JPH056336B2 - - Google Patents

Info

Publication number
JPH056336B2
JPH056336B2 JP57092905A JP9290582A JPH056336B2 JP H056336 B2 JPH056336 B2 JP H056336B2 JP 57092905 A JP57092905 A JP 57092905A JP 9290582 A JP9290582 A JP 9290582A JP H056336 B2 JPH056336 B2 JP H056336B2
Authority
JP
Japan
Prior art keywords
pattern
resist
electron beam
accelerating voltage
minimum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57092905A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58210616A (ja
Inventor
Tadahiro Takigawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP9290582A priority Critical patent/JPS58210616A/ja
Publication of JPS58210616A publication Critical patent/JPS58210616A/ja
Publication of JPH056336B2 publication Critical patent/JPH056336B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Beam Exposure (AREA)
JP9290582A 1982-05-31 1982-05-31 電子ビ−ム描画方法 Granted JPS58210616A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9290582A JPS58210616A (ja) 1982-05-31 1982-05-31 電子ビ−ム描画方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9290582A JPS58210616A (ja) 1982-05-31 1982-05-31 電子ビ−ム描画方法

Publications (2)

Publication Number Publication Date
JPS58210616A JPS58210616A (ja) 1983-12-07
JPH056336B2 true JPH056336B2 (enrdf_load_stackoverflow) 1993-01-26

Family

ID=14067492

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9290582A Granted JPS58210616A (ja) 1982-05-31 1982-05-31 電子ビ−ム描画方法

Country Status (1)

Country Link
JP (1) JPS58210616A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013207045A (ja) * 2012-03-28 2013-10-07 Toppan Printing Co Ltd パターン描画方法およびそれを用いるパターン描画装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5380168A (en) * 1976-12-25 1978-07-15 Fujitsu Ltd Exposure method for electronic beam
US4099062A (en) * 1976-12-27 1978-07-04 International Business Machines Corporation Electron beam lithography process
JPS5726436A (en) * 1980-07-23 1982-02-12 Fujitsu Ltd Extraction pattern for electron scattering intensity distribution
JPS5783029A (en) * 1980-11-11 1982-05-24 Fujitsu Ltd Exposure of electron beam

Also Published As

Publication number Publication date
JPS58210616A (ja) 1983-12-07

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