JPH0616891Y2 - オゾン反応処理装置 - Google Patents

オゾン反応処理装置

Info

Publication number
JPH0616891Y2
JPH0616891Y2 JP1987091369U JP9136987U JPH0616891Y2 JP H0616891 Y2 JPH0616891 Y2 JP H0616891Y2 JP 1987091369 U JP1987091369 U JP 1987091369U JP 9136987 U JP9136987 U JP 9136987U JP H0616891 Y2 JPH0616891 Y2 JP H0616891Y2
Authority
JP
Japan
Prior art keywords
ozone
ceramics
containing gas
reactor
voltage power
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1987091369U
Other languages
English (en)
Japanese (ja)
Other versions
JPS642035U (enrdf_load_stackoverflow
Inventor
健一 西尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ube Corp
Original Assignee
Ube Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ube Industries Ltd filed Critical Ube Industries Ltd
Priority to JP1987091369U priority Critical patent/JPH0616891Y2/ja
Publication of JPS642035U publication Critical patent/JPS642035U/ja
Application granted granted Critical
Publication of JPH0616891Y2 publication Critical patent/JPH0616891Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Oxygen, Ozone, And Oxides In General (AREA)
  • Drying Of Semiconductors (AREA)
JP1987091369U 1987-06-16 1987-06-16 オゾン反応処理装置 Expired - Lifetime JPH0616891Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987091369U JPH0616891Y2 (ja) 1987-06-16 1987-06-16 オゾン反応処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987091369U JPH0616891Y2 (ja) 1987-06-16 1987-06-16 オゾン反応処理装置

Publications (2)

Publication Number Publication Date
JPS642035U JPS642035U (enrdf_load_stackoverflow) 1989-01-09
JPH0616891Y2 true JPH0616891Y2 (ja) 1994-05-02

Family

ID=30952091

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987091369U Expired - Lifetime JPH0616891Y2 (ja) 1987-06-16 1987-06-16 オゾン反応処理装置

Country Status (1)

Country Link
JP (1) JPH0616891Y2 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6195803B2 (ja) * 2014-05-02 2017-09-13 東京エレクトロン株式会社 基板処理装置、基板処理方法および記憶媒体

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS557564A (en) * 1978-06-30 1980-01-19 Sumitomo Precision Prod Co Ltd Ozonizer
JPS55126506A (en) * 1979-03-23 1980-09-30 Mitsubishi Electric Corp Ozonizer controlling system
JPS5962390A (ja) * 1982-09-30 1984-04-09 Toshiba Corp オゾン発生装置

Also Published As

Publication number Publication date
JPS642035U (enrdf_load_stackoverflow) 1989-01-09

Similar Documents

Publication Publication Date Title
JPH0616891Y2 (ja) オゾン反応処理装置
JPH0831435B2 (ja) 基板の洗浄方法
JP3653735B2 (ja) 表面処理方法及びその装置
JP2669168B2 (ja) マイクロ波プラズマ処理装置
JP2001156049A (ja) 有機物剥離装置及び有機物剥離方法
JP2004349375A (ja) ドライエッチング装置のガス分散板
TW383420B (en) Manufacturing method and manufacturing apparatus for semiconductor device
JPH0691059B2 (ja) 洗浄装置
JP2002134478A (ja) オゾン処理装置
JP3893939B2 (ja) レジスト剥離装置、レジスト剥離方法、半導体装置の製造方法
JPS6381823A (ja) アツシング装置
JPH08148471A (ja) プラズマエッチング装置
JPS6127635A (ja) フオトレジストの高能率乾式除去装置
JP2546441B2 (ja) レジスト灰化装置
JPS6358933A (ja) アツシング装置
JPH06101424B2 (ja) 半導体ウエハ処理装置
JPS63150922A (ja) アツシング方法
JPS63310118A (ja) オゾン反応処理方法
JPS6245121A (ja) 処理装置
JPS63260034A (ja) アッシング装置
JPS6358932A (ja) アツシング装置
JPS63133528A (ja) アツシング装置
JPS6348825A (ja) アツシング装置
JPH01286315A (ja) アッシング装置
JPH03159237A (ja) 洗浄装置