JPH0573339B2 - - Google Patents
Info
- Publication number
- JPH0573339B2 JPH0573339B2 JP62272549A JP27254987A JPH0573339B2 JP H0573339 B2 JPH0573339 B2 JP H0573339B2 JP 62272549 A JP62272549 A JP 62272549A JP 27254987 A JP27254987 A JP 27254987A JP H0573339 B2 JPH0573339 B2 JP H0573339B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- electrode pad
- semiconductor device
- base layer
- corrosion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H10W72/90—
-
- H10W72/9226—
-
- H10W72/923—
-
- H10W72/983—
Landscapes
- Wire Bonding (AREA)
- Local Oxidation Of Silicon (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62272549A JPH01115144A (ja) | 1987-10-28 | 1987-10-28 | 半導体装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62272549A JPH01115144A (ja) | 1987-10-28 | 1987-10-28 | 半導体装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01115144A JPH01115144A (ja) | 1989-05-08 |
| JPH0573339B2 true JPH0573339B2 (Direct) | 1993-10-14 |
Family
ID=17515450
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62272549A Granted JPH01115144A (ja) | 1987-10-28 | 1987-10-28 | 半導体装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01115144A (Direct) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AT409429B (de) * | 1999-07-15 | 2002-08-26 | Sez Semiconduct Equip Zubehoer | Verfahren zum ätzbehandeln von halbleitersubstraten zwecks freilegen einer metallschicht |
| JP2002289640A (ja) * | 2001-03-27 | 2002-10-04 | Hitachi Chem Co Ltd | ワイヤボンディング接続電極構造 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5563842A (en) * | 1978-11-08 | 1980-05-14 | Nec Corp | Semiconductor device |
-
1987
- 1987-10-28 JP JP62272549A patent/JPH01115144A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01115144A (ja) | 1989-05-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5656858A (en) | Semiconductor device with bump structure | |
| US5310699A (en) | Method of manufacturing a bump electrode | |
| US6566253B2 (en) | Method of making electrical interconnection for attachment to a substrate | |
| JPS62145758A (ja) | パラジウムを用いる銅製ボンデイングパツドの酸化防止法 | |
| US6297160B1 (en) | Application of pure aluminum to prevent pad corrosion | |
| JPH0547760A (ja) | 半導体集積回路装置、その製造方法およびその製造に用いるスパツタターゲツト | |
| JP2622156B2 (ja) | 集積回路パッド用の接触方法とその構造 | |
| JPS61152042A (ja) | 半導体素子の金属化パターンおよびその方法 | |
| US5751067A (en) | Compact semiconductor device having excellent electrical characteristics and long time reliability | |
| JPH0573339B2 (Direct) | ||
| TW200837855A (en) | Copper-metallized integrated circuits having an overcoat for protecting bondable metal contacts and improving mold compound adhesion | |
| JPH02125447A (ja) | 半導体装置およびその製造方法 | |
| US4713260A (en) | Method of ensuring adhesion of chemically vapor deposited oxide to gold integrated circuit interconnect lines | |
| JP2000068269A (ja) | 半導体装置および半導体装置の製造方法 | |
| US4716071A (en) | Method of ensuring adhesion of chemically vapor deposited oxide to gold integrated circuit interconnect lines | |
| JP2509175B2 (ja) | 配線構造体の製造方法 | |
| JP2616063B2 (ja) | バンプ電極の製造方法 | |
| US7163884B2 (en) | Semiconductor device and fabrication method thereof | |
| JPH04217323A (ja) | 半導体装置用バンプ電極の製造方法 | |
| JPH04127454A (ja) | 半導体装置 | |
| KR100445409B1 (ko) | 반도체소자의금속배선형성방법 | |
| JPS59145537A (ja) | 半導体装置 | |
| JP3471723B2 (ja) | ベアチップ実装対応多層配線とその作製方法 | |
| JP3702480B2 (ja) | 電極パッドの形成方法 | |
| JP2850341B2 (ja) | 半導体装置の製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |