JPH0567945B2 - - Google Patents

Info

Publication number
JPH0567945B2
JPH0567945B2 JP63102353A JP10235388A JPH0567945B2 JP H0567945 B2 JPH0567945 B2 JP H0567945B2 JP 63102353 A JP63102353 A JP 63102353A JP 10235388 A JP10235388 A JP 10235388A JP H0567945 B2 JPH0567945 B2 JP H0567945B2
Authority
JP
Japan
Prior art keywords
copolymer
hydroxy
methacrylate
photosensitive
printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63102353A
Other languages
English (en)
Japanese (ja)
Other versions
JPH01274132A (ja
Inventor
Hiroshi Komano
Koji Myaji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP10235388A priority Critical patent/JPH01274132A/ja
Publication of JPH01274132A publication Critical patent/JPH01274132A/ja
Publication of JPH0567945B2 publication Critical patent/JPH0567945B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP10235388A 1988-04-27 1988-04-27 感光性組成物 Granted JPH01274132A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10235388A JPH01274132A (ja) 1988-04-27 1988-04-27 感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10235388A JPH01274132A (ja) 1988-04-27 1988-04-27 感光性組成物

Publications (2)

Publication Number Publication Date
JPH01274132A JPH01274132A (ja) 1989-11-01
JPH0567945B2 true JPH0567945B2 (en, 2012) 1993-09-27

Family

ID=14325112

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10235388A Granted JPH01274132A (ja) 1988-04-27 1988-04-27 感光性組成物

Country Status (1)

Country Link
JP (1) JPH01274132A (en, 2012)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5403943B2 (ja) * 2008-05-21 2014-01-29 昭和電工株式会社 ポリマー、感光性樹脂組成物及びレジストパターンの形成方法
JP7440224B2 (ja) * 2019-08-21 2024-02-28 太陽ホールディングス株式会社 ポジ型感光性樹脂組成物

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60217356A (ja) * 1984-04-13 1985-10-30 Asahi Chem Ind Co Ltd 感光性組成物

Also Published As

Publication number Publication date
JPH01274132A (ja) 1989-11-01

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