JPH0587008B2 - - Google Patents

Info

Publication number
JPH0587008B2
JPH0587008B2 JP61032742A JP3274286A JPH0587008B2 JP H0587008 B2 JPH0587008 B2 JP H0587008B2 JP 61032742 A JP61032742 A JP 61032742A JP 3274286 A JP3274286 A JP 3274286A JP H0587008 B2 JPH0587008 B2 JP H0587008B2
Authority
JP
Japan
Prior art keywords
wafer
mask
mounting table
groove
grooves
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61032742A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62193119A (ja
Inventor
Yoshinori Shimamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP61032742A priority Critical patent/JPS62193119A/ja
Publication of JPS62193119A publication Critical patent/JPS62193119A/ja
Publication of JPH0587008B2 publication Critical patent/JPH0587008B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61032742A 1986-02-19 1986-02-19 ウエハ密着方法 Granted JPS62193119A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61032742A JPS62193119A (ja) 1986-02-19 1986-02-19 ウエハ密着方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61032742A JPS62193119A (ja) 1986-02-19 1986-02-19 ウエハ密着方法

Publications (2)

Publication Number Publication Date
JPS62193119A JPS62193119A (ja) 1987-08-25
JPH0587008B2 true JPH0587008B2 (enrdf_load_stackoverflow) 1993-12-15

Family

ID=12367289

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61032742A Granted JPS62193119A (ja) 1986-02-19 1986-02-19 ウエハ密着方法

Country Status (1)

Country Link
JP (1) JPS62193119A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9557659B2 (en) 2013-10-23 2017-01-31 Canon Kabushiki Kaisha Lithography apparatus, determination method, and method of manufacturing article

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9557659B2 (en) 2013-10-23 2017-01-31 Canon Kabushiki Kaisha Lithography apparatus, determination method, and method of manufacturing article

Also Published As

Publication number Publication date
JPS62193119A (ja) 1987-08-25

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