JPH0559593B2 - - Google Patents
Info
- Publication number
- JPH0559593B2 JPH0559593B2 JP19565783A JP19565783A JPH0559593B2 JP H0559593 B2 JPH0559593 B2 JP H0559593B2 JP 19565783 A JP19565783 A JP 19565783A JP 19565783 A JP19565783 A JP 19565783A JP H0559593 B2 JPH0559593 B2 JP H0559593B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- gaas
- stripe
- semiconductor laser
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 claims description 22
- 239000013078 crystal Substances 0.000 claims description 21
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 239000010409 thin film Substances 0.000 claims description 8
- 238000010894 electron beam technology Methods 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 22
- 238000000034 method Methods 0.000 description 15
- 239000000758 substrate Substances 0.000 description 10
- 230000010355 oscillation Effects 0.000 description 7
- 239000010408 film Substances 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000003321 amplification Effects 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 238000000927 vapour-phase epitaxy Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/323—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/32308—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm
Landscapes
- Semiconductor Lasers (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19565783A JPS6086888A (ja) | 1983-10-19 | 1983-10-19 | 半導体レ−ザ装置の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19565783A JPS6086888A (ja) | 1983-10-19 | 1983-10-19 | 半導体レ−ザ装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6086888A JPS6086888A (ja) | 1985-05-16 |
JPH0559593B2 true JPH0559593B2 (enrdf_load_stackoverflow) | 1993-08-31 |
Family
ID=16344817
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19565783A Granted JPS6086888A (ja) | 1983-10-19 | 1983-10-19 | 半導体レ−ザ装置の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6086888A (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2687668B2 (ja) * | 1990-04-17 | 1997-12-08 | 日本電気株式会社 | 高出力半導体レーザ素子及びその製造方法 |
-
1983
- 1983-10-19 JP JP19565783A patent/JPS6086888A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6086888A (ja) | 1985-05-16 |
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