JPH0544818B2 - - Google Patents

Info

Publication number
JPH0544818B2
JPH0544818B2 JP59036045A JP3604584A JPH0544818B2 JP H0544818 B2 JPH0544818 B2 JP H0544818B2 JP 59036045 A JP59036045 A JP 59036045A JP 3604584 A JP3604584 A JP 3604584A JP H0544818 B2 JPH0544818 B2 JP H0544818B2
Authority
JP
Japan
Prior art keywords
reaction vessel
reaction
gas
light
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59036045A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60182128A (ja
Inventor
Yasuhiro Mochizuki
Takaya Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP3604584A priority Critical patent/JPS60182128A/ja
Publication of JPS60182128A publication Critical patent/JPS60182128A/ja
Publication of JPH0544818B2 publication Critical patent/JPH0544818B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02524—Group 14 semiconducting materials
    • H01L21/02532—Silicon, silicon germanium, germanium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/0257—Doping during depositing
    • H01L21/02573—Conductivity type
    • H01L21/02576—N-type
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
JP3604584A 1984-02-29 1984-02-29 薄膜形成装置 Granted JPS60182128A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3604584A JPS60182128A (ja) 1984-02-29 1984-02-29 薄膜形成装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3604584A JPS60182128A (ja) 1984-02-29 1984-02-29 薄膜形成装置

Publications (2)

Publication Number Publication Date
JPS60182128A JPS60182128A (ja) 1985-09-17
JPH0544818B2 true JPH0544818B2 (enrdf_load_stackoverflow) 1993-07-07

Family

ID=12458736

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3604584A Granted JPS60182128A (ja) 1984-02-29 1984-02-29 薄膜形成装置

Country Status (1)

Country Link
JP (1) JPS60182128A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3025837U (ja) * 1995-06-09 1996-06-25 佐々木通商株式会社 トレイを兼ねるコーヒーパック等の函

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5436621Y2 (enrdf_load_stackoverflow) * 1975-09-11 1979-11-05
JPS52127065A (en) * 1976-04-16 1977-10-25 Matsushita Electric Ind Co Ltd Gas phase growing method of semiconductor and its device
JPS58119336A (ja) * 1982-01-08 1983-07-15 Ushio Inc 光反応蒸着装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3025837U (ja) * 1995-06-09 1996-06-25 佐々木通商株式会社 トレイを兼ねるコーヒーパック等の函

Also Published As

Publication number Publication date
JPS60182128A (ja) 1985-09-17

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