JPH055180B2 - - Google Patents
Info
- Publication number
- JPH055180B2 JPH055180B2 JP59242414A JP24241484A JPH055180B2 JP H055180 B2 JPH055180 B2 JP H055180B2 JP 59242414 A JP59242414 A JP 59242414A JP 24241484 A JP24241484 A JP 24241484A JP H055180 B2 JPH055180 B2 JP H055180B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- emitter
- conductivity type
- base
- collector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
- Bipolar Transistors (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59242414A JPS61121359A (ja) | 1984-11-19 | 1984-11-19 | 高速半導体装置の製造方法 |
| US06/781,787 US4617724A (en) | 1983-06-30 | 1985-09-30 | Process for fabricating heterojunction bipolar transistor with low base resistance |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59242414A JPS61121359A (ja) | 1984-11-19 | 1984-11-19 | 高速半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61121359A JPS61121359A (ja) | 1986-06-09 |
| JPH055180B2 true JPH055180B2 (enrdf_load_stackoverflow) | 1993-01-21 |
Family
ID=17088766
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59242414A Granted JPS61121359A (ja) | 1983-06-30 | 1984-11-19 | 高速半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61121359A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5318624B2 (ja) * | 2009-03-27 | 2013-10-16 | 日本電信電話株式会社 | ヘテロ接合バイポーラトランジスタの製造方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2508707A1 (fr) * | 1981-06-26 | 1982-12-31 | Thomson Csf | Transistor balistique a multiples heterojonctions |
-
1984
- 1984-11-19 JP JP59242414A patent/JPS61121359A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61121359A (ja) | 1986-06-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS61121369A (ja) | 半導体装置 | |
| JPH0324782B2 (enrdf_load_stackoverflow) | ||
| JP2590842B2 (ja) | ヘテロ接合型バイポーラトランジスタ | |
| JPH02252267A (ja) | 半導体装置の製造方法 | |
| JPS61188966A (ja) | 高速半導体装置の製造方法 | |
| JPH0326535B2 (enrdf_load_stackoverflow) | ||
| JPH055180B2 (enrdf_load_stackoverflow) | ||
| JP2822400B2 (ja) | 半導体装置 | |
| JPH08102537A (ja) | 単一電子素子とその製造方法 | |
| JPS627159A (ja) | 半導体装置 | |
| JPS63314866A (ja) | バイボ−ラ・トランジスタ | |
| JPH06163602A (ja) | 高電子移動度トランジスタ及びその製造方法 | |
| JPH0793318B2 (ja) | 半導体装置の製造方法 | |
| JPS6376380A (ja) | 半導体装置 | |
| JP2568680B2 (ja) | 化合物半導体装置の製造方法 | |
| JP2570770B2 (ja) | バイポーラ・トランジスタ | |
| JP2611162B2 (ja) | オーミツク電極の形成方法 | |
| JPS6143443A (ja) | 半導体装置の製造方法 | |
| JP3113689B2 (ja) | 半導体装置 | |
| JPH0395824A (ja) | 半導体電子放出素子 | |
| JPS63252475A (ja) | ヘテロ接合型バイポ−ラトランジスタ | |
| JPH1145992A (ja) | 微細構造半導体装置およびその製造法 | |
| JPS61191076A (ja) | 化合物半導体装置の製造方法 | |
| JPS62179765A (ja) | Mis型半導体装置の製造方法 | |
| JPS635564A (ja) | ヘテロ接合型バイポ−ラトランジスタ |