JPH0584513B2 - - Google Patents

Info

Publication number
JPH0584513B2
JPH0584513B2 JP60117145A JP11714585A JPH0584513B2 JP H0584513 B2 JPH0584513 B2 JP H0584513B2 JP 60117145 A JP60117145 A JP 60117145A JP 11714585 A JP11714585 A JP 11714585A JP H0584513 B2 JPH0584513 B2 JP H0584513B2
Authority
JP
Japan
Prior art keywords
resist
reaction
present
molecular compound
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60117145A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61275747A (ja
Inventor
Katsumi Tanigaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP60117145A priority Critical patent/JPS61275747A/ja
Publication of JPS61275747A publication Critical patent/JPS61275747A/ja
Publication of JPH0584513B2 publication Critical patent/JPH0584513B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP60117145A 1985-05-30 1985-05-30 ネガレジスト材料 Granted JPS61275747A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60117145A JPS61275747A (ja) 1985-05-30 1985-05-30 ネガレジスト材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60117145A JPS61275747A (ja) 1985-05-30 1985-05-30 ネガレジスト材料

Publications (2)

Publication Number Publication Date
JPS61275747A JPS61275747A (ja) 1986-12-05
JPH0584513B2 true JPH0584513B2 (en, 2012) 1993-12-02

Family

ID=14704573

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60117145A Granted JPS61275747A (ja) 1985-05-30 1985-05-30 ネガレジスト材料

Country Status (1)

Country Link
JP (1) JPS61275747A (en, 2012)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52106901A (en) * 1976-03-02 1977-09-08 Oji Paper Co Photoosensitive resin composition
DE2718259C2 (de) * 1977-04-25 1982-11-25 Hoechst Ag, 6000 Frankfurt Strahlungsempfindliches Gemisch
JPS5423574A (en) * 1977-07-22 1979-02-22 Seiko Epson Corp Electronic watch
JPS54153622A (en) * 1978-05-24 1979-12-04 Fuji Photo Film Co Ltd Photosensitive composition and image formation method using this
JPS5730829A (en) * 1980-08-01 1982-02-19 Hitachi Ltd Micropattern formation method

Also Published As

Publication number Publication date
JPS61275747A (ja) 1986-12-05

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