JPH0551670B2 - - Google Patents

Info

Publication number
JPH0551670B2
JPH0551670B2 JP18544982A JP18544982A JPH0551670B2 JP H0551670 B2 JPH0551670 B2 JP H0551670B2 JP 18544982 A JP18544982 A JP 18544982A JP 18544982 A JP18544982 A JP 18544982A JP H0551670 B2 JPH0551670 B2 JP H0551670B2
Authority
JP
Japan
Prior art keywords
electrode
etched
temperature
etching
mosi
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP18544982A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5976876A (ja
Inventor
Katsuya Okumura
Tooru Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP18544982A priority Critical patent/JPS5976876A/ja
Publication of JPS5976876A publication Critical patent/JPS5976876A/ja
Publication of JPH0551670B2 publication Critical patent/JPH0551670B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
  • Weting (AREA)
JP18544982A 1982-10-22 1982-10-22 反応性イオンエツチング方法およびその装置 Granted JPS5976876A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18544982A JPS5976876A (ja) 1982-10-22 1982-10-22 反応性イオンエツチング方法およびその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18544982A JPS5976876A (ja) 1982-10-22 1982-10-22 反応性イオンエツチング方法およびその装置

Publications (2)

Publication Number Publication Date
JPS5976876A JPS5976876A (ja) 1984-05-02
JPH0551670B2 true JPH0551670B2 (enExample) 1993-08-03

Family

ID=16170986

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18544982A Granted JPS5976876A (ja) 1982-10-22 1982-10-22 反応性イオンエツチング方法およびその装置

Country Status (1)

Country Link
JP (1) JPS5976876A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT387989B (de) * 1987-09-01 1989-04-10 Miba Gleitlager Ag Vorrichtung zur behandlung von als kathode geschalteten innenflaechen von gegenstaenden durch ionenbeschuss aus einer gasentladung
US5427670A (en) * 1992-12-10 1995-06-27 U.S. Philips Corporation Device for the treatment of substrates at low temperature
US6231776B1 (en) * 1995-12-04 2001-05-15 Daniel L. Flamm Multi-temperature processing
JP4832594B1 (ja) * 2010-12-27 2011-12-07 卓也 佐々木 管式熱交換器

Also Published As

Publication number Publication date
JPS5976876A (ja) 1984-05-02

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