Sealing resin composition - Google Patents

Sealing resin composition

Info

Publication number
JPS60152522A
JPS60152522A JP855884A JP855884A JPS60152522A JP S60152522 A JPS60152522 A JP S60152522A JP 855884 A JP855884 A JP 855884A JP 855884 A JP855884 A JP 855884A JP S60152522 A JPS60152522 A JP S60152522A
Authority
JP
Japan
Prior art keywords
resin
resin composition
compound
epoxy resin
epoxy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP855884A
Other languages
Japanese (ja)
Inventor
Tsutomu Nagata
勉 永田
Hiroyuki Hosokawa
洋行 細川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Chemical Products Co Ltd
Kyocera Chemical Corp
Original Assignee
Toshiba Chemical Products Co Ltd
Toshiba Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Chemical Products Co Ltd, Toshiba Chemical Corp filed Critical Toshiba Chemical Products Co Ltd
Priority to JP855884A priority Critical patent/JPS60152522A/en
Publication of JPS60152522A publication Critical patent/JPS60152522A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:A sealing resin composition excellent in laser markability and good in moisture resistance, heat resistance, and mechanical properties, prepared by mixing an epoxy resin with a novolak phenolic resin, an azo compound and an inorganic filler. CONSTITUTION:An epoxy resin (A) (e.g., bisphenol A-derived epoxy resin or novolak epoxy resin) is melt-blended with a novolak phenolic resin (B), a compound (C) having at least one azo group in the molecule (e.g., a compound of the formula), and an inorganic filler (D) (e.g., silica powder or alumina) in a kneader or the like. and the blend is solidified by cooling and ground. Here, the molar rario of the epoxy groups of component A to the phenolic hydroxyl groups of component B is about 0.1-10, the rate of component C (azo compound) to the total resin composition is 0.01-10wt%, and the rate of component D (inorganic filler) to the total is 29-90wt%.

Description

【発明の詳細な説明】 [発明の技術分野] 本発明は、半導体装置等の封止用樹脂組成物に関し、さ
らに詳しくはレーザーマーク性に優れ、かつ耐湿性、耐
熱性、機械的特性のよい封止用樹脂組成物にIIIする
[Detailed Description of the Invention] [Technical Field of the Invention] The present invention relates to a resin composition for sealing semiconductor devices, etc., and more specifically, a resin composition that has excellent laser mark properties and good moisture resistance, heat resistance, and mechanical properties. III to the sealing resin composition.

[発明の技術的背景とその問題点] 従来ダイオード、トランジスタ、集積回路等の電子部品
では熱硬化性樹脂を用いて封止する方法が行われてきた
。 この樹脂封止はガラス、金属、セラミックを用いた
ハーメチックシール方式に比較して経済的に有利なため
広く実用化されている。
[Technical background of the invention and its problems] Conventionally, electronic components such as diodes, transistors, and integrated circuits have been sealed using thermosetting resin. This resin sealing is economically advantageous compared to hermetic sealing methods using glass, metal, or ceramic, and is therefore widely put into practical use.

封止用樹脂組成物としては、熱硬化性樹脂組成物の中で
も信頼性及び価格の点からエポキシ樹脂組成物が最も一
般的に用いられている。 エポキシ樹脂組成物は、酸無
水物、芳香族アミン、ノボラック型フェノール樹脂等の
硬化剤が用いられている。 これらの中でノボラック型
フェノール樹脂を硬化剤としたエポキシ樹脂組成物は、
伯の硬化剤を使用したものに比べて、成形性、耐湿性に
優れ、毒性がなく且つ安価であるため半導体封止材料と
して広く用いられている。
Among thermosetting resin compositions, epoxy resin compositions are most commonly used as sealing resin compositions in terms of reliability and cost. Epoxy resin compositions use curing agents such as acid anhydrides, aromatic amines, and novolac-type phenolic resins. Among these, epoxy resin compositions using novolac type phenolic resin as a curing agent are
It is widely used as a semiconductor encapsulation material because it has excellent moldability and moisture resistance, is non-toxic, and is inexpensive compared to those using the hardening agent described above.

しかしながらノボラック型フェノール樹脂を硬化剤とし
たエポキシ樹脂組成物でも゛、電子部品の高密度化に伴
う耐湿性及び耐熱性に対する信頼性については十分でな
いという欠点がある。 こうした樹脂組成物を使用した
成形品の温寒サイクルテストを行なうと、ボンディング
ワイヤのオープン、樹脂クラック、ペレットクラックが
発生し、電子部品としての機能が果せず、また耐湿性試
験を行なうと前記と同じような現象が発生し機能が果せ
なくなるという問題があった。 また樹脂封止した半導
体製品(ダイオード、トランジスタ、集積回路)の表面
に製品名や製造者名をマークするのに、現在熱硬化性イ
ンキで捺印する方法が一般に採用されている。 しかし
このインキによるマークは有機溶剤で比較的容易に消え
ること、また摩擦に弱いという欠点がある。 これらの
欠点を補ない、かつマーキング工程の効率ILをはかる
ために最近CO2などのレーザーを用いたレーザーマー
クが行なわれるようになった。 しかし、従来の樹脂組
成物ではレーザーマークをした場合、マークの鮮明度が
インキマーキング法より劣るという欠点があった。
However, even epoxy resin compositions using a novolak type phenol resin as a curing agent have the disadvantage that they are not reliable enough in terms of moisture resistance and heat resistance, which are required as electronic parts become more densely densified. When a molded product using such a resin composition is subjected to a temperature/cold cycle test, bonding wire opens, resin cracks, and pellet cracks occur, making it unable to function as an electronic component. There was a problem that a similar phenomenon occurred and the function could no longer be fulfilled. Furthermore, in order to mark the product name and manufacturer's name on the surface of resin-sealed semiconductor products (diodes, transistors, integrated circuits), a method of stamping with thermosetting ink is currently generally employed. However, marks made with this ink have the disadvantage that they are relatively easily erased with organic solvents and are susceptible to friction. In order to compensate for these drawbacks and to improve the efficiency IL of the marking process, laser marking using a CO2 laser or the like has recently begun to be performed. However, when a laser mark is made with a conventional resin composition, the clarity of the mark is inferior to that of an ink marking method.

[発明の目的] 本発明の目的は、上記の欠点を解消するためになされた
もので、レーザーマーク性に優れ、かつ耐湿性、耐熱性
、機械的特性のよい封止用樹脂組成物を提供しようとす
るものである。
[Object of the Invention] The object of the present invention was to solve the above-mentioned drawbacks, and to provide a sealing resin composition that has excellent laser mark properties and good moisture resistance, heat resistance, and mechanical properties. This is what I am trying to do.

[発明の概要] 本発明者らは、上記の目的を達成すべく鋭意研究を重ね
た結果、分子中に1個以上のアゾ基を有する化合物を含
有する樹脂組成物が優れたレーザーマーク性を有し、か
つ、その他の特性もよく封止用樹脂組成物に好適してい
ることを見い出したものである。 即ち、本発明は、 (A)エポキシ樹脂 (B)ノボラック型フェノール樹脂 (C)分子中に1個以上のアゾ基を有する化合物 (D)無機質充填剤 を必須成分とし、前記分子中に1個以上のアゾ基を有す
る化合物を樹脂組成物に対して0.01〜10重量%お
よび前記無機質充填剤を樹脂組成物に対して25〜90
重間%配合することを特徴とする封止用樹脂組成物であ
る。
[Summary of the Invention] As a result of intensive research to achieve the above object, the present inventors have discovered that a resin composition containing a compound having one or more azo groups in the molecule exhibits excellent laser mark properties. It has been found that the resin composition has the following characteristics and also has good other properties, making it suitable for a sealing resin composition. That is, the present invention includes (A) an epoxy resin, (B) a novolac type phenolic resin, (C) a compound having one or more azo groups in the molecule, and (D) an inorganic filler as an essential component, and one or more azo groups in the molecule. 0.01 to 10% by weight of the above azo group-containing compound based on the resin composition and 25 to 90% of the above inorganic filler based on the resin composition.
This is a sealing resin composition characterized in that it is blended in a weight percent.

本発明に用いる(A)エポキシ樹脂は、その分子中にエ
ポキシ基を少なくとも2個以上有する化合物である限り
、分子構造、分子量などに特に制限はなく、一般に使用
されているものを広く包含することが−できる。 例え
ば、ビスフェノール型の芳香族系、シクロヘサンM導体
等の脂環族系、さらに次の一般式で示されるエポキシノ
ボラック系等の樹脂が挙げられる。
The epoxy resin (A) used in the present invention is not particularly limited in molecular structure, molecular weight, etc., as long as it is a compound having at least two epoxy groups in its molecule, and may broadly include commonly used ones. I can do it. Examples include aromatic resins such as bisphenol type, alicyclic resins such as cyclohexane M conductor, and epoxy novolak resins represented by the following general formula.

(式中、R1は水素原子、ハロゲン原子又はアルキル基
を、R2は水素原子又はアルキル基を、nは1以上の整
数を表す) これらのエポキシ樹脂は1種又は2種以上
混合して用いることもできる。
(In the formula, R1 represents a hydrogen atom, a halogen atom, or an alkyl group, R2 represents a hydrogen atom or an alkyl group, and n represents an integer of 1 or more.) These epoxy resins may be used alone or in combination of two or more. You can also do it.

本発明に使用する(B)ノボラック型フェノール樹脂と
しては、フェノール、アルキルフェノール等のフェノー
ル類とホルムアルデヒドあるいはバ・ラボルムアルデヒ
ドを反応させて得られるノボラック型フェノール樹脂、
およびこれらの変性樹脂例えばエポキシ化もしくはブチ
ル化ノボラック型フェノール樹脂等が挙げられる。 ノ
ボラック型フェノール樹脂の配合割合は、前記(A)エ
ポキシ樹脂のエポキシI(a)と(B)ノボラック型フ
ェノール樹脂のフェノール性水酸基(b)とのモル比(
a/b)が0.1〜10の範囲内にあることが好ましい
。 モル比が0.1未満もしくは10を超えると耐湿性
、成形作業性および硬化物の電気特性が悪くなり、いず
れの場合も好ましくない。
The (B) novolak type phenol resin used in the present invention includes a novolak type phenol resin obtained by reacting phenols such as phenol and alkylphenol with formaldehyde or var-laboraldehyde;
and modified resins thereof, such as epoxidized or butylated novolak type phenolic resins. The blending ratio of the novolak type phenolic resin is determined by the molar ratio of the epoxy I (a) of the (A) epoxy resin and the phenolic hydroxyl group (b) of the novolak type phenol resin (B) (
It is preferable that a/b) is within the range of 0.1 to 10. If the molar ratio is less than 0.1 or more than 10, the moisture resistance, molding workability, and electrical properties of the cured product will deteriorate, and either case is unfavorable.

従って上記範囲に限定される。Therefore, it is limited to the above range.

本発明に用いる(C)分子中に1個以上のアゾ基を有す
る化合物は、その分子中に1個以上のアゾ基を有する化
合物である限り、分子構造、分子量などに特に制限はな
く次のような化合物が挙げられる。
The compound (C) used in the present invention having one or more azo groups in its molecule is not particularly limited in molecular structure, molecular weight, etc., as long as it has one or more azo groups in its molecule, and is as follows: Compounds such as:

この化合物としては分子中に塩素や臭素などハロゲン原
子を含まないものが好ましい。 この分子中に1個以上
のアゾ基を有する化合物の配合割合は樹脂組成物の0.
01〜10重量%であることが望ましい。 配合量が0
.01重量%未満では、レーザーマーク性に効果なく、
10重量%を超えるとかさぼりが大きくなり成形性が悪
く、実用に適さない。
This compound is preferably one that does not contain a halogen atom such as chlorine or bromine in its molecule. The compounding ratio of the compound having one or more azo groups in the molecule is 0.00% of the resin composition.
The content is preferably 01 to 10% by weight. Blend amount is 0
.. If it is less than 0.01% by weight, it has no effect on laser mark properties,
If it exceeds 10% by weight, bulk will increase and moldability will be poor, making it unsuitable for practical use.

さらに本発明に使用する(D)無機質充填剤としては、
シリカ粉末、アルミナ、三酸化アンチモン、タルク、炭
酸カルシウム、チタンホワイト、クレー、アスベスト、
マイカ、ベンガラ、ガラス繊維、炭素iim等が挙げら
れ、特にシリカ粉末およびアルミナが好ましい。 無機
質充填剤の配合割合は、樹脂組成物の25〜90重昂%
であることが好ましい。 25重量%未満では、耐湿性
、耐熱性および機械的特性、更に成形性に効果なり、9
0重量%を超えるとかさぼりが大きくなり、成形性が悪
く実用に適さない。
Furthermore, as the inorganic filler (D) used in the present invention,
Silica powder, alumina, antimony trioxide, talc, calcium carbonate, titanium white, clay, asbestos,
Examples include mica, red iron oxide, glass fiber, carbon iim, etc., and silica powder and alumina are particularly preferred. The blending ratio of the inorganic filler is 25 to 90% by weight of the resin composition.
It is preferable that If it is less than 25% by weight, it will have an effect on moisture resistance, heat resistance, mechanical properties, and moldability.
If it exceeds 0% by weight, bulk will increase and moldability will be poor, making it unsuitable for practical use.

本発明の封止用樹脂組成物はエポキシ樹脂、ノボラック
型フェノール樹脂、アゾ基を有する化合物、無機質充填
剤を必須成分とするが必要に応じて、例えば天然ワック
ス類、直鎖脂肪酸の金属塩。
The sealing resin composition of the present invention contains an epoxy resin, a novolac type phenol resin, a compound having an azo group, and an inorganic filler as essential components, and may optionally contain, for example, natural waxes and metal salts of straight chain fatty acids.

酸アミド類、エステル類、もしくはパラフィン類などの
離形剤、塩素化パラフィン、ブロムトルエン、ヘキサブ
ロムベンゼン、三酸化アンチモンなどの難燃剤、カーボ
ンブラック、ベンガラなどの着色剤、シランカップリン
グ剤等を適宜添加配合しても差しつかえない。
Release agents such as acid amides, esters, or paraffins, flame retardants such as chlorinated paraffin, bromotoluene, hexabromobenzene, and antimony trioxide, colorants such as carbon black and red iron, silane coupling agents, etc. There is no problem even if they are added and blended as appropriate.

本発明の封止用樹脂組成物を成形材料として調製Jる場
合の一般的な方法としては、エポキシ樹脂、ノボラック
型フェノール樹脂、分子中に1個以上のアゾ基を有する
化合物、無機質充填剤、その他を所定の組成比に選んだ
原料をミキサー等によって十分均一に混合した後、更に
熱ロールによる溶融混合処理、またはニーダなどによる
混合処理を行い、次いで冷却固化させ適当な大きさに粉
砕して成形材料を得ることができる。
A general method for preparing the encapsulating resin composition of the present invention as a molding material includes an epoxy resin, a novolac type phenol resin, a compound having one or more azo groups in the molecule, an inorganic filler, After mixing the other raw materials in a predetermined composition ratio sufficiently uniformly using a mixer, etc., they are further melted and mixed using heated rolls or mixed using a kneader, etc., and then cooled to solidify and pulverized to an appropriate size. A molding material can be obtained.

本発明に係る封止用樹脂組成物を電子部品、電気部品の
封止、被覆、絶縁などに適用した場合に優れた特性およ
び信頼性を付与することができる。
When the encapsulating resin composition according to the present invention is applied to encapsulating, coating, insulating, etc. electronic components and electrical components, excellent characteristics and reliability can be imparted.

[発明の効果] 本発明の封止用樹脂組成物は、耐湿性、機械的特性がよ
く、耐熱性が高く、レーザーマーク性に優れ、かつ成形
作業性のよい封止用樹脂組成物であるため電子、電気部
品の封止用等に用いた場合、十分な信頼性を得ることが
できる。
[Effects of the Invention] The encapsulating resin composition of the present invention has good moisture resistance, good mechanical properties, high heat resistance, excellent laser mark properties, and good molding workability. Therefore, sufficient reliability can be obtained when used for sealing electronic and electrical components.

[発明の実施例] 本発明を実施例により具体的に説明するが、本発明は以
下の実施例に限定されるものではない。
[Examples of the Invention] The present invention will be specifically explained with reference to Examples, but the present invention is not limited to the following Examples.

以下実施例および比較例において「%」とあるの−は「
重量%」を意味する。
In the following Examples and Comparative Examples, "%" is replaced by "-"
% by weight.

実施例 1 タレゾールノボラックエポキシ樹脂(エポキシ当1i 
215) 18%にノボラック型フェノール樹脂(フェ
ノール当量107ン12%、 1%、およびシリカ粉末69%を常温で混合し、90〜
95℃で混練して冷却した後、粉砕して成形材料を得た
。 得られた成形材料をタブレット化し予熱してトラン
スファー成形で170℃に加熱した金型内に注入し硬化
させて成形品とした。 この成形品について、レーザー
マーク性、耐湿性、機械的強度を試験しその結果を第1
表に示した。
Example 1 Talesol novolak epoxy resin (1i per epoxy
215) 18%, novolak type phenolic resin (phenol equivalent: 107%, 12%, and 69% silica powder were mixed at room temperature, and 90~
After kneading and cooling at 95°C, the mixture was pulverized to obtain a molding material. The obtained molding material was made into a tablet, preheated, injected into a mold heated to 170° C. by transfer molding, and cured to obtain a molded product. This molded product was tested for laser mark resistance, moisture resistance, and mechanical strength, and the results were evaluated in the first stage.
Shown in the table.

実施例 2 クレゾールノボラックエポキシ樹脂(エポキシ当量21
5) 16%にノボラック型フェノール樹脂(フェノー
ル当量107) 13.5%、0.5%、およびシリカ
粉末70%を実施例1と同様にして成形材料とし、また
同様に成形品を得た。
Example 2 Cresol novolac epoxy resin (epoxy equivalent weight 21
5) 16%, 13.5% of novolac type phenol resin (phenol equivalent: 107), 0.5%, and 70% of silica powder were used as a molding material in the same manner as in Example 1, and a molded article was obtained in the same manner.

得られた成形品について実施例1と同様な諸特性を試験
しその結果を第1表に示した。
The obtained molded article was tested for various properties similar to those in Example 1, and the results are shown in Table 1.

比較例 クレゾールノボラックエポキシ樹脂(エポキシ当m 2
15) 20%にノボラック型フェノール樹脂(フェノ
ール当11i 107) 10%、およびシリカ粉末1
0%を実施例1と同様にして成形材料を得て、それを用
いて成形品とした。 得られた成形品について同様に諸
特性を試験したので第1表に示した。
Comparative Example Cresol novolak epoxy resin (epoxy m2
15) 20% novolac type phenolic resin (phenol 11i 107) 10%, and silica powder 1
A molding material was obtained in the same manner as in Example 1, and a molded article was made using it. The properties of the obtained molded articles were similarly tested and are shown in Table 1.

第1表 * 1 30X 25X 5mll1の成形品の底面に
25X 25X 3IIII11の銅板を埋め込々、−
40℃と+200℃の恒温槽へ各30分間づつ入れ、1
5サイクルくり返した後の樹脂クラックを調査した。
Table 1 * 1 Embed a 25X 25X 3III11 copper plate on the bottom of a 30X 25X 5ml1 molded product, -
Place in constant temperature baths at 40℃ and +200℃ for 30 minutes each.
Resin cracks after 5 cycles were investigated.

*2 封止用樹脂組成物を用いて2本のアルミニウム配
線を有する電気部品を170℃で3分間トランスファー
成形し、その後180℃で8時間硬化させた。 こうし
て得た封止電気部品100個について、120℃の高圧
水蒸気中で耐湿試験を行ない、アルミニウム腐蝕による
50%の断線(不良発生)の起こる時間を評価した。
*2 An electrical component having two aluminum wirings was transfer-molded at 170°C for 3 minutes using the sealing resin composition, and then cured at 180°C for 8 hours. The 100 sealed electrical components thus obtained were subjected to a moisture resistance test in high-pressure steam at 120° C., and the time required for 50% disconnection (defect occurrence) due to aluminum corrosion was evaluated.

*゛3 封止用樹脂組成物を用いて2本のアルミニウム
配線を有する電気部品を170℃で3分間トランスファ
ー成形し、その後180℃で8時間硬化させた。 こう
して得た封止電気部品100個について、CO2レーザ
ーを用いてレーザーマークを行ない目視で鮮明度を評価
した。
*゛3 Using the sealing resin composition, an electrical component having two aluminum wirings was transfer-molded at 170°C for 3 minutes, and then cured at 180°C for 8 hours. A laser mark was made using a CO2 laser on the 100 sealed electrical components thus obtained, and the sharpness was visually evaluated.

本発明の実施例は比較例に比べてレーザーマーク性に優
れ、かつその伯耐湿性、機械的特性について劣っていな
いことがわかる。
It can be seen that the examples of the present invention have better laser mark properties than the comparative examples, and are not inferior in terms of moisture resistance and mechanical properties.

Claims (1)

【特許請求の範囲】 1 (Aンエポキシ樹脂 (B)ノボラック型フェノール樹脂 (C)分子中に1個の以上のアゾ基を有する化合物 (D)無機質充填剤 を必須成分とし、前記分子中に1個以上のアゾ基を有す
る化合物を樹脂組成物に対して0.01〜10重量%お
よび前記無機質充填剤を樹脂組成物に対して25〜90
重量%配合することを特徴とする封止用樹脂組成物。 2 エポキシ樹脂のエポキシ基(a )とノボラック型
フェノール樹脂のフェノール性水酸基(b)とのモル比
[(a)/(b)]が0.1〜10の範囲内にあること
を特徴とする特許請求の範囲第1項記載の封止用樹脂組
成物。
[Claims] 1 (A) epoxy resin (B) novolac type phenol resin (C) compound having one or more azo groups in the molecule (D) an inorganic filler as an essential component; 0.01 to 10% by weight of the compound having at least 10 azo groups to the resin composition, and 25 to 90% of the inorganic filler to the resin composition.
A sealing resin composition characterized in that it is blended in a weight percent. 2 The molar ratio [(a)/(b)] between the epoxy group (a) of the epoxy resin and the phenolic hydroxyl group (b) of the novolac type phenolic resin is within the range of 0.1 to 10. A sealing resin composition according to claim 1.
JP855884A 1984-01-23 1984-01-23 Sealing resin composition Pending JPS60152522A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP855884A JPS60152522A (en) 1984-01-23 1984-01-23 Sealing resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP855884A JPS60152522A (en) 1984-01-23 1984-01-23 Sealing resin composition

Publications (1)

Publication Number Publication Date
JPS60152522A true JPS60152522A (en) 1985-08-10

Family

ID=11696429

Family Applications (1)

Application Number Title Priority Date Filing Date
JP855884A Pending JPS60152522A (en) 1984-01-23 1984-01-23 Sealing resin composition

Country Status (1)

Country Link
JP (1) JPS60152522A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62176151A (en) * 1986-01-30 1987-08-01 Toshiba Chem Corp Resin sealed type semiconductor device
CN115572370A (en) * 2022-11-10 2023-01-06 西南石油大学 Light response epoxy resin based on azopyridine structure and preparation method and light response method thereof

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6047065A (en) * 1983-08-25 1985-03-14 Nitto Electric Ind Co Ltd Molding resin composition

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6047065A (en) * 1983-08-25 1985-03-14 Nitto Electric Ind Co Ltd Molding resin composition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62176151A (en) * 1986-01-30 1987-08-01 Toshiba Chem Corp Resin sealed type semiconductor device
CN115572370A (en) * 2022-11-10 2023-01-06 西南石油大学 Light response epoxy resin based on azopyridine structure and preparation method and light response method thereof

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