JPH0586471B2 - - Google Patents

Info

Publication number
JPH0586471B2
JPH0586471B2 JP61212487A JP21248786A JPH0586471B2 JP H0586471 B2 JPH0586471 B2 JP H0586471B2 JP 61212487 A JP61212487 A JP 61212487A JP 21248786 A JP21248786 A JP 21248786A JP H0586471 B2 JPH0586471 B2 JP H0586471B2
Authority
JP
Japan
Prior art keywords
mask
holes
substrate
thin film
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61212487A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6369962A (ja
Inventor
Osamu Shimizu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP21248786A priority Critical patent/JPS6369962A/ja
Publication of JPS6369962A publication Critical patent/JPS6369962A/ja
Publication of JPH0586471B2 publication Critical patent/JPH0586471B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP21248786A 1986-09-09 1986-09-09 マスクスパツタ法 Granted JPS6369962A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21248786A JPS6369962A (ja) 1986-09-09 1986-09-09 マスクスパツタ法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21248786A JPS6369962A (ja) 1986-09-09 1986-09-09 マスクスパツタ法

Publications (2)

Publication Number Publication Date
JPS6369962A JPS6369962A (ja) 1988-03-30
JPH0586471B2 true JPH0586471B2 (enExample) 1993-12-13

Family

ID=16623463

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21248786A Granted JPS6369962A (ja) 1986-09-09 1986-09-09 マスクスパツタ法

Country Status (1)

Country Link
JP (1) JPS6369962A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008013834A (ja) * 2006-07-07 2008-01-24 Canon Anelva Corp 基板トレイ及び成膜装置
JP2012124127A (ja) * 2010-12-10 2012-06-28 Canon Inc 蒸着マスクおよびそれを用いた有機ｅｌ表示パネルの製造方法
JP6137041B2 (ja) * 2014-04-28 2017-05-31 トヨタ自動車株式会社 表面に膜を有する部材を製造する方法
JP7129888B2 (ja) * 2018-11-07 2022-09-02 東京エレクトロン株式会社 成膜方法及び半導体製造装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4727897U (enExample) * 1971-04-15 1972-11-29

Also Published As

Publication number Publication date
JPS6369962A (ja) 1988-03-30

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