JPH0586475B2 - - Google Patents

Info

Publication number
JPH0586475B2
JPH0586475B2 JP61277559A JP27755986A JPH0586475B2 JP H0586475 B2 JPH0586475 B2 JP H0586475B2 JP 61277559 A JP61277559 A JP 61277559A JP 27755986 A JP27755986 A JP 27755986A JP H0586475 B2 JPH0586475 B2 JP H0586475B2
Authority
JP
Japan
Prior art keywords
target
sputtering
cooling
cooling block
thermal expansion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61277559A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63130771A (ja
Inventor
Kenichi Kubo
Fumio Matsukawa
Koji Ookubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP27755986A priority Critical patent/JPS63130771A/ja
Publication of JPS63130771A publication Critical patent/JPS63130771A/ja
Publication of JPH0586475B2 publication Critical patent/JPH0586475B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP27755986A 1986-11-20 1986-11-20 スパツタ装置 Granted JPS63130771A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27755986A JPS63130771A (ja) 1986-11-20 1986-11-20 スパツタ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27755986A JPS63130771A (ja) 1986-11-20 1986-11-20 スパツタ装置

Publications (2)

Publication Number Publication Date
JPS63130771A JPS63130771A (ja) 1988-06-02
JPH0586475B2 true JPH0586475B2 (cg-RX-API-DMAC10.html) 1993-12-13

Family

ID=17585209

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27755986A Granted JPS63130771A (ja) 1986-11-20 1986-11-20 スパツタ装置

Country Status (1)

Country Link
JP (1) JPS63130771A (cg-RX-API-DMAC10.html)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4385979A (en) * 1982-07-09 1983-05-31 Varian Associates, Inc. Target assemblies of special materials for use in sputter coating apparatus
JPS6065529A (ja) * 1983-09-21 1985-04-15 Hitachi Ltd スパッタリング用タ−ゲット

Also Published As

Publication number Publication date
JPS63130771A (ja) 1988-06-02

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