JPH057238Y2 - - Google Patents
Info
- Publication number
- JPH057238Y2 JPH057238Y2 JP1987060742U JP6074287U JPH057238Y2 JP H057238 Y2 JPH057238 Y2 JP H057238Y2 JP 1987060742 U JP1987060742 U JP 1987060742U JP 6074287 U JP6074287 U JP 6074287U JP H057238 Y2 JPH057238 Y2 JP H057238Y2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- bias voltage
- constant
- processed
- evaporated particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 35
- 238000007733 ion plating Methods 0.000 claims description 12
- 239000002245 particle Substances 0.000 description 21
- 239000000463 material Substances 0.000 description 6
- 230000001133 acceleration Effects 0.000 description 5
- 238000001704 evaporation Methods 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 238000010891 electric arc Methods 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- FFRBMBIXVSCUFS-UHFFFAOYSA-N 2,4-dinitro-1-naphthol Chemical compound C1=CC=C2C(O)=C([N+]([O-])=O)C=C([N+]([O-])=O)C2=C1 FFRBMBIXVSCUFS-UHFFFAOYSA-N 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987060742U JPH057238Y2 (ko) | 1987-04-23 | 1987-04-23 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987060742U JPH057238Y2 (ko) | 1987-04-23 | 1987-04-23 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63170458U JPS63170458U (ko) | 1988-11-07 |
| JPH057238Y2 true JPH057238Y2 (ko) | 1993-02-24 |
Family
ID=30893430
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987060742U Expired - Lifetime JPH057238Y2 (ko) | 1987-04-23 | 1987-04-23 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH057238Y2 (ko) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59190359A (ja) * | 1983-01-19 | 1984-10-29 | マルチ−ア−ク・バキユ−ム・システムズ・インコ−ポレ−テツド | 真空蒸着装置の基体保持装置 |
| JPS6210266A (ja) * | 1985-07-06 | 1987-01-19 | Kobe Steel Ltd | 蒸着装置 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5270149U (ko) * | 1975-11-21 | 1977-05-25 | ||
| JPS5969964U (ja) * | 1982-10-28 | 1984-05-12 | 日本電子株式会社 | 成膜装置 |
| JPS5995157U (ja) * | 1982-12-20 | 1984-06-28 | 株式会社日立製作所 | イオンプレ−テイング装置 |
-
1987
- 1987-04-23 JP JP1987060742U patent/JPH057238Y2/ja not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59190359A (ja) * | 1983-01-19 | 1984-10-29 | マルチ−ア−ク・バキユ−ム・システムズ・インコ−ポレ−テツド | 真空蒸着装置の基体保持装置 |
| JPS6210266A (ja) * | 1985-07-06 | 1987-01-19 | Kobe Steel Ltd | 蒸着装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63170458U (ko) | 1988-11-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4485759A (en) | Planetary substrate support apparatus for vapor vacuum deposition coating | |
| JPS6254078A (ja) | 陰極スパツタリング処理により基板に薄層を被着する装置 | |
| GB1483966A (en) | Vapourized-metal cluster ion source and ionized-cluster beam deposition | |
| EP0390692A3 (en) | Method of forming thin film, apparatus for forming thin film and sensor | |
| WO2004059027A3 (en) | Ionic plasma deposition of anti-microbial surfaces and the anti-microbial surfaces resulting therefrom | |
| Ehrich et al. | Adhesive metal films obtained by thermionic vacuum arc (TVA) deposition | |
| JPH057238Y2 (ko) | ||
| CN100519828C (zh) | 一种真空镀膜方法和设备 | |
| EP0776987B1 (de) | Vakuumbeschichtungsanlage mit einem in der Vakuumkammer angeordneten Tiegel zur Aufnahme von zu verdampfendem Material | |
| JPS6082665A (ja) | イオンビ−ムスパツタ法による多層薄膜製造方法 | |
| JPH05202471A (ja) | マグネトロンスパッタリング装置 | |
| JPS5780713A (en) | Manufacture of magnetic thin film by sputtering | |
| JPS6473075A (en) | Film forming device by ion beam sputtering | |
| JPH0297673A (ja) | イオンビームスパッタ法 | |
| JPS59153882A (ja) | スパツタ−蒸着法 | |
| JPS6452061A (en) | Formation of metal film | |
| JPS627851A (ja) | スパツタ方法 | |
| JPH07188920A (ja) | イオンミキシング装置 | |
| RU2135633C1 (ru) | Способ вакуумного нанесения тонких пленок | |
| JP2000038663A (ja) | マグネトロンスパッタ装置 | |
| JPH04221059A (ja) | 立方晶窒化ほう素膜の形成方法 | |
| JPS61117272A (ja) | 発光膜形成装置 | |
| Eizner | Investigating the Sputtering Process of EI 437 B Alloy by Ion Bombardment | |
| RU2075539C1 (ru) | Устройство для ионно-плазменного распыления материалов в вакууме | |
| JPS6465261A (en) | Vapor deposition method by plasma ionization |