JPH0614479Y2 - 炭化ケイ素単結晶の液相エピタキシヤル成長装置 - Google Patents
炭化ケイ素単結晶の液相エピタキシヤル成長装置Info
- Publication number
- JPH0614479Y2 JPH0614479Y2 JP1986127461U JP12746186U JPH0614479Y2 JP H0614479 Y2 JPH0614479 Y2 JP H0614479Y2 JP 1986127461 U JP1986127461 U JP 1986127461U JP 12746186 U JP12746186 U JP 12746186U JP H0614479 Y2 JPH0614479 Y2 JP H0614479Y2
- Authority
- JP
- Japan
- Prior art keywords
- single crystal
- silicon carbide
- crucible
- melt
- carbide single
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986127461U JPH0614479Y2 (ja) | 1986-08-20 | 1986-08-20 | 炭化ケイ素単結晶の液相エピタキシヤル成長装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986127461U JPH0614479Y2 (ja) | 1986-08-20 | 1986-08-20 | 炭化ケイ素単結晶の液相エピタキシヤル成長装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6333623U JPS6333623U (enExample) | 1988-03-04 |
| JPH0614479Y2 true JPH0614479Y2 (ja) | 1994-04-13 |
Family
ID=31022236
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986127461U Expired - Lifetime JPH0614479Y2 (ja) | 1986-08-20 | 1986-08-20 | 炭化ケイ素単結晶の液相エピタキシヤル成長装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0614479Y2 (enExample) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5645893A (en) * | 1979-09-25 | 1981-04-25 | Nippon Telegr & Teleph Corp <Ntt> | Reducing method for defect of silicon single crystal |
| JPS58104096A (ja) * | 1981-10-23 | 1983-06-21 | Toshiba Ceramics Co Ltd | 単結晶シリコン引上装置 |
-
1986
- 1986-08-20 JP JP1986127461U patent/JPH0614479Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6333623U (enExample) | 1988-03-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5968261A (en) | Method for growing large silicon carbide single crystals | |
| US6066205A (en) | Growth of bulk single crystals of aluminum nitride from a melt | |
| US9068277B2 (en) | Apparatus for manufacturing single-crystal silicon carbide | |
| JP5580764B2 (ja) | SiC単結晶製造装置 | |
| CN113122924B (zh) | 晶体生长组件、晶体生长装置和方法 | |
| JPH07172998A (ja) | 炭化ケイ素単結晶の製造方法 | |
| JP4052678B2 (ja) | 大形炭化珪素単結晶成長装置 | |
| JP3237069B2 (ja) | SiC単結晶の製造方法 | |
| JP2012193055A (ja) | SiC単結晶製造方法およびそれに用いる装置 | |
| JPH05178698A (ja) | 炭化珪素バルク単結晶の製造装置及び製造方法 | |
| JP4070353B2 (ja) | シリコンカーバイドのエピタキシャル成長方法 | |
| JP4053125B2 (ja) | SiC単結晶の合成方法 | |
| Gillessen et al. | Growth of silicon carbide from liquid silicon by a travelling heater method | |
| JPH05345700A (ja) | 炭化ケイ素単結晶の液相エピタキシャル成長装置 | |
| PL238539B1 (pl) | Sposób wytwarzania kryształów węglika krzemu | |
| JP4836377B2 (ja) | 溶融体からの窒化アルミニウムのバルク単結晶の成長 | |
| JP2680617B2 (ja) | 炭化ケイ素単結晶の成長方法 | |
| US3649210A (en) | Apparatus for crucible-free zone-melting of crystalline materials | |
| JPS59203798A (ja) | 帯状シリコン結晶製造装置 | |
| JPH0648897A (ja) | SiC単結晶の液相エピタキシャル成長装置と製造方法 | |
| JPH0416597A (ja) | 炭化珪素単結晶の製造方法 | |
| JPS63156095A (ja) | SiC単結晶の液相エピタキシヤル成長方法 | |
| TWI875366B (zh) | 一種具有多個沉積位點的長晶裝置與其製程 | |
| JP2758038B2 (ja) | 単結晶製造装置 | |
| JPH09142995A (ja) | P型単結晶炭化珪素の製造方法 |