JPH0565527B2 - - Google Patents

Info

Publication number
JPH0565527B2
JPH0565527B2 JP12386682A JP12386682A JPH0565527B2 JP H0565527 B2 JPH0565527 B2 JP H0565527B2 JP 12386682 A JP12386682 A JP 12386682A JP 12386682 A JP12386682 A JP 12386682A JP H0565527 B2 JPH0565527 B2 JP H0565527B2
Authority
JP
Japan
Prior art keywords
group
product
mol
formula
molecular weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP12386682A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5915419A (ja
Inventor
Kazuhide Saigo
Shigeyoshi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP12386682A priority Critical patent/JPS5915419A/ja
Priority to US06/501,201 priority patent/US4551417A/en
Priority to CA000429834A priority patent/CA1207216A/en
Priority to IE1339/83A priority patent/IE54731B1/en
Priority to EP83303324A priority patent/EP0096596B2/en
Priority to DE8383303324T priority patent/DE3363914D1/de
Publication of JPS5915419A publication Critical patent/JPS5915419A/ja
Publication of JPH0565527B2 publication Critical patent/JPH0565527B2/ja
Granted legal-status Critical Current

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  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP12386682A 1982-06-08 1982-07-16 シリコン原子を有するスチレン系重合体 Granted JPS5915419A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP12386682A JPS5915419A (ja) 1982-07-16 1982-07-16 シリコン原子を有するスチレン系重合体
US06/501,201 US4551417A (en) 1982-06-08 1983-06-06 Method of forming patterns in manufacturing microelectronic devices
CA000429834A CA1207216A (en) 1982-06-08 1983-06-07 Method of forming patterns in manufacturing microelectronic devices
IE1339/83A IE54731B1 (en) 1982-06-08 1983-06-07 Microelectronic device manufacture
EP83303324A EP0096596B2 (en) 1982-06-08 1983-06-08 Microelectronic device manufacture
DE8383303324T DE3363914D1 (en) 1982-06-08 1983-06-08 Microelectronic device manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12386682A JPS5915419A (ja) 1982-07-16 1982-07-16 シリコン原子を有するスチレン系重合体

Publications (2)

Publication Number Publication Date
JPS5915419A JPS5915419A (ja) 1984-01-26
JPH0565527B2 true JPH0565527B2 (enExample) 1993-09-17

Family

ID=14871317

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12386682A Granted JPS5915419A (ja) 1982-06-08 1982-07-16 シリコン原子を有するスチレン系重合体

Country Status (1)

Country Link
JP (1) JPS5915419A (enExample)

Also Published As

Publication number Publication date
JPS5915419A (ja) 1984-01-26

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