JPS5976876A - 反応性イオンエツチング方法およびその装置 - Google Patents

反応性イオンエツチング方法およびその装置

Info

Publication number
JPS5976876A
JPS5976876A JP18544982A JP18544982A JPS5976876A JP S5976876 A JPS5976876 A JP S5976876A JP 18544982 A JP18544982 A JP 18544982A JP 18544982 A JP18544982 A JP 18544982A JP S5976876 A JPS5976876 A JP S5976876A
Authority
JP
Japan
Prior art keywords
electrode
etched
etching
ion etching
reactive ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18544982A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0551670B2 (enExample
Inventor
Katsuya Okumura
勝弥 奥村
Toru Watanabe
徹 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP18544982A priority Critical patent/JPS5976876A/ja
Publication of JPS5976876A publication Critical patent/JPS5976876A/ja
Publication of JPH0551670B2 publication Critical patent/JPH0551670B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
  • Weting (AREA)
JP18544982A 1982-10-22 1982-10-22 反応性イオンエツチング方法およびその装置 Granted JPS5976876A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18544982A JPS5976876A (ja) 1982-10-22 1982-10-22 反応性イオンエツチング方法およびその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18544982A JPS5976876A (ja) 1982-10-22 1982-10-22 反応性イオンエツチング方法およびその装置

Publications (2)

Publication Number Publication Date
JPS5976876A true JPS5976876A (ja) 1984-05-02
JPH0551670B2 JPH0551670B2 (enExample) 1993-08-03

Family

ID=16170986

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18544982A Granted JPS5976876A (ja) 1982-10-22 1982-10-22 反応性イオンエツチング方法およびその装置

Country Status (1)

Country Link
JP (1) JPS5976876A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT387989B (de) * 1987-09-01 1989-04-10 Miba Gleitlager Ag Vorrichtung zur behandlung von als kathode geschalteten innenflaechen von gegenstaenden durch ionenbeschuss aus einer gasentladung
JPH06280057A (ja) * 1992-12-10 1994-10-04 Philips Electron Nv 基板の低温処理装置
USRE40264E1 (en) * 1995-12-04 2008-04-29 Flamm Daniel L Multi-temperature processing
JP4832594B1 (ja) * 2010-12-27 2011-12-07 卓也 佐々木 管式熱交換器

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT387989B (de) * 1987-09-01 1989-04-10 Miba Gleitlager Ag Vorrichtung zur behandlung von als kathode geschalteten innenflaechen von gegenstaenden durch ionenbeschuss aus einer gasentladung
JPH06280057A (ja) * 1992-12-10 1994-10-04 Philips Electron Nv 基板の低温処理装置
USRE40264E1 (en) * 1995-12-04 2008-04-29 Flamm Daniel L Multi-temperature processing
JP4832594B1 (ja) * 2010-12-27 2011-12-07 卓也 佐々木 管式熱交換器

Also Published As

Publication number Publication date
JPH0551670B2 (enExample) 1993-08-03

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