JPH0546694B2 - - Google Patents

Info

Publication number
JPH0546694B2
JPH0546694B2 JP61017072A JP1707286A JPH0546694B2 JP H0546694 B2 JPH0546694 B2 JP H0546694B2 JP 61017072 A JP61017072 A JP 61017072A JP 1707286 A JP1707286 A JP 1707286A JP H0546694 B2 JPH0546694 B2 JP H0546694B2
Authority
JP
Japan
Prior art keywords
exposure
wafer
light
output
amount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61017072A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62176129A (ja
Inventor
Makoto Torigoe
Terumasa Sakai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP61017072A priority Critical patent/JPS62176129A/ja
Publication of JPS62176129A publication Critical patent/JPS62176129A/ja
Publication of JPH0546694B2 publication Critical patent/JPH0546694B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Control Of Exposure In Printing And Copying (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61017072A 1986-01-29 1986-01-29 露光装置 Granted JPS62176129A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61017072A JPS62176129A (ja) 1986-01-29 1986-01-29 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61017072A JPS62176129A (ja) 1986-01-29 1986-01-29 露光装置

Publications (2)

Publication Number Publication Date
JPS62176129A JPS62176129A (ja) 1987-08-01
JPH0546694B2 true JPH0546694B2 (cg-RX-API-DMAC7.html) 1993-07-14

Family

ID=11933779

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61017072A Granted JPS62176129A (ja) 1986-01-29 1986-01-29 露光装置

Country Status (1)

Country Link
JP (1) JPS62176129A (cg-RX-API-DMAC7.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2615687B2 (ja) * 1987-10-26 1997-06-04 松下電器産業株式会社 エキシマレーザ縮小投影露光方法
JP2003068611A (ja) 2001-08-24 2003-03-07 Canon Inc 露光装置及び半導体デバイスの製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0758678B2 (ja) * 1984-02-14 1995-06-21 キヤノン株式会社 露光装置
JPS61111529A (ja) * 1984-11-06 1986-05-29 Canon Inc 露光量制御装置

Also Published As

Publication number Publication date
JPS62176129A (ja) 1987-08-01

Similar Documents

Publication Publication Date Title
US6252650B1 (en) Exposure apparatus, output control method for energy source, laser device using the control method, and method of producing microdevice
US4711568A (en) Exposure apparatus
US20010035945A1 (en) Exposure method, exposure apparatus and device producing method
JP3617558B2 (ja) 露光量制御方法、露光装置、及び素子製造方法
US6496247B2 (en) Exposure apparatus and exposure method
JP2005506684A (ja) リソグラフィーシステム及びデバイスの製造方法
JPH0774092A (ja) 露光装置及び該露光装置を用いてデバイスを製造する方法
JP2001345245A (ja) 露光方法及び露光装置並びにデバイス製造方法
JP3363532B2 (ja) 走査型露光装置
JP2503495B2 (ja) 露光装置及び露光方法
JPWO2002065597A1 (ja) 光源装置及び光照射装置、並びにデバイス製造方法
JPH0546694B2 (cg-RX-API-DMAC7.html)
US7023885B1 (en) Laser apparatus and method for controlling the same
JP3278892B2 (ja) 露光装置及び方法、並びにデバイス製造方法
JP2001326159A (ja) レーザ装置、露光装置、および該露光装置を用いるデバイス製造方法
JP2004186234A (ja) 露光装置
JP4268364B2 (ja) リソグラフィ装置、デバイス製造方法、およびそれによって製造したデバイス
WO2009150871A1 (ja) 露光装置及びデバイス製造方法
JP2001023888A (ja) レーザ装置及びその制御方法、並びに露光装置及び露光方法
JP2005203802A (ja) 変動する走査速度に対する感度を低下させる被変調リソグラフィビーム
JPH0715875B2 (ja) 露光装置及び方法
JPS6216526A (ja) 投影露光装置及びそれを用いたデバイス製造方法
JP2000331915A (ja) 露光量制御方法および露光装置ならびにレーザビーム出力装置
JP2001203141A (ja) 露光装置及び光源装置
JP2002025880A (ja) 投影露光装置、投影露光方法、光洗浄方法および半導体デバイスの製造方法

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term